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    • 4. 发明申请
    • ELECTROLYTIC COPPER FOIL, METHOD OF PRODUCING ELECTROLYTIC COPPER FOIL, LITHIUM ION SECONDARY CELL USING ELECTROLYTIC COPPER FOIL AS COLLECTOR
    • 电解铜箔,生产电解铜箔的方法,使用电解铜箔作为收集器的锂离子二次电池
    • US20140199588A1
    • 2014-07-17
    • US14129138
    • 2012-06-27
    • Kensaku ShinozakiAkitoshi Suzuki
    • Kensaku ShinozakiAkitoshi Suzuki
    • H01M4/66H01M4/04
    • H01M4/667C25D1/04C25D3/38C25D5/50H01M4/0452H01M4/134H01M4/386H01M4/387H01M4/661H01M10/052
    • The present invention provides an electrodeposited copper foil having a tensile strength of at least 300 MPa and elongation rate of at least 3.0% after heat treatment at 350° C. for 1 hour and provides a copper foil which prevents the breakage of a current collector (copper foil) while maintaining adhesiveness between the current collector (copper foil) and the active material in response to substantial expansion and contraction of a Si or Sn alloy-based active material. The foil is an electrodeposited copper foil having a roughened surface, the tensile strength of the copper foil being at least 300 MPa after heating at 350° C. for 1 hour, the elongation rate being at least 3.0% after heating at 350° C. for 1 hour, and respective surface area ratios (actual surface area/geometric surface area) of both sides of the copper foil (the side that is roughened and the side that is not roughened) being from 1.6 to 2.2. The electrodeposited copper foil is produced with an electrolyte in which from 3 to 20 ppm of organic additives of one or more compounds selected from compounds having a structure with an SH group binding to a heterocycle containing N or thiourea-based compounds is added to a copper sulfate-based electrolyte, and then from 0 to 12 ppm of hydroxyethyl cellulose or a low-molecular weight glue, and from 10 to 80 ppm of chlorine ions are added thereto.
    • 本发明提供一种在350℃热处理1小时后的拉伸强度为300MPa以上的伸长率为3.0%以上的电解铜箔,提供了防止集电体断裂的铜箔( 铜箔),同时响应于基于Si或Sn合金的活性材料的显着的膨胀和收缩而保持集电体(铜箔)和活性材料之间的粘合性。 箔是具有粗糙表面的电沉积铜箔,在350℃下加热1小时后,铜箔的拉伸强度至少为300MPa,在350℃加热后的伸长率至少为3.0%。 1小时,铜箔两侧(粗糙面和未粗糙化面)的表面积比(实际面积/几何面积)为1.6〜2.2。 电沉积铜箔是用电解液制成的,其中3至20ppm的一种或多种选自具有SH基团结构的化合物的有机添加剂与含有N或硫脲类化合物的杂环结合的化合物加入到铜 硫酸盐类电解质,然后0〜12ppm的羟乙基纤维素或低分子量的胶,向其中加入10〜80ppm的氯离子。