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1. 发明授权

US06057206A Mark protection scheme with no masking 有权
标题翻译：标记保护方案，无掩蔽
公开(公告)号：US06057206A
公开(公告)日：2000-05-02
申请号：US410526
申请日：1999-10-01
申请人： Khanh B. Nguyen , Marina Plat , Christopher F. Lyons , Harry J. Levinson
发明人： Khanh B. Nguyen , Marina Plat , Christopher F. Lyons , Harry J. Levinson
IPC分类号： H01L23/544 , H01L21/76
CPC分类号： H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/54493 , H01L2924/0002
摘要： A method of forming an alignment mark protection structure is disclosed and includes forming an alignment mark protection layer over a substrate which has an alignment mark associated therewith. The method also includes forming a negative photoresist layer over the alignment mark protection layer and removing a portion of the negative photoresist layer which does not overlie the alignment mark. The removal exposes a portion of the alignment mark protection layer which does not overlie the alignment mark and the exposed portion of the alignment mark protection layer is then removed. Preferably, the removal of a portion of the negative photoresist includes selectively exposing a peripheral portion thereof using an edge-bead removal tool, thereby allowing for the formation of an alignment mark protection structure without an extra masking step.
摘要翻译：公开了一种形成对准标记保护结构的方法，并且包括在具有与其相关联的对准标记的衬底上形成对准标记保护层。该方法还包括在对准标记保护层上形成负光致抗蚀剂层，并且去除不覆盖对准标记的负光致抗蚀剂层的一部分。去除暴露出不覆盖对准标记的对准标记保护层的一部分，然后去除对准标记保护层的暴露部分。优选地，去除负光致抗蚀剂的一部分包括使用边缘珠去除工具选择性地暴露其周边部分，从而允许形成对准标记保护结构而没有额外的掩模步骤。

2. 发明授权

US06309926B1 Thin resist with nitride hard mask for gate etch application 有权
标题翻译：具有栅极蚀刻应用的氮化物硬掩模的薄抗蚀剂
公开(公告)号：US06309926B1
公开(公告)日：2001-10-30
申请号：US09205211
申请日：1998-12-04
申请人： Scott A. Bell , Christopher F. Lyons , Harry J. Levinson , Khanh B. Nguyen , Fei Wang , Chih Yuh Yang
发明人： Scott A. Bell , Christopher F. Lyons , Harry J. Levinson , Khanh B. Nguyen , Fei Wang , Chih Yuh Yang
IPC分类号： H01L218242
CPC分类号： H01L27/11521 , H01L21/0274 , H01L21/31116 , H01L21/32136 , H01L21/32137 , H01L21/32139 , H01L27/115
摘要： A method of forming a gate structure is provided. In the method, a nitride layer is formed on a gate material layer. An ultra-thin photoresist layer is formed on the nitride layer. The ultra-thin photoresist layer is patterned with short wavelength radiation to define a pattern for the gate. The ultra-thin photoresist layer is used as a mask during a first etch step to transfer the gate pattern to the nitride layer. The first etch step includes an etch chemistry that is selective to the nitride layer over the ultra-thin photoresist layer. The nitride layer is used as a hard mask during a second etch step to form the gate by transferring the gate pattern to the gate material layer via the second etch step.
摘要翻译：提供一种形成栅极结构的方法。在该方法中，在栅极材料层上形成氮化物层。在氮化物层上形成超薄的光致抗蚀剂层。用短波长辐射对超薄光致抗蚀剂层进行构图，以限定栅极的图案。在第一蚀刻步骤期间，将超薄光致抗蚀剂层用作掩模，以将栅极图案转移到氮化物层。第一蚀刻步骤包括对超薄光致抗蚀剂层上的氮化物层有选择性的蚀刻化学品。在第二蚀刻步骤期间，氮化物层用作硬掩模，以通过经由第二蚀刻步骤将栅极图案转移到栅极材料层来形成栅极。

3. 发明授权

US06165695A Thin resist with amorphous silicon hard mask for via etch application 有权
标题翻译：具有非晶硅硬掩模的薄抗蚀剂，用于通孔蚀刻应用
公开(公告)号：US06165695A
公开(公告)日：2000-12-26
申请号：US203150
申请日：1998-12-01
申请人： Chih Yuh Yang , Christopher F. Lyons , Harry J. Levinson , Khanh B. Nguyen , Fei Wang , Scott A. Bell
发明人： Chih Yuh Yang , Christopher F. Lyons , Harry J. Levinson , Khanh B. Nguyen , Fei Wang , Scott A. Bell
IPC分类号： H01L21/027 , H01L21/033 , H01L21/311 , H01L21/768 , G03C5/00
CPC分类号： H01L21/31144 , H01L21/0276 , H01L21/0332 , H01L21/0338 , H01L21/76816 , Y10S430/168
摘要： A method of forming a via structure is provided. In the method, a dielectric layer is formed on an anti-reflective coating (ARC) layer covering a first metal layer; and an amorphous silicon layer is formed on the dielectric layer. An ultra-thin photoresist layer is formed on the amorphous silicon layer, and the ultra-thin photoresist layer is patterned with short wavelength radiation to define a pattern for a via. The patterned ultra-thin photoresist layer is used as a mask during a first etch step to transfer the via pattern to the amorphous silicon layer. The first etch step includes an etch chemistry that is selective to the amorphous silicon layer over the ultra-thin photoresist layer and the dielectric layer. The amorphous silicon layer is employed as a hard mask during a second etch step to form a contact hole corresponding to the via pattern by etching portions of the dielectric layer.
摘要翻译：提供一种形成通孔结构的方法。在该方法中，在覆盖第一金属层的抗反射涂层（ARC）层上形成电介质层; 并且在该电介质层上形成非晶硅层。在非晶硅层上形成超薄光致抗蚀剂层，并用短波长辐射对超薄光致抗蚀剂层进行构图，以限定通孔的图案。在第一蚀刻步骤期间，将图案化超薄光致抗蚀剂层用作掩模，以将通孔图案转印到非晶硅层。第一蚀刻步骤包括对超薄光致抗蚀剂层和介电层上的非晶硅层有选择性的蚀刻化学品。在第二蚀刻步骤期间，非晶硅层用作硬掩模，以通过蚀刻介电层的部分形成对应于通孔图案的接触孔。

4. 发明授权

US6156658A Ultra-thin resist and silicon/oxide hard mask for metal etch 有权
标题翻译：用于金属蚀刻的超薄抗蚀剂和硅/氧化物硬掩模
公开(公告)号：US6156658A
公开(公告)日：2000-12-05
申请号：US203774
申请日：1998-12-02
申请人： Fei Wang , Christopher F. Lyons , Khanh B. Nguyen , Scott A. Bell , Harry J. Levinson , Chih Yuh Yang
发明人： Fei Wang , Christopher F. Lyons , Khanh B. Nguyen , Scott A. Bell , Harry J. Levinson , Chih Yuh Yang
IPC分类号： H01L21/027 , H01L21/3213 , H01L21/44 , H01L21/302 , H01L21/461
CPC分类号： H01L21/32139 , H01L21/0274 , H01L21/32136
摘要： In one embodiment, the present invention relates to a method of forming a metal line, involving the steps of providing a semiconductor substrate comprising a metal layer, an oxide layer over the metal layer, and a silicon layer over the oxide layer; depositing an ultra-thin photoresist over the silicon layer, the ultra-thin photoresist having a thickness less than about 2,000 .ANG.; irradiating the ultra-thin photoresist with electromagnetic radiation having a wavelength of about 250 nm or less; developing the ultra-thin photoresist exposing a portion of the silicon layer; etching the exposed portion of the silicon layer exposing a portion of the oxide layer; etching the exposed portion of the oxide layer exposing a portion of the metal layer; and etching the exposed portion of the metal layer thereby forming the metal line.
摘要翻译：在一个实施例中，本发明涉及一种形成金属线的方法，包括以下步骤：提供包括金属层的半导体衬底，金属层上的氧化物层和氧化物层上的硅层; 在硅层上沉积超薄光致抗蚀剂，超薄光致抗蚀剂的厚度小于约2,000安培; 用波长约250nm或更小的电磁辐射照射超薄光致抗蚀剂; 开发暴露一部分硅层的超薄光刻胶; 蚀刻暴露出氧化物层的一部分的硅层的暴露部分; 蚀刻暴露出金属层的一部分的氧化物层的暴露部分; 并且蚀刻金属层的暴露部分从而形成金属线。

5. 发明授权

US06740566B2 Ultra-thin resist shallow trench process using high selectivity nitride etch 有权
标题翻译：使用高选择性氮化物蚀刻的超薄抗蚀剂浅沟槽工艺
公开(公告)号：US06740566B2
公开(公告)日：2004-05-25
申请号：US09398641
申请日：1999-09-17
申请人： Christopher F. Lyons , Scott A. Bell , Harry J. Levinson , Khanh B. Nguyen , Fei Wang , Chih Yuh Yang
发明人： Christopher F. Lyons , Scott A. Bell , Harry J. Levinson , Khanh B. Nguyen , Fei Wang , Chih Yuh Yang
IPC分类号： H01L2176
CPC分类号： H01L21/76224
摘要： In one embodiment, the present invention relates to a method of forming a shallow trench, involving the steps of providing a semiconductor substrate comprising a barrier oxide layer over at the semiconductor substrate and a nitride layer over the barrier oxide layer; depositing an ultra-thin photoresist over the nitride layer, the ultra-thin photoresist having a thickness of about 2,000 Å or less; patterning the ultra-thin photoresist to expose a portion of the nitride layer and to define a pattern for the shallow trench; etching the exposed portion of the nitride layer with an etchant having a nitride:photoresist selectivity of at least about 10:1 to expose a portion of the barrier oxide layer; etching the exposed portion of the barrier oxide layer to expose a portion of the semiconductor substrate; and etching the exposed portion of the semiconductor substrate to provide the shallow trench. In another embodiment, the method further involves depositing an insulating filler material into the shallow trench to provide a shallow trench isolation region.
摘要翻译：在一个实施例中，本发明涉及一种形成浅沟槽的方法，包括以下步骤：在半导体衬底上提供包括阻挡氧化物层的半导体衬底，以及在阻挡氧化物层上方的氮化物层; 在所述氮化物层上沉积超薄光致抗蚀剂，所述超薄光致抗蚀剂具有约2,000或更小的厚度; 图案化超薄光致抗蚀剂以暴露氮化物层的一部分并且限定用于浅沟槽的图案; 用具有至少约10:1的氮化物：光致抗蚀剂选择性的蚀刻剂蚀刻氮化物层的暴露部分以暴露部分阻挡氧化物层; 蚀刻阻挡氧化物层的暴露部分以暴露半导体衬底的一部分; 并蚀刻半导体衬底的暴露部分以提供浅沟槽。在另一个实施例中，该方法还包括将绝缘填充材料沉积到浅沟槽中以提供浅沟槽隔离区域。

6. 发明授权

US06171763B2 Ultra-thin resist and oxide/nitride hard mask for metal etch 有权
标题翻译：用于金属蚀刻的超薄抗蚀剂和氧化物/氮化物硬掩模
公开(公告)号：US06171763B2
公开(公告)日：2001-01-09
申请号：US09204651
申请日：1998-12-02
申请人： Fei Wang , Christopher F. Lyons , Khanh B. Nguyen , Scott A. Bell , Harry J. Levinson , Chih Yuh Yang
发明人： Fei Wang , Christopher F. Lyons , Khanh B. Nguyen , Scott A. Bell , Harry J. Levinson , Chih Yuh Yang
IPC分类号： G03F700
CPC分类号： H01L21/32139 , G03F7/094 , G03F7/40 , G03F7/405 , H01L21/32136
摘要： In one embodiment, the present invention relates to a method of forming a metal line, involving the steps of providing a semiconductor substrate comprising a metal layer, a silicon nitride layer over the metal layer, and an oxide layer over the silicon nitride layer; depositing an ultra-thin photoresist over the oxide layer, the ultra-thin photoresist having a thickness less than about 2,000 Å; irradiating the ultra-thin photoresist with electromagnetic radiation having a wavelength of about 250 nm or less; developing the ultra-thin photoresist exposing a portion of the oxide layer; etching the exposed portion of the oxide layer exposing a portion of the silicon nitride layer; etching the exposed portion of the silicon nitride layer exposing a portion of the metal layer; and etching the exposed portion of the metal layer thereby forming the metal line.
摘要翻译：在一个实施例中，本发明涉及一种形成金属线的方法，包括以下步骤：提供包括金属层的半导体衬底，金属层上的氮化硅层和氮化硅层上的氧化物层; 在所述氧化物层上沉积超薄光致抗蚀剂，所述超薄光致抗蚀剂具有小于约的厚度; 用波长约250nm或更小的电磁辐射照射超薄光致抗蚀剂; 显影暴露一部分氧化物层的超薄光刻胶; 蚀刻暴露出氮化硅层的一部分的氧化物层的暴露部分; 蚀刻暴露出金属层的一部分的氮化硅层的暴露部分; 并且蚀刻金属层的暴露部分从而形成金属线。

7. 发明授权

US6020269A Ultra-thin resist and nitride/oxide hard mask for metal etch 有权
标题翻译：用于金属蚀刻的超薄抗蚀剂和氮化物/氧化物硬掩模
公开(公告)号：US6020269A
公开(公告)日：2000-02-01
申请号：US203461
申请日：1998-12-02
申请人： Fei Wang , Christopher F. Lyons , Khanh B. Nguyen , Scott A. Bell , Harry J. Levinson , Chih Yuh Yang
发明人： Fei Wang , Christopher F. Lyons , Khanh B. Nguyen , Scott A. Bell , Harry J. Levinson , Chih Yuh Yang
IPC分类号： H01L21/3213 , H01L21/302
CPC分类号： H01L21/32139
摘要： In one embodiment, the present invention relates to a method of forming a metal line, involving the steps of providing a semiconductor substrate comprising a metal layer, an oxide layer over the metal layer, and a silicon nitride layer over the oxide layer; depositing an ultra-thin photoresist over the silicon nitride layer, the ultra-thin photoresist having a thickness less than about 2,000 .ANG.; irradiating the ultra-thin photoresist with electromagnetic radiation having a wavelength of about 250 nm or less; developing the ultra-thin photoresist exposing a portion of the silicon nitride layer; etching the exposed portion of the silicon nitride layer exposing a portion of the oxide layer; etching the exposed portion of the oxide layer exposing a portion of the metal layer; and etching the exposed portion of the metal layer thereby forming the metal line.
摘要翻译：在一个实施方案中，本发明涉及一种形成金属线的方法，包括以下步骤：提供包含金属层的半导体衬底，金属层上的氧化物层和氧化物层上的氮化硅层; 在氮化硅层上沉积超薄光致抗蚀剂，超薄光致抗蚀剂的厚度小于约2,000安培; 用波长约250nm或更小的电磁辐射照射超薄光致抗蚀剂; 显影暴露氮化硅层的一部分的超薄光刻胶; 蚀刻暴露出氧化物层的一部分的氮化硅层的暴露部分; 蚀刻暴露出金属层的一部分的氧化物层的暴露部分; 并且蚀刻金属层的暴露部分从而形成金属线。

8. 发明授权

US06544885B1 Polished hard mask process for conductor layer patterning 有权
标题翻译：用于导体层图案化的抛光硬掩模工艺
公开(公告)号：US06544885B1
公开(公告)日：2003-04-08
申请号：US09706498
申请日：2000-11-03
申请人： Khanh B. Nguyen , Harry J. Levinson , Christopher F. Lyons , Scott A. Bell , Fei Wang , Chih Yuh Yang
发明人： Khanh B. Nguyen , Harry J. Levinson , Christopher F. Lyons , Scott A. Bell , Fei Wang , Chih Yuh Yang
IPC分类号： H01L2358
CPC分类号： H01L21/76895 , H01L21/32139 , H01L2924/0002 , Y10S438/95 , H01L2924/00
摘要： A method of forming a conductor pattern on a base with uneven topography includes placing conductor material on the base, placing a hard mask material on the conductor material, planarizing an exposed surface of the hard mask material, and placing a layer of resist on the hard mask material. The resist is patterned and the patterned resist is used in selectively etching the hard mask material, with the hard mask material used in selectively etching the underlying conductor material. By planarizing the hard mask material prior to placing a layer of resist thereupon, uniformity of the resist coating is enhanced and depth of focus problems in exposing the resist are reduced.
摘要翻译：在具有不平坦的地形的基底上形成导体图案的方法包括将导体材料放置在基底上，将硬掩模材料放置在导体材料上，平坦化硬掩模材料的暴露表面，以及将一层抗蚀剂放置在硬面具材料。抗蚀剂被图案化，并且图案化的抗蚀剂用于选择性地蚀刻硬掩模材料，其中硬掩模材料用于选择性蚀刻下面的导体材料。通过在放置一层抗蚀剂之前对硬掩模材料进行平面化，抗蚀剂涂层的均匀性得到提高，并且降低了曝光抗蚀剂的焦点深度问题。

9. 发明授权

US06306560B1 Ultra-thin resist and SiON/oxide hard mask for metal etch 失效
标题翻译：用于金属蚀刻的超薄抗蚀剂和SiON /氧化物硬掩模
公开(公告)号：US06306560B1
公开(公告)日：2001-10-23
申请号：US09204630
申请日：1998-12-02
申请人： Fei Wang , Christopher F. Lyons , Khanh B. Nguyen , Scott A. Bell , Harry J. Levinson , Chih Yuh Yang
发明人： Fei Wang , Christopher F. Lyons , Khanh B. Nguyen , Scott A. Bell , Harry J. Levinson , Chih Yuh Yang
IPC分类号： G03C500
CPC分类号： H01L21/31144 , H01L21/0274 , H01L21/0332 , H01L21/31116 , H01L21/32139
摘要： In one embodiment, the present invention relates to a method of forming a metal line, involving the steps of providing a semiconductor substrate comprising a metal layer, an oxide layer over the metal layer, and a silicon oxynitride layer over the oxide layer; depositing an ultra-thin photoresist over the silicon oxynitride layer, the ultra-thin photoresist having a thickness less than about 2,000 Å; irradiating the ultra-thin photoresist with electromagnetic radiation having a wavelength of about 250 nm or less; developing the ultra-thin photoresist exposing a portion of the silicon oxynitride layer; etching the exposed portion of the silicon oxynitride layer exposing a portion of the oxide layer; etching the exposed portion of the oxide layer exposing a portion of the metal layer; and etching the exposed portion of the metal layer thereby forming the metal line.
摘要翻译：在一个实施例中，本发明涉及一种形成金属线的方法，包括以下步骤：在氧化物层上方提供包括金属层，金属层上的氧化物层和氧氮化硅层的半导体衬底; 在所述氮氧化硅层上沉积超薄光致抗蚀剂，所述超薄光致抗蚀剂具有小于约的厚度; 用波长约250nm或更小的电磁辐射照射超薄光致抗蚀剂; 显影暴露一部分氮氧化硅层的超薄光刻胶; 蚀刻暴露氧化物层的一部分的氧氮化硅层的暴露部分; 蚀刻暴露出金属层的一部分的氧化物层的暴露部分; 并且蚀刻金属层的暴露部分从而形成金属线。

10. 发明授权

US6162587A Thin resist with transition metal hard mask for via etch application 有权
公开(公告)号：US6162587A
公开(公告)日：2000-12-19
申请号：US203450
申请日：1998-12-01
申请人： Chih Yuh Yang , Christopher F. Lyons , Harry J. Levinson , Khanh B. Nguyen , Fei Wang , Scott A. Bell
发明人： Chih Yuh Yang , Christopher F. Lyons , Harry J. Levinson , Khanh B. Nguyen , Fei Wang , Scott A. Bell
IPC分类号： H01L21/027 , H01L21/033 , H01L21/3213 , H01L21/768 , G03C5/00
CPC分类号： H01L21/76816 , H01L21/0276 , H01L21/0332 , H01L21/0338 , H01L21/32139
摘要： A method of forming a via structure is provided. In the method, a dielectric layer is formed on an anti-reflective coating (ARC) layer covering a first metal layer; and a transition metal layer is formed on the dielectric layer. An ultra-thin photoresist layer is formed on the transition metal layer, and the ultra-thin photoresist layer is patterned with short wavelength radiation to define a pattern for a via. The patterned ultra-thin photoresist layer is used as a mask during a first etch step to transfer the via pattern to the transition metal layer. The first etch step includes an etch chemistry that is selective to the transition metal layer over the ultra-thin photoresist layer and the dielectric layer. The transition metal layer is employed as a hard mask during a second etch step to form a contact hole corresponding to the via pattern by etching portions of the dielectric layer.

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