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1. 发明授权

US06590704B1 Multi-eye image sensing apparatus 失效
公开(公告)号：US06590704B1
公开(公告)日：2003-07-08
申请号：US09339938
申请日：1999-06-25
申请人： Kotaro Yano , Keisuke Araki , Toshihiro Sunaga
发明人： Kotaro Yano , Keisuke Araki , Toshihiro Sunaga
IPC分类号： G02B2722
CPC分类号： G02B17/086 , G02B13/06 , G02B17/0848 , G02B27/2242 , G03B35/10 , G03B37/04 , G06T7/97 , H04N13/10 , H04N13/189 , H04N13/239 , H04N13/243 , H04N13/289 , H04N13/296 , H04N19/597 , H04N2013/0081 , H04N2013/0088 , H04N2013/0096
摘要： In a multi-eye camera head unit (10), a panoramic image sensing exchangeable camera head unit (111) and three-dimensional image sensing exchangeable camera head unit (112) are exchanged in correspondence with the image sensing mode. The panoramic image sensing exchangeable camera head unit (111) includes a pair of optical elements (111R, 111L), which comprise offaxial optical systems each having a plurality of reflecting and refracting surfaces. The three-dimensional image sensing camera head unit (112) includes a pair of optical elements (112R, 112L), which comprise offaxial optical systems each having a plurality of reflecting and refracting surfaces.

2. 发明授权

US06804056B2 Multi-eye image sensing apparatus 失效
标题翻译：多眼摄像装置
公开(公告)号：US06804056B2
公开(公告)日：2004-10-12
申请号：US10461428
申请日：2003-06-16
申请人： Kotaro Yano , Keisuke Araki , Toshihiro Sunaga
发明人： Kotaro Yano , Keisuke Araki , Toshihiro Sunaga
IPC分类号： G02B2722
CPC分类号： G02B17/086 , G02B13/06 , G02B17/0848 , G02B27/2242 , G03B35/10 , G03B37/04 , G06T7/97 , H04N13/10 , H04N13/189 , H04N13/239 , H04N13/243 , H04N13/289 , H04N13/296 , H04N19/597 , H04N2013/0081 , H04N2013/0088 , H04N2013/0096
摘要： In a multi-eye camera head unit (10), a panoramic image sensing exchangeable camera head unit (111) and three-dimensional image sensing exchangeable camera head unit (112) are exchanged in correspondence with the image sensing mode. The panoramic image sensing exchangeable camera head unit (111) includes a pair of optical elements (111R, 111L), which comprise offaxial optical systems each having a plurality of reflecting and refracting surfaces. The three-dimensional image sensing camera head unit (112) includes a pair of optical elements (112R, 112L), which comprise offaxial optical systems each having a plurality of reflecting and refracting surfaces.
摘要翻译：在多眼摄像机头单元（10）中，与图像感测模式对应地交换全景图像感测可更换相机头单元（111）和三维图像感测可更换相机头单元（112）。全景图像感测可更换相机头单元（111）包括一对光学元件（111R，111L），其包括各自具有多个反射和折射表面的离轴光学系统。三维图像感测摄像头单元（112）包括一对光学元件（112R，112L），其包括各自具有多个反射和折射表面的离轴光学系统。

3. 发明授权

US06842280B2 Optical element and optical apparatus 失效
标题翻译：光学元件和光学设备
公开(公告)号：US06842280B2
公开(公告)日：2005-01-11
申请号：US10763201
申请日：2004-01-26
申请人： Keisuke Araki , Tsunefumi Tanaka , Makoto Sekita , Kenichi Kimura , Takeshi Akiyama , Toshihiro Sunaga
发明人： Keisuke Araki , Tsunefumi Tanaka , Makoto Sekita , Kenichi Kimura , Takeshi Akiyama , Toshihiro Sunaga
IPC分类号： G02B17/08 , G02B23/00 , G02B27/14
CPC分类号： G02B17/0848 , G02B17/086 , G02B17/0896
摘要： An optical element comprising an object-side imaging element for imaging an object on an intermediate image plane in an optical path before a final image plane and an image-side imaging element for reimaging an object image formed on the intermediate image plane, on the final image plane, wherein at least one of the object-side imaging element and the image-side imaging element comprises an off-axial curved surface, and wherein aberration is generated by both of the object-side imaging element and the image-side imaging element, thereby flattening (disturbance of) a light intensity distribution caused on the final image plane by a noise source at or near the intermediate image plane.
摘要翻译：一种光学元件，包括用于在最终图像平面之前的光路中的中间图像平面上的物体成像的物体侧成像元件和用于对形成在中间图像平面上的物体图像进行再成像的图像侧成像元件图像平面，其中所述物体侧成像元件和所述图像侧成像元件中的至少一个包括非轴向弯曲表面，并且其中所述物体侧成像元件和所述图像侧成像元件都产生像差，从而在中间图像平面处或附近由噪声源在最终图像平面上引起的光强度分布变平（干扰）。

4. 发明授权

US08945416B2 Laser processing method 有权
标题翻译：激光加工方法
公开(公告)号：US08945416B2
公开(公告)日：2015-02-03
申请号：US13389048
申请日：2011-07-19
申请人： Hideki Shimoi , Keisuke Araki
发明人： Hideki Shimoi , Keisuke Araki
IPC分类号： H01L21/02 , B23K26/38 , B23K26/40 , H01L21/306 , H01L21/48 , B23K26/00
CPC分类号： H05K3/002 , B23K26/382 , B23K26/384 , B23K26/40 , B23K26/55 , B23K2101/35 , B23K2103/50 , H01L21/30604 , H01L21/30625 , H01L21/486 , H05K2203/107
摘要： A laser processing method of converging laser light into an object to be processed made of silicon so as to form a modified region and etching the object along the modified region so as to form the object with a through hole comprises an etch resist film producing step of producing an etch resist film resistant to etching on an outer surface of the object; a laser light converging step of converging the laser light at the object after the etch resist film producing step so as to form the modified region along a part corresponding to the through hole in the object and converging the laser light at the etch resist film so as to form a defect region along a part corresponding to the through hole in the etch resist film; and an etching step of etching the object after the laser light converging step so as to advance the etching selectively along the modified region and form the through hole.
摘要翻译：一种激光加工方法，其将激光会聚到由硅制成的待加工物体中以形成改质区域，并沿着改质区域蚀刻物体以形成具有通孔的物体，其包括：抗蚀剂膜制造步骤产生耐蚀刻物体的外表面上的蚀刻抗蚀剂膜; 在该抗蚀剂膜制造工序之后，将激光会聚在被处理物体上的激光聚光步骤，沿着与物体的贯通孔对应的部分形成改质区域，并将激光会聚在抗蚀剂膜上，以便沿着与蚀刻抗蚀剂膜中的通孔对应的部分形成缺陷区域; 以及在激光聚光步骤之后蚀刻所述物体以便沿着所述改质区域选择性地进行蚀刻并形成所述通孔的蚀刻步骤。

5. 发明授权

US08828873B2 Method for manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US08828873B2
公开(公告)日：2014-09-09
申请号：US13388626
申请日：2011-07-19
申请人： Hideki Shimoi , Keisuke Araki
发明人： Hideki Shimoi , Keisuke Araki
IPC分类号： H01L21/302 , H01L23/473 , B23K26/06 , B23K26/00 , B23K26/08
CPC分类号： B23K26/55 , B23K26/0006 , B23K26/0622 , B23K26/0853 , B23K2101/40 , B23K2103/56 , H01L23/473 , H01L2924/0002 , H01L2924/00
摘要： A method for manufacturing a semiconductor device having a cooling mechanism comprises a modified region forming step of converging a laser light at a sheet-like object to be processed made of silicon so as to form a modified region within the object along a line to form a modified region, an etching step of anisotropically etching the object after the modified region forming step so as to advance the etching selectively along the first modified region and form a flow path for circulating a coolant as a cooling mechanism within the object, and a functional device forming step of forming a functional device on one main face side of the object.
摘要翻译：一种制造具有冷却机构的半导体器件的方法包括：将由激光制成的待加工的片状物体的激光聚光的改质区域形成工序，以在该物体内沿着线形成修饰区域，形成修改区域，在改质区域形成工序后各向异性蚀刻物体的蚀刻步骤，以沿着第一改质区域选择性地进行蚀刻，并形成用于使作为冷却机构的冷却剂循环在物体内的流路，以及功能元件在物体的一个主面侧形成功能元件的形成工序。

6. 发明申请

US20120135606A1 LASER PROCESSING METHOD 有权
标题翻译：激光加工方法
公开(公告)号：US20120135606A1
公开(公告)日：2012-05-31
申请号：US13389048
申请日：2011-07-19
申请人： Hideki Shimoi , Keisuke Araki
发明人： Hideki Shimoi , Keisuke Araki
IPC分类号： H01L21/02
CPC分类号： H05K3/002 , B23K26/382 , B23K26/384 , B23K26/40 , B23K26/55 , B23K2101/35 , B23K2103/50 , H01L21/30604 , H01L21/30625 , H01L21/486 , H05K2203/107
摘要： A laser processing method of converging laser light into an object to be processed made of silicon so as to form a modified region and etching the object along the modified region so as to form the object with a through hole comprises an etch resist film producing step of producing an etch resist film resistant to etching on an outer surface of the object; a laser light converging step of converging the laser light at the object after the etch resist film producing step so as to form the modified region along a part corresponding to the through hole in the object and converging the laser light at the etch resist film so as to form a defect region along a part corresponding to the through hole in the etch resist film; and an etching step of etching the object after the laser light converging step so as to advance the etching selectively along the modified region and form the through hole.
摘要翻译：一种激光加工方法，其将激光会聚到由硅制成的待加工物体中以形成改质区域，并沿着改质区域蚀刻物体以形成具有通孔的物体，其包括：抗蚀剂膜制造步骤产生耐蚀刻物体的外表面上的蚀刻抗蚀剂膜; 在该抗蚀剂膜制造工序之后，将激光会聚在被处理物体上的激光聚光步骤，沿着与物体的贯通孔对应的部分形成改质区域，并将激光会聚在抗蚀剂膜上，以便沿着与蚀刻抗蚀剂膜中的通孔对应的部分形成缺陷区域; 以及在激光聚光步骤之后蚀刻所述物体以便沿着所述改质区域选择性地进行蚀刻并形成所述通孔的蚀刻步骤。

7. 发明授权

US5999311A Small-sized variable magnification optical system 失效
标题翻译：小型可变放大光学系统
公开(公告)号：US5999311A
公开(公告)日：1999-12-07
申请号：US828835
申请日：1997-03-24
申请人： Norihiro Nanba , Keisuke Araki
发明人： Norihiro Nanba , Keisuke Araki
IPC分类号： G02B15/16 , G02B27/00 , G02B23/06
CPC分类号： G02B15/16
摘要： A variable magnification optical system comprises at least three optical units which are a first moving optical unit, a fixed optical unit and a second moving optical unit. The three optical units are arranged in that order in a propagation direction of light, and a variation of magnification is effected by a relative movement between the first moving optical unit and the second moving optical unit. If a ray which exits from an object and enters the variable magnification optical system, and passes through a center of a stop of the variable magnification optical system and reaches a center of a final image plane is represented as a reference axis ray, the second moving optical unit has a cross-sectional shape which is asymmetrical in a plane which contains the reference axis, and a curved reflecting surface which is inclined with respect to the reference axis, and the direction of the entering reference axis and the direction of the exiting reference axis of the second moving optical unit are parallel to each other and differ from each other by 180.degree., the variable magnification optical system being arranged in such a manner that a final image is formed after an intermediate image is formed at least twice.
摘要翻译：可变放大率光学系统包括至少三个光学单元，它们是第一移动光学单元，固定光学单元和第二移动光学单元。三个光学单元按照光的传播方向依次布置，并且通过第一移动光学单元和第二移动光学单元之间的相对移动来实现放大变化。如果从物体出来并进入可变放大光学系统并且通过可变放大光学系统的停止的中心并到达最终图像平面的中心的光线被表示为参考轴线，则第二移动光学单元具有在包含参考轴的平面中不对称的横截面形状，以及相对于参考轴倾斜的弯曲反射表面，以及输入参考轴的方向和出射基准的方向第二移动光学单元的轴线彼此平行并且彼此相差180°，可变倍率光学系统被布置成使得在中间图像形成至少两次之后形成最终图像。

8. 发明授权

US5287147A Original scanning apparatus with fixed light source 失效
标题翻译：具有固定光源的原始扫描装置
公开(公告)号：US5287147A
公开(公告)日：1994-02-15
申请号：US824782
申请日：1992-01-22
申请人： Motomu Fukasawa , Kazuo Fujibayashi , Keisuke Araki
发明人： Motomu Fukasawa , Kazuo Fujibayashi , Keisuke Araki
IPC分类号： G03B27/52 , G03B27/54 , G03G15/04
CPC分类号： G03B27/542 , G03B27/526 , G03G15/04 , G03G15/0435
摘要： An original scanning apparatus comprising original support means on which an original is rested, elongated light source means for illuminating the original rested on the original support means, reflection means for reflecting light from the elongated light source means toward the original support means. The elongated light source means is fixed and the reflection means being shiftable, so that the original rested on the original support means is scanned by shifting the reflection means. Apparatus further includes side reflector means disposed at a longitudinal end of the elongated light source means and extending along a shifting direction of the reflection means.
摘要翻译：一种原始扫描装置，包括原件支撑装置，原件搁置在原件上，用于照亮搁置在原始支撑装置上的原件的细长光源装置，用于将来自细长光源装置的光反射到原始支撑装置的反射装置。细长光源装置是固定的，并且反射装置是可移动的，使得搁置在原始支撑装置上的原件通过移动反射装置被扫描。装置还包括设置在细长光源装置的纵向端并沿着反射装置的移动方向延伸的侧反射器装置。

9. 发明授权

US09108269B2 Method for manufacturing light-absorbing substrate and method for manufacturing mold for making same 有权
标题翻译：光吸收基板的制造方法及其制造方法
公开(公告)号：US09108269B2
公开(公告)日：2015-08-18
申请号：US13388595
申请日：2011-07-19
申请人： Hideki Shimoi , Keisuke Araki
发明人： Hideki Shimoi , Keisuke Araki
IPC分类号： B44C1/22 , B23K26/00 , B23K26/36 , H01L31/0236
CPC分类号： B23K26/355 , B23K26/361 , H01L31/02363 , Y02E10/50
摘要： A method for manufacturing a light-absorbing substrate having a surface with depressions and projections comprises a first step of irradiating a substrate with a laser light so as to form a plurality of modified regions arranged two-dimensionally along a surface of the substrate within the substrate and cause at least one of each modified region and a fracture generated from the modified region to reach the surface of the substrate and a second step of etching the surface of the substrate after the first step so as to form depressions and projections on the surface of the substrate.
摘要翻译：一种具有凹凸表面的光吸收基板的制造方法，其特征在于，包括：第一工序，用激光照射基板，形成沿着基板的基板表面二维配置的多个改质区域并且使得每个改性区域中的至少一个和从所述改性区域产生的断裂到达所述基板的表面;以及第二步骤，在所述第一步骤之后蚀刻所述基板的表面，以在所述第一步骤的表面上形成凹陷和突起底物。

10. 发明授权

US08961806B2 Laser processing method 有权
标题翻译：激光加工方法
公开(公告)号：US08961806B2
公开(公告)日：2015-02-24
申请号：US13388597
申请日：2011-07-19
申请人： Hideki Shimoi , Hiroyuki Kyushima , Keisuke Araki
发明人： Hideki Shimoi , Hiroyuki Kyushima , Keisuke Araki
IPC分类号： B44C1/22 , H01L21/306 , B23K26/00 , B23K26/06 , B23K26/08
CPC分类号： H01L23/147 , B23K26/0006 , B23K26/0622 , B23K26/0853 , B23K26/53 , B23K2101/40 , B23K2103/56 , H01L21/30608 , H01L21/486 , H01L21/76898 , H01L23/49827
摘要： In a method comprising a modified region forming step of converging a laser light at a sheet-like object to be processed made of silicon so as to form a plurality of modified spots within the object along a modified region forming line tilted in a first lateral direction with respect to a thickness direction of the object and the plurality of modified spots construct a modified region, and an etching step of anisotropically etching the object after the modified region forming step so as to advance the etching selectively along the modified region and form the object with a space extending obliquely with respect to the thickness direction, the modified region forming step forms the plurality of modified spots such that the modified spots adjacent to each other at least partly overlap each other when seen in the first lateral direction.
摘要翻译：在包括修改区域形成步骤的方法中，所述修改区域形成步骤将激光会聚在由硅制成的待加工的片状物体上，以沿着沿第一横向方向倾斜的改质区域形成线在物体内形成多个改质点相对于物体的厚度方向，并且所述多个改质点构成改质区域，以及在所述改质区域形成工序之后对所述物体进行各向异性蚀刻的蚀刻工序，以沿着所述改质区域选择性地进行蚀刻，并形成所述物体具有相对于厚度方向倾斜延伸的空间，所述改质区域形成步骤形成所述多个改质点，使得当在所述第一横向方向上观察时，彼此相邻的所述改性斑点彼此至少部分重叠。

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