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1. 发明授权

US4685198A Method of manufacturing isolated semiconductor devices 失效
标题翻译：制造隔离半导体器件的方法
公开(公告)号：US4685198A
公开(公告)日：1987-08-11
申请号：US758962
申请日：1985-07-25
申请人： Kenji Kawakita , Noboru Nomura , Toyoki Takemoto
发明人： Kenji Kawakita , Noboru Nomura , Toyoki Takemoto
IPC分类号： H01L21/762 , H01L21/763 , H01L29/06
CPC分类号： H01L21/76264 , H01L21/762 , H01L21/763 , H01L21/76281 , H01L21/76283 , Y10S148/05 , Y10S148/115 , Y10S438/973
摘要： Disclosed is a method of isolating a transistor perfectly by employing a selective oxidation technology (LOCOS technology). More particularly, vertical openings are formed in the surface of {100} silicon substrate, and oxidation resistant films are formed of this surface and in part of the side walls of these openings. In succession, by etching with an etchant having an orientation anisotropy, dents are formed at high precision in the side walls of the openings. By oxidizing using the oxidation resistant film as the mask, an oxide film growing out from a dent in the opening side wall is connected with another oxide film growing out from an adjacent dent. The transistor thus formed in the active region of the silicon electrically isolated from the substrate is small in parasitic capacitance and may be formed into a small size, so that it possesses the features suited to VLSI, that is, high speed, low power consumption, and processability to high density integration.
摘要翻译：公开了通过采用选择氧化技术（LOCOS技术）将晶体管完全隔离的方法。更具体地，在{100}硅衬底的表面中形成垂直开口，并且由该表面和这些开口的一部分侧壁形成抗氧化膜。相继地，通过用具有取向各向异性的蚀刻剂进行蚀刻，在开口的侧壁中以高精度形成凹痕。通过使用抗氧化膜作为掩模进行氧化，从开口侧壁中的凹陷生长的氧化膜与从相邻凹坑生长的另一氧化膜连接。因此，在与衬底电隔离的硅的有源区中形成的晶体管的寄生电容小，并且可以形成为小尺寸，使得其具有适合于VLSI的特征，即高速度，低功耗，和可加工性的高密度集成。

2. 发明授权

US5169494A Fine pattern forming method 失效
标题翻译：精细图案形成方法
公开(公告)号：US5169494A
公开(公告)日：1992-12-08
申请号：US742550
申请日：1991-08-08
申请人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
发明人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
IPC分类号： G03F7/039 , G03F7/09
CPC分类号： G03F7/094 , G03F7/039
摘要： The present invention provides a method of forming a fine pattern comprising the steps of forming on a semiconductor substrate an organic polymer film and heat treating it, forming on the organic polymer film an inorganic film and heat treating it, forming on the inorganic film an electron beam resist film and heat treating it, drawing a pattern on the resist film, developing it to form a resist pattern, and etching the inorganic film and the organic polymer film using the resist pattern as a mask, wherein the improvement comprises using one substance selected from the group consisting of a polyphenylene sulfide, a derivative thereof, and a polymer represented by the formula (I): ##STR1## where n is a positive integer, for forming at least one of the organic polymer film and the electron beam resist film. According to the present invention, it is possible to prevent charging by incident electrons, thereby keeping free of field butting and reduction of overlay accuracy, and to form an accurate and vertical fine resist pattern.
摘要翻译：本发明提供一种形成精细图案的方法，包括以下步骤：在半导体衬底上形成有机聚合物膜并进行热处理，在有机聚合物膜上形成无机膜并进行热处理，在无机膜上形成电子抗蚀剂膜并对其进行热处理，在抗蚀剂膜上绘制图案，将其显影以形成抗蚀剂图案，并使用抗蚀剂图案作为掩模蚀刻无机膜和有机聚合物膜，其中改进包括使用选择的一种物质由聚苯硫醚，其衍生物和由式（I）表示的聚合物组成：其中n为正整数，用于形成至少一个有机聚合物膜和电子光束抗蚀膜。根据本发明，可以防止入射电子的充电，从而保持无间隙对接和降低覆盖精度，并形成精确和垂直的精细抗蚀剂图案。

3. 发明授权

US4936951A Method of reducing proximity effect in electron beam resists 失效
标题翻译：减少电子束抗蚀剂邻近效应的方法
公开(公告)号：US4936951A
公开(公告)日：1990-06-26
申请号：US262871
申请日：1988-10-26
申请人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
发明人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
IPC分类号： G03F7/004 , G03F7/09
CPC分类号： G03F7/094 , G03F7/004 , Y10S438/949
摘要： A fine pattern forming method capable of forming an accurate fine pattern without charge-up at the time of electron beam or focus ion beam exposure is provided by treating the bottom layer or intermediate layer or silicon containing resist of a multi-layer resist with ion shower irradiation or reducing solvent.
摘要翻译：通过用离子淋洗处理多层抗蚀剂的底层或中间层或含硅抗蚀剂，可以提供在电子束或聚焦离子束曝光时无需充电形成精确精细图案的精细图案形成方法照射或还原溶剂。

4. 发明授权

US4976818A Fine pattern forming method 失效
标题翻译：精细图案形成方法
公开(公告)号：US4976818A
公开(公告)日：1990-12-11
申请号：US520654
申请日：1990-04-24
申请人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
发明人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
IPC分类号： G03F7/004 , G03F7/09
CPC分类号： G03F7/094 , G03F7/004 , Y10S438/949
摘要： A fine pattern forming method capable of forming an accurate fine pattern without charge-up at the time of electron beam or focus ion beam exposure, by treating the bottom layer or intermediate layer or silicon containing resist of a multi-layer resist with ion shower irradiation or reducing solvent.
摘要翻译：通过用离子喷淋照射处理多层抗蚀剂的底层或中间层或含硅抗蚀剂，能够在电子束或聚焦离子束曝光时形成精细图案而不进行充电的精细图案形成方法或还原溶剂。

5. 发明授权

US5306601A Fine pattern forming material and pattern forming method 失效
标题翻译：精细图案形成材料和图案形成方法
公开(公告)号：US5306601A
公开(公告)日：1994-04-26
申请号：US93032
申请日：1993-07-19
申请人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
发明人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
IPC分类号： G03F7/038 , G03F7/039 , G03C5/00
CPC分类号： B82Y30/00 , B82Y10/00 , G03F7/038 , G03F7/039 , C08G2261/1412 , C08G2261/3223 , Y10S430/143
摘要： Herein is provided a fine pattern forming method which is prevented from the charging-up phenomenon at the time of electric charged beam writing owing to the use of a polyalkylthiophene type conductive polymeric substance or a quaternary ammonium ion type polymeric substance in a monolayer or multilayer resist.
摘要翻译：本发明提供了一种精细图案形成方法，该方法由于在单层或多层抗蚀剂中使用聚烷基噻吩型导电聚合物或季铵离子型聚合物而防止充电光束写入时的充电现象。

6. 发明授权

US5093224A Process for producing fine patterns using cyclocarbosilane 失效
标题翻译：使用环磷酰胺生产精细图案的方法
公开(公告)号：US5093224A
公开(公告)日：1992-03-03
申请号：US496020
申请日：1990-03-20
申请人： Kazuhiko Hashimoto , Kenji Kawakita , Noboru Nomura
发明人： Kazuhiko Hashimoto , Kenji Kawakita , Noboru Nomura
IPC分类号： G03F7/004 , G03F7/075 , H01L21/027 , H01L21/30 , H01L21/3213
CPC分类号： G03F7/0754 , Y10S430/168
摘要： A process for forming a fine pattern comprising the steps of forming an organic polymer film on a semiconductor substrate followed by heat treatment, applying a resist film consisting of a cyclocarbosilane represented by the general formula (I): ##STR1## where R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each hydrogen or an alkyl group,a polymer resin, and a photo acid generator, on the organic polymer film followed by heat treatment, exposing to an electric charged beam, forming a resist pattern by developing, and etching the organic polymer film while using the resist pattern as a mask. According to the present invention, a dry etching resistant precise fine resist pattern can be formed with high sensitivity.

7. 发明授权

US5030549A Fine pattern forming method 失效
标题翻译：精细图案形成方法
公开(公告)号：US5030549A
公开(公告)日：1991-07-09
申请号：US371289
申请日：1989-06-26
申请人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
发明人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
IPC分类号： G03F7/105 , G03F1/68 , G03F1/80 , G03F7/004 , G03F7/039 , G03F7/09 , G03F7/11 , G03F7/26 , G03F7/38 , G03F7/40 , H01L21/027 , H01L21/30
CPC分类号： G03F7/039 , G03F7/0047 , G03F7/093
摘要： Provided is a method for forming fine pattern free from shear of pattern caused by charging and high in dry etch resistance by using a high molecular organic film containing an organometallic complex or a metallic salt in single-layer or multi-layer resist process and treating the surface of this film with a reducing agent to form a metallic layer on the surface.

8. 发明授权

US07213664B2 Cogeneration vehicle system utilizing a fuel cell car, and a mobile unit as a component of the system 有权
标题翻译：利用燃料电池汽车的热电联产车辆系统和作为系统的部件的移动单元
公开(公告)号：US07213664B2
公开(公告)日：2007-05-08
申请号：US11369748
申请日：2006-03-08
申请人： Noboru Nomura , Takashi Fukunaga , Jiro Suzuki
发明人： Noboru Nomura , Takashi Fukunaga , Jiro Suzuki
IPC分类号： B60K1/00
CPC分类号： B60L11/1892 , B60K1/04 , B60L1/003 , B60L1/02 , B60L3/0046 , B60L7/14 , B60L11/1803 , B60L11/1861 , B60L11/1875 , B60L11/1887 , B60L11/1894 , B60L2210/30 , B60L2210/40 , B60L2240/36 , B60L2240/545 , B60L2240/662 , B60L2270/44 , H01M8/04007 , H01M8/04052 , H01M8/04156 , H01M8/04164 , H01M8/0662 , H01M16/006 , H01M2250/20 , H01M2250/405 , Y02B90/16 , Y02T10/7044 , Y02T10/705 , Y02T10/7241 , Y02T10/7291 , Y02T90/16 , Y02T90/32 , Y02T90/34
摘要： There is provided a vehicle system, including an electromobile having a fuel cell power generator mounted therein, and a predetermined mobile unit jointable to the electromobile, such that cogeneration within the mobile unit can be realized even during the travel of the electromobile. Via a joint section 30, a vehicle 10 including a fuel cell 13 as a source of motive power is jointed to a mobile unit 20 capable of travelling and at least including a storage battery 23 and a water tank 25. The water produced in the fuel cell 13 is recovered by a water recovery section 21 via the joint section 30. The heat produced in the fuel cell 13 is recovered by a heat recovery section 22 via the joint section 30. The recovered water is warmed up with the recovered heat, and thereafter stored in the water tank 25. The hot water stored in the water tank 25 is utilized as hot water to be used for controlling the temperature of the mobile unit 20 or supplied as hot water. Any excess electric power generated by the fuel cell 13 is stored in the storage battery 23, and supplied onto electric wiring within the mobile unit 20.
摘要翻译：提供了一种车辆系统，其包括具有安装在其中的燃料电池发电机的电动机和可与电动机连接的预定移动单元，使得即使在电动汽车行驶期间也可以实现移动单元内的热电联供。通过接合部30，将包括作为动力源的燃料电池13的车辆10接合到能够行驶的移动单元20，并且至少包括蓄电池23和水箱25。在燃料电池13中产生的水经由接合部30被水回收部21回收。在燃料电池13中产生的热量经由接合部30被热回收部22回收。回收的水用回收的热量加热，然后储存在水箱25中。存储在水箱25中的热水被用作用于控制移动单元20的温度或作为热水供应的热水。由燃料电池13产生的任何多余的电力被存储在蓄电池23中，并被供给到移动单元20内的电线路上。

9. 发明授权

US06362784B1 Antenna unit and digital television receiver 失效
标题翻译：天线单元和数字电视接收机
公开(公告)号：US06362784B1
公开(公告)日：2002-03-26
申请号：US09424115
申请日：1999-11-19
申请人： Joji Kane , Takasi Yosida , Noboru Nomura , Toyokazu Ikeda , Tosiro Sugiyama , Hideto Majima
发明人： Joji Kane , Takasi Yosida , Noboru Nomura , Toyokazu Ikeda , Tosiro Sugiyama , Hideto Majima
IPC分类号： H01Q138
CPC分类号： H01Q1/38 , H01Q1/084 , H01Q1/32 , H01Q1/3275 , H01Q1/36 , H01Q5/371 , H01Q5/378 , H01Q5/40 , H01Q5/50 , H01Q9/0421 , H01Q9/14 , H01Q9/42 , H04N5/44
摘要： The present invention provides an antenna device comprising a conductive substrate and an antenna element located in the proximity of the conductive substrate, in which a portion of the antenna element is formed of a coil or zigzag conductor and an end of the antenna element is connected to the conductive substrate for grounding. In addition, the coil or zigzag conductor is formed at an end of the antenna element and the coil or zigzag conductor and the other end of the antenna element are connected together on an insulator provided on the conductive substrate.
摘要翻译：本发明提供了一种天线装置，其包括导电基板和位于导电基板附近的天线元件，天线元件的一部分由线圈或之字形导体形成，天线元件的端部连接到用于接地的导电基板。此外，线圈或之字形导体形成在天线元件的端部，并且线圈或之字形导体和天线元件的另一端在设置在导电衬底上的绝缘体上连接在一起。

10. 发明授权

US6130626A Mobile unit support system and mobile unit detection device and a system 失效
标题翻译：移动单元支持系统和移动单元检测设备及系统
公开(公告)号：US6130626A
公开(公告)日：2000-10-10
申请号：US899483
申请日：1997-07-24
申请人： Joji Kane , Takashi Yoshida , Noboru Nomura
发明人： Joji Kane , Takashi Yoshida , Noboru Nomura
IPC分类号： G08G1/01 , G08G1/09 , G08G1/0967
CPC分类号： G08G1/096716 , G08G1/0104 , G08G1/09 , G08G1/096725 , G08G1/09675 , G08G1/096775
摘要： A mobile unit support system has a mobile unit and a plurality of sources to be detected installed along a route of movement of said mobile unit, characterized in that said mobile unit includes a storage section for storing in advance the information on the arrangement of said plurality of the sources to be detected, a detection section for detecting said sources to be detected, and an arithmetic processing section for producing predetermined information on the basis of said detection information detected and said arrangement information stored.
摘要翻译：移动单元支持系统具有沿着所述移动单元的移动路线安装的移动单元和多个待检测的源，其特征在于，所述移动单元包括用于预先存储关于所述多个移动单元的布置的信息的存储部分要检测的源，用于检测所述检测源的检测部分，以及用于根据检测到的所述检测信息和存储的所述布置信息产生预定信息的算术处理部分。

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