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1. 发明授权

US5096936A Photo-crosslinkable resin composition 失效
标题翻译：光交联性树脂组合物
公开(公告)号：US5096936A
公开(公告)日：1992-03-17
申请号：US476923
申请日：1990-02-08
申请人： Kenji Seko , Satoshi Watanabe , Naozumi Iwasawa
发明人： Kenji Seko , Satoshi Watanabe , Naozumi Iwasawa
IPC分类号： C08G59/20 , C07D303/16 , C08F4/12 , C08F20/32 , C08G59/00 , C08G59/32 , C08G59/68 , G03F7/029 , G03F7/038
CPC分类号： C08G59/68 , C08G59/3209 , G03F7/029 , G03F7/038
摘要： The invention provides a photo-crosslinkable resin composition consisting essentially of an acrylic resin having alicyclic epoxy groups and a photo cationic polymerization initiator.
摘要翻译：本发明提供一种基本上由具有脂环族环氧基的丙烯酸树脂和光阳离子聚合引发剂组成的光交联性树脂组合物。

2. 发明授权

US5102775A Visible light sensitive electrodeposition coating composition and image-forming method using the same 失效
标题翻译：可见光敏感电沉积涂料组合物和使用其的成像方法
公开(公告)号：US5102775A
公开(公告)日：1992-04-07
申请号：US413677
申请日：1989-09-28
申请人： Motoko Okuhara , Ichiro Yoshihara , Yasuo Doi , Takao Yamamoto , Kenji Seko , Yutaka Yoshikawa , Naozumi Iwasawa
发明人： Motoko Okuhara , Ichiro Yoshihara , Yasuo Doi , Takao Yamamoto , Kenji Seko , Yutaka Yoshikawa , Naozumi Iwasawa
IPC分类号： C08F2/50 , G03F7/004 , G03F7/038 , G03F7/16
CPC分类号： G03F7/004 , G03F7/038 , G03F7/164 , Y10S430/12 , Y10S430/121 , Y10S430/123 , Y10S430/127 , Y10S430/136 , Y10S430/146
摘要： A composition for visible light sensitive electrodeposition coating which comprises (A) a photocurable resin having light sensitive groups capable of being crosslinked or polymerized by light irradiation and ionic groups, (B) a sensitizer which is excited by absorption of visible light and has a property to interact with the resin (A), (C) a water-insoluble polymerization initiator, and optionally, (D) at least one specific nitrogen-containing compound; and an image-forming method which comprises (i) coating the surface of a conductor by electrodeposition with the aforesaid composition, (ii) exposing the resulting film by electrodeposition by partially irradiating the film with visible light, and then (iii) contacting the resulting film with a developing solution to remove the unexposed areas.
摘要翻译：一种用于可见光敏电沉积涂料的组合物，其包含（A）具有能够通过光照射和离子基团交联或聚合的光敏基团的光固化树脂，（B）通过吸收可见光而被激发并具有与树脂（A），（C）水不溶性聚合引发剂和任选的（D）至少一种特定的含氮化合物相互作用; 以及图像形成方法，其包括：（i）通过用上述组合物电沉积涂覆导体的表面，（ii）通过用可见光部分地照射该膜而通过电沉积曝光所得到的膜，然后（iii）使所得到的膜用显影液除去未曝光的区域。

3. 发明授权

US5002977A Active energy ray-curable unsaturated resin composition 失效
标题翻译：活性能量射线固化型不饱和树脂组合物
公开(公告)号：US5002977A
公开(公告)日：1991-03-26
申请号：US353335
申请日：1989-05-17
申请人： Kenji Seko , Naozumi Iwasawa
发明人： Kenji Seko , Naozumi Iwasawa
IPC分类号： C08F8/00 , C08F8/14 , C09D11/10 , G03F7/038 , H05K3/28
CPC分类号： H05K3/287 , C08F8/00 , C08F8/14 , C09D11/101 , G03F7/038 , H05K2203/0793
摘要： An unsaturated resin composition curable with an active energy ray, comprising a reaction product between an acid group-containing vinylic resin and an alicyclic epoxy group-containing unsaturated compound; and an unsaturated resin composition curable with an active energy ray, comprising a reaction product between an alicyclic epoxy group-containing vinylic resin and an acid group-containing unsaturated compound.
摘要翻译：一种可活化能量射线固化的不饱和树脂组合物，其含有含酸基的乙烯基树脂与含脂环族环氧基的不饱和化合物之间的反应产物; 以及可活化能量射线固化的不饱和树脂组合物，其含有含有脂环式环氧基的乙烯基树脂与含酸基的不饱和化合物之间的反应产物。

4. 发明授权

US4898656A Electrodeposition coating process of photoresist for printed circuit board 失效
标题翻译：印刷电路板光刻胶电沉积涂层工艺
公开(公告)号：US4898656A
公开(公告)日：1990-02-06
申请号：US329636
申请日：1989-03-28
申请人： Masahiro Hoshino , Isao Kobayashi , Kenji Seko , Naozumi Iwasawa , Yuu Akaki , Toshio Kondo
发明人： Masahiro Hoshino , Isao Kobayashi , Kenji Seko , Naozumi Iwasawa , Yuu Akaki , Toshio Kondo
IPC分类号： G03F7/09 , G03F7/16 , H05K3/00 , H05K3/06
CPC分类号： H05K3/0079 , G03F7/092 , G03F7/164 , H05K2203/0577 , H05K2203/135 , H05K3/064 , Y10T428/31504
摘要： An electrodeposition coating process of a photoresist for printed circuit board which comprises electrodeposition coating on a conductive surface a photosensitive electrodeposition coating composition (A), and thereafter further electrodeposition coating on the resultant coated plate an electrodeposition coating composition (B) composed chiefly of water-soluble or water-dispersible resin having a glass transition temperature (Tg) not lower than 20.degree. C.

5. 发明授权

US5070000A Electrodeposition coating composition for use in printed circuit board photo resist 失效
标题翻译：用于印刷电路板光刻胶的电沉积涂料组合物
公开(公告)号：US5070000A
公开(公告)日：1991-12-03
申请号：US265770
申请日：1988-11-01
申请人： Kenji Seko , Yuu Akaki , Naozumi Iwasawa , Toshio Kondo
发明人： Kenji Seko , Yuu Akaki , Naozumi Iwasawa , Toshio Kondo
IPC分类号： C09D5/44 , G03C1/74 , G03F7/032 , G03F7/038 , G03F7/16 , H05K3/00 , H05K3/06
CPC分类号： G03F7/0388 , G03F7/164 , H05K3/0076
摘要： Disclosed is an electrodeposition coating composition for use in printed circuit board photo resist, comprising (a) an acrylic resin containing (meth)acryloyl group and obtained by use of diacetone (meth)acrylamide as an essential monomer component, said acrylic resin being a water-soluble or water-dispersible photo-curable unsaturated resin having an acid value of 20 to 300, a degree of unsaturation of 0.2 to 4.5 moles/kg, a number average molecular weight of 1,000 to 100,000 and a glass transition temperature of 0.degree. to 100.degree. C., and (b) a water-insoluble photopolymerization initiator.
摘要翻译：公开了一种用于印刷电路板光致抗蚀剂的电沉积涂料组合物，其包含（a）含有（甲基）丙烯酰基并通过使用双丙酮（甲基）丙烯酰胺作为必需单体成分得到的丙烯酸树脂，所述丙烯酸树脂为水 - 可溶性或水分散性光固化型不饱和树脂，其酸值为20〜300，不饱和度为0.2〜4.5摩尔/千克，数均分子量为1,000〜100,000，玻璃化转变温度为0〜 100℃，（b）水不溶性光聚合引发剂。

6. 发明授权

US5370971A Epoxy based photopolymerizable composition 失效
标题翻译：环氧类光聚合组合物
公开(公告)号：US5370971A
公开(公告)日：1994-12-06
申请号：US968313
申请日：1992-10-29
申请人： Tetsuo Ogawa , Kenji Seko , Tetsu Maki , Naozumi Iwasawa
发明人： Tetsuo Ogawa , Kenji Seko , Tetsu Maki , Naozumi Iwasawa
IPC分类号： C08F299/02 , C08F290/00 , C08F299/08 , C08G59/14 , C08L83/04 , C09J163/00 , G03F7/027 , G03F7/038 , G03F7/075 , H01L21/027 , H05K3/06 , G03C1/725 , C08G59/18
CPC分类号： G03F7/0388 , C08G59/1433 , C09J163/00 , G03F7/038
摘要： A photopolymerizable composition comprising:(a) an aromatic epoxy resin derivative containing, per kilogram of the resin, 0.3 to 10 mole equivalents of a polymerizable unsaturated group and 0.1 to 3 mole equivalents of a specific aprotic onium salt-containing group,(b) a polysiloxane having a specific polysiloxane chain in a molecule, and containing 0.01 to 5 mole equivalents, per kilogram of the polysiloxane, of the aprotic onium salt-containing group, and(c) a photopolymerization initiator.Said photopolymerizable composition can form a resist film excellent in adhesion to a substrate, heat resistance, chemical resistance, impact resistance and solder plating property, and is suitable as a solder resist in particular.
摘要翻译：一种可光聚合组合物，其包含：（a）每千克树脂含有0.3-10摩尔当量的可聚合不饱和基团和0.1-3摩尔当量的特定非质子含鎓盐基团的芳族环氧树脂衍生物，（b）分子中具有特定聚硅氧烷链的聚硅氧烷，每千克聚硅氧烷含有0.01〜5摩尔当量的非质子性含盐盐基团，和（c）光聚合引发剂。所述光聚合性组合物可以形成对基材的粘附性，耐热性，耐化学性，耐冲击性和焊料镀覆性优异的抗蚀剂膜，特别适合作为阻焊剂。

7. 发明授权

US4975351A Positive-type photosensitive electrodeposition coating composition with o-quinone diazide sulfonyl amide polymer 失效
标题翻译：正型光敏电沉积涂料组合物与邻醌二叠氮磺酰胺聚合物
公开(公告)号：US4975351A
公开(公告)日：1990-12-04
申请号：US268547
申请日：1988-11-07
申请人： Yuu Akaki , Kenji Seko , Toshio Kondo , Naozumi Iwasawa
发明人： Yuu Akaki , Kenji Seko , Toshio Kondo , Naozumi Iwasawa
IPC分类号： C09D5/44 , C09D201/02 , G03C1/72 , G03C1/74 , G03F7/022 , G03F7/023 , G03F7/16 , H05K3/06
CPC分类号： G03F7/023 , G03F7/164
摘要： A positive-type photosensitive electrodeposition coating composition comprising as a main component a water-soluble or water-dispersible resin containing modified quinonediazidesulfone units represented by the following formula (I) ##STR1## wherein R.sub.1 represents ##STR2## or ##STR3## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, andR.sub.3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, in the molecule.

8. 发明授权

US5702872A Process for resist pattern formation using positive electrodeposition photoresist compositions 失效
标题翻译：使用正电沉积光致抗蚀剂组合物的抗蚀剂图案形成方法
公开(公告)号：US5702872A
公开(公告)日：1997-12-30
申请号：US610237
申请日：1996-03-04
申请人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
发明人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
IPC分类号： G03F7/004 , G03F7/039 , G03F7/16 , G03F7/027
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/164 , G03F7/168 , Y10S430/12 , Y10S430/122
摘要： A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxy-phenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound. The positive type electrodeposition photoresist composition allows the forming of a fine image pattern at high resolution. A process for a resist pattern formation using such a composition is also disclosed.
摘要翻译：正型电沉积光致抗蚀剂组合物包括作为必要组分的（A）100重量份的具有羧基的聚合物，其量为每当所述聚合物为0.5至10当量，并且任选地具有羟基苯基至少1当量/ kg聚合物或（A'）含羧基聚合物和（A“）含羟基苯基的聚合物的量; （B）5〜150重量份的分子中具有至少2个乙烯基醚基的化合物; 和（C）每100重量份聚合物（A）或聚合物（A'）和聚合物（A“）和含乙烯基醚基化合物（B）的总量为0.1〜40重量份），当用光化射线照射时产生酸。通过用碱性化合物中和聚合物（A）或（A'）中的羧基，将组合物溶解或分散在水性介质中。正型电沉积光致抗蚀剂组合物允许以高分辨率形成精细图像图案。还公开了使用这种组合物的抗蚀剂图案形成方法。

9. 发明授权

US5527656A Positive type electrodeposition photoresist compositions 失效
标题翻译：正型电沉积光致抗蚀剂组合物
公开(公告)号：US5527656A
公开(公告)日：1996-06-18
申请号：US233443
申请日：1994-04-26
申请人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
发明人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
IPC分类号： G03F7/004 , G03F7/039 , G03F7/16 , G03C1/73
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/164 , G03F7/168 , Y10S430/12 , Y10S430/122
摘要： A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxyphenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound. The positive type electrodeposition photoresist composition allows the forming of a fine image pattern at high resolution. A process for a resist pattern formation using such a composition is also disclosed.
摘要翻译：正型电沉积光致抗蚀剂组合物包括作为必要组分的（A）100重量份的具有羧基的聚合物，其量为每当所述聚合物为0.5至10当量，并且任选地具有羟基苯基或（A'）含有羧基的聚合物和（A“）含羟基苯基的聚合物的量为每千克聚合物至少1当量; （B）5〜150重量份的分子中具有至少2个乙烯基醚基的化合物; 和（C）每100重量份聚合物（A）或聚合物（A'）和聚合物（A“）和含乙烯基醚基化合物（B）的总量为0.1〜40重量份），当用光化射线照射时产生酸。通过用碱性化合物中和聚合物（A）或（A'）中的羧基，将组合物溶解或分散在水性介质中。正型电沉积光致抗蚀剂组合物允许以高分辨率形成精细图像图案。还公开了使用这种组合物的抗蚀剂图案形成方法。

10. 发明授权

US5389727A Resin compositions and a method of curing the same 失效
标题翻译：树脂组合物及其固化方法
公开(公告)号：US5389727A
公开(公告)日：1995-02-14
申请号：US112311
申请日：1993-08-27
申请人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
发明人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
IPC分类号： C08G59/40 , C07F7/08 , C07F7/18 , C08G59/00 , C08G59/02 , C08G59/04 , C08G59/30 , C08G59/32 , C08G59/70 , C08K5/00 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L33/06 , C08L43/04 , C08L63/00 , C08L75/04 , C08L101/06 , C09D133/06 , C09D133/14 , C09D143/04 , C09D163/00 , C08F8/00
CPC分类号： C08L63/00 , C07F7/0836 , C07F7/0858 , C07F7/0859 , C07F7/182 , C07F7/1836 , C07F7/1844 , C07F7/1896 , C08G59/02 , C08G59/04 , C08G59/306 , C08G59/3254 , C08G59/70 , C08K5/00 , C08K5/0091 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L101/06 , C08L75/04 , C09D133/064 , C09D133/068 , C09D143/04 , C09D163/00 , C08L33/068 , C08L43/04
摘要： A resin composition comprising a high molecular weight compound containing an average of 2 or more hydroxyl groups and an average of 1 or more functional groups selected from the class consisting of alkoxysilane, silanol and acyloxysilane groups per molecule and having a number average molecular weight of 3,000 to 200,000; a low molecular weight compound containing an average of 2 or more epoxy groups per molecule and having a number average molecular weight of 240 to 5,000; and, as a curing catalyst, a metal chelate compound, is curable at a relatively low temperature to yield a film having excellent resistance to weathering.
摘要翻译：一种树脂组合物，其包含平均分子量为2以上且平均分子量为1以上的官能团的高分子量化合物，每分子含有烷氧基硅烷，硅烷醇和酰氧基硅烷基，数均分子量为3000 到20万; 每分子平均含有2个以上环氧基且数均分子量为240〜5000的低分子量化合物; 作为固化催化剂，作为固化催化剂，金属螯合物在相对较低的温度下可固化，得到耐候性优异的膜。

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