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    • 2. 发明授权
    • Substrate holding device, substrate processing apparatus using the same, and method for aligning and holding substrate
    • 基板保持装置,使用其的基板处理装置以及基板对准和保持方法
    • US07123350B2
    • 2006-10-17
    • US10891032
    • 2004-07-15
    • Kotaro AkutsuMitsuru Inoue
    • Kotaro AkutsuMitsuru Inoue
    • G03B27/58G03B27/42
    • G03F7/707G03F7/70708
    • A substrate holding device has a substrate holding unit and supporting elements movable to protrude from a substrate-holding surface of the substrate holding unit. The substrate holding unit holds the substrate in a predetermined state with a first holding force after relative positions of the substrate and the substrate holding unit are adjusted while the supporting elements lift the substrate off the substrate-holding surface. Before the relative positions of the substrate and the substrate holding unit are adjusted, the substrate holding device holds the substrate with a second holding force that is smaller than the first holding force and includes a zero holding force. Thus, the substrate holding device is able to align and hold the substrate in a short time.
    • 基板保持装置具有基板保持单元和可移动地从基板保持单元的基板保持表面突出的支撑元件。 基板保持单元在基板和基板保持单元的相对位置调整同时支撑元件将基板从基板保持表面提起时,以基板保持力将基板保持在预定状态。 在调整基板和基板保持单元的相对位置之前,基板保持装置以比第一保持力小的第二保持力保持基板,并且包括零保持力。 因此,基板保持装置能够在短时间内对准和保持基板。
    • 5. 发明授权
    • Stage system, exposure apparatus, and device manufacturing method
    • 舞台系统,曝光装置和装置制造方法
    • US07030964B2
    • 2006-04-18
    • US10862383
    • 2004-06-08
    • Kotaro AkutsuNobushige KorenagaMitsuru Inoue
    • Kotaro AkutsuNobushige KorenagaMitsuru Inoue
    • G03B27/42G03B27/58H01J37/08H02K41/00
    • G03F7/70808G03F7/70716G03F7/70758G03F7/70816H01J37/20H01J2237/20292H01J2237/3175H02K1/278H02K16/00H02K41/031H02K2201/18
    • A stage system including a first fixed guide having a first guide surface being parallel to a first direction and a second direction being orthogonal to the first direction, a first movable guide to be guided by the first fixed guide and having three freedoms of straight motions in the first and second directions and a motion in a rotational direction about a third direction being orthogonal to the first and second directions, the first movable guide extending in the second direction, a second fixed guide having a second guide surface being parallel to the first and second directions, a second movable guide to be guided by the second fixed guide and having three freedoms of straight motions in the first and second directions and a motion in a rotational direction about the third direction, the second movable guide having a second guide extending in the first direction, and a movable member to be guided in the first and second directions by the first and second movable guides.
    • 一种舞台系统,包括:第一固定导向器,具有平行于第一方向的第一导向表面和与第一方向正交的第二方向;第一可移动引导件,由第一固定引导件引导,并且具有三个直线运动自由度 所述第一和第二方向以及围绕第三方向的旋转方向的运动与所述第一和第二方向正交,所述第一可移动引导件沿所述第二方向延伸;第二固定引导件,其具有与所述第一和第二方向平行的第二引导表面, 第二方向,由第二固定引导件引导并且具有在第一和第二方向上的直线运动的三个自由度的第二可移动引导件和围绕第三方向的旋转方向的运动,第二可移动引导件具有延伸到第二方向的第二引导件 第一方向,以及通过第一和第二可移动引导件在第一和第二方向上被引导的可动构件。
    • 7. 发明授权
    • in-facility information provision system and in-facility information provision method
    • 设施内信息提供系统和设施信息提供方法
    • US07454216B2
    • 2008-11-18
    • US11071342
    • 2005-03-04
    • Hiroaki ShikanoNaohiko IrieAtsushi ItoJunji InabaMitsuru InoueKazutaka Sakai
    • Hiroaki ShikanoNaohiko IrieAtsushi ItoJunji InabaMitsuru InoueKazutaka Sakai
    • H04Q7/20
    • G06Q30/00
    • To enable an appropriate change of a path according to a situation of a user and a situation of a target store and the path without having a special terminal when the user of a facility utilizes the target store and an appropriate guidance, spatial recognition nodes respectively provided with a sensor and information processing equipment are installed in each location in the facility and connected via a network. The nodes recognize the position, the action and the behavior of a user of the facility. A server controlling a system manages the recognition result and constantly grasps the situation of the user. The situation of the user is recognized by the node installed at a destination and on a path, and notified to the server. The server displays appropriate path information based on the recognition result on any of plural information displays installed in the facility when the user approaches.
    • 为了在设施的用户利用目标存储和适当的指导的情况下,根据用户的情况和目标存储的情况以及路径而不具有特殊终端的路径的适当改变,分别提供了空间识别节点 传感器和信息处理设备安装在设施的每个位置并通过网络连接。 节点识别设施的用户的位置,动作和行为。 控制系统的服务器管理识别结果并且不断掌握用户的情况。 用户的情况由安装在目的地和路径上的节点识别,并通知给服务器。 当用户接近时,服务器基于在设施中安装的多个信息显示器中的任一个上的识别结果来显示适当的路径信息。
    • 8. 发明申请
    • EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    • 曝光装置和装置制造方法
    • US20080158530A1
    • 2008-07-03
    • US11959197
    • 2007-12-18
    • Hirofumi FujiiHiroshi ItoMitsuru Inoue
    • Hirofumi FujiiHiroshi ItoMitsuru Inoue
    • G03B27/42
    • G03B27/58G03F7/70725G03F7/709
    • An exposure apparatus including a projection optical system and configured to expose a substrate to light via the projection optical system includes a support configured to support the projection optical system, an object supported by the support and movable relative the support, an actuator configured to drive the object, a detector configured to detect a relative position between the object and the support, and a controller configured to perform a control of the actuator based on an output of the detector to cause the object to follow the support. The controller is configured to perform an estimation of a vibration of the support based on an output of the detector in parallel with the control to cause the object to follow the support.
    • 包括投影光学系统并经配置以经由投影光学系统将基板曝光于光的曝光装置包括:支撑构件,用于支撑投影光学系统;由支撑件支撑并可相对于支撑件移动的物体;致动器, 物体,被配置为检测物体和支撑体之间的相对位置的检测器,以及被配置为基于检测器的输出执行致动器的控制以使物体跟随支撑件的控制器。 控制器被配置为基于检测器的输出与控制并行地执行对支撑件的振动的估计,以使对象遵循支撑。