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1. 发明授权

US5572170A Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits 失效
标题翻译：使用可调电感元件和谐振回路的电子调谐匹配网络
公开(公告)号：US5572170A
公开(公告)日：1996-11-05
申请号：US518014
申请日：1995-08-22
申请人： Kenneth S. Collins , John Trow , Craig A. Roderick , Jay D. Pinson, II , Douglas A. Buchberger, II , Robert P. Hartlage , Viktor Shel
发明人： Kenneth S. Collins , John Trow , Craig A. Roderick , Jay D. Pinson, II , Douglas A. Buchberger, II , Robert P. Hartlage , Viktor Shel
IPC分类号： H01F21/02 , H01F29/14 , H01J37/32 , H01L21/311 , H03H7/38 , H03H7/40 , H03H11/30 , H03J3/22 , H05H1/46 , H01P5/08
CPC分类号： H01J37/32183 , H01F29/146 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32522 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01L21/31116 , H03H11/30 , H03H7/40 , H05H1/46 , H01F2029/143
摘要： A plasma processing system including a plasma processing chamber; an antenna circuit including a source antenna positioned relative to the processing chamber so as to couple energy into a plasma within the chamber during processing, the antenna circuit having a first terminal and a second terminal with the source antenna electrically coupled between the first and second terminals; and a local impedance transforming network connected to the antenna circuit, the local impedance transforming network including a first capacitor connected between the first terminal and a grounded node, and a second capacitor connected between the second terminal and the grounded node.
摘要翻译：一种等离子体处理系统，包括等离子体处理室; 天线电路包括相对于处理室定位的源天线，以便在处理期间将能量耦合到腔室内的等离子体中，天线电路具有第一端子和第二端子，源极天线电耦合在第一和第二端子之间 ; 以及连接到所述天线电路的局部阻抗变换网络，所述局部阻抗变换网络包括连接在所述第一端子和接地节点之间的第一电容器，以及连接在所述第二端子和所述接地节点之间的第二电容器。

2. 发明授权

US5392018A Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits 失效
标题翻译：使用可调电感元件和谐振回路的电子调谐匹配网络
公开(公告)号：US5392018A
公开(公告)日：1995-02-21
申请号：US975355
申请日：1992-11-12
申请人： Kenneth S. Collins , John Trow , Craig A. Roderick , Jay D. Pinson, II , Douglas A. Buchberger, II , Robert P. Hartlage , Viktor Shel
发明人： Kenneth S. Collins , John Trow , Craig A. Roderick , Jay D. Pinson, II , Douglas A. Buchberger, II , Robert P. Hartlage , Viktor Shel
IPC分类号： H01F21/02 , H01F29/14 , H01J37/32 , H01L21/311 , H03H7/38 , H03H7/40 , H03H11/30 , H03J3/22 , H05H1/46 , H01F21/00
CPC分类号： H01J37/32183 , H01F29/146 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32522 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01L21/31116 , H03H11/30 , H03H7/40 , H05H1/46 , H01F2029/143
摘要： The disclosure discusses impedance matching circuits based on parallel-resonant L-C tank circuits, and describes a low-loss design for an adjustable inductance element suitable for use in these parallel tank circuits. The application of an impedance matching circuit to a plasma process is also disclosed; in this context, a local impedance transformation circuit is used to improve power transfer to the plasma source antenna.
摘要翻译：本公开内容讨论了基于并联谐振L-C谐振电路的阻抗匹配电路，并且描述了适用于这些并联电路中的可调电感元件的低损耗设计。还公开了阻抗匹配电路对等离子体工艺的应用; 在本文中，使用局部阻抗变换电路来改善对等离子体源天线的功率传递。

3. 发明授权

US5574410A Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits 失效
公开(公告)号：US5574410A
公开(公告)日：1996-11-12
申请号：US336873
申请日：1994-11-09
申请人： Kenneth S. Collins , John Trow , Craig A. Roderick , Jay D. Pinson, II , Douglas A. Buchberger, II , Robert P. Hartlage , Viktor Shel
发明人： Kenneth S. Collins , John Trow , Craig A. Roderick , Jay D. Pinson, II , Douglas A. Buchberger, II , Robert P. Hartlage , Viktor Shel
IPC分类号： H01F21/02 , H01F29/14 , H01J37/32 , H01L21/311 , H03H7/38 , H03H7/40 , H03H11/30 , H03J3/22 , H05H1/46
CPC分类号： H01J37/32183 , H01F29/146 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32522 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01L21/31116 , H03H11/30 , H03H7/40 , H05H1/46 , H01F2029/143
摘要： The disclosure discusses impedance matching circuits based on parallel-resonant L-C tank circuits, and describes a low-loss design for an adjustable inductance element suitable for use in these parallel tank circuits. The application of an impedance matching circuit to a plasma process is also disclosed; in this context, a local impedance transformation circuit is used to improve power transfer to the plasma source antenna.

4. 发明授权

US06252354B1 RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control 失效
标题翻译：使用频率伺服和功率，电压，电流或DI / DT控制的RF等离子体反应器的RF调谐方法
公开(公告)号：US06252354B1
公开(公告)日：2001-06-26
申请号：US08743059
申请日：1996-11-04
申请人： Kenneth Collins , Craig Roderick , Douglas Buchberger , John Trow , Viktor Shel
发明人： Kenneth Collins , Craig Roderick , Douglas Buchberger , John Trow , Viktor Shel
IPC分类号： H05H146
CPC分类号： H03H7/40 , H01J37/321 , H01J37/32174 , H01J37/3299
摘要： In an RF plasma reactor including a reactor chamber with a process gas inlet, a workpiece support, an RF signal applicator facing a portion of the interior of the chamber and an RF signal generator having a controllable RF frequency and an RF signal output coupled to an input of the RF signal applicator, the invention tunes the RF signal generator to the plasma-loaded RF signal applicator by sensing an RF parameter at the RF signal generator or at the RF signal applicator and then adjusting the frequency of the RF signal generator so as to optimize the parameter. The invention further controls the RF signal generator output magnitude (power, current or voltage) by optimizing the value of the same RF parameter or another RF parameter. The reactor preferably includes a fixed tuning circuit between the RF signal generator and the RF signal applicator.
摘要翻译：在包括具有工艺气体入口的反应器室的RF等离子体反应器中，工件支撑件，面向腔室内部的一部分的RF信号施加器以及RF信号发生器，RF信号发生器具有耦合到 RF信号施加器的输入，本发明通过感测RF信号发生器或RF信号施加器处的RF参数，然后调整RF信号发生器的频率，将RF信号发生器调谐到等离子体负载的RF信号施加器，以便以优化参数。本发明还通过优化相同RF参数或另一个RF参数的值来进一步控制RF信号发生器的输出幅度（功率，电流或电压）。反应器优选地包括在RF信号发生器和RF信号施加器之间的固定调谐电路。

5. 发明授权

US06308654B1 Inductively coupled parallel-plate plasma reactor with a conical dome 失效
标题翻译：具有锥形圆顶的电感耦合平行板等离子体反应器
公开(公告)号：US06308654B1
公开(公告)日：2001-10-30
申请号：US08734015
申请日：1996-10-18
申请人： Gerhard Schneider , Viktor Shel , Andrew Nguyen , Robert W. Wu , Gerald Z. Yin
发明人： Gerhard Schneider , Viktor Shel , Andrew Nguyen , Robert W. Wu , Gerald Z. Yin
IPC分类号： C23C1600
CPC分类号： H01J37/321
摘要： A plasma reactor appropriate for fabrication, especially etching, of semiconductor integrated circuits and similar processes in which the chamber has a top comprising a truncated conical dome and, preferably, a counter electrode disposed at the top of the conical dome. An RF coil is wrapped around the conical dome to inductively couple RF energy into a plasma within the chamber dome. The dome temperature can be controlled in a number of ways. A heat sink can be attached to the outside rim of the dome. A rigid conical thermal control sheath can be fit to the outside of the dome, and any differential thermal expansion between the two is accommodated by the conical geometry, thus assuring good thermal contact. The rigid thermal control sheath can include resistive heating, fluid cooling, or both. Alternatively, a flexible resistive heater can be wrapped around the dome inside the RF coil. The resistive heater includes a heater wire wound in a serpentine path that has straight portions overlying and perpendicular to the RF coil but has bends located away from the RF coil. The path prevents the heater wire from shorting the azimuthal electric field induced by the RF coil and also acts as a Faraday shield preventing capacitive coupling from the coil into the chamber plasma.
摘要翻译：适用于半导体集成电路的制造，特别是蚀刻的等离子体反应器和类似的工艺，其中腔室具有顶部，该顶部包括截顶圆锥形圆顶，优选地，设置在锥形圆顶顶部的对置电极。 RF线圈围绕圆锥形圆顶包裹以将射频能量感应耦合到腔室内的等离子体中。圆顶温度可以以多种方式进行控制。散热器可以连接到圆顶的外边缘。刚性圆锥形热控制护套可以配合到圆顶的外部，并且两者之间的任何差别的热膨胀由锥形几何形状适应，从而确保良好的热接触。刚性热控鞘可以包括电阻加热，流体冷却或两者。或者，柔性电阻加热器可以缠绕在RF线圈内的圆顶周围。电阻加热器包括缠绕在蛇形路径中的加热线，其具有覆盖并垂直于RF线圈的直线部分，但具有远离RF线圈的弯曲。该路径防止加热线短路由RF线圈引起的方位电场，并且还用作防止从线圈到室等离子体的电容耦合的法拉第屏蔽。

6. 发明授权

US5872456A Apparatus for directly measuring component values within an RF circuit 失效
标题翻译：用于直接测量RF电路内的元件值的装置
公开(公告)号：US5872456A
公开(公告)日：1999-02-16
申请号：US862230
申请日：1997-05-23
申请人： Craig Alan Roderick , Viktor Shel
发明人： Craig Alan Roderick , Viktor Shel
IPC分类号： G01R27/26 , G01R31/28
CPC分类号： G01R27/26 , G01R31/2822
摘要： Apparatus for directly measuring the value of a component within an RF circuit (e.g., an RF matching network within a semiconductor wafer processing system). Specifically, the apparatus applies a low frequency signal (e.g., a 1 KHz) across one or more of the components within an RF circuit using a bridge circuit that is sufficiently isolated from the RF signal to accomplish accurate measurements of the component. The apparatus monitors the amplitude of the low frequency signal across the component. The amplitude of the low frequency signal is indicative of the value of the component.
摘要翻译：用于直接测量RF电路内的部件的值（例如，半导体晶片处理系统内的RF匹配网络）的装置。具体地，该装置使用与RF信号充分隔离的桥接电路，在RF电路内的一个或多个组件上施加低频信号（例如，1KHz），以实现组件的精确测量。该装置监测组件上的低频信号的幅度。低频信号的幅度表示组件的值。

7. 发明授权

US5790365A Method and apparatus for releasing a workpiece from and electrostatic chuck 失效
标题翻译：从静电吸盘释放工件的方法和装置
公开(公告)号：US5790365A
公开(公告)日：1998-08-04
申请号：US690086
申请日：1996-07-31
申请人： Viktor Shel
发明人： Viktor Shel
IPC分类号： H01L21/683 , H02N13/00
CPC分类号： H01L21/6833 , Y10T279/23
摘要： An apparatus and concomitant method that applies an oscillating voltage to at least one electrode of an electrostatic chuck. The apparatus is a switching circuit connected between the electrostatic chuck power supply and an electrode or electrodes of an electrostatic chuck. In one contact position, the relay applies the electrostatic chuck chucking voltage to the electrode(s). While in a second contact position, the electrode(s) is connected through an inductor to a predetermined potential, e.g., ground. To dechuck a wafer from the chuck surface, the relay is switched from the first position to the second position connecting the electrode(s) through the inductor to ground. Because the wafer and the chuck electrode(s) form a parallel plate capacitor, this inductor and capacitor combination forms a tank circuit that oscillates at a resonant frequency. As such, energy is transferred between the capacitor and the inductor, and vice versa, in a decaying manner over a period of time that is defined by the Q of the tank circuit. This oscillating energy produces an oscillating voltage across the wafer-to-chuck interface that discharges any residual charge between the wafer and chuck.
摘要翻译：一种将振荡电压施加到静电卡盘的至少一个电极的装置和伴随方法。该装置是连接在静电卡盘电源和静电卡盘的电极或电极之间的开关电路。在一个接触位置，继电器将静电卡盘夹持电压施加到电极。当在第二接触位置时，电极通过电感器连接到预定电位，例如接地。为了从卡盘表面去取出晶片，继电器从第一位置切换到将电极通过电感器连接到地的第二位置。由于晶片和卡盘电极形成平行板电容器，因此该电感器和电容器组合形成以谐振频率振荡的振荡电路。因此，在由电容器Q的Q定义的时间段内，能量在电容器和电感器之间传递，反之亦然。该振荡能量在晶片与卡盘接口之间产生振荡电压，从而释放晶片和卡盘之间的任何残余电荷。

8. 发明授权

US5585766A Electrically tuned matching networks using adjustable inductance elements 失效
标题翻译：使用可调电感元件的电调谐匹配网络
公开(公告)号：US5585766A
公开(公告)日：1996-12-17
申请号：US330167
申请日：1994-10-27
申请人： Viktor Shel
发明人： Viktor Shel
IPC分类号： H05H1/46 , H01F29/14 , H01L21/302 , H01L21/3065 , H03H7/40 , H01F21/08
CPC分类号： H01J37/32183 , H01F29/146
摘要： A plasma processing system for use in fabricating electronic devices including an RF generator; a process chamber including an electrical load which produces a plasma within the chamber when powered by the RF generator; an electronically tunable matching network connected between the RF generator and the electrical load of the process chamber, wherein during operation the matching network couples power from the RF generator into the plasma within the process chamber; and a control circuit connected to the matching network, wherein during operation the control circuit electronically adjusts the matching network so as to control a transfer of power from the RF generator into the plasma in the process chamber. The matching network includes an electronically tunable variable inductor including a core made of a material which exhibits a non-linear relationship between magnetic field intensity, H, and magnetic flux density, B. The core is configured as a closed loop defining a central opening. A magnetization coil is wound around the core so that the core forms a closed magnetic flux path for the magnetization coil. The magnetization coil includes two input terminals for coupling an electrical signal from the control circuit into the windings of the magnetization coil. There is also a primary coil formed around the outside of said closed-loop core and having input terminals for receiving a high-frequency current signal from the RF generator.
摘要翻译：一种用于制造包括RF发生器的电子设备的等离子体处理系统; 处理室，包括在由RF发生器供电时在室内产生等离子体的电负载; 连接在RF发生器和处理室的电负载之间的电子可调匹配网络，其中在操作期间，匹配网络将来自RF发生器的功率耦合到处理室内的等离子体中; 以及连接到所述匹配网络的控制电路，其中在操作期间，所述控制电路以电子方式调整所述匹配网络，以便控制从所述RF发生器到所述处理室中的等离子体的功率传递。匹配网络包括电子可调谐可变电感器，其包括由表现出磁场强度H和磁通密度B之间的非线性关系的材料制成的芯体。芯体被配置为限定中心开口的闭合回路。磁化线圈缠绕在芯上，使得磁芯形成用于磁化线圈的闭合磁通路径。磁化线圈包括用于将来自控制电路的电信号耦合到磁化线圈的绕组的两个输入端子。还存在形成在所述闭环芯的外部周围的初级线圈，并且具有用于接收来自RF发生器的高频电流信号的输入端子。

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