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1. 发明授权

US09448495B2 Resist pattern calculation method and calculation program storage medium 有权
标题翻译：抗蚀图案计算方法和计算程序存储介质
公开(公告)号：US09448495B2
公开(公告)日：2016-09-20
申请号：US13233209
申请日：2011-09-15
申请人： Ryo Nakayama , Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
发明人： Ryo Nakayama , Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
IPC分类号： G03B27/32 , G03F7/20
CPC分类号： G03F7/705 , G03F7/70558 , G03F7/70608
摘要： A recording medium stores a program for causing a computer to execute a method of calculating a resist pattern. The method includes: a first step of calculating a light intensity distribution of an optical image formed on the resist, based on the reticle pattern and an exposure condition; a second step of convoluting, using a first diffusion length, the calculated light intensity distribution; a third step of calculating a representative light intensity from the calculated light intensity distribution or the convoluted light intensity distribution; a fourth step of correcting the convoluted light intensity distribution by adding, to the convoluted light intensity distribution, a correction function including a first function given by: { ∑ k = 0 n ⁢ ( a k ⁢ J k ) } ⁢ exp ⁡ ( - α ⁢ ⁢ J ) where J is the distribution of the representative light intensity; and a fifth step of calculating the resist pattern based on the corrected light intensity distribution and a slice level set in advance.

2. 发明授权

US09036897B2 Storage medium storing computer program for determining at least one of exposure condition and mask pattern 有权
标题翻译：存储介质，存储用于确定曝光条件和掩模图案中的至少一个的计算机程序
公开(公告)号：US09036897B2
公开(公告)日：2015-05-19
申请号：US13032960
申请日：2011-02-23
申请人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
发明人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
IPC分类号： G06K9/00 , G03F7/20
CPC分类号： G03F7/709 , G03F7/70091 , G03F7/70358 , G03F7/705 , G03F7/70525
摘要： A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result.
摘要翻译：提供了一种计算机可读存储介质，其存储用于使计算机确定具有照明光学系统的曝光装置的掩模图案和曝光条件中的至少一个的计算机可执行程序，所述照明光学系统用于从光源和用于将掩模图案投影到基板上的投影光学系统。该程序使计算机使用关于由曝光装置引起的图像的横向偏移的信息来执行投影光学系统的物体平面上的图案的图像的计算，以及确定曝光条件和掩模中的至少一个基于计算结果的模式。

3. 发明申请

US20120092639A1 RESIST PATTERN CALCULATION METHOD AND CALCULATION PROGRAM STORAGE MEDIUM 有权
标题翻译：电阻图案计算方法和计算程序存储介质
公开(公告)号：US20120092639A1
公开(公告)日：2012-04-19
申请号：US13233209
申请日：2011-09-15
申请人： Ryo Nakayama , Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
发明人： Ryo Nakayama , Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
IPC分类号： G03B27/58
CPC分类号： G03F7/705 , G03F7/70558 , G03F7/70608
摘要： A recording medium stores a program for causing a computer to execute a method of calculating a resist pattern. The method includes: a first step of calculating a light intensity distribution of an optical image formed on the resist, based on the reticle pattern and an exposure condition; a second step of convoluting, using a first diffusion length, the calculated light intensity distribution; a third step of calculating a representative light intensity from the calculated light intensity distribution or the convoluted light intensity distribution; a fourth step of correcting the convoluted light intensity distribution by adding, to the convoluted light intensity distribution, a correction function including a first function given by: { ∑ k = 0 n  ( a k  J k ) }  exp  ( - α   J ) where J is the distribution of the representative light intensity; and a fifth step of calculating the resist pattern based on the corrected light intensity distribution and a slice level set in advance.
摘要翻译：记录介质存储用于使计算机执行计算抗蚀剂图案的方法的程序。该方法包括：基于掩模图案和曝光条件计算形成在抗蚀剂上的光学图像的光强度分布的第一步骤; 使用第一扩散长度卷积计算的光强度分布的第二步骤; 从计算出的光强度分布或卷积光强度分布计算代表光强度的第三步骤; 第四步骤，通过向所述卷积光强度分布中加入包括由下式给出的第一函数的校正函数来校正所述卷积光强度分布：{Σk = 0 n（ak）J k）} exp（ J）其中J是代表光强度的分布; 以及第五步骤，基于校正的光强度分布和预先设定的限幅电平来计算抗蚀剂图案。

4. 发明申请

US20100009275A1 EXPOSURE METHOD AND MEMORY MEDIUM STORING COMPUTER PROGRAM 有权
标题翻译：曝光方法和记忆媒体存储计算机程序
公开(公告)号：US20100009275A1
公开(公告)日：2010-01-14
申请号：US12499730
申请日：2009-07-08
申请人： Koji Mikami , Kouichirou Tsujita , Hiroyuki Ishii
发明人： Koji Mikami , Kouichirou Tsujita , Hiroyuki Ishii
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70091 , G03F7/705
摘要： A method comprises determining an exposure condition by executing a process including computing an image formed on an image plane under the current exposure condition while changing the exposure condition, and evaluating a line width of the computed image, and exposing the substrate under the determined exposure condition, wherein the determining includes, computing a simplified evaluation value of the computed image, changing the exposure condition and executing the process in the changed exposure condition, after evaluating the computed image if the simplified evaluation value satisfies an allowable value, and changing the exposure condition and executing the process in the changed exposure condition without evaluating the computed image if the simplified evaluation value does not satisfy the allowable value.
摘要翻译：一种方法包括：通过执行包括在改变曝光条件的同时计算在当前曝光条件下形成在图像平面上的图像并评估计算图像的线宽度并在确定的曝光条件下曝光基板的处理来确定曝光条件其中，所述确定包括：如果所述简化评估值满足允许值，则在评估所述计算图像之后，计算所计算图像的简化评估值，改变所述曝光条件并执行所述改变的曝光条件中的处理，并且改变所述曝光条件以及如果所述简化评估值不满足所述允许值，则在不评估所述计算图像的情况下执行所述改变的曝光条件下的处理。

5. 发明授权

US08029954B2 Exposure method and memory medium storing computer program 有权
标题翻译：曝光方法和存储计算机程序的存储介质
公开(公告)号：US08029954B2
公开(公告)日：2011-10-04
申请号：US12499730
申请日：2009-07-08
申请人： Koji Mikami , Kouichirou Tsujita , Hiroyuki Ishii
发明人： Koji Mikami , Kouichirou Tsujita , Hiroyuki Ishii
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70258 , G03F7/70091 , G03F7/705
摘要： A method comprises determining an exposure condition by executing a process including computing an image formed on an image plane under the current exposure condition while changing the exposure condition, and evaluating a line width of the computed image, and exposing the substrate under the determined exposure condition, wherein the determining includes, computing a simplified evaluation value of the computed image, changing the exposure condition and executing the process in the changed exposure condition, after evaluating the computed image if the simplified evaluation value satisfies an allowable value, and changing the exposure condition and executing the process in the changed exposure condition without evaluating the computed image if the simplified evaluation value does not satisfy the allowable value.
摘要翻译：一种方法包括：通过执行包括在改变曝光条件的同时计算在当前曝光条件下形成在图像平面上的图像并评估计算图像的线宽度并在确定的曝光条件下曝光基板的处理来确定曝光条件其中，所述确定包括：如果所述简化评估值满足允许值，则在评估所述计算图像之后，计算所计算图像的简化评估值，改变所述曝光条件并执行所述改变的曝光条件中的处理，并且改变所述曝光条件以及如果所述简化评估值不满足所述允许值，则在不评估所述计算图像的情况下执行所述改变的曝光条件下的处理。

6. 发明申请

US20110206270A1 STORAGE MEDIUM STORING COMPUTER PROGRAM FOR DETERMINING AT LEAST ONE OF EXPOSURE CONDITION AND MASK PATTERN 有权
标题翻译：存储中央存储计算机程序，用于确定至少一个接触条件和掩模图案
公开(公告)号：US20110206270A1
公开(公告)日：2011-08-25
申请号：US13032960
申请日：2011-02-23
申请人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
发明人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
IPC分类号： G06K9/00
CPC分类号： G03F7/709 , G03F7/70091 , G03F7/70358 , G03F7/705 , G03F7/70525
摘要： A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result.
摘要翻译：提供了一种计算机可读存储介质，其存储用于使计算机确定具有照明光学系统的曝光装置的掩模图案和曝光条件中的至少一个的计算机可执行程序，所述照明光学系统用于从光源和用于将掩模图案投影到基板上的投影光学系统。该程序使计算机使用关于由曝光装置引起的图像的横向偏移的信息来执行投影光学系统的物体平面上的图案的图像的计算，以及确定曝光条件和掩模中的至少一个基于计算结果的模式。

7. 发明申请

US20100102255A1 METHOD OF TRANSFERRING PATTERN OF RETICLE, COMPUTER READABLE STORAGE MEDIUM, AND METHOD OF MANUFACTURING DEVICE 有权
标题翻译：传输模式，计算机可读存储介质的方法和制造设备的方法
公开(公告)号：US20100102255A1
公开(公告)日：2010-04-29
申请号：US12607015
申请日：2009-10-27
申请人： Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
发明人： Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
IPC分类号： G21K5/10
CPC分类号： G03F7/70141 , G03F7/705 , G03F7/70625
摘要： A method includes setting a target pattern to be formed on a substrate using a reticle, obtaining a first pattern using the reticle and a first illumination condition, calculating, a second illumination condition under which the target pattern is transferred onto the substrate using the reticle, and a third illumination condition under which the first pattern is transferred onto a substrate using the reticle, using mathematical models each of which defines the relationship between an illumination condition and a virtual pattern transferred onto a substrate using the illumination condition, determining a fourth illumination condition, obtained by adding the difference between the calculated second illumination condition and third illumination condition to the first illumination condition, as the illumination condition, and transferring the pattern of the reticle onto the substrate by illuminating the reticle using the determined illumination condition.
摘要翻译：一种方法包括使用标线设置在基板上形成的目标图案，使用所述掩模版获得第一图案和第一照明条件，计算使用所述掩模版将所述目标图案转印到所述基板上的第二照明条件，以及第三照明条件，在该第三照明条件下，使用数学模型将第一图案转印到基板上，每个数学模型使用照明条件限定照明条件和转印到基板上的虚拟图案之间的关系，确定第四照明条件通过将计算出的第二照明条件和第三照明条件之间的差与第一照明条件相加而获得，作为照明条件，并且通过使用确定的照明条件照射标线，将掩模版的图案转印到基板上。

8. 发明授权

US08049191B2 Method of transferring pattern of reticle, computer readable storage medium, and method of manufacturing device 有权
标题翻译：传送标线图形，计算机可读存储介质的方法和制造装置的方法
公开(公告)号：US08049191B2
公开(公告)日：2011-11-01
申请号：US12607015
申请日：2009-10-27
申请人： Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
发明人： Kouichirou Tsujita , Koji Mikami , Hiroyuki Ishii
IPC分类号： G21K5/10
CPC分类号： G03F7/70141 , G03F7/705 , G03F7/70625
摘要： A method includes setting a target pattern to be formed on a substrate using a reticle, obtaining a first pattern using the reticle and a first illumination condition, calculating, a second illumination condition under which the target pattern is transferred onto the substrate using the reticle, and a third illumination condition under which the first pattern is transferred onto a substrate using the reticle, using mathematical models each of which defines the relationship between an illumination condition and a virtual pattern transferred onto a substrate using the illumination condition, determining a fourth illumination condition, obtained by adding the difference between the calculated second illumination condition and third illumination condition to the first illumination condition, as the illumination condition, and transferring the pattern of the reticle onto the substrate by illuminating the reticle using the determined illumination condition.
摘要翻译：一种方法包括使用标线设置在基板上形成的目标图案，使用所述掩模版获得第一图案和第一照明条件，计算使用所述掩模版将所述目标图案转印到所述基板上的第二照明条件，以及第三照明条件，在该第三照明条件下，使用数学模型将第一图案转印到基板上，每个数学模型使用照明条件限定照明条件和转印到基板上的虚拟图案之间的关系，确定第四照明条件通过将计算出的第二照明条件和第三照明条件之间的差与第一照明条件相加而获得，作为照明条件，并且通过使用确定的照明条件照射标线，将掩模版的图案转印到基板上。

9. 发明授权

US08949748B2 Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method 有权
标题翻译：用于产生掩模数据的记录介质记录程序，掩模制造方法和曝光方法
公开(公告)号：US08949748B2
公开(公告)日：2015-02-03
申请号：US13280735
申请日：2011-10-25
申请人： Hiroyuki Ishii , Kouichirou Tsujita
发明人： Hiroyuki Ishii , Kouichirou Tsujita
IPC分类号： G06F17/50 , G03F1/36 , G03F7/20
CPC分类号： G03F1/36 , G03F7/70125 , G03F7/70441 , G03F7/705
摘要： A mask includes a main pattern for resolving a target pattern to be formed on a substrate and an auxiliary pattern not resolving. Values of parameters of the main pattern and the auxiliary pattern are set. An image is calculated that is formed when the main pattern and the auxiliary pattern determined by the values of the parameters of the main pattern and the auxiliary pattern are projected by a projection optical system. Based on a result of the calculation that is performed by modifying the values of the parameters of the main pattern and the auxiliary pattern, the values of the parameters of the main pattern and the auxiliary pattern are determined to generate data of the mask including the main pattern and the auxiliary pattern determined.
摘要翻译：掩模包括用于分辨要在基板上形成的目标图案的主图案和不分辨的辅助图案。设置主图案和辅助图案的参数值。计算由主图案和辅助图案的参数的值确定的主图案和辅助图案由投影光学系统投影时形成的图像。基于通过修改主图案和辅助图案的参数的值进行的计算的结果，确定主图案和辅助图案的参数的值以生成包括主图案的掩模的数据图案和辅助图案确定。

10. 发明申请

US20120107730A1 RECORDING MEDIUM RECORDING PROGRAM FOR GENERATING MASK DATA, METHOD FOR MANUFACTURING MASK, AND EXPOSURE METHOD 有权
标题翻译：用于生成掩模数据的记录媒体记录程序，制造掩模的方法和曝光方法
公开(公告)号：US20120107730A1
公开(公告)日：2012-05-03
申请号：US13280735
申请日：2011-10-25
申请人： Hiroyuki Ishii , Kouichirou Tsujita
发明人： Hiroyuki Ishii , Kouichirou Tsujita
IPC分类号： G03F7/20 , G03F1/68
CPC分类号： G03F1/36 , G03F7/70125 , G03F7/70441 , G03F7/705
摘要： A mask includes a main pattern for resolving a target pattern to be formed on a substrate and an auxiliary pattern not resolving. Values of parameters of the main pattern and the auxiliary pattern are set. An image is calculated that is formed when the main pattern and the auxiliary pattern determined by the values of the parameters of the main pattern and the auxiliary pattern are projected by a projection optical system. Based on a result of the calculation that is performed by modifying the values of the parameters of the main pattern and the auxiliary pattern, the values of the parameters of the main pattern and the auxiliary pattern are determined to generate data of the mask including the main pattern and the auxiliary pattern determined.
摘要翻译：掩模包括用于分辨要在基板上形成的目标图案的主图案和不分辨的辅助图案。设置主图案和辅助图案的参数值。计算由主图案和辅助图案的参数的值确定的主图案和辅助图案由投影光学系统投影时形成的图像。基于通过修改主图案和辅助图案的参数的值进行的计算的结果，确定主图案和辅助图案的参数的值以生成包括主图案的掩模的数据图案和辅助图案确定。

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