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    • 2. 发明授权
    • Plasma processing method and plasma etching method
    • 等离子体处理方法和等离子体蚀刻方法
    • US5716534A
    • 1998-02-10
    • US564621
    • 1995-11-29
    • Hiroshi TsuchiyaYoshio FukasawaShuji MochizukiYukio NaitoKosuke Imafuku
    • Hiroshi TsuchiyaYoshio FukasawaShuji MochizukiYukio NaitoKosuke Imafuku
    • H01J37/32H01L21/00
    • H01J37/32082H01J37/32165H01J37/3299H01J2237/3343
    • A plasma etching apparatus includes a process chamber that can be set at a reduced pressure. A lower electrode on which a semiconductor wafer is placed and an upper electrode opposing the lower electrode are disposed in the process chamber. The lower and upper electrodes are connected to RF power supplies, respectively. First and second RF powers, the phases and power ratio of which are separately controlled, can be applied to the upper and lower electrodes. Parameters including the frequencies, power values, and relative phases of the first and second RF powers are selected in order to set the etching characteristics, e.g., an etching rate, the planar uniformity of the etching rate, the etching selectivity ratio and the like to predetermined values. During etching, the first and second RF powers are monitored by separate detectors, and are maintained at initial preset values through a controller.
    • 等离子体蚀刻装置包括能够减压设置的处理室。 在其中放置半导体晶片的下电极和与下电极相对的上电极设置在处理室中。 下电极和上电极分别连接到RF电源。 第一和第二RF功率(其相位和功率比被单独控制)可以应用于上电极和下电极。 选择包括第一和第二RF功率的频率,功率值和相对相位的参数,以便将蚀刻特性,例如蚀刻速率,蚀刻速率的平面均匀性,蚀刻选择比等设置为 预定值。 在蚀刻期间,第一和第二RF功率由分离的检测器监测,并通过控制器保持在初始预设值。
    • 4. 发明申请
    • LIQUID CRYSTAL DISPLAY DEVICE
    • 液晶显示装置
    • US20120306731A1
    • 2012-12-06
    • US13577987
    • 2010-12-20
    • Yuichi IyamaAkira ShibazakiYoshito HashimotoMasahiro ShimizuHiroshi TsuchiyaYusuke NishiharaKen Kuboki
    • Yuichi IyamaAkira ShibazakiYoshito HashimotoMasahiro ShimizuHiroshi TsuchiyaYusuke NishiharaKen Kuboki
    • G09G3/36
    • G02F1/136213G02F1/133707G02F1/134363
    • Disclosed is a liquid crystal display device of active matrix type. Each pixel electrode (1) includes either a single regional electrode (2) or two or more regional electrodes (2) which are electrically connected to each other. The or each regional electrode is provided with: a first electrode (cross-shaped electrode) (3) which has a pattern dividing a first region into a plurality of second regions (R1, R2, R3, and R4); and a plurality of stripe electrodes (4) which are provided in each of the second regions so as to extend from the first electrode and so as to be separated from each other by a distance. A storage capacitor line (CSL) is provided facing one of pixel electrodes (1) in a film thickness direction to form a storage capacitor. The storage capacitor line (CSL) is provided so as not to extend facing an edge (2e, 2e′) of a first region in the film thickness direction parallelly to the edge (2e, 2e′). The invention eliminates irregular orientation of liquid crystal molecules in polymer sustained alignment.
    • 公开了一种有源矩阵型液晶显示装置。 每个像素电极(1)包括彼此电连接的单个区域电极(2)或两个或更多个区域电极(2)。 该区域电极或每个区域电极设置有:第一电极(十字形电极)(3),其具有将第一区域划分成多个第二区域(R1,R2,R3和R4)的图案; 以及多个条状电极(4),其设置在每个第二区域中以便从第一电极延伸并且彼此分开一定距离。 在膜厚方向上设置有一个像素电极(1)的存储电容线(CSL),以形成存储电容器。 保持电容配线(CSL)被设置为不与面向边缘(2e,2e')的膜厚度方向上的第一区域的边缘(2e,2e')相对延伸。 本发明消除了聚合物持续排列中液晶分子的不规则取向。
    • 5. 发明申请
    • Harmful Substance Evaluating Method and Harmful Substance Evaluation Kit
    • 有害物质评估方法及有害物质评估工具
    • US20070224659A1
    • 2007-09-27
    • US10583128
    • 2004-12-16
    • Masakazu KatsumataHiroshi TsuchiyaTakashi KoikeMasataka Nishikawa
    • Masakazu KatsumataHiroshi TsuchiyaTakashi KoikeMasataka Nishikawa
    • G01N21/64C12Q1/04G01N21/76
    • G01N21/6408G01N21/6486G01N2021/635
    • A biological growth inhibition factor assay method includes: a first step of mixing a photosynthetic sample, with an aqueous solution sample to prepare a test measurement solution, letting the test measurement solution stand, and then after illuminating light onto the test measurement solution for a predetermined illumination time, measuring the light amount of the delayed fluorescence that is emitted; a second step of mixing the photosynthetic sample with a standard sample, in which biological growth inhibition factors are not present, to prepare a standard measurement solution, letting the standard measurement solution stand, and then after illuminating light onto the standard measurement solution for a predetermined illumination time, measuring the light amount of the delayed fluorescence that is emitted; and a third step of computing assay values based on the light amounts of delayed fluorescence, respectively measured in the first step and the second step, and determining a comparison value of the assay values to assay biological growth inhibition factors. A biological growth inhibition factor assay method that enables analysis of a wide range of inhibition factors in a short time is thereby realized.
    • 生物生长抑制因子测定方法包括:将光合作用样品与水溶液样品混合以制备测试测量溶液的第一步骤,使测试测量溶液静置,然后将光照射到测试测量溶液上以达到预定的 照射时间,测量发射的延迟荧光的光量; 将光合作用样品与其中不存在生物生长抑制因子的标准样品混合以制备标准测量溶液,使标准测量溶液静置,然后将光照射到标准测量溶液上达预定的第二步骤 照射时间,测量发射的延迟荧光的光量; 以及分别基于第一步骤和第二步骤中测量的延迟荧光的光量来计算测定值的第三步骤,以及测定测定值以测定生物生长抑制因子的比较值。 从而实现了能够在短时间内分析广泛的抑制因子的生物生长抑制因子测定方法。