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    • 6. 发明授权
    • Voltage controlled oscillator
    • 压控振荡器
    • US07211933B2
    • 2007-05-01
    • US10935264
    • 2004-09-08
    • Takashi KawakuboKazuhide AbeMayumi Morizuka
    • Takashi KawakuboKazuhide AbeMayumi Morizuka
    • H01L41/08
    • H03H9/173H03B5/326H03B5/366H03H9/0542H03H2009/02204Y10T29/42Y10T29/43Y10T29/49005Y10T29/49155
    • The present invention provides a voltage controlled oscillator comprising an thin film BAW resonator and a variable capacitor element. The thin film BAW resonator includes an anchor section formed on a Si substrate, a lower electrode supported on the anchor section and positioned to face the Si substrate, a first piezoelectric film formed on the lower electrode, and an upper electrode formed on the first piezoelectric film. On the other hand, the variable capacitor element includes a stationary electrode formed on a Si substrate, an anchor section formed on the Si substrate, a first electrode supported on the anchor section and positioned to face the Si substrate, a second piezoelectric film formed on the first electrode, and a second electrode formed on the second piezoelectric film.
    • 本发明提供一种包括薄膜BAW谐振器和可变电容器元件的压控振荡器。 薄膜BAW谐振器包括形成在Si衬底上的锚定部分,支撑在锚固部分上并定位成面对Si衬底的下电极,形成在下电极上的第一压电膜,以及形成在第一压电 电影。 另一方面,可变电容器元件包括形成在Si衬底上的固定电极,形成在Si衬底上的锚定部分,支撑在锚定部分上并且定位成面对Si衬底的第一电极,形成在第二压电膜上的第二压电膜 第一电极和形成在第二压电膜上的第二电极。
    • 8. 发明授权
    • High electron mobility transistor
    • 高电子迁移率晶体管
    • US06555851B2
    • 2003-04-29
    • US09778823
    • 2001-02-08
    • Mayumi Morizuka
    • Mayumi Morizuka
    • H01L310256
    • H01L29/7787H01L29/2003
    • A high electron mobility transistor comprises a GaN-based electron accumulation layer formed on a substrate, an electron supply layer formed on the electron accumulation layer, a source electrode and a drain electrode formed on the electron supply layer and spaced from each other, a gate electrode formed on the electron supply layer between the source and drain electrodes, and a hole absorption electrode formed on the electron accumulation layer so as to be substantially spaced from the electron supply layer. Since the hole absorption electrode is formed on the electron absorption layer in order to prevent holes generated by impact ionization from being accumulated on the electron accumulation layer, a kink phenomenon is prevented. Good drain-current/voltage characteristics are therefore obtained. A high power/high electron mobility transistor is provided with a high power-added efficiency and good linearity.
    • 高电子迁移率晶体管包括形成在基板上的GaN基电子累积层,形成在电子积累层上的电子供应层,形成在电子供给层上的源电极和漏电极,彼此间​​隔开,栅极 形成在源电极和漏电极之间的电子供给层上的电极和形成在电子积累层上以与电子供给层基本间隔开的空穴吸收电极。 由于空穴吸收电极形成在电子吸收层上,以防止由电子堆积层积聚产生的冲击电离产生的空穴,因此可以防止扭结现象。 因此获得良好的漏极电流/电压特性。 高功率/高电子迁移率晶体管具有高的功率附加效率和良好的线性度。
    • 10. 发明授权
    • High electron mobility transistor and method of manufacturing the same
    • 高电子迁移率晶体管及其制造方法
    • US06908799B2
    • 2005-06-21
    • US10673319
    • 2003-09-30
    • Mayumi Morizuka
    • Mayumi Morizuka
    • H01L29/812H01L21/335H01L21/338H01L29/20H01L29/778
    • H01L29/7787H01L29/2003
    • A high electron mobility transistor comprises a GaN-based electron accumulation layer formed on a substrate, an electron supply layer formed on the electron accumulation layer, a source electrode and a drain electrode formed on the electron supply layer and spaced from each other, a gate electrode formed on the electron supply layer between the source and drain electrodes, and a hole absorption electrode formed on the electron accumulation layer so as to be substantially spaced from the electron supply layer. Since the hole absorption electrode is formed on the electron absorption layer in order to prevent holes generated by impact ionization from being accumulated on the electron accumulation layer, a kink phenomenon is prevented. Good drain-current/voltage characteristics are therefore obtained. A high power/high electron mobility transistor is provided with a high power-added efficiency and good linearity.
    • 高电子迁移率晶体管包括形成在基板上的GaN基电子累积层,形成在电子积累层上的电子供应层,形成在电子供给层上的源电极和漏电极,彼此间​​隔开,栅极 形成在源电极和漏电极之间的电子供给层上的电极和形成在电子积累层上以与电子供给层基本间隔开的空穴吸收电极。 由于空穴吸收电极形成在电子吸收层上,以防止由电子堆积层积聚产生的冲击电离产生的空穴,因此可以防止扭结现象。 因此获得良好的漏极电流/电压特性。 高功率/高电子迁移率晶体管具有高的功率附加效率和良好的线性度。