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1. 发明申请

US20110206270A1 STORAGE MEDIUM STORING COMPUTER PROGRAM FOR DETERMINING AT LEAST ONE OF EXPOSURE CONDITION AND MASK PATTERN 有权
标题翻译：存储中央存储计算机程序，用于确定至少一个接触条件和掩模图案
公开(公告)号：US20110206270A1
公开(公告)日：2011-08-25
申请号：US13032960
申请日：2011-02-23
申请人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
发明人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
IPC分类号： G06K9/00
CPC分类号： G03F7/709 , G03F7/70091 , G03F7/70358 , G03F7/705 , G03F7/70525
摘要： A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result.
摘要翻译：提供了一种计算机可读存储介质，其存储用于使计算机确定具有照明光学系统的曝光装置的掩模图案和曝光条件中的至少一个的计算机可执行程序，所述照明光学系统用于从光源和用于将掩模图案投影到基板上的投影光学系统。该程序使计算机使用关于由曝光装置引起的图像的横向偏移的信息来执行投影光学系统的物体平面上的图案的图像的计算，以及确定曝光条件和掩模中的至少一个基于计算结果的模式。

2. 发明授权

US09036897B2 Storage medium storing computer program for determining at least one of exposure condition and mask pattern 有权
标题翻译：存储介质，存储用于确定曝光条件和掩模图案中的至少一个的计算机程序
公开(公告)号：US09036897B2
公开(公告)日：2015-05-19
申请号：US13032960
申请日：2011-02-23
申请人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
发明人： Hiroyuki Ishii , Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
IPC分类号： G06K9/00 , G03F7/20
CPC分类号： G03F7/709 , G03F7/70091 , G03F7/70358 , G03F7/705 , G03F7/70525
摘要： A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result.
摘要翻译：提供了一种计算机可读存储介质，其存储用于使计算机确定具有照明光学系统的曝光装置的掩模图案和曝光条件中的至少一个的计算机可执行程序，所述照明光学系统用于从光源和用于将掩模图案投影到基板上的投影光学系统。该程序使计算机使用关于由曝光装置引起的图像的横向偏移的信息来执行投影光学系统的物体平面上的图案的图像的计算，以及确定曝光条件和掩模中的至少一个基于计算结果的模式。

3. 发明授权

US09551926B2 Determination method, storage medium and information processing apparatus 有权
标题翻译：确定方法，存储介质和信息处理设备
公开(公告)号：US09551926B2
公开(公告)日：2017-01-24
申请号：US13534059
申请日：2012-06-27
申请人： Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
发明人： Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
IPC分类号： G03B27/68 , G03F1/50 , G03F7/20
CPC分类号： G03F1/50 , G03F7/705
摘要： The present invention provides a determination method of determining exposure conditions of an exposure apparatus including an illumination optical system which illuminates a mask, and a projection optical system which projects a pattern of the mask onto a substrate, the method including a step of setting an illumination parameter for a light intensity distribution formed on a pupil plane of the illumination optical system, and an aberration parameter for an aberration of the projection optical system, and a step of determining a value of the illumination parameter and a value of the aberration parameter so that an image performance of an optical image of the pattern of the mask satisfies an evaluation criterion set for a target pattern to be formed on an image plane of the projection optical system.
摘要翻译：本发明提供了一种确定曝光条件的曝光条件的方法，所述曝光装置包括照明掩模的照明光学系统和投影光学系统，所述投影光学系统将掩模的图案投影到基板上，所述方法包括设置照明用于形成在照明光学系统的光瞳平面上的光强度分布的参数，以及投影光学系统的像差的像差参数，以及确定照明参数的值和像差参数的值的步骤，使得掩模图案的光学图像的图像性能满足为在投影光学系统的图像平面上形成的目标图案设定的评价标准。

4. 发明申请

US20130010272A1 DETERMINATION METHOD, STORAGE MEDIUM AND INFORMATION PROCESSING APPARATUS 有权
标题翻译：确定方法，存储介质和信息处理设备
公开(公告)号：US20130010272A1
公开(公告)日：2013-01-10
申请号：US13534059
申请日：2012-06-27
申请人： Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
发明人： Yuichi Gyoda , Koji Mikami , Kouichirou Tsujita
IPC分类号： G03B27/72
CPC分类号： G03F1/50 , G03F7/705
摘要： The present invention provides a determination method of determining exposure conditions of an exposure apparatus including an illumination optical system which illuminates a mask, and a projection optical system which projects a pattern of the mask onto a substrate, the method including a step of setting an illumination parameter for a light intensity distribution formed on a pupil plane of the illumination optical system, and an aberration parameter for an aberration of the projection optical system, and a step of determining a value of the illumination parameter and a value of the aberration parameter so that an image performance of an optical image of the pattern of the mask satisfies an evaluation criterion set for a target pattern to be formed on an image plane of the projection optical system.
摘要翻译：本发明提供了一种确定曝光条件的曝光条件的方法，所述曝光装置包括照明掩模的照明光学系统和投影光学系统，所述投影光学系统将掩模的图案投影到基板上，所述方法包括设置照明用于形成在照明光学系统的光瞳平面上的光强度分布的参数，以及投影光学系统的像差的像差参数，以及确定照明参数的值和像差参数的值的步骤，使得掩模图案的光学图像的图像性能满足为在投影光学系统的图像平面上形成的目标图案设定的评价标准。

5. 发明授权

US08811714B2 Method, apparatus and medium for determining the intensity distribution formed on a pupil plane of an illumination optical system 有权
标题翻译：用于确定在照明光学系统的光瞳平面上形成的强度分布的方法，装置和介质
公开(公告)号：US08811714B2
公开(公告)日：2014-08-19
申请号：US13217558
申请日：2011-08-25
申请人： Yuichi Gyoda , Hiroyuki Ishii , Koji Mikami , Youzou Fukagawa
发明人： Yuichi Gyoda , Hiroyuki Ishii , Koji Mikami , Youzou Fukagawa
IPC分类号： G06K9/20 , G06K9/60 , G06K9/64 , G03F7/20
CPC分类号： G03F7/70091 , G03F7/705
摘要： The present invention provides a determination method of determining a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus, the method including a step of setting a cutline used to evaluate an image of a pattern of a mask, which is formed on an image plane of a projection optical system, and a target position of the image, and a step of determining an intensity of an element light source such that the position of a midpoint between edges of the image of the pattern of the mask on the cutline from a calculated image comes close to the target position, thereby determining the light intensity distribution.
摘要翻译：本发明提供一种确定在曝光装置中确定在照明光学系统的光瞳平面上形成的光强度分布的方法，该方法包括设置用于评估掩模图案的图像的切割线的步骤，其形成在投影光学系统的图像平面上，以及图像的目标位置，以及确定元件光源的强度的步骤，使得图案的图像的边缘之间的中点的位置来自计算图像的切割线上的掩模接近目标位置，由此确定光强度分布。

6. 发明申请

US20120233574A1 NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM, DECISION METHOD AND COMPUTER 有权
标题翻译：非终端计算机可读存储介质，决策方法和计算机
公开(公告)号：US20120233574A1
公开(公告)日：2012-09-13
申请号：US13409466
申请日：2012-03-01
申请人： Yuichi Gyoda , Kouichirou Tsujita
发明人： Yuichi Gyoda , Kouichirou Tsujita
IPC分类号： G06F17/50
CPC分类号： G03F7/70125 , G03F7/70441 , G03F7/705
摘要： The present invention provides a non-transitory computer-readable storage medium storing a program that causes a computer to decide an exposure condition in an exposure apparatus, the program causing the computer to execute a step of selecting an evaluation item of interest from a plurality of evaluation items to be used to evaluate an image formed on an image plane of a projection optical system in correspondence with the exposure condition, a step of selecting, as an auxiliary evaluation item, an evaluation item which is different from the evaluation item of interest and changes a value in the same direction as that of a change in a value of the evaluation item of interest upon changing parameter values included in the exposure condition, and a step of setting an evaluation function including the evaluation item of interest and the auxiliary evaluation item as values.
摘要翻译：本发明提供了一种存储使计算机能够决定曝光装置中的曝光条件的程序的非瞬时计算机可读存储介质，该程序使计算机执行从多个用于评估与曝光条件相对应的在投影光学系统的像面上形成的图像的评价项目;选择与感兴趣的评价项目不同的评价项目作为辅助评价项目的步骤;以及在改变包括在曝光条件中的参数值时，改变与改变感兴趣的评估项目的值相同的方向的值，以及设置包括感兴趣的评价项目和辅助评价项目的评估功能的步骤作为值。

7. 发明授权

US08584055B2 Non-transitory computer-readable storage medium, decision method and computer for deciding exposure condition using evaluation item of interest and auxiliary evaluation item 有权
标题翻译：非暂行计算机可读存储介质，决策方法和计算机，用于使用感兴趣的评估项目和辅助评估项目来决定曝光条件
公开(公告)号：US08584055B2
公开(公告)日：2013-11-12
申请号：US13409466
申请日：2012-03-01
申请人： Yuichi Gyoda , Kouichirou Tsujita
发明人： Yuichi Gyoda , Kouichirou Tsujita
IPC分类号： G06F17/50
CPC分类号： G03F7/70125 , G03F7/70441 , G03F7/705
摘要： The present invention provides a non-transitory computer-readable storage medium storing a program that causes a computer to decide an exposure condition in an exposure apparatus, the program causing the computer to execute a step of selecting an evaluation item of interest from a plurality of evaluation items to be used to evaluate an image formed on an image plane of a projection optical system in correspondence with the exposure condition, a step of selecting, as an auxiliary evaluation item, an evaluation item which is different from the evaluation item of interest and changes a value in the same direction as that of a change in a value of the evaluation item of interest upon changing parameter values included in the exposure condition, and a step of setting an evaluation function including the evaluation item of interest and the auxiliary evaluation item as values.
摘要翻译：本发明提供了一种存储使计算机能够决定曝光装置中的曝光条件的程序的非瞬时计算机可读存储介质，该程序使计算机执行从多个用于评估与曝光条件相对应的在投影光学系统的像面上形成的图像的评价项目;选择与感兴趣的评价项目不同的评价项目作为辅助评价项目的步骤;以及在改变包括在曝光条件中的参数值时，改变与改变感兴趣的评估项目的值相同的方向的值，以及设置包括感兴趣的评价项目和辅助评价项目的评估功能的步骤作为值。

8. 发明授权

US09268239B2 Exposure method and storage medium 有权
标题翻译：曝光方法和储存介质
公开(公告)号：US09268239B2
公开(公告)日：2016-02-23
申请号：US13224488
申请日：2011-09-02
申请人： Yuichi Gyoda , Kouichirou Tsujita
发明人： Yuichi Gyoda , Kouichirou Tsujita
IPC分类号： G03F7/20
CPC分类号： G03F7/706 , G03F7/705
摘要： The present invention provides an exposure method including the steps of generating a plurality of element light sources formed on a pupil plane of an illumination optical system, setting a plurality of aberration states which are expected to exist in a projection optical system, calculating, for each of all combinations of the plurality of aberration states and the plurality of element light sources, an optical image of a pattern of a mask, which is formed in an evaluation area when one aberration state among the plurality of aberration states is produced in the projection optical system, and the pattern of the mask is illuminated with one element light source among the plurality of element light sources, determining, based on the calculated optical images, as a light intensity distribution to be formed on the pupil plane, a light source obtained by combining the plurality of element light sources applied with weights.
摘要翻译：本发明提供了一种曝光方法，包括以下步骤：产生形成在照明光学系统的光瞳平面上的多个元件光源，设置预期存在于投影光学系统中的多个像差状态，在多个像差状态和多个元素光源的所有组合中，在投影光学器件中产生在多个像差状态中的一个像差状态时形成在评估区域中的掩模图案的光学图像系统，并且在多个元件光源中用一个元件光源照射掩模的图案，基于计算出的光学图像，确定要在瞳孔平面上形成的光强度分布，由组合施加有重物的多个元件光源。

9. 发明授权

US08450031B2 Determination method, exposure method and storage medium 有权
标题翻译：测定方法，曝光方法和储存介质
公开(公告)号：US08450031B2
公开(公告)日：2013-05-28
申请号：US13222628
申请日：2011-08-31
申请人： Yuichi Gyoda , Hiroyuki Ishii , Youzou Fukagawa , Yuji Shinano
发明人： Yuichi Gyoda , Hiroyuki Ishii , Youzou Fukagawa , Yuji Shinano
IPC分类号： G03C5/00
CPC分类号： G03F7/705
摘要： The present invention provides a determination method of determining a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus, the method including a step of setting a cut line used to evaluate an image of a pattern of a mask, which is formed on an image plane of a projection optical system, and a target value of a dimension of the image, and a step of obtaining the dimension of the image of the pattern on the cut line, and determining a weight to be applied to each of a plurality of element light sources such that the obtained dimension comes close to the target value of the dimension, thereby determining, as the light intensity distribution, light sources obtained by combining the plurality of element light sources applied with the weights.
摘要翻译：本发明提供了一种确定方法，其确定在曝光装置中的照明光学系统的光瞳平面上形成的光强分布，该方法包括设置用于评估图像的图像的切割线的步骤掩模，其形成在投影光学系统的图像平面上，以及图像的尺寸的目标值，以及获得切割线上的图案的尺寸的步骤，并且确定重量为应用于多个元件光源中的每一个，使得所获得的尺寸接近尺寸的目标值，从而确定通过组合施加有重物的多个元件光源获得的光源作为光强度分布。

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