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1. 发明申请

US20120244715A1 HIGH-SELECTIVITY ETCHING SYSTEM AND METHOD 审中-公开
标题翻译：高选择性蚀刻系统和方法
公开(公告)号：US20120244715A1
公开(公告)日：2012-09-27
申请号：US13512634
申请日：2010-12-02
申请人： Kyle S. Lebouitz , Andrew David Johnson , Eugene Karwacki, JR. , Suhas Narayan Ketkar , John Neumann , David L. Springer
发明人： Kyle S. Lebouitz , Andrew David Johnson , Eugene Karwacki, JR. , Suhas Narayan Ketkar , John Neumann , David L. Springer
IPC分类号： H01L21/306 , B05C11/10 , B44C1/22
CPC分类号： H01L21/3065 , H01L21/32135
摘要： In a method and system for vapor etching, a material to be etched and an etch resistant material are placed into an etching chamber. Thereafter, a pressure in the etching chamber is adjusted to a desired pressure and the substrate is exposed to an etching gas and a gas that comprises oxygen. The exposure substantially selectively etches the material to be etched while substantially avoiding the etching of the etch resistant material.
摘要翻译：在用于蒸气蚀刻的方法和系统中，将要蚀刻的材料和耐蚀刻材料放置在蚀刻室中。此后，将蚀刻室中的压力调节到期望的压力，并将衬底暴露于蚀刻气体和包含氧的气体。曝光基本上选择性地蚀刻待蚀刻的材料，同时基本上避免蚀刻抗蚀刻材料。

2. 发明授权

US06518581B1 Apparatus for control of gas flow into a mass spectrometer using a series of small orifices 失效
标题翻译：用于使用一系列小孔控制气体流入质谱仪的装置
公开(公告)号：US06518581B1
公开(公告)日：2003-02-11
申请号：US09539605
申请日：2000-03-31
申请人： Seksan Dheandhanoo , Ralph J. Ciotti , Suhas Narayan Ketkar , Richard Vincent Pearce
发明人： Seksan Dheandhanoo , Ralph J. Ciotti , Suhas Narayan Ketkar , Richard Vincent Pearce
IPC分类号： H01J3934
CPC分类号： H01J49/0422
摘要： A gas sampling and inlet device for a mass spectrometer has a hollow housing sleeve with an open inside region and a hollow inner sleeve with an open inside region, with the inner sleeve coaxial to the housing sleeve. One end of the housing sleeve and one end of the inner sleeve are connected with a single first end cap. The second end of the housing sleeve has a second end cap, but the second end of the inner sleeve is open such that the inside of the inner sleeve is open to the inside of the housing sleeve. The first end cap has a small diameter orifice adapted to receive a gaseous fluid. The second end cap is connected to a mass spectrometer. The second end cap has an orifice adapted to receive a gaseous fluid into the mass spectrometer that is substantially smaller in diameter than the orifice in the first end cap. The housing sleeve has a vacuum pump port to allow a vacuum to be created in the interior of the inlet device.
摘要翻译：用于质谱仪的气体取样和入口装置具有中空的壳体套筒，其具有敞开的内部区域和具有敞开的内部区域的中空的内部套筒，内部套筒与壳体套筒同轴。壳体套筒的一端和内套筒的一端与单个第一端盖连接。壳体套筒的第二端具有第二端盖，但是内套筒的第二端是敞开的，使得内套筒的内部对壳体套筒的内部敞开。第一端盖具有适于容纳气态流体的小直径孔口。第二端帽连接到质谱仪。第二端盖具有适于将气态流体接收到质谱仪中的孔口，其直径比第一端盖中的孔口小得多。壳体套筒具有真空泵端口，以允许在入口装置的内部产生真空。

3. 发明授权

US08915992B2 Process and system for providing acetylene 有权
标题翻译：提供乙炔的工艺和系统
公开(公告)号：US08915992B2
公开(公告)日：2014-12-23
申请号：US13359790
申请日：2012-01-27
申请人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, Jr. , Neil Alexander Downie
发明人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, Jr. , Neil Alexander Downie
IPC分类号： C07C11/24 , F17C11/00 , C07C7/09
CPC分类号： C07C7/09 , C07C11/24
摘要： A system for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising a storage vessel that houses an acetylene feed steam comprising acetylene and solvent; a cooling system that maintains the storage vessel and provides the acetylene feed stream at a temperature ranging from 20° C. to −50° C.; and a purifier in fluid communication with the storage vessel wherein the acetylene feed stream is introduced into the purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.
摘要翻译：一种用于提供包含100ppm或更少溶剂的高纯度乙炔的系统，其用途包括容纳包含乙炔和溶剂的乙炔进料蒸汽的储存容器; 冷却系统，其维持储存容器并在20℃至-50℃的温度范围内提供乙炔进料流; 以及与储存容器流体连通的净化器，其中乙炔进料流在-50℃至30℃的温度下引入净化器中以除去其中所含的至少一部分溶剂，并提供高纯乙炔。

4. 发明申请

US20120118763A1 Process and System for Providing Acetylene 有权
标题翻译：提供乙炔的方法和体系
公开(公告)号：US20120118763A1
公开(公告)日：2012-05-17
申请号：US13359790
申请日：2012-01-27
申请人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, JR. , Neil Alexander Downie
发明人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, JR. , Neil Alexander Downie
IPC分类号： B65B3/00
CPC分类号： C07C7/09 , C07C11/24
摘要： A system for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising a storage vessel that houses an acetylene feed steam comprising acetylene and solvent; a cooling system that maintains the storage vessel and provides the acetylene feed stream at a temperature ranging from 20° C. to −50° C.; and a purifier in fluid communication with the storage vessel wherein the acetylene feed stream is introduced into the purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.
摘要翻译：一种用于提供包含100ppm或更少溶剂的高纯度乙炔的系统，其用途包括容纳包含乙炔和溶剂的乙炔进料蒸汽的储存容器; 冷却系统，其维持储存容器并在20℃至-50℃的温度范围内提供乙炔进料流; 以及与储存容器流体连通的净化器，其中乙炔进料流在-50℃至30℃的温度下引入净化器中以除去其中所含的至少一部分溶剂，并提供高纯乙炔。

5. 发明授权

US06606899B1 Total impurity monitor for gases 有权
标题翻译：气体总杂质监测仪
公开(公告)号：US06606899B1
公开(公告)日：2003-08-19
申请号：US09611842
申请日：2000-07-07
申请人： Suhas Narayan Ketkar , Seksan Dheandhanoo
发明人： Suhas Narayan Ketkar , Seksan Dheandhanoo
IPC分类号： G01N1910
CPC分类号： G01N27/622
摘要： A device for measuring a total concentration of impurities in a sample gas is provided which includes a housing having an inlet to allow the sample gas to enter the housing, an emitter to generate ions from the sample gas, a field gradient to accelerate the ions toward a collector, the collector adapted to measure total ions, and an outlet to allow the sample gas to exit the housing, whereby a change in total ions received by the collector indicates a change in the total concentration of impurities in the sample gas.
摘要翻译：提供了一种用于测量样品气体中杂质总浓度的装置，其包括具有允许样品气体进入壳体的入口的壳体，从样品气体产生离子的发射体，用于加速离子朝向收集器，适于测量总离子的收集器和允许样品气体离开壳体的出口，由收集器接收的总离子的变化指示样品气体中杂质总浓度的变化。

6. 发明授权

US08129577B2 Process and system for providing acetylene 有权
标题翻译：提供乙炔的工艺和系统
公开(公告)号：US08129577B2
公开(公告)日：2012-03-06
申请号：US12554052
申请日：2009-09-04
申请人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, Jr. , Neil Alexander Downie
发明人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, Jr. , Neil Alexander Downie
IPC分类号： B65B1/04
CPC分类号： C07C7/09 , C07C11/24
摘要： A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to −50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.
摘要翻译：用于提供乙炔的系统和方法，优选在高纯度水平（例如，包括100ppm（“ppm”）或10ppm，或1ppm，或100ppm（“ppb”）或10 ppb或1ppb或更少的溶剂），到本文中描述的诸如半导体制造工艺的使用点。在一个方面，提供了一种方法，用于提供一种方法，该方法提供包含100ppm或更少溶剂的高纯度乙炔到使用点，包括：在20℃的温度下提供包含乙炔和溶剂的乙炔进料流至-50℃。并在-50℃至30℃的温度范围内将乙炔进料流引入净化器中以除去其中所含溶剂的至少一部分，并提供高纯度乙炔。

7. 发明申请

US20100069689A1 Process and System for Providing Acetylene 有权
标题翻译：提供乙炔的工艺和体系
公开(公告)号：US20100069689A1
公开(公告)日：2010-03-18
申请号：US12554052
申请日：2009-09-04
申请人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, JR. , Neil Alexander Downie
发明人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, JR. , Neil Alexander Downie
IPC分类号： C07C11/24 , B01D53/14
CPC分类号： C07C7/09 , C07C11/24
摘要： A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to −50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.
摘要翻译：用于提供乙炔的系统和方法，优选在高纯度水平（例如，包括100ppm（“ppm”）或10ppm，或1ppm，或100ppm（“ppb”）或10 ppb或1ppb或更少的溶剂），到本文中描述的诸如半导体制造工艺的使用点。在一个方面，提供了一种方法，用于提供一种方法，该方法提供包含100ppm或更少溶剂的高纯度乙炔到使用点，包括：在20℃的温度下提供包含乙炔和溶剂的乙炔进料流至-50℃。并在-50℃至30℃的温度范围内将乙炔进料流引入净化器中以除去其中所含溶剂的至少一部分，并提供高纯度乙炔。

8. 发明授权

US06686999B2 Method of using an aerosol to calibrate spectrometers 失效
标题翻译：使用气溶胶校准光谱仪的方法
公开(公告)号：US06686999B2
公开(公告)日：2004-02-03
申请号：US10020559
申请日：2001-12-14
申请人： Suhas Narayan Ketkar
发明人： Suhas Narayan Ketkar
IPC分类号： G01J330
CPC分类号： G01N21/278 , G01N21/73
摘要： Using a nebulizer gas, sub micron and micron size particulates can be generated from a solution containing salts covering a broad range of elements. The fractional concentration of elements can be determined by bubbling the aerosol through aqueous acid and analyzing the aqueous acid for metals. The nebulizer can be coupled to an ICP (Inductively Coupled Plasma) torch and the ICPMS (Inductively Coupled Plasma Mass Spectrometer) or ICPOES (Inductively Coupled Plasma Optical Emission Spectrometer) response to different elements can be determined. This provides the response factor of the ICPMS or ICPOES for different elements.
摘要翻译：使用雾化器气体，亚微米和微米尺寸的颗粒可以由含有宽范围元素的盐的溶液产生。元素的分数浓度可以通过使气溶胶鼓泡通过含水酸并分析含水酸的金属来确定。喷雾器可以耦合到ICP（电感耦合等离子体）手电筒，并且可以确定对不同元件的ICPMS（电感耦合等离子体质谱仪）或ICPOES（电感耦合等离子体发射光谱仪）响应。这为不同元素提供了ICPMS或ICPOES的响应因子。

9. 发明授权

US06639214B1 Method of improving the performance of an ion mobility spectrometer used to detect trace atmospheric impurities in gases 失效
标题翻译：用于检测气体中痕量大气杂质的离子迁移谱仪的性能的方法
公开(公告)号：US06639214B1
公开(公告)日：2003-10-28
申请号：US09567387
申请日：2000-05-09
申请人： Suhas Narayan Ketkar , Seksan Dheandhanoo
发明人： Suhas Narayan Ketkar , Seksan Dheandhanoo
IPC分类号： B01D5944
CPC分类号： G01N27/622
摘要： A method for eliminating interference when analyzing a test sample of a bulk inert gas in an ion mobility spectrometer is disclosed which includes the steps of providing an ionization source for the spectrometer to form ions of the bulk inert gas, mixing a reagent gas with the test sample prior to entry into the spectrometer to alter the nature of the ions formed by the bulk inert gas to shift the location of a bulk inert gas mobility peak such that a bulk inert gas mobility peak does not overlap with an impurity mobility peak of the ions of a trace impurity of interest, whereby bulk inert gas ions are quenched and a clusters of the reagent gas and the bulk gas are formed. Alternatively, the reagent gas may be mixed with the drift gas in the ion mobility spectrometer, rather than with the test sample.
摘要翻译：公开了一种在分析离子迁移谱仪中的大量惰性气体的测试样品时消除干扰的方法，其包括以下步骤：为光谱仪提供离子源以形成大量惰性气体的离子，将试剂气体与测试在进入光谱仪之前的样品以改变由大量惰性气体形成的离子的性质，以移动体惰性气体迁移率峰的位置，使得体惰性气体迁移率峰不与离子的杂质迁移率峰重叠的痕量杂质，由此大量惰性气体离子被淬灭并形成了一组反应气体和本体气体。或者，反应气体可以与离子迁移谱仪中的漂移气体而不是与测试样品混合。

10. 发明授权

US5661225A Dynamic dilution system 失效
标题翻译：动态稀释系统
公开(公告)号：US5661225A
公开(公告)日：1997-08-26
申请号：US712765
申请日：1996-09-12
申请人： Robert Gordon Ridgeway , Richard Vincent Pearce , Peter James Maroulis , Seksan Dheandhanoo , Suhas Narayan Ketkar
发明人： Robert Gordon Ridgeway , Richard Vincent Pearce , Peter James Maroulis , Seksan Dheandhanoo , Suhas Narayan Ketkar
IPC分类号： G01N1/00 , G01M3/20 , G01N30/04 , G01N33/00
CPC分类号： G01M3/207 , G01N33/0006 , G01N33/0018 , Y10T137/0352
摘要： An apparatus for generating a low concentration calibration gas mixture containing percent, ppm, ppb or ppt amounts of a desired analyte from a high concentration gas mixture and a high purity diluent using a series of source gas containing vessels and a series of parallel gas or chemical conduits controlled by mass flow controllers in a purged enclosure with conduits to purge gas conduits of residual gases or corrosive gases.
摘要翻译：一种用于产生低浓度校准气体混合物的装置，其包含来自高浓度气体混合物和高纯度稀释剂的百分比，ppm，ppb或ppt量的期望分析物，其使用一系列含有气体的容器和一系列平行的气体或化学在清洗的外壳中由质量流量控制器控制的管道具有用于清除残留气体或腐蚀性气体的气体导管的导管。

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