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    • 7. 发明授权
    • Display substrate, conductor, and insulator
    • 显示基板,导体和绝缘体
    • US6030707A
    • 2000-02-29
    • US212283
    • 1998-12-16
    • Toshihiro KatohTakao KuriyamaTatsuya TakeiTakashi KawaiHiroshi MurakamiEiji MunemotoNorio OhtaKoji Shimada
    • Toshihiro KatohTakao KuriyamaTatsuya TakeiTakashi KawaiHiroshi MurakamiEiji MunemotoNorio OhtaKoji Shimada
    • G03F7/004G03F7/021G03F7/04H01J9/02B32B9/04
    • G03F7/0212G03F7/0047G03F7/04H01J9/02H01J2217/04
    • The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling of a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.
    • 本发明的目的是解决通过光刻法形成图案形式的导电或绝缘层所涉及的问题,即与处理溶剂有关的环境问题以及与碱性水溶液的显影中的废水处理有关的问题 。 通过光刻法在玻璃基板上形成导电层(阳极母线3)或绝缘层(阻挡层1)的方法,使用通过混合低熔点玻璃粉末作为粘合剂而制备的感光浆料溶液和导电或绝缘 粉末成为PVA系的水溶性感光性溶液,其中,全部低熔点玻璃粉末中的B 2 O 3成分的含量被严格控制在6重量%以下。 这使得涂层不会凝胶化PVA。 与使用溶剂型感光浆料的常规光刻不同,本发明的方法可以解决与碱性溶液的显影相关的处理溶剂和与废水处理有关的问题的环境问题。
    • 8. 发明授权
    • Photosensitive slurry
    • 感光浆
    • US5891604A
    • 1999-04-06
    • US857251
    • 1997-05-16
    • Toshihiro KatohTakao KuriyamaTatsuya TakeiTakashi KawaiHiroshi MurakamiEiji MunemotoNorio OhtaKoji Shimada
    • Toshihiro KatohTakao KuriyamaTatsuya TakeiTakashi KawaiHiroshi MurakamiEiji MunemotoNorio OhtaKoji Shimada
    • G03F7/004G03F7/021G03F7/04H01J9/02G03C1/492
    • G03F7/0212G03F7/0047G03F7/04H01J9/02H01J2217/04
    • The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.
    • 本发明的目的在于解决通过光刻技术形成图形形式的导电或绝缘层所涉及的问题,即在用碱性水溶液进行显影时与处理溶剂有关的环境问题和与废水处理有关的问题。 通过光刻法在玻璃基板上形成导电层(阳极母线3)或绝缘层(阻挡层1)的方法,使用通过混合低熔点玻璃粉末作为粘合剂而制备的感光浆料溶液和导电或绝缘 粉末成为PVA系的水溶性感光性溶液,其中,全部低熔点玻璃粉末中的B 2 O 3成分的含量被严格控制在6重量%以下。 这使得涂层不会凝胶化PVA。 与使用溶剂型感光浆料的常规光刻不同,本发明的方法可以解决与碱性溶液的显影相关的处理溶剂和与废水处理有关的问题的环境问题。