专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06606899B1 Total impurity monitor for gases 有权
标题翻译：气体总杂质监测仪
公开(公告)号：US06606899B1
公开(公告)日：2003-08-19
申请号：US09611842
申请日：2000-07-07
申请人： Suhas Narayan Ketkar , Seksan Dheandhanoo
发明人： Suhas Narayan Ketkar , Seksan Dheandhanoo
IPC分类号： G01N1910
CPC分类号： G01N27/622
摘要： A device for measuring a total concentration of impurities in a sample gas is provided which includes a housing having an inlet to allow the sample gas to enter the housing, an emitter to generate ions from the sample gas, a field gradient to accelerate the ions toward a collector, the collector adapted to measure total ions, and an outlet to allow the sample gas to exit the housing, whereby a change in total ions received by the collector indicates a change in the total concentration of impurities in the sample gas.
摘要翻译：提供了一种用于测量样品气体中杂质总浓度的装置，其包括具有允许样品气体进入壳体的入口的壳体，从样品气体产生离子的发射体，用于加速离子朝向收集器，适于测量总离子的收集器和允许样品气体离开壳体的出口，由收集器接收的总离子的变化指示样品气体中杂质总浓度的变化。

2. 发明授权

US06518581B1 Apparatus for control of gas flow into a mass spectrometer using a series of small orifices 失效
标题翻译：用于使用一系列小孔控制气体流入质谱仪的装置
公开(公告)号：US06518581B1
公开(公告)日：2003-02-11
申请号：US09539605
申请日：2000-03-31
申请人： Seksan Dheandhanoo , Ralph J. Ciotti , Suhas Narayan Ketkar , Richard Vincent Pearce
发明人： Seksan Dheandhanoo , Ralph J. Ciotti , Suhas Narayan Ketkar , Richard Vincent Pearce
IPC分类号： H01J3934
CPC分类号： H01J49/0422
摘要： A gas sampling and inlet device for a mass spectrometer has a hollow housing sleeve with an open inside region and a hollow inner sleeve with an open inside region, with the inner sleeve coaxial to the housing sleeve. One end of the housing sleeve and one end of the inner sleeve are connected with a single first end cap. The second end of the housing sleeve has a second end cap, but the second end of the inner sleeve is open such that the inside of the inner sleeve is open to the inside of the housing sleeve. The first end cap has a small diameter orifice adapted to receive a gaseous fluid. The second end cap is connected to a mass spectrometer. The second end cap has an orifice adapted to receive a gaseous fluid into the mass spectrometer that is substantially smaller in diameter than the orifice in the first end cap. The housing sleeve has a vacuum pump port to allow a vacuum to be created in the interior of the inlet device.
摘要翻译：用于质谱仪的气体取样和入口装置具有中空的壳体套筒，其具有敞开的内部区域和具有敞开的内部区域的中空的内部套筒，内部套筒与壳体套筒同轴。壳体套筒的一端和内套筒的一端与单个第一端盖连接。壳体套筒的第二端具有第二端盖，但是内套筒的第二端是敞开的，使得内套筒的内部对壳体套筒的内部敞开。第一端盖具有适于容纳气态流体的小直径孔口。第二端帽连接到质谱仪。第二端盖具有适于将气态流体接收到质谱仪中的孔口，其直径比第一端盖中的孔口小得多。壳体套筒具有真空泵端口，以允许在入口装置的内部产生真空。

3. 发明申请

US20050161060A1 Cleaning CVD chambers following deposition of porogen-containing materials 审中-公开
标题翻译：沉积含致孔剂的材料后清洁CVD室
公开(公告)号：US20050161060A1
公开(公告)日：2005-07-28
申请号：US11019709
申请日：2004-12-22
申请人： Andrew Johnson , Seksan Dheandhanoo , Mark Bitner , Raymond Vrtis
发明人： Andrew Johnson , Seksan Dheandhanoo , Mark Bitner , Raymond Vrtis
IPC分类号： C23C16/00 , B08B3/00 , B08B6/00 , B08B7/00 , B08B9/08 , C23C16/44 , C23G3/00 , C25F1/00 , H01L21/304 , H01L21/31
CPC分类号： C23C16/4405
摘要： The present invention is a process for cleaning equipment surfaces in a semiconductor material processing chamber after deposition of a porous film containing a porogen, comprising; contacting the equipment surfaces with a proton donor containing atmosphere to react with the porogen deposited on the equipment surfaces; contacting the equipment surfaces with a fluorine donor containing atmosphere to react with the film deposited on the equipment surfaces.
摘要翻译：本发明是一种在沉积包含致孔剂的多孔膜之后，在半导体材料处理室中清洁设备表面的方法，包括：使设备表面与含质子供体的气氛接触以与沉积在设备表面上的致孔剂反应; 使设备表面与含氟给体的气氛接触，与沉积在设备表面上的膜反应。

4. 发明授权

US06639214B1 Method of improving the performance of an ion mobility spectrometer used to detect trace atmospheric impurities in gases 失效
标题翻译：用于检测气体中痕量大气杂质的离子迁移谱仪的性能的方法
公开(公告)号：US06639214B1
公开(公告)日：2003-10-28
申请号：US09567387
申请日：2000-05-09
申请人： Suhas Narayan Ketkar , Seksan Dheandhanoo
发明人： Suhas Narayan Ketkar , Seksan Dheandhanoo
IPC分类号： B01D5944
CPC分类号： G01N27/622
摘要： A method for eliminating interference when analyzing a test sample of a bulk inert gas in an ion mobility spectrometer is disclosed which includes the steps of providing an ionization source for the spectrometer to form ions of the bulk inert gas, mixing a reagent gas with the test sample prior to entry into the spectrometer to alter the nature of the ions formed by the bulk inert gas to shift the location of a bulk inert gas mobility peak such that a bulk inert gas mobility peak does not overlap with an impurity mobility peak of the ions of a trace impurity of interest, whereby bulk inert gas ions are quenched and a clusters of the reagent gas and the bulk gas are formed. Alternatively, the reagent gas may be mixed with the drift gas in the ion mobility spectrometer, rather than with the test sample.
摘要翻译：公开了一种在分析离子迁移谱仪中的大量惰性气体的测试样品时消除干扰的方法，其包括以下步骤：为光谱仪提供离子源以形成大量惰性气体的离子，将试剂气体与测试在进入光谱仪之前的样品以改变由大量惰性气体形成的离子的性质，以移动体惰性气体迁移率峰的位置，使得体惰性气体迁移率峰不与离子的杂质迁移率峰重叠的痕量杂质，由此大量惰性气体离子被淬灭并形成了一组反应气体和本体气体。或者，反应气体可以与离子迁移谱仪中的漂移气体而不是与测试样品混合。

5. 发明授权

US5661225A Dynamic dilution system 失效
标题翻译：动态稀释系统
公开(公告)号：US5661225A
公开(公告)日：1997-08-26
申请号：US712765
申请日：1996-09-12
申请人： Robert Gordon Ridgeway , Richard Vincent Pearce , Peter James Maroulis , Seksan Dheandhanoo , Suhas Narayan Ketkar
发明人： Robert Gordon Ridgeway , Richard Vincent Pearce , Peter James Maroulis , Seksan Dheandhanoo , Suhas Narayan Ketkar
IPC分类号： G01N1/00 , G01M3/20 , G01N30/04 , G01N33/00
CPC分类号： G01M3/207 , G01N33/0006 , G01N33/0018 , Y10T137/0352
摘要： An apparatus for generating a low concentration calibration gas mixture containing percent, ppm, ppb or ppt amounts of a desired analyte from a high concentration gas mixture and a high purity diluent using a series of source gas containing vessels and a series of parallel gas or chemical conduits controlled by mass flow controllers in a purged enclosure with conduits to purge gas conduits of residual gases or corrosive gases.
摘要翻译：一种用于产生低浓度校准气体混合物的装置，其包含来自高浓度气体混合物和高纯度稀释剂的百分比，ppm，ppb或ppt量的期望分析物，其使用一系列含有气体的容器和一系列平行的气体或化学在清洗的外壳中由质量流量控制器控制的管道具有用于清除残留气体或腐蚀性气体的气体导管的导管。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式