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    • 1. 发明授权
    • Vacuum deposition apparatus
    • 真空沉积装置
    • US09017534B2
    • 2015-04-28
    • US13543330
    • 2012-07-06
    • Kenji YamamotoSatoshi Hirota
    • Kenji YamamotoSatoshi Hirota
    • C23C14/34C23C14/32C23C14/35C23C14/50H01J37/32H01J37/34
    • C23C14/3492C23C14/325C23C14/352C23C14/505H01J37/32055H01J37/3402H01J37/3447H01J2237/0264
    • Disclosed is a vacuum deposition apparatus which suppresses mutual interference of magnetic fields generated by multiple magnetic-field applying mechanisms for evaporation sources. The vacuum deposition apparatus includes a deposition chamber; a magnetic-field applying mechanism of sputtering evaporation source disposed in the deposition chamber; a magnetic-field applying mechanism of arc evaporation source disposed in the same deposition chamber; and magnetic-field shielding units arranged so as to cover partially or entirely at least one of these magnetic-field applying mechanisms for evaporation sources (preferably the magnetic-field applying mechanism of sputtering evaporation source). Portions (portions to face a target material upon dosing) of openable units of magnetic-field shielding units are preferably made from a non-magnetic material.
    • 公开了一种真空沉积装置,其抑制由用于蒸发源的多个磁场施加机构产生的磁场的相互干扰。 真空沉积设备包括沉积室; 设置在所述沉积室中的溅射蒸发源的磁场施加机构; 设置在同一沉积室中的电弧蒸发源的磁场施加机构; 以及磁场屏蔽单元,被布置成部分地或全部地覆盖这些用于蒸发源的磁场施加机构(优选地是溅射蒸发源的磁场施加机构)中的至少一个。 磁场屏蔽单元的可开启单元的部分(在计量时面向目标材料的部分)优选地由非磁性材料制成。
    • 2. 发明申请
    • VACUUM DEPOSITION APPARATUS
    • 真空沉积装置
    • US20130020195A1
    • 2013-01-24
    • US13543330
    • 2012-07-06
    • Kenji YamamotoSatoshi Hirota
    • Kenji YamamotoSatoshi Hirota
    • C23C14/35
    • C23C14/3492C23C14/325C23C14/352C23C14/505H01J37/32055H01J37/3402H01J37/3447H01J2237/0264
    • Disclosed is a vacuum deposition apparatus which suppresses mutual interference of magnetic fields generated by multiple magnetic-field applying mechanisms for evaporation sources. The vacuum deposition apparatus includes a deposition chamber; a magnetic-field applying mechanism of sputtering evaporation source disposed in the deposition chamber; a magnetic-field applying mechanism of arc evaporation source disposed in the same deposition chamber; and magnetic-field shielding units arranged so as to cover partially or entirely at least one of these magnetic-field applying mechanisms for evaporation sources (preferably the magnetic-field applying mechanism of sputtering evaporation source). Portions (portions to face a target material upon dosing) of openable units of magnetic-field shielding units are preferably made from a non-magnetic material.
    • 公开了一种真空沉积装置,其抑制由用于蒸发源的多个磁场施加机构产生的磁场的相互干扰。 真空沉积设备包括沉积室; 设置在所述沉积室中的溅射蒸发源的磁场施加机构; 设置在同一沉积室中的电弧蒸发源的磁场施加机构; 以及磁场屏蔽单元,被布置成部分地或全部地覆盖这些用于蒸发源的磁场施加机构(优选地是溅射蒸发源的磁场施加机构)中的至少一个。 磁场屏蔽单元的可开启单元的部分(在计量时面向目标材料的部分)优选地由非磁性材料制成。
    • 3. 发明申请
    • LASER RADAR DEVICE AND OBJECT DETECTION METHOD
    • 激光雷达设备和对象检测方法
    • US20150185320A1
    • 2015-07-02
    • US14577776
    • 2014-12-19
    • Tadao NishiguchiDaisuke ItaoSatoshi Hirota
    • Tadao NishiguchiDaisuke ItaoSatoshi Hirota
    • G01S17/02G01S7/486
    • G01S17/026G01S7/4861G01S7/4863G01S7/487G01S7/497G01S17/10G01S17/42G01S17/936
    • A laser radar device includes: a projection part repeatedly performing processing of projecting measurement light that is of a pulsed laser beam to a predetermined monitoring area in a measurement period having a predetermined first length, the processing being repeated in c cycles (c≧2) in a detection period having a predetermined second length; a light receiver including n1 (n1≧2) light receiving elements and receiving reflected light of the measurement light in directions different from one another; a selector selecting light receiving signals of the n1 light receiving elements in each measurement period and output n2 (n2≧2) light receiving signals; a sampling part sampling the light receiving signals output from the selector s (s≧2) times every time the measurement light is projected; and a detector performing processing of detecting an object in a detection-period-based period based on sampling values.
    • 激光雷达装置包括:投影部分,在具有预定的第一长度的测量周期中重复执行将脉冲激光束的测量光投影到预定监视区域的处理,所述处理以c个周期(c≥2)重复, 在具有预定的第二长度的检测周期中; 包括n1(n1≥2)个光接收元件并且在彼此不同的方向上接收测量光的反射光的光接收器; 选择器,在每个测量周期中选择n1个光接收元件的光接收信号并输出​​n2(n2≥2)个光接收信号; 每次测量光投射时,采样部分对从选择器输出的光接收信号(s≥2)进行采样; 以及检测器,其基于采样值执行基于检测周期的周期中的对象的检测。
    • 6. 发明申请
    • LASER RADAR APPARATUS
    • 激光雷达设备
    • US20150094908A1
    • 2015-04-02
    • US14504056
    • 2014-10-01
    • Satoshi HirotaDaisuke Itao
    • Satoshi HirotaDaisuke Itao
    • B60S1/08G01S17/95
    • B60S1/0833B60S1/0818G01S7/481G01S17/87G01S17/95Y02A90/19
    • A laser radar apparatus includes a beam projecting unit and a beam receiving unit that receives via a glass surface a reflective wave occurring when a beam projected from the beam projecting unit is reflected from an object. The laser radar apparatus further includes control unit that commands a prompt operation mode of a wiper when an amount of the objects is determined to be greater than or equal to a threshold level based on a beam reception level detected by the beam receiving unit, and a wiper operation control unit that controls the wiper to operate in the prompt operation mode after a waiting time period elapses. The waiting time period is from when it is detected that the amount of the objects is greater than or equal to the threshold level to when a wiper operation starts.
    • 一种激光雷达设备包括一个光束投射单元和一个光束接收单元,其经由玻璃表面接收当从投影单元投影的光束从物体反射时发生的反射波。 激光雷达装置还包括控制单元,当根据由波束接收单元检测到的波束接收电平将物体的数量确定为大于或等于阈值电平时,命令雨刮器的快速操作模式,以及 雨刮器操作控制单元,在等待时间段过去之后,控制刮水器在提示操作模式下操作。 等待时间段是从检测到物体的数量大于或等于阈值水平的时刻到雨刮操作开始时。