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1. 发明授权

US08624345B2 Photomask and photomask substrate with reduced light scattering properties 有权
标题翻译：光掩模和光掩模底物，具有降低的光散射性能
公开(公告)号：US08624345B2
公开(公告)日：2014-01-07
申请号：US13486995
申请日：2012-06-01
申请人： Ken Wu , Hung-Chang Hsieh , Chang-Cheng Hung , Luke Hsu , Ren-Guey Hsieh , Hsin-Chang Lee , Chia-Jen Chen
发明人： Ken Wu , Hung-Chang Hsieh , Chang-Cheng Hung , Luke Hsu , Ren-Guey Hsieh , Hsin-Chang Lee , Chia-Jen Chen
IPC分类号： H01L33/44 , G03F1/46 , G03F1/58 , G03F1/68
CPC分类号： G03F7/70941 , G03F1/26 , G03F1/46 , G03F7/70433
摘要： A mask substrate, photomask and method for forming the same are provided. The photomask includes a substantially light transparent substrate and a circuitry pattern disposed over the light transparent substrate. The circuitry pattern includes a phase shifting layer disposed over the substantially light transparent substrate. A substantially light shielding layer is disposed over the phase shifting layer. At least one barrier layer is disposed over the substantially light shielding layer. An uppermost portion of the substantially light shielding layer does not comprise anti-reflective properties and the at least one barrier layer comprises an uppermost hardmask layer and an underlying anti-reflective layer.
摘要翻译：提供了掩模基板，光掩模及其形成方法。光掩模包括基本上透明的基板和设置在光透明基板上的电路图案。电路图案包括设置在基本上光透明基底上的相移层。基本上遮光层设置在相移层上。至少一个阻挡层设置在基本上遮光层上。基本上遮光层的最上部分不包括抗反射性质，并且至少一个阻挡层包括最上面的硬掩模层和下面的抗反射层。

2. 发明授权

US08198118B2 Method for forming a robust mask with reduced light scattering 有权
标题翻译：用于形成具有减少的光散射的鲁棒掩模的方法
公开(公告)号：US08198118B2
公开(公告)日：2012-06-12
申请号：US11590257
申请日：2006-10-31
申请人： Ken Wu , Hung-Chang Hsieh , Chang-Cheng Hung , Luke Hsu , Ren-Guey Hsieh , Hsin-Chang Lee , Chia-Jen Chen
发明人： Ken Wu , Hung-Chang Hsieh , Chang-Cheng Hung , Luke Hsu , Ren-Guey Hsieh , Hsin-Chang Lee , Chia-Jen Chen
IPC分类号： H01L21/31 , H01L33/44 , G03F1/00 , G03F9/00
CPC分类号： G03F7/70941 , G03F1/26 , G03F1/46 , G03F7/70433
摘要： A mask and method for forming the same including carrying out a photolithographic patterning process the method including providing a substantially light transparent portion; forming a substantially light shielding layer disposed over the substantially light transparent portion; forming at least one barrier layer disposed over the substantially light shielding layer; forming a resist layer disposed over the at least one barrier layer; patterning the resist layer for producing a circuitry pattern; and, carrying out an etching process according to the circuitry pattern to expose a portion of the substantially light transparent portion to form a mask.
摘要翻译：一种掩模及其形成方法，包括进行光刻图案处理，该方法包括提供基本上透明的部分; 形成设置在所述基本上透明部分上的基本上遮光层; 形成设置在所述基本上遮光层上的至少一个势垒层; 形成设置在所述至少一个阻挡层上的抗蚀剂层; 图案化抗蚀剂层以产生电路图案; 并且根据电路图案进行蚀刻处理以暴露基本上光透明部分的一部分以形成掩模。

3. 发明申请

US20120237861A1 PHOTOMASK AND PHOTOMASK SUBSTRATE WITH REDUCED LIGHT SCATTERING PROPERTIES 有权
标题翻译：具有降低光散射特性的光电子和光电子基板
公开(公告)号：US20120237861A1
公开(公告)日：2012-09-20
申请号：US13486995
申请日：2012-06-01
申请人： Ken Wu , Hung-Chang Hsieh , Chang-Cheng Hung , Luke Hsu , Ren-Guey Hsieh , Hsin-Chang Lee , Chia-Jen Chen
发明人： Ken Wu , Hung-Chang Hsieh , Chang-Cheng Hung , Luke Hsu , Ren-Guey Hsieh , Hsin-Chang Lee , Chia-Jen Chen
IPC分类号： G03F1/26
CPC分类号： G03F7/70941 , G03F1/26 , G03F1/46 , G03F7/70433
摘要： A mask substrate, photomask and method for forming the same are provided. The photomask includes a substantially light transparent substrate and a circuitry pattern disposed over the light transparent substrate. The circuitry pattern includes a phase shifting layer disposed over the substantially light transparent substrate. A substantially light shielding layer is disposed over the phase shifting layer. At least one barrier layer is disposed over the substantially light shielding layer. An uppermost portion of the substantially light shielding layer does not comprise anti-reflective properties and the at least one barrier layer comprises an uppermost hardmask layer and an underlying anti-reflective layer.
摘要翻译：提供了掩模基板，光掩模及其形成方法。光掩模包括基本上透明的基板和设置在光透明基板上的电路图案。电路图案包括设置在基本上光透明基底上的相移层。基本上遮光层设置在相移层上。至少一个阻挡层设置在基本上遮光层上。基本上遮光层的最上部分不包括抗反射性质，并且至少一个阻挡层包括最上面的硬掩模层和下面的抗反射层。

4. 发明申请

US20080102379A1 Method for forming a robust mask with reduced light scattering 有权
标题翻译：用于形成具有减少的光散射的鲁棒掩模的方法
公开(公告)号：US20080102379A1
公开(公告)日：2008-05-01
申请号：US11590257
申请日：2006-10-31
申请人： Ken Wu , Hung-Chang Hsieh , Chang-Cheng Hung , Luke Hsu , Ren-Guey Hsieh , Hsin-Chang Lee , Chia-Jen Chen
发明人： Ken Wu , Hung-Chang Hsieh , Chang-Cheng Hung , Luke Hsu , Ren-Guey Hsieh , Hsin-Chang Lee , Chia-Jen Chen
IPC分类号： H01L21/00
CPC分类号： G03F7/70941 , G03F1/26 , G03F1/46 , G03F7/70433
摘要： A mask and method for forming the same including carrying out a photolithographic patterning process the method including providing a substantially light transparent portion; forming a substantially light shielding layer disposed over the substantially light transparent portion; forming at least one barrier layer disposed over the substantially light shielding layer; forming a resist layer disposed over the at least one barrier layer; patterning the resist layer for producing a circuitry pattern; and, carrying out an etching process according to the circuitry pattern to expose a portion of the substantially light transparent portion to form a mask.
摘要翻译：一种掩模及其形成方法，包括进行光刻图案处理，该方法包括提供基本上透明的部分; 形成设置在所述基本上透明部分上的基本上遮光层; 形成设置在所述基本上遮光层上的至少一个阻挡层; 形成设置在所述至少一个阻挡层上的抗蚀剂层; 图案化抗蚀剂层以产生电路图案; 并且根据电路图案进行蚀刻处理以暴露基本上光透明部分的一部分以形成掩模。

5. 发明授权

US07727682B2 System and method for providing phase shift mask passivation layer 失效
标题翻译：提供相移掩模钝化层的系统和方法
公开(公告)号：US07727682B2
公开(公告)日：2010-06-01
申请号：US11689242
申请日：2007-03-21
申请人： Hung-Ting Pan , Ken Wu , Luke Hsu , Yao-Ching Ku
发明人： Hung-Ting Pan , Ken Wu , Luke Hsu , Yao-Ching Ku
IPC分类号： G03F1/00
CPC分类号： G03F1/62 , G03F1/26 , G03F1/48 , G03F1/86
摘要： System and method for providing a passivation layer for a phase shift mask (“PSM”) are described. In one embodiment, a PSM comprises a transparent substrate; a phase shift pattern disposed on the transparent substrate; and a passivation layer disposed to substantially cover exposed surfaces of at least a portion of the phase shift pattern.
摘要翻译：描述了用于为相移掩模（“PSM”）提供钝化层的系统和方法。在一个实施例中，PSM包括透明基板; 设置在所述透明基板上的相移图案; 以及钝化层，其设置成基本上覆盖至少部分相移图案的暴露表面。

6. 发明申请

US20080233486A1 System and Method for Providing Phase Shift Mask Passivation Layer 失效
标题翻译：提供相移掩模钝化层的系统和方法
公开(公告)号：US20080233486A1
公开(公告)日：2008-09-25
申请号：US11689242
申请日：2007-03-21
申请人： Hung-Ting Pan , Ken Wu , Luke Hsu , Yao-Ching Ku
发明人： Hung-Ting Pan , Ken Wu , Luke Hsu , Yao-Ching Ku
IPC分类号： G03F1/00
CPC分类号： G03F1/62 , G03F1/26 , G03F1/48 , G03F1/86
摘要： System and method for providing a passivation layer for a phase shift mask (“PSM”) are described. In one embodiment, a PSM comprises a transparent substrate; a phase shift pattern disposed on the transparent substrate; and a passivation layer disposed to substantially cover exposed surfaces of at least a portion of the phase shift pattern.
摘要翻译：描述了用于为相移掩模（“PSM”）提供钝化层的系统和方法。在一个实施例中，PSM包括透明基板; 设置在所述透明基板上的相移图案; 以及钝化层，其设置成基本上覆盖至少部分相移图案的暴露表面。

7. 发明授权

US08493469B2 Method and apparatus for controlling a camera module to compensate for the color spectrum of a white LED 有权
标题翻译：用于控制相机模块以补偿白色LED的色谱的方法和装置
公开(公告)号：US08493469B2
公开(公告)日：2013-07-23
申请号：US13151502
申请日：2011-06-02
申请人： Marc Drader , Ken Wu , Michael Purdy
发明人： Marc Drader , Ken Wu , Michael Purdy
IPC分类号： H04N9/73
CPC分类号： H04N9/735 , H04N5/2256 , H04N5/232
摘要： A method and an apparatus enabling use of a light source emitting a spectrum of light not following characteristics of a blackbody source of light with a camera module programmed for use with light sources following characteristics of blackbody sources of light, wherein a white-balance patch is transmitted to the camera module to cause the camera module to accept color coordinates representing a point on a chromaticity chart that partly defines a region of color coordinates on the chromaticity chart into which color coordinates of the light source fall and to which color coordinates of a reference white color derived by a white-balance routine of the camera module are constrained.
摘要翻译：一种方法和装置，其能够使用发射不具有黑体光源特征的光谱的光源，其具有被编程为与源于黑体光源的特征的光源一起使用的相机模块，其中白平衡贴片是传送到摄像机模块以使照相机模块接受表示色度图上的点的颜色坐标，该色坐标部分地限定色度图上颜色坐标的区域，光源的颜色坐标落在哪个颜色坐标上，参考点的颜色坐标由相机模块的白平衡程序导出的白色被约束。

8. 发明授权

US08325249B2 Method and apparatus for controlling a camera module to compensate for the light level of a white LED 有权
标题翻译：用于控制相机模块以补偿白色LED的光级的方法和装置
公开(公告)号：US08325249B2
公开(公告)日：2012-12-04
申请号：US12903732
申请日：2010-10-13
申请人： Marc Drader , Ken Wu , Michael Purdy
发明人： Marc Drader , Ken Wu , Michael Purdy
IPC分类号： H04N9/73
CPC分类号： H04N5/2354 , G03B15/05 , G03B2215/0567 , H04N5/2256 , H04N9/735
摘要： A method and an apparatus enabling use of a light source emitting a light of changing intensity and changing spectrum as a flash with a camera module having a white-balance routine and an exposure routine, wherein an initial value representative of a color spectrum emitted by the light source is transmitted to the camera module, the light source is turned on, and the camera module is signaled to scan a plurality of images of the scene while the light source is turned on, allowing the white-balance and exposure algorithms to be employed with each image scanned to refine the first initial value to refine the degree of compensation employed in correcting a color and a light level in the last one of the images of the plurality of images scanned.
摘要翻译：一种能够利用具有白平衡例程和曝光例程的相机模块，使用发射强度变化的光的光源和将频谱变化为闪光的方法和装置，其中表示由所述白平衡例程和曝光例程发出的色谱的初始值光源被传送到相机模块，光源被打开，并且在光源被打开的同时，信号通知相机模块来扫描场景的多个图像，从而允许使用白平衡和曝光算法其中扫描每个图像以细化第一初始值，以细化在校正扫描的多个图像的最后一个图像中的颜色和光级的补偿程度。

9. 发明授权

US08294601B2 Detection of intended key activation on a mobile device 有权
标题翻译：检测移动设备上预期的密钥激活
公开(公告)号：US08294601B2
公开(公告)日：2012-10-23
申请号：US12617993
申请日：2009-11-13
申请人： Colin Mark Werner , Lawrence Edward Kuhl , Keizo Marui , Chao Chen , Ken Wu
发明人： Colin Mark Werner , Lawrence Edward Kuhl , Keizo Marui , Chao Chen , Ken Wu
IPC分类号： H03M11/00
CPC分类号： H03K17/9622 , G06F1/3231 , G06F3/0202 , H03K2217/960755 , Y02D10/173
摘要： A method and device are provided for preventing unintended activation of one or more hard keys on a mobile device. A capacitive sensor senses a capacitance level at a location on the keyboard, to detect whether a hard key is being actuated by a human hand or human skin. If the sensed capacitance level exceeds a key activation capacitance threshold, a key circuit connection is identified as being associated with an intended hard key activation. If the measured capacitance level is within an uncertainty tolerance below the key activation capacitance threshold, a secondary capacitance level is measured at a non-keyboard location. The key circuit connection is identified as being associated with an intended hard key activation when the measured secondary capacitance level exceeds a key activation confirmation threshold. Additional secondary indicators can be obtained based on size and shape capacitance pattern, timing information, and an active application or device state.
摘要翻译：提供了一种用于防止移动设备上的一个或多个硬键的意外激活的方法和设备。电容传感器感测键盘上的位置处的电容电平，以检测硬键是由人的手还是人皮肤致动。如果感测到的电容电平超过键激活电容阈值，则将键电路连接识别为与预期的硬键激活相关联。如果测量的电容电平在低于键激活电容阈值的不确定性容限内，则在非键盘位置测量次级电容电平。当测量的次级电容电平超过键激活确认阈值时，将钥匙电路连接识别为与预期的硬键激活相关联。可以基于尺寸和形状电容图案，定时信息以及主动应用或设备状态来获得附加的次要指示符。

10. 发明授权

US07871269B2 Injection impression tray 有权
标题翻译：注塑印模托盘
公开(公告)号：US07871269B2
公开(公告)日：2011-01-18
申请号：US11867608
申请日：2007-10-04
申请人： Ken Wu , Jon Moss , Ryan Kimura , Heng Cao
发明人： Ken Wu , Jon Moss , Ryan Kimura , Heng Cao
IPC分类号： A61C9/00
CPC分类号： A61C9/0006
摘要： The present invention relates to an improved dental impression tray and related methods. In one embodiment, a dental impression tray includes a first portion for receiving impression material from a source and a second portion is configured for receiving a patient's upper or lower teeth and will at least partial define a cavity shaped to receive the teeth during use. In use, impression material introduced into the first portion can pass through openings and into the second portion and around a patient's teeth.
摘要翻译：本发明涉及一种改进的牙印模托盘及相关方法。在一个实施例中，牙齿印模托盘包括用于从源接收印模材料的第一部分，并且第二部分构造成用于接收患者的上牙或下牙，并且将至少部分地限定在使用期间成形为接收牙齿的腔。在使用中，引入第一部分的印模材料可以穿过开口并进入第二部分和患者的牙齿周围。

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