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1. 发明授权

US07218703B2 X-ray microscopic inspection apparatus 有权
标题翻译： X线显微镜检查仪
公开(公告)号：US07218703B2
公开(公告)日：2007-05-15
申请号：US10719008
申请日：2003-11-21
申请人： Keiji Yada , Hiromi Kai , Yasushi Saito
发明人： Keiji Yada , Hiromi Kai , Yasushi Saito
IPC分类号： G21K7/00
CPC分类号： H01J35/065 , G21K7/00 , H01J35/12 , H01J2235/1204 , H01J2235/1291 , H01J2235/186
摘要： To provide an X-ray microscopic inspection apparatus capable of performing non-destructive inspection with high resolving power equal to or less than 0.1 μm in a very short period, and largely contributing to the nano-technology field.In the X-ray microscopic inspection apparatus having X-ray generating means for generating an X-ray by allowing an electron beam from an electron source to impinge on a target for X-ray generation, for inspecting an object to be inspected by utilizing the X-ray, a magnetic field superposition lens having a magnetic field generating portion disposed in the vicinity of an electron generating portion of an electron gun is included as a component element of the X-ray generating means. Further, the apparatus includes a liquid metal electron source using liquid metal or a thermal field emission electron source as the electron source, as a component element of the X-ray generating means. Furthermore, the apparatus includes a target with a heat sink using CVD diamond as the heat sink as the target for X-ray generation, as a component element of the X-ray generating means.
摘要翻译：本发明提供一种X射线显微镜检查装置，其能够在非常短的时间内以高分辨能力进行0.1μm以下的非破坏性检查，并且在很大程度上有助于纳米技术领域。在具有用于通过使来自电子源的电子束撞击到X射线产生用靶上而产生X射线的X射线显微镜检查装置中，为了利用作为X射线产生装置的构成要素，包括设置在电子枪的电子发生部附近的具有磁场产生部的磁场叠加透镜。此外，该装置包括使用液态金属或热场发射电子源作为电子源的液态金属电子源作为X射线产生装置的组成元件。此外，该装置包括具有使用CVD金刚石作为散热器作为X射线产生的目标的散热器的靶，作为X射线产生装置的组成元件。

2. 发明申请

US20050111624A1 X-ray microscopic inspection apparatus 有权
标题翻译： X线显微镜检查仪
公开(公告)号：US20050111624A1
公开(公告)日：2005-05-26
申请号：US10719008
申请日：2003-11-21
申请人： Keiji Yada , Hiromi Kai , Yasushi Saito
发明人： Keiji Yada , Hiromi Kai , Yasushi Saito
IPC分类号： G21K7/00 , H01J35/06 , H01J35/12
CPC分类号： H01J35/065 , G21K7/00 , H01J35/12 , H01J2235/1204 , H01J2235/1291 , H01J2235/186
摘要： To provide an X-ray microscopic inspection apparatus capable of performing non-destructive inspection with high resolving power equal to or less than 0.1 μm in a very short period, and largely contributing to the nano-technology field. In the X-ray microscopic inspection apparatus having X-ray generating means for generating an X-ray by allowing an electron beam from an electron source to impinge on a target for X-ray generation, for inspecting an object to be inspected by utilizing the X-ray, a magnetic field superposition lens having a magnetic field generating portion disposed in the vicinity of an electron generating portion of an electron gun is included as a component element of the X-ray generating means. Further, the apparatus includes a liquid metal electron source using liquid metal or a thermal field emission electron source as the electron source, as a component element of the X-ray generating means. Furthermore, the apparatus includes a target with a heat sink using CVD diamond as the heat sink as the target for X-ray generation, as a component element of the X-ray generating means.
摘要翻译：本发明提供一种X射线显微镜检查装置，其能够在非常短的时间内以高分辨能力进行0.1μm以下的非破坏性检查，并且在很大程度上有助于纳米技术领域。在具有用于通过使来自电子源的电子束撞击到X射线产生用靶上而产生X射线的X射线显微镜检查装置中，为了利用作为X射线产生装置的构成要素，包括设置在电子枪的电子发生部附近的具有磁场产生部的磁场叠加透镜。此外，该装置包括使用液态金属或热场发射电子源作为电子源的液态金属电子源作为X射线产生装置的组成元件。此外，该装置包括具有使用CVD金刚石作为散热器作为X射线产生的目标的散热器的靶，作为X射线产生装置的组成元件。

3. 发明授权

US07221731B2 X-ray microscopic inspection apparatus 有权
标题翻译： X线显微镜检查仪
公开(公告)号：US07221731B2
公开(公告)日：2007-05-22
申请号：US10719887
申请日：2003-11-21
申请人： Keiji Yada , Hiromi Kai , Yasushi Saito
发明人： Keiji Yada , Hiromi Kai , Yasushi Saito
IPC分类号： G21K7/00
CPC分类号： G21K7/00 , G01N23/04
摘要： To provide an X-ray microscopic inspection apparatus capable of performing non-destructive inspection with high resolving power within a very short period, and having advantageous functions such as a high precision electron probe control function, a CT function, an elemental analysis function, and a target switching function. The apparatus includes a magnetic superposition lens having a magnetic field generating portion disposed in the vicinity of an electron generating portion of an electron gun; reflected electron detecting means having a detecting portion disposed above the target for X-ray generation, for detecting a reflected electron from the target; and electron image generating means for performing imaging of a target surface utilizing the signals from the reflected electron detecting means, wherein the apparatus is arranged so that alignment including focus adjustment to the target for X-ray generation and astigmatism correction may be performed based on image information of the electron image. Further, the apparatus is equipped with functions such as the electron probe control function, the CT function, the electron axis alignment function the elemental analysis function, and the target switching function.
摘要翻译：提供能够在很短的时间内以高分辨能力进行非破坏性检查的X射线显微镜检查装置，具有高精度电子探针控制功能，CT功能，元素分析功能和目标切换功能。该装置包括具有设置在电子枪的电子产生部分附近的磁场产生部分的磁性叠加透镜; 反射电子检测装置，具有设置在用于X射线产生的目标上方的检测部分，用于检测来自靶的反射电子; 以及电子图像生成装置，用于利用来自反射电子检测装置的信号进行目标表面的成像，其中，该装置被布置成使得可以基于图像执行包括对于X射线产生的目标的焦点调整和像散校正的对准电子图像的信息。此外，该装置具有电子探针控制功能，CT功能，电子轴对准功能，元素分析功能和目标切换功能等功能。

4. 发明授权

US6046793A Proximity printing device with variable irradiation angle 失效
标题翻译：具有可变照射角度的接近式打印装置
公开(公告)号：US6046793A
公开(公告)日：2000-04-04
申请号：US025732
申请日：1998-02-18
申请人： Yoneta Tanaka , Hiromi Kai
发明人： Yoneta Tanaka , Hiromi Kai
IPC分类号： G03F7/20 , G03B27/54 , H01L21/027 , G03B27/42
CPC分类号： G03B27/54
摘要： A proximity printing device in which the angle of the light with which a workpiece is irradiated can be changed has an exit part attached on a base and a light source part supported by two bearings. Light emitted from a lamp is focused by an oval focusing mirror and is radiated onto the workpiece via a mask. In one embodiment, two ends of the base are joined to guides of arc-shaped arms. Rotating the base tilts the exit part and the workpiece can be obliquely irradiated with light. Because the light source part is held by two bearings, the lamp of the light source part can be held in a vertical state even when the base is tilted. Furthermore, the direction of motion of the light source part can be limited by means of a ball spline or the like to a horizontal direction, and can be moved by means of a drive so that the exit part can be tilted while holding the light source part vertical.
摘要翻译：可以改变其中照射工件的光的角度的接近打印装置具有附接在基部上的出口部分和由两个轴承支撑的光源部分。从灯发出的光由椭圆形聚焦镜聚焦，并通过掩模辐射到工件上。在一个实施例中，基座的两个端部连接到弧形臂的引导件。旋转基座倾斜出口部分，工件可以用光倾斜照射。由于光源部分由两个轴承保持，所以即使当基座倾斜时，光源部分的灯也可以保持在垂直状态。此外，光源部的运动方向可以通过滚珠花键等在水平方向上受到限制，并且可以通过驱动来移动，使得出射部能够在保持光源的同时倾斜部分垂直。

5. 发明授权

US6003828A Means for supporting a mask 失效
标题翻译：支持面具的手段
公开(公告)号：US6003828A
公开(公告)日：1999-12-21
申请号：US85017
申请日：1998-05-28
申请人： Takashi Kawahashi , Hiromi Kai
发明人： Takashi Kawahashi , Hiromi Kai
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , F16M13/00 , G03B27/58 , G03B27/62
CPC分类号： G03F7/707 , G03F7/2002 , H01L21/682
摘要： To prevent tilting or bending of a large mask frame holder and at the same time to prevent distortion when the mask holding frame is attached to a support base by ball plungers in three of the four corner areas of a mask holding frame that engage V groove bodies which face the ball plungers on the surface of the base, compression springs are provided in those three corners which pre-stress the mask holding frame toward the support base while a compression spring is provided between the remaining corner area of the mask holding frame and the base which acts in a direction pressing the mask holding frame away from the support base, thereby preventing the mask holding frame from bending or tilting. As an alternative, in each of the three pre-stressed corner areas of the mask holding frame, instead of a compression spring, an elastic attachment component in the form of a bracket with spring-like legs mounted to the supporting component can be provided.
摘要翻译：为了防止大面罩框架保持架的倾斜或弯曲，并且同时防止当将面罩保持框架通过球形插塞安装在支撑座上时在面罩保持框架的四个角区域中接合V形槽体的同时防止变形其面对基座表面上的球形突起，压缩弹簧被设置在那些三个角部，这三个角部将荫罩保持框架朝向支撑基座预压，同时在掩模保持框架的剩余拐角区域和基部，其沿着将荫罩保持框架远离支撑基座的方向作用，从而防止荫罩保持框架弯曲或倾斜。作为替代方案，在掩模保持框架的三个预应力角区域中的每一个中，代替压缩弹簧，可以提供具有安装到支撑部件上的弹簧状支架的支架形式的弹性附接部件。

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