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1. 发明授权

US4493745A Optical emission spectroscopy end point detection in plasma etching 失效
标题翻译：等离子体蚀刻中的光发射光谱终点检测
公开(公告)号：US4493745A
公开(公告)日：1985-01-15
申请号：US575611
申请日：1984-01-31
申请人： Lee Chen , Henri A. Khoury , Harlan R. Seymour
发明人： Lee Chen , Henri A. Khoury , Harlan R. Seymour
IPC分类号： H01L21/302 , C23F4/00 , H01J37/32 , H01L21/3065 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： H01J37/32935 , C23F4/00
摘要： A method for etching a batch of semiconductor wafers to end point using optical emission spectroscopy is described. The method is applicable to any form of dry plasma etching which produces an emission species capable of being monitored. In a preferred embodiment, as well as a first alternative embodiment, a computer simulation is performed using an algorithm describing the concentration of the monitored etch species within the etching chamber as a function of time. The simulation produces a time period for continuing the etching process past a detected time while monitoring the intensity of emission of the etch species. In a second alternative embodiment, this latter time period is calculated using mathematical distributions describing the parameters of the etching process. In all three embodiments, the actual time that end point of an etching process is reached is closely approximated. In this manner, all wafers in a batch of wafers being etched reach end point while at the same time, the amount of over etching is greatly minimized.
摘要翻译：描述了使用光发射光谱法将一批半导体晶片蚀刻到终点的方法。该方法适用于产生能够被监测的发射物质的任何形式的干等离子体蚀刻。在优选实施例中，以及第一替代实施例，使用描述作为时间的函数的蚀刻室内监测的蚀刻物质的浓度的算法来执行计算机模拟。模拟产生一个时间段，用于在监测蚀刻物质的发射强度的同时，在检测到的时间内继续蚀刻工艺。在第二替代实施例中，使用描述蚀刻工艺的参数的数学分布来计算后一时间段。在所有三个实施例中，达到蚀刻工艺的终点的实际时间是非常接近的。以这种方式，一批待蚀刻的晶片中的所有晶片都到达终点，而同时过度蚀刻的量大大减至最小。

2. 发明申请

US20150376797A1 ANISOTROPIC ETCH OF COPPER USING PASSIVATION 有权
标题翻译：使用钝化的铜的各向异性蚀刻
公开(公告)号：US20150376797A1
公开(公告)日：2015-12-31
申请号：US14320058
申请日：2014-06-30
申请人： Lee Chen , Ying Zhang
发明人： Lee Chen , Ying Zhang
IPC分类号： C23F1/02 , C23F1/08 , H01J37/32 , C23F4/00
CPC分类号： C23F1/02 , C23F1/08 , C23F4/00 , C23G5/00 , H01J37/32862 , H01J2237/334
摘要： A method for anisotropically etching a feature in a Cu-containing layer includes providing a substrate having a Cu-containing layer and a patterned etch mask formed on the Cu-containing layer such that on exposed Cu-containing layer is exposed to processing through the patterned etch mask, passivating a first surface of the exposed Cu-containing layer, and inhibiting passivation of a second surface of the Cu-containing layer. A Cu compound is formed on said second surface of the Cu-containing layer, and the Cu compound is removed from the second surface of the Cu-containing layer to anisotropically etch a feature in the Cu-containing layer.
摘要翻译：一种用于各向异性蚀刻含Cu层中的特征的方法包括提供具有含Cu层的基板和形成在含Cu层上的图案化蚀刻掩模，使得暴露的含Cu层暴露于通过图案化的处理蚀刻掩模，钝化暴露的含Cu层的第一表面，并抑制含Cu层的第二表面的钝化。在Cu含量层的第二表面上形成Cu化合物，并且从Cu含量层的第二表面除去Cu化合物以各向异性地蚀刻含Cu层中的特征。

3. 发明授权

US09112715B2 Method and system for intelligently forwarding multicast packets 有权
标题翻译：智能转发组播报文的方法和系统
公开(公告)号：US09112715B2
公开(公告)日：2015-08-18
申请号：US12765765
申请日：2010-04-22
申请人： Nitin Jain , Lee Chen , Earl Ferguson , Min Zhu
发明人： Nitin Jain , Lee Chen , Earl Ferguson , Min Zhu
IPC分类号： H04L12/18
CPC分类号： H04L12/1886
摘要： A routing system utilizes a layer 2 switch interconnecting several routers to intelligently forward multicast packets throughout an interne exchange carrying multicast content. The layer 2 switch performs protocol snooping to extract a lookup key that is based on network layer protocol information. The lookup key is uniquely formulated to support either shared or explicit source distribution trees. The lookup key is used to query a forwarding memory that returns an outgoing port index. The outgoing port index points to one or more outgoing ports that are eligible to receive the multicast packet. The outgoing ports are also connected to the neighboring device(s) that are designated to receive the multicast packet. The routing system also supports real time maintenance and updating of the forwarding memory based on the periodic exchange of control messages. The routing system is configured to support PIM routers operating in PIM SM or PIM SSM modes. However, the routing system can also support other multicast protocols and/or standards.
摘要翻译：路由系统利用互连多个路由器的层2交换机在携带多播内容的内部交换机中智能地转发多播分组。第二层交换机执行协议侦听，提取基于网络层协议信息的查找密钥。查找密钥是独一无二的，用于支持共享或明确的源分发树。查询键用于查询返回出站端口索引的转发内存。出站端口索引指向一个或多个有资格接收组播数据包的输出端口。输出端口也连接到被指定为接收多播分组的相邻设备。路由系统还支持基于控制消息的周期性交换的转发存储器的实时维护和更新。路由系统配置为支持以PIM SM或PIM SSM模式运行的PIM路由器。然而，路由系统还可以支持其他多播协议和/或标准。

4. 发明授权

US09111727B2 Plasma tuning rods in microwave resonator plasma sources 有权
标题翻译：微波谐振器等离子体源中的等离子体调谐棒
公开(公告)号：US09111727B2
公开(公告)日：2015-08-18
申请号：US13249560
申请日：2011-09-30
申请人： Jianping Zhao , Lee Chen , Merritt Funk , Toshihiko Iwao , Peter L.G. Ventzek
发明人： Jianping Zhao , Lee Chen , Merritt Funk , Toshihiko Iwao , Peter L.G. Ventzek
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01J37/32
CPC分类号： H01J37/32256 , H01J37/32247 , H01J37/32935 , H01L22/00
摘要： The invention provides a plurality of resonator subsystems. The resonator subsystems can comprise one or more resonant cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to plasma by generating resonant microwave energy in a resonant cavity adjacent the plasma. The resonator subsystem can be coupled to a process chamber using one or more interface subsystems and can comprise one or more resonant cavities, and each resonant cavity can have a plurality of plasma tuning rods coupled thereto. Some of the plasma tuning rods can be configured to couple the EM-energy from one or more of the resonant cavities to the process space within the process chamber.
摘要翻译：本发明提供了多个谐振器子系统。谐振器子系统可以包括一个或多个谐振腔，其被配置为通过在与等离子体相邻的谐振腔中产生谐振微波能量将所期望的EM波模式中的电磁（EM）能量耦合到等离子体。谐振器子系统可以使用一个或多个接口子系统耦合到处理室，并且可以包括一个或多个谐振腔，并且每个谐振腔可以具有耦合到其上的多个等离子体调谐棒。一些等离子体调谐杆可被配置成将EM能量从一个或多个谐振腔耦合到处理室内的处理空间。

5. 发明申请

US20150156223A1 NETWORK PROXY LAYER FOR POLICY-BASED APPLICATION PROXIES 审中-公开
标题翻译：网络代理层用于基于策略的应用程序
公开(公告)号：US20150156223A1
公开(公告)日：2015-06-04
申请号：US14094529
申请日：2013-12-02
申请人： Feilong Xu , Chih-Wei Chao , Lee Chen
发明人： Feilong Xu , Chih-Wei Chao , Lee Chen
IPC分类号： H04L29/06
CPC分类号： H04L65/105 , H04L65/1069 , H04L67/141
摘要： A system and method for providing a network proxy layer are disclosed. The network proxy layer may receive a connection establishment event for a client connection of an application session and send the client connection event to an application proxy for the application session, the application proxy being associated with an application of a server. Upon establishment of the client connection, the network proxy layer may receive one or more data packets from the client connection. The network proxy layer may further receive a connection establishment event for a server connection of the application session of the server, and receive one or more data packets from the server connection.
摘要翻译：公开了一种用于提供网络代理层的系统和方法。网络代理层可以接收用于应用会话的客户端连接的连接建立事件，并且将客户端连接事件发送到应用程序会话的应用代理，应用代理与服务器的应用相关联。在建立客户端连接时，网络代理层可以从客户端连接接收一个或多个数据分组。网络代理层还可以接收服务器应用会话的服务器连接的连接建立事件，并从服务器连接接收一个或多个数据包。

6. 发明授权

US08721833B2 Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereof 有权
标题翻译：包含铁电材料的可变电容室部件及其制造和使用方法
公开(公告)号：US08721833B2
公开(公告)日：2014-05-13
申请号：US13366341
申请日：2012-02-05
申请人： Zhiying Chen , Jianping Zhao , Lee Chen , Merritt Funk , Radha Sundararajan
发明人： Zhiying Chen , Jianping Zhao , Lee Chen , Merritt Funk , Radha Sundararajan
IPC分类号： H01L21/306
CPC分类号： H01J37/32495 , H01J37/32504
摘要： A replaceable chamber element for use in a plasma processing system, such as a plasma etching system, is described. The replaceable chamber element includes a chamber component configured to be exposed to plasma in a plasma processing system, wherein the chamber component is fabricated of a ferroelectric material.
摘要翻译：描述了用于诸如等离子体蚀刻系统的等离子体处理系统中的可替换室元件。可替换室元件包括腔室部件，其被构造成在等离子体处理系统中暴露于等离子体，其中室部件由铁电材料制成。

7. 再颁专利

USRE44701E1 System and method for an adaptive TCP SYN cookie with time validation 有权
标题翻译：具有时间验证的自适应TCP SYN cookie的系统和方法
公开(公告)号：USRE44701E1
公开(公告)日：2014-01-14
申请号：US13413191
申请日：2012-03-06
申请人： Lee Chen , Ronald Wai Lun Szeto , Shih-Tsung Hwang
发明人： Lee Chen , Ronald Wai Lun Szeto , Shih-Tsung Hwang
IPC分类号： G01R31/08 , H04L12/56
CPC分类号： H04L47/10 , H04L63/1458
摘要： Provided is a method and system for TCP SYN cookie validation. The method includes receiving a session SYN packet by a TCP session setup module of a host server, generating a transition cookie including a time value representing the actual time, sending a session SYN/ACK packet, including the transition cookie, in response to the received session SYN packet, receiving a session ACK packet, and determining whether a candidate transition cookie in the received session ACK packet comprises a time value representing a time within a predetermined time interval from the time the session ACK packet is received.
摘要翻译：提供了一种用于TCP SYN cookie验证的方法和系统。所述方法包括：通过主机服务器的TCP会话建立模块接收会话SYN分组，生成包含表示实际时间的时间值的转换cookie，响应于接收到的发送包括转换cookie的会话SYN / ACK分组会话SYN分组，接收会话ACK分组，以及确定接收到的会话ACK分组中的候选转移cookie是否包括表示从接收到会话ACK分组的时间起的预定时间间隔内的时间的时间值。

8. 发明授权

US08501499B2 Adaptive recipe selector 有权
标题翻译：自适应配方选择器
公开(公告)号：US08501499B2
公开(公告)日：2013-08-06
申请号：US13073237
申请日：2011-03-28
申请人： Radha Sundararajan , Merritt Funk , Lee Chen , Barton Lane
发明人： Radha Sundararajan , Merritt Funk , Lee Chen , Barton Lane
IPC分类号： H01L21/00 , H01L21/461 , H01L21/302
CPC分类号： H01L22/20 , H01J37/32082 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/32136 , H01L21/32137 , H01L21/32139 , H01L21/6708 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The invention provides a method of processing a wafer using Ion Energy (IE)-related multilayer process sequences and Ion Energy Controlled Multi-Input/Multi-Output (IEC-MIMO) models and libraries that can include one or more measurement procedures, one or more IEC-etch sequences, and one or more Ion Energy Optimized (IEO) etch procedures. The IEC-MIMO process control uses dynamically interacting behavioral modeling between multiple layers and/or multiple IEC etch sequences. The multiple layers and/or the multiple IEC etch sequence can be associated with the creation of lines, trenches, vias, spacers, contacts, and gate structures that can be created using IEO etch procedures.
摘要翻译：本发明提供了一种使用离子能量（IE）相关的多层过程序列和离子能量控制多输入/多输出（IEC-MIMO）模型和可包括一个或多个测量过程的库来处理晶片的方法，其中一个或多个更多的IEC蚀刻序列和一个或多个离子能量优化（IEO）蚀刻程序。 IEC-MIMO过程控制使用多层和/或多个IEC蚀刻序列之间的动态交互行为建模。多层和/或多个IEC蚀刻序列可以与可以使用IEO蚀刻工艺创建的线，沟槽，通孔，间隔物，触点和栅极结构的产生相关联。

9. 发明授权

US08464333B1 System and method for distributed multi-processing security gateway 有权
标题翻译：分布式多处理安全网关的系统和方法
公开(公告)号：US08464333B1
公开(公告)日：2013-06-11
申请号：US13347027
申请日：2012-01-10
申请人： Lee Chen , Ronald Wai Lun Szeto
发明人： Lee Chen , Ronald Wai Lun Szeto
IPC分类号： G06F21/00
CPC分类号： H04L63/20 , H04L29/12433 , H04L29/12481 , H04L61/2539 , H04L61/2557 , H04L63/0209 , H04L63/0218 , H04L63/0227 , H04L63/0281 , H04L65/1069
摘要： A system and method for a distributed multi-processing security gateway establishes a host side session, selects a proxy network address for a server, uses the proxy network address to establish a server side session, receives a data packet, assigns a central processing unit core from a plurality of central processing unit cores in a multi-core processor of the security gateway to process the data packet, processes the data packet according to security policies, and sends the processed data packet. The proxy network address is selected such that a same central processing unit core is assigned to process data packets from the server side session and the host side session. By assigning central processing unit cores in this manner, higher capable security gateways are provided.
摘要翻译：用于分布式多处理安全网关的系统和方法建立主机侧会话，为服务器选择代理网络地址，使用代理网络地址建立服务器端会话，接收数据包，分配中央处理单元核心从安全网关的多核处理器中的多个中央处理单元核心处理数据分组，根据安全策略处理数据分组，并发送处理后的数据分组。代理网络地址被选择为使得相同的中央处理单元核心被分配以处理来自服务器端会话和主机侧会话的数据分组。通过以这种方式分配中央处理单元核心，提供了更高能力的安全网关。

10. 发明授权

US08460567B2 Method and system for etching a MEM device 有权
标题翻译：蚀刻MEM器件的方法和系统
公开(公告)号：US08460567B2
公开(公告)日：2013-06-11
申请号：US12165801
申请日：2008-07-01
申请人： Lee Chen
发明人： Lee Chen
IPC分类号： B44C1/22
CPC分类号： H01L21/3065 , B81C1/00619 , H01J2237/18
摘要： A method and system for etching a substrate is described and, in particular, a method for etching large, high aspect ratio features, such as those in micro-electromechanical devices (MEMs), is also described. The method comprises disposing a substrate in a processing system, forming plasma having a substantial population of negatively-charged ions, and etching one or more features in the substrate using the negative ion population.
摘要翻译：描述了用于蚀刻衬底的方法和系统，并且特别地描述了用于蚀刻大的高纵横比特征的方法，例如微机电器件（MEM）中的那些。该方法包括将衬底设置在处理系统中，形成具有大量负电荷离子的等离子体，以及使用负离子群蚀刻衬底中的一个或多个特征。

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