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1. 发明授权

US5194398A Semiconductor film and process for its production 失效
标题翻译：半导体薄膜及其生产工艺
公开(公告)号：US5194398A
公开(公告)日：1993-03-16
申请号：US830967
申请日：1992-02-06
申请人： Kenji Miyachi , Nobuhiro Fukuda , Yoshinori Ashida , Masato Koyama
发明人： Kenji Miyachi , Nobuhiro Fukuda , Yoshinori Ashida , Masato Koyama
IPC分类号： C23C14/06 , C23C14/58 , C23C16/56 , H01L21/203 , H01L21/205 , H01L21/30 , H01L31/20 , H01L21/20
CPC分类号： C23C14/0682 , C23C14/58 , C23C14/5826 , C23C14/5846 , C23C16/56 , H01L21/02381 , H01L21/0242 , H01L21/02529 , H01L21/02532 , H01L21/02535 , H01L21/0254 , H01L21/0262 , H01L21/02631 , H01L21/3003 , H01L31/202 , H01L31/204 , Y02E10/50 , Y02P70/521 , Y10S438/909
摘要： A method for forming an amorphous semiconductor film, which comprises (a) a film-forming step of forming a semiconductor film having not more than 20 atomic percent of bound hydrogen to a thickness of 3 to 1000 .ANG., and (b) a modifying step of modifying the formed film, the steps being repeated multiple times.
摘要翻译：一种形成非晶半导体膜的方法，包括：（a）形成厚度为3〜1000的不超过20原子％的氢的半导体膜的成膜步骤，（b）修饰步骤改变形成的膜，该步骤被重复多次。

2. 发明授权

US5248348A Amorphous silicon solar cell and method for manufacturing the same 失效
标题翻译：非晶硅太阳能电池及其制造方法
公开(公告)号：US5248348A
公开(公告)日：1993-09-28
申请号：US756219
申请日：1991-09-05
申请人： Kenji Miyachi , Masato Koyama , Yoshinori Ashida , Nobuhiro Fukuda
发明人： Kenji Miyachi , Masato Koyama , Yoshinori Ashida , Nobuhiro Fukuda
IPC分类号： H01L31/075 , H01L31/20
CPC分类号： H01L31/075 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要： A method for preparing an amorphous silicon solar cell is disclosed which comprises forming on a substrate, in the following order, a first electrode, a first conductive film, a thin first substantially intrinsic film, a thicker second substantially intrinsic film, a second conductive film and a second electrode.the method being characterized in that at least the thicker second substantially intrinsic film is formed by the sequential steps of:(a) depositing a semiconductor film containing 20 atom % or less of bound hydrogen and/or bound deuterium to a thickness of from 5 to 1000 .ANG., and then (b) modifying the deposited film, the sequence of steps being repeated multiple times.The solar cell formed by the above-mentioned method is particularly excellent in long-term stability.

3. 发明授权

US5151255A Method for forming window material for solar cells and method for producing amorphous silicon solar cell 失效
标题翻译：太阳能电池窗材料的形成方法及非晶硅太阳能电池的制造方法
公开(公告)号：US5151255A
公开(公告)日：1992-09-29
申请号：US593480
申请日：1990-10-03
申请人： Nobuhiro Fukuda , Sadao Kobayashi , Kenji Miyachi , Hidemi Takenouchi , Yoji Kawahara , Takayuki Teramoto
发明人： Nobuhiro Fukuda , Sadao Kobayashi , Kenji Miyachi , Hidemi Takenouchi , Yoji Kawahara , Takayuki Teramoto
IPC分类号： H01L31/04 , H01L31/20
CPC分类号： H01L31/202 , Y02E10/50 , Y02P70/521
摘要： A method for forming a dihydride rich amorphous silicon semiconductor film suitable for use as a window material of solar cells only from a silicon material, which comprises decomposing a gaseous mixture composed of disilane, a dopant capable of imparting p-type electrical conductivity and a diluent gas by applying a glow discharge energy, and thereby forming a semiconductor film having an optical band gap of at least 1.8 eV, preferably more than 1.9 eV, on a substrate.
摘要翻译：一种用于形成适合仅用作硅材料的太阳能电池窗材料的二氢化氢非晶硅半导体膜的方法，其包括分解由乙硅烷组成的气态混合物，能赋予p型导电性的掺杂剂和稀释剂通过施加辉光放电能量，从而在衬底上形成具有至少1.8eV，优选大于1.9eV的光学带隙的半导体膜。

4. 发明授权

US06187060B1 Sheet processing method 失效
标题翻译：片材加工方法
公开(公告)号：US06187060B1
公开(公告)日：2001-02-13
申请号：US09154741
申请日：1998-09-17
申请人： Tatsuya Nishida , Kenji Miyachi , Syujiro Oka
发明人： Tatsuya Nishida , Kenji Miyachi , Syujiro Oka
IPC分类号： H01L2100
CPC分类号： H01L21/67034 , Y10S134/902 , Y10S414/135 , Y10S414/14 , Y10T29/41
摘要： A processing apparatus of the invention includes a rotary processing part for rotating and drying plural sheets of objects to be processed collectively in order to allow the object to be rotated immediately after they are accommodated in the rotary processing part and a balance adjusting mechanism for adjusting balance of the rotary processing part by moving counterweights in accordance with the number of the objects. Further the processing apparatus further includes a counter for counting the number of the objects accommodated in the rotary processing part and a control unit for controlling the balance adjusting operation of the balance adjusting mechanism in accordance with a predetermined relationship between the number of objects and the respective positions of the counterweights.
摘要翻译：本发明的处理装置包括旋转处理部分，用于一体旋转和干燥待处理的多个物体，以允许物体在容纳在旋转处理部分中之后立即旋转，以及用于调节平衡的平衡调节机构的旋转处理部件通过根据物体的数量移动配重。此外，处理装置还包括用于对容纳在旋转处理部分中的物体的数量进行计数的计数器和用于根据物体数量与相应物体之间的预定关系来控制平衡调节机构的平衡调节操作的控制单元配重的位置。

5. 发明授权

US5960562A Processing apparatus of processing wafer sheets 失效
标题翻译：处理晶片片的处理装置
公开(公告)号：US5960562A
公开(公告)日：1999-10-05
申请号：US877565
申请日：1997-06-17
申请人： Tatsuya Nishida , Kenji Miyachi , Syujiro Oka
发明人： Tatsuya Nishida , Kenji Miyachi , Syujiro Oka
IPC分类号： H01L21/304 , H01L21/00 , F26B13/10
CPC分类号： H01L21/67034 , Y10S134/902 , Y10S414/135 , Y10S414/14 , Y10T29/41
摘要： A processing apparatus of the invention includes a rotary processing part for rotating and drying plural sheets of objects to be processed collectively in order to allow the object to be rotated immediately after they are accommodated in the rotary processing part and a balance adjusting mechanism for adjusting balance of the rotary processing part by moving counterweights in accordance with the number of the objects. Further the processing apparatus further includes a counter for counting the number of the objects accommodated in the rotary processing part and a control unit for controlling the balance adjusting operation of the balance adjusting mechanism in accordance with a predetermined relationship between the number of objects and the respective positions of the counterweights.
摘要翻译：本发明的处理装置包括旋转处理部分，用于一体旋转和干燥待处理的多个物体，以允许物体在容纳在旋转处理部分中之后立即旋转，以及用于调节平衡的平衡调节机构的旋转处理部件通过根据物体的数量移动配重。此外，处理装置还包括用于对容纳在旋转处理部分中的物体的数量进行计数的计数器和用于根据物体数量与相应物体之间的预定关系来控制平衡调节机构的平衡调节操作的控制单元配重的位置。

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