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1. 发明申请

US20130020195A1 VACUUM DEPOSITION APPARATUS 有权
标题翻译：真空沉积装置
公开(公告)号：US20130020195A1
公开(公告)日：2013-01-24
申请号：US13543330
申请日：2012-07-06
申请人： Kenji Yamamoto , Satoshi Hirota
发明人： Kenji Yamamoto , Satoshi Hirota
IPC分类号： C23C14/35
CPC分类号： C23C14/3492 , C23C14/325 , C23C14/352 , C23C14/505 , H01J37/32055 , H01J37/3402 , H01J37/3447 , H01J2237/0264
摘要： Disclosed is a vacuum deposition apparatus which suppresses mutual interference of magnetic fields generated by multiple magnetic-field applying mechanisms for evaporation sources. The vacuum deposition apparatus includes a deposition chamber; a magnetic-field applying mechanism of sputtering evaporation source disposed in the deposition chamber; a magnetic-field applying mechanism of arc evaporation source disposed in the same deposition chamber; and magnetic-field shielding units arranged so as to cover partially or entirely at least one of these magnetic-field applying mechanisms for evaporation sources (preferably the magnetic-field applying mechanism of sputtering evaporation source). Portions (portions to face a target material upon dosing) of openable units of magnetic-field shielding units are preferably made from a non-magnetic material.
摘要翻译：公开了一种真空沉积装置，其抑制由用于蒸发源的多个磁场施加机构产生的磁场的相互干扰。真空沉积设备包括沉积室; 设置在所述沉积室中的溅射蒸发源的磁场施加机构; 设置在同一沉积室中的电弧蒸发源的磁场施加机构; 以及磁场屏蔽单元，被布置成部分地或全部地覆盖这些用于蒸发源的磁场施加机构（优选地是溅射蒸发源的磁场施加机构）中的至少一个。磁场屏蔽单元的可开启单元的部分（在计量时面向目标材料的部分）优选地由非磁性材料制成。

2. 发明授权

US09017534B2 Vacuum deposition apparatus 有权
标题翻译：真空沉积装置
公开(公告)号：US09017534B2
公开(公告)日：2015-04-28
申请号：US13543330
申请日：2012-07-06
申请人： Kenji Yamamoto , Satoshi Hirota
发明人： Kenji Yamamoto , Satoshi Hirota
IPC分类号： C23C14/34 , C23C14/32 , C23C14/35 , C23C14/50 , H01J37/32 , H01J37/34
CPC分类号： C23C14/3492 , C23C14/325 , C23C14/352 , C23C14/505 , H01J37/32055 , H01J37/3402 , H01J37/3447 , H01J2237/0264
摘要： Disclosed is a vacuum deposition apparatus which suppresses mutual interference of magnetic fields generated by multiple magnetic-field applying mechanisms for evaporation sources. The vacuum deposition apparatus includes a deposition chamber; a magnetic-field applying mechanism of sputtering evaporation source disposed in the deposition chamber; a magnetic-field applying mechanism of arc evaporation source disposed in the same deposition chamber; and magnetic-field shielding units arranged so as to cover partially or entirely at least one of these magnetic-field applying mechanisms for evaporation sources (preferably the magnetic-field applying mechanism of sputtering evaporation source). Portions (portions to face a target material upon dosing) of openable units of magnetic-field shielding units are preferably made from a non-magnetic material.
摘要翻译：公开了一种真空沉积装置，其抑制由用于蒸发源的多个磁场施加机构产生的磁场的相互干扰。真空沉积设备包括沉积室; 设置在所述沉积室中的溅射蒸发源的磁场施加机构; 设置在同一沉积室中的电弧蒸发源的磁场施加机构; 以及磁场屏蔽单元，被布置成部分地或全部地覆盖这些用于蒸发源的磁场施加机构（优选地是溅射蒸发源的磁场施加机构）中的至少一个。磁场屏蔽单元的可开启单元的部分（在计量时面向目标材料的部分）优选地由非磁性材料制成。

3. 发明授权

US11901568B2 Electrocatalyst 有权
公开(公告)号：US11901568B2
公开(公告)日：2024-02-13
申请号：US17653400
申请日：2022-03-03
申请人： Ryo Shimizu , Kumiko Nomura , Tomohiro Takeshita , Shu Miyasaka , Kenji Yamamoto
发明人： Ryo Shimizu , Kumiko Nomura , Tomohiro Takeshita , Shu Miyasaka , Kenji Yamamoto
IPC分类号： H01M4/00 , H01M4/92 , H01M4/88 , C22C5/04
CPC分类号： H01M4/926 , H01M4/8842 , C22C5/04
摘要： To provide an electrocatalyst for fuel cells, which is configured to ensure both the initial performance and durability of fuel cells. An electrocatalyst for fuel cells, wherein the electrocatalyst comprises a carbon support including a mesopore and a catalyst alloy supported on the carbon support, and the catalyst alloy is a catalyst alloy of platinum and a transition metal; wherein the mesopore includes at least one throat; wherein an average effective diameter of the at least one throat is 1.8 nm or more and less than 3.2 nm; and wherein a transition metal ratio of the catalyst alloy supported on a deeper-side region than the at least one throat, is lower than the transition metal ratio of the catalyst alloy supported on a nearer-side region than the at least one throat.

4. 发明授权

US10050257B2 Aluminum alloy foil for electrode current collectors and manufacturing method thereof 有权
公开(公告)号：US10050257B2
公开(公告)日：2018-08-14
申请号：US13995916
申请日：2011-12-12
申请人： Masakazu Seki , Satoshi Suzuki , Tomohiko Furutani , Kenji Yamamoto , Koichi Ashizawa
发明人： Masakazu Seki , Satoshi Suzuki , Tomohiko Furutani , Kenji Yamamoto , Koichi Ashizawa
IPC分类号： H01M4/00 , H01M4/04 , C22C21/00 , C22F1/04 , H01M4/66 , H01M10/0525
摘要： An aluminum alloy foil for an electrode current collectors has a high post-drying strength after application of an active material while keeping a high electrical conductivity. The aluminum alloy foil includes 0.1 to 1.0 mass % of Fe, 0.01 to 0.5% of Si, and 0.01 to 0.2 mass % of Cu, and the rest includes Al and unavoidable impurities. The aluminum alloy foil after final cold rolling has a tensile strength of 220 MPa or higher, a 0.2% yield strength of 180 MPa or higher, and an electrical conductivity of 58% IACS or higher. The aluminum alloy foil has a tensile strength of 190 MPa or higher and a 0.2% yield strength of 160 MPa or higher after the aluminum alloy foil is heat treated at any of 120° C. for 24 hours, 140° C. for 3 hours, and 160° C. for 15 minutes.

5. 发明授权

US10016798B2 Gear spindle and oil seal used therein 有权
公开(公告)号：US10016798B2
公开(公告)日：2018-07-10
申请号：US14424582
申请日：2012-08-31
申请人： Kenji Yamamoto
发明人： Kenji Yamamoto
IPC分类号： F16D3/18 , B21B35/14 , F16D3/16 , F16D3/10 , F16D3/84 , F16J15/52
CPC分类号： B21B35/147 , F16D3/10 , F16D3/16 , F16D3/185 , F16D3/845 , F16D2300/06 , F16J15/525
摘要： In a gear spindle, outer cylinder gear sections (11) are each integrally formed on an inner peripheral surface of a spindle outer cylinder and inner cylinder gear sections (14) are each integrally formed on an outer peripheral surface of a spindle inner cylinder (13). An oil seal (27) that seals in the lubricating oil (20) for each of the aforementioned gear sections includes, a seal body (29) having a channel-shaped cross section and interposed in the peripheral gap between the inner peripheral surface of the spindle outer cylinder and the outer peripheral surface of the spindle inner cylinder (13), and a seal mounting member (30) that includes a band, a spring, or the like that tightens and fixes the seal body to the outer peripheral surface of the spindle inner cylinder (13) to allow expansion of the seal body in the axial direction in the aforementioned peripheral gap.

6. 发明授权

US09902093B2 Press-forming mold and method for manufacturing protective film for press-forming mold 有权
公开(公告)号：US09902093B2
公开(公告)日：2018-02-27
申请号：US14009522
申请日：2012-04-03
申请人： Takaharu Kashi , Kenji Yamamoto
发明人： Takaharu Kashi , Kenji Yamamoto
IPC分类号： B29C33/68 , B21D37/01 , C23C14/06 , C23C14/58
CPC分类号： B29C33/68 , B21D37/01 , C23C14/0641 , C23C14/5886
摘要： A press-forming mold has a protective film for preventing seizing during press-forming formed on at least a forming surface that comes into contact with a formed body. The protective film is formed by PVD. An arbitrary selection section extracted from the surface of the protective film is divided into a plurality of individual sections; and, when the gradient of the surface at the nth division point is represented by (dZn/dXn), taking N to represent the number of divisions, the root-mean-square RΔq calculated by the following numerical expression is no greater than 0.032. R ⁢ ⁢ Δ ⁢ ⁢ q = 1 N ⁢ ∑ n = 1 N ⁢ ⁢ ( d ⁢ ⁢ Z n d ⁢ ⁢ X n ) 2 It is thereby possible to improve the seizing resistance of a press-forming mold having a protective film formed by PVD.

7. 发明授权

US09546408B2 Quenching method for steel pipe 有权
标题翻译：钢管淬火方法
公开(公告)号：US09546408B2
公开(公告)日：2017-01-17
申请号：US14005853
申请日：2012-03-13
申请人： Akihiro Sakamoto , Kazuo Okamura , Kenji Yamamoto , Tomohiko Omura , Yuji Arai
发明人： Akihiro Sakamoto , Kazuo Okamura , Kenji Yamamoto , Tomohiko Omura , Yuji Arai
IPC分类号： C21D1/18 , C21D1/19 , C21D6/00 , C21D9/08 , C22C38/00 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/22 , C22C38/24 , C22C38/26 , C22C38/42 , C22C38/44 , C22C38/46 , C22C38/48 , C22C38/18 , C22C38/40 , C22C1/02
CPC分类号： C21D1/18 , C21D1/19 , C21D6/002 , C21D9/08 , C21D2221/00 , C22C1/02 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/18 , C22C38/22 , C22C38/24 , C22C38/26 , C22C38/40 , C22C38/42 , C22C38/44 , C22C38/46 , C22C38/48
摘要： A method for quenching a steel pipe by water cooling from an outer surface thereof, where pipe end portions are not subjected to water cooling, and at least part of a main body other than the pipe end portions is subjected to water cooling. A region(s) that is not subjected to direct water cooling over an entire circumference thereof can be along an axial direction at least in part of the main body other than the pipe end portions. The start and stop of water cooling can be intermittent at least in part of the quenching. During the water cooling of the pipe outer surface, an intensified water cooling can be performed in a temperature range in which the pipe outer surface temperature is higher than Ms point. Thereafter, the cooling can be switched to moderate cooling so that the outer surface is cooled down to Ms point or lower.
摘要翻译：通过水管从其外表面进行水冷淬火的方法，其中管端部不进行水冷，至少部分管端部以外的主体进行水冷。在其整个圆周上不经受直接水冷却的区域可以沿除了管端部以外的主体的至少一部分的轴向方向。水冷却的开始和停止至少部分地可以是间歇性的淬火。在管外表面的水冷却期间，可以在管外表面温度高于Ms点的温度范围内进行增强的水冷。此后，可以将冷却切换到适度的冷却，使得外表面冷却至Ms点或更低。

8. 发明授权

US09297061B2 Transparent electroconductive film and process for producing the same 有权
标题翻译：透明导电膜及其制造方法
公开(公告)号：US09297061B2
公开(公告)日：2016-03-29
申请号：US12449303
申请日：2008-02-15
申请人： Takashi Kuchiyama , Kenji Yamamoto
发明人： Takashi Kuchiyama , Kenji Yamamoto
IPC分类号： B32B9/00 , C23C14/08 , C03C17/34
CPC分类号： C23C14/086 , C03C17/3441 , C03C2217/944 , C03C2218/365
摘要： In a transparent electroconductive film including a transparent substrate and a transparent electroconductive oxide layer disposed on the transparent substrate, when the transparent electroconductive oxide layer is composed of zinc oxide, the surface resistivity of the transparent electroconductive oxide layer increases with time and thus it has been difficult to obtain a transparent electroconductive film stable against an environmental variation. Consequently, hard carbon films are provided on the surfaces of a transparent electroconductive oxide layer including at least one layer and containing zinc oxide as a main component in “the order of transparent substrate-hard carbon film-transparent electroconductive oxide layer-hard carbon film” or “the order of hard carbon film-transparent substrate-transparent electroconductive oxide layer-hard carbon film”. Alternatively, an organosilicon compound covering layer is provided on a surface of the transparent electroconductive oxide layer. Thereby, the water contact angle can be 75 degrees or more, and an increase in the resistivity of the transparent electroconductive oxide layer can be suppressed.
摘要翻译：在透明导电膜包括透明基板和透明导电氧化物层的透明导电膜上，当透明导电氧化物层由氧化锌组成时，透明导电氧化物层的表面电阻率随着时间的推移而增加，难以获得对环境变化稳定的透明导电膜。因此，在“透明基板 - 硬质碳膜透明导电氧化物层 - 硬质碳膜”的顺序，在包含至少一层并含有氧化锌作为主要成分的透明导电氧化物层的表面上设置硬质碳膜，或“硬碳膜透明基板透明导电氧化物层 - 硬质碳膜的顺序”。或者，在透明导电氧化物层的表面上设置有机硅化合物覆盖层。因此，水接触角可以为75度以上，并且可以抑制透明导电氧化物层的电阻率的增加。

9. 发明授权

US09266180B2 Arc evaporation source having fast film-forming speed, coating film manufacturing method and film formation apparatus using the arc evaporation source 有权
标题翻译：电弧蒸发源具有快速的成膜速度，涂膜制造方法和使用电弧蒸发源的成膜装置
公开(公告)号：US09266180B2
公开(公告)日：2016-02-23
申请号：US13805259
申请日：2011-06-15
申请人： Shinichi Tanifuji , Kenji Yamamoto , Homare Nomura , Yoshinori Kurokawa , Naoyuki Goto
发明人： Shinichi Tanifuji , Kenji Yamamoto , Homare Nomura , Yoshinori Kurokawa , Naoyuki Goto
IPC分类号： B23K9/00 , C23C14/32 , H01J37/32 , H01J37/34
CPC分类号： B23K9/00 , C23C14/325 , H01J37/32055 , H01J37/3402
摘要： An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.
摘要翻译：具有快速成膜速度的电弧蒸发源包括：围绕靶周围的至少一个圆周磁体，其中磁体的磁化方向正交于目标表面; 目标的背面侧的非环状的第一永久磁铁具有与周边磁体相同方向的极性，并且被配置为使其磁化方向与目标表面正交; 布置在第一永磁体的后表面侧或第一永磁体与靶之间以便与第一永久磁铁隔开间隙的非环形的第二永久磁铁的极性与圆周磁体，并且被布置成使得其磁化方向垂直于靶的表面; 以及在第一永磁体和第二永磁体之间的磁体。

10. 发明授权

US09200360B2 Arc evaporation source and film forming method using the same 有权
标题翻译：电弧蒸发源和成膜方法使用相同
公开(公告)号：US09200360B2
公开(公告)日：2015-12-01
申请号：US13263946
申请日：2010-04-14
申请人： Shinichi Tanifuji , Kenji Yamamoto , Hirofumi Fujii , Yoshinori Kurokawa
发明人： Shinichi Tanifuji , Kenji Yamamoto , Hirofumi Fujii , Yoshinori Kurokawa
IPC分类号： C23C14/00 , C23C14/32 , C23C14/54 , H01J37/32
CPC分类号： C23C14/325 , C23C14/54 , H01J37/32055 , H01J37/32669 , H01J37/34 , H01J37/345
摘要： Provided is an arc evaporation source wherein film-forming speed is increased by inducing magnetic lines in the substrate direction. The arc evaporation source is provided with: at least one outer circumferential magnet (3), which is disposed such that the outer circumferential magnet surrounds the outer circumference of a target (2) and that the magnetization direction thereof is in the direction orthogonally intersecting the surface of the target (2); and a rear surface magnet (4) disposed on the rear surface side of the target (2). The rear surface magnet (4) has a non-ring-shaped first permanent magnet (4A) wherein the polarity thereof faces the same direction as the polarity of the outer circumferential magnet (3) and the magnetization direction of the rear surface magnet (4) is in the direction orthogonally intersecting the surface of the target (2).
摘要翻译：提供了一种电弧蒸发源，其中通过在基板方向上诱导磁线来增加成膜速度。电弧蒸发源设置有：至少一个外周磁铁（3），其设置成使得外周磁铁围绕靶（2）的外周，并且其磁化方向与正交方向正交的方向目标（2）的表面; 以及设置在所述靶（2）的背面侧的后表面磁体（4）。后表面磁体（4）具有非环状的第一永久磁铁（4A），其极性与外周磁铁（3）的极性和背面磁体（4）的磁化方向相同）在与靶（2）的表面正交相交的方向上。

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