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1. 发明授权

US5672460A Method for forming conductive or insulating layers 失效
标题翻译：形成导电层或绝缘层的方法
公开(公告)号：US5672460A
公开(公告)日：1997-09-30
申请号：US480608
申请日：1995-06-08
申请人： Toshihiro Katoh , Takao Kuriyama , Tatsuya Takei , Takashi Kawai , Hiroshi Murakami , Eiji Munemoto , Norio Ohta , Koji Shimada
发明人： Toshihiro Katoh , Takao Kuriyama , Tatsuya Takei , Takashi Kawai , Hiroshi Murakami , Eiji Munemoto , Norio Ohta , Koji Shimada
IPC分类号： G03F7/004 , G03F7/021 , G03F7/04 , H01J9/02 , G03C11/00
CPC分类号： G03F7/0212 , G03F7/0047 , G03F7/04 , H01J9/02 , H01J2217/04
摘要： The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.
摘要翻译：本发明的目的在于解决通过光刻技术形成图形形式的导电或绝缘层所涉及的问题，即在用碱性水溶液进行显影时与处理溶剂有关的环境问题和与废水处理有关的问题。通过光刻法在玻璃基板上形成导电层（阳极母线3）或绝缘层（阻挡层1）的方法，使用通过混合低熔点玻璃粉末作为粘合剂而制备的感光浆料溶液和导电或绝缘粉末成为PVA系的水溶性感光性溶液，其中，全部低熔点玻璃粉末中的B 2 O 3成分的含量被严格控制在6重量％以下。这使得涂层不会凝胶化PVA。与使用溶剂型感光浆料的常规光刻不同，本发明的方法可以解决与碱性溶液的显影相关的处理溶剂和与废水处理有关的问题的环境问题。

2. 发明申请

US20060270209A1 Process for producing transparent electrode 审中-公开
标题翻译：制造透明电极的方法
公开(公告)号：US20060270209A1
公开(公告)日：2006-11-30
申请号：US11500896
申请日：2006-08-09
申请人： Akira Mitsui , Hidefumi Odaka , Shigeaki Yonemori , Yasuhiko Akao
发明人： Akira Mitsui , Hidefumi Odaka , Shigeaki Yonemori , Yasuhiko Akao
IPC分类号： H01L21/44
CPC分类号： C03C17/245 , C03C2217/231 , C03C2218/154 , C03C2218/328 , C03C2218/33 , G02F1/13439 , H01J9/02 , H01J2217/04 , H01L31/1884 , Y02E10/50
摘要： To provide a process for producing a transparent electrode comprising a tin oxide film which can readily be patterned, which can be realized at a low cost, and which has low resistivity and is excellent in transparency. A process for producing a transparent electrode having a patterned tin oxide film formed on a substrate, which comprises a step of forming a tin oxide film having light absorption characteristics on a substrate, a patterning step of removing part of the tin oxide film having light absorption characteristics, and a step of subjecting the patterned tin oxide film having light absorption characteristics to heat treatment to obtain a tin oxide film.
摘要翻译：提供一种制造透明电极的方法，该透明电极包括可以容易地被图案化的氧化锡膜，其可以以低成本实现，并且具有低电阻率并且透明度优异。一种用于制造在基板上形成有图案化氧化锡膜的透明电极的方法，其包括在基板上形成具有吸光特性的氧化锡膜的步骤，除去部分具有吸光性的氧化锡膜的图案化步骤特性，以及对具有光吸收特性的图案化氧化锡膜进行热处理以获得氧化锡膜的步骤。

3. 发明授权

US6030707A Display substrate, conductor, and insulator 失效
标题翻译：显示基板，导体和绝缘体
公开(公告)号：US6030707A
公开(公告)日：2000-02-29
申请号：US212283
申请日：1998-12-16
申请人： Toshihiro Katoh , Takao Kuriyama , Tatsuya Takei , Takashi Kawai , Hiroshi Murakami , Eiji Munemoto , Norio Ohta , Koji Shimada
发明人： Toshihiro Katoh , Takao Kuriyama , Tatsuya Takei , Takashi Kawai , Hiroshi Murakami , Eiji Munemoto , Norio Ohta , Koji Shimada
IPC分类号： G03F7/004 , G03F7/021 , G03F7/04 , H01J9/02 , B32B9/04
CPC分类号： G03F7/0212 , G03F7/0047 , G03F7/04 , H01J9/02 , H01J2217/04
摘要： The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling of a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.
摘要翻译：本发明的目的是解决通过光刻法形成图案形式的导电或绝缘层所涉及的问题，即与处理溶剂有关的环境问题以及与碱性水溶液的显影中的废水处理有关的问题。通过光刻法在玻璃基板上形成导电层（阳极母线3）或绝缘层（阻挡层1）的方法，使用通过混合低熔点玻璃粉末作为粘合剂而制备的感光浆料溶液和导电或绝缘粉末成为PVA系的水溶性感光性溶液，其中，全部低熔点玻璃粉末中的B 2 O 3成分的含量被严格控制在6重量％以下。这使得涂层不会凝胶化PVA。与使用溶剂型感光浆料的常规光刻不同，本发明的方法可以解决与碱性溶液的显影相关的处理溶剂和与废水处理有关的问题的环境问题。

4. 发明授权

US5891604A Photosensitive slurry 失效
标题翻译：感光浆
公开(公告)号：US5891604A
公开(公告)日：1999-04-06
申请号：US857251
申请日：1997-05-16
申请人： Toshihiro Katoh , Takao Kuriyama , Tatsuya Takei , Takashi Kawai , Hiroshi Murakami , Eiji Munemoto , Norio Ohta , Koji Shimada
发明人： Toshihiro Katoh , Takao Kuriyama , Tatsuya Takei , Takashi Kawai , Hiroshi Murakami , Eiji Munemoto , Norio Ohta , Koji Shimada
IPC分类号： G03F7/004 , G03F7/021 , G03F7/04 , H01J9/02 , G03C1/492
CPC分类号： G03F7/0212 , G03F7/0047 , G03F7/04 , H01J9/02 , H01J2217/04
摘要： The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.
摘要翻译：本发明的目的在于解决通过光刻技术形成图形形式的导电或绝缘层所涉及的问题，即在用碱性水溶液进行显影时与处理溶剂有关的环境问题和与废水处理有关的问题。通过光刻法在玻璃基板上形成导电层（阳极母线3）或绝缘层（阻挡层1）的方法，使用通过混合低熔点玻璃粉末作为粘合剂而制备的感光浆料溶液和导电或绝缘粉末成为PVA系的水溶性感光性溶液，其中，全部低熔点玻璃粉末中的B 2 O 3成分的含量被严格控制在6重量％以下。这使得涂层不会凝胶化PVA。与使用溶剂型感光浆料的常规光刻不同，本发明的方法可以解决与碱性溶液的显影相关的处理溶剂和与废水处理有关的问题的环境问题。

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