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1. 发明授权

US06998738B2 Plain surface stage apparatus 失效
标题翻译：平面平台装置
公开(公告)号：US06998738B2
公开(公告)日：2006-02-14
申请号：US10686636
申请日：2003-10-17
申请人： Yoneta Tanaka
发明人： Yoneta Tanaka
IPC分类号： H02K41/00
CPC分类号： G03F7/70716
摘要： A plain surface stage apparatus includes a platen having a plain surface, stationary type supports comprising at least three supporting members, and displacement type supports, each of which supports the platen and forms a displacement type supporting point at a position other than those of supporting points formed by the stationary type supports, wherein the displacement type supports expand and contract in a direction perpendicular to the plain surface of the platen so as to be displaced, and holds a selected displaced state of the displacement type supports.
摘要翻译：普通表面平台装置包括具有平坦表面的压板，包括至少三个支撑构件的固定型支撑件和位移型支撑件，每个支撑构件支撑压板并在支撑点以外的位置处形成位移型支撑点由固定型支撑件形成，其中位移型支撑件在垂直于压盘平面的方向上伸展和收缩以便移动，并且保持位移型支撑件的选定位移状态。

2. 发明授权

US5543890A Process and device for adjusting the distance between a workpiece and a mask 失效
标题翻译：用于调节工件和面罩之间的距离的工艺和装置
公开(公告)号：US5543890A
公开(公告)日：1996-08-06
申请号：US271950
申请日：1994-07-08
申请人： Yoneta Tanaka , Shoichi Okada
发明人： Yoneta Tanaka , Shoichi Okada
IPC分类号： G03F7/20 , G03F9/02 , H01L21/68 , G03B27/42 , G03B27/04 , G03B27/44
CPC分类号： G03F7/70691 , H01L21/682
摘要： A process and device for adjusting distance for purposes of parallel positioning of a workpiece relative to a mask at a preset distance in which production can be done easily and with low costs. A workpiece is held at a distance from a mask on a work-holding fixture and one of the work-holding fixture and a mask carrier carrying the mask is moved by a moving device toward the other to bring the workpiece comes into contact with the mask. After such contact has occurred, movement of the moving device is continued until a signal is transmitted to a system controller from each of at least three alignment devices which are arranged on the work-holding fixture or the mask carrier, the alignment devices having calibration device which essentially begin to move beginning at a time at which the workpiece and mask come into contact with one another and can no longer execute any further relative movement. Movement of the work-holding fixture or the mask carrier is stopped when the system controller receives a signal from all of the calibration devices, which thus is assessed as achievement of a parallel alignment of the workpiece and mask relative to one another, at which time the displacement of the calibration device of each alignment device is fixed. Thereafter, the direction of movement of the one of the work-holding fixture and the mask carrier is reversed until the desired spacing distance is achieved.
摘要翻译：用于调整距离的过程和装置，用于将工件相对于掩模平行定位在预定的距离内，在该距离内可以容易且成本低廉地进行生产。工件被保持在工件夹持器上的掩模一定距离处，并且保持工具中的一个和承载掩模的掩模载体由移动装置朝向另一个移动以使工件与掩模接触。在发生这样的接触之后，移动装置的运动继续进行，直到信号从设置在保持工具或掩模载体上的至少三个对准装置中的每一个传送到系统控制器，对准装置具有校准装置其基本上开始从工件和掩模彼此接触的时间开始移动，并且不能再执行任何进一步的相对运动。当系统控制器接收到来自所有校准装置的信号时，保持固定装置或掩模载体的移动被停止，因此被评估为工件和掩模相对于彼此的平行对准的实现，此时每个对准装置的校准装置的位移是固定的。此后，保持夹具和掩模载体之一的移动方向相反，直到实现期望的间隔距离。

3. 发明授权

US06232023B1 Contact exposure process and device 失效
标题翻译：接触曝光过程和设备
公开(公告)号：US06232023B1
公开(公告)日：2001-05-15
申请号：US09299748
申请日：1999-04-27
申请人： Toshiyuki Matsuki , Yoneta Tanaka
发明人： Toshiyuki Matsuki , Yoneta Tanaka
IPC分类号： G03F720
CPC分类号： G03F7/70691 , G03F7/7035
摘要： A contact exposure device and process in which there is no danger of damage to the mask, and in which the workpiece is not damaged is achieved by a back up ring or the like being provided between a mask carrier and a workpiece carrier. The workpiece carrier and the mask carrier are moved apart from one another by a stipulated distance. The mask and the workpiece are attached by vacuum suction or the like on the mask carrier and the workpiece carrier, respectively. A subatmospheric pressure is produced in the space between the mask and the workpiece. Since the workpiece carrier and the mask carrier are moved apart from one another by a stipulated distance, the mask does bend when the pressure is reduced, but the mask and the workpiece do not come into contact. In this state, air is supplied from a compressor to openings in the workpiece carrier, causing the workpiece to be raised and arranged tightly against the mask, at which point, exposure is performed.
摘要翻译：通过在掩模载体和工件载体之间设置有备用环等，可以实现接触曝光装置和其中没有损坏掩模的危险并且其中工件不被损坏的过程。工件载体和掩模载体彼此分开规定的距离。掩模和工件分别通过真空吸附等附着在掩模载体和工件载体上。在掩模和工件之间的空间中产生低于大气压的压力。由于工件载体和掩模载体彼此间隔规定的距离移动，所以当压力降低时掩模弯曲，但掩模和工件不接触。在这种状态下，空气从压缩机供给到工件载体上的开口，使得工件被升高并紧密地布置在掩模上，此时进行曝光。

4. 发明授权

US6046793A Proximity printing device with variable irradiation angle 失效
标题翻译：具有可变照射角度的接近式打印装置
公开(公告)号：US6046793A
公开(公告)日：2000-04-04
申请号：US025732
申请日：1998-02-18
申请人： Yoneta Tanaka , Hiromi Kai
发明人： Yoneta Tanaka , Hiromi Kai
IPC分类号： G03F7/20 , G03B27/54 , H01L21/027 , G03B27/42
CPC分类号： G03B27/54
摘要： A proximity printing device in which the angle of the light with which a workpiece is irradiated can be changed has an exit part attached on a base and a light source part supported by two bearings. Light emitted from a lamp is focused by an oval focusing mirror and is radiated onto the workpiece via a mask. In one embodiment, two ends of the base are joined to guides of arc-shaped arms. Rotating the base tilts the exit part and the workpiece can be obliquely irradiated with light. Because the light source part is held by two bearings, the lamp of the light source part can be held in a vertical state even when the base is tilted. Furthermore, the direction of motion of the light source part can be limited by means of a ball spline or the like to a horizontal direction, and can be moved by means of a drive so that the exit part can be tilted while holding the light source part vertical.
摘要翻译：可以改变其中照射工件的光的角度的接近打印装置具有附接在基部上的出口部分和由两个轴承支撑的光源部分。从灯发出的光由椭圆形聚焦镜聚焦，并通过掩模辐射到工件上。在一个实施例中，基座的两个端部连接到弧形臂的引导件。旋转基座倾斜出口部分，工件可以用光倾斜照射。由于光源部分由两个轴承保持，所以即使当基座倾斜时，光源部分的灯也可以保持在垂直状态。此外，光源部的运动方向可以通过滚珠花键等在水平方向上受到限制，并且可以通过驱动来移动，使得出射部能够在保持光源的同时倾斜部分垂直。

5. 发明授权

US5940528A Process for positioning of a mask relative to another mask, or masks relative to a workpiece and device for executing the process 失效
标题翻译：用于相对于另一个掩模定位掩模的工艺，或相对于工件和设备进行掩模以执行该过程
公开(公告)号：US5940528A
公开(公告)日：1999-08-17
申请号：US688006
申请日：1996-07-29
申请人： Yoneta Tanaka , Manabu Goto
发明人： Yoneta Tanaka , Manabu Goto
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G06K9/00
CPC分类号： G03F9/7026 , G03F7/70425 , G03F9/7003 , G03F9/7084
摘要： A process for positioning, in which a dummy is not used, in which multichromatic light can be used as the light source for purposes of alignment, and in which aberration correction is unnecessary, and a device for executing the process is achieved according to the invention by executing projection onto a first mask by projection lenses in which at least the workpiece facing sides of the lenses are telocentric. In a state in which a workpiece is remote, light with exposure wavelengths is emitted from a light irradiation part onto a second mask. The first mask (or second mask) is moved such that the projected images of the alignment marks of the second mask and the alignment marks of the first mask come to lie on top of one another. Furthermore, the irradiation light is branched off by beam splitters and positions of the alignment marks of the second mask are stored. Next, emission of the light with exposure wavelengths is stopped, a workpiece is inserted into a predetermined position, from another light irradiation part light multichrome with nonexposure wavelengths is emitted, positions of the alignment marks of the workpiece are determined and the workpiece is moved to bring these alignment marks into position on top of the stored position of the alignment marks of the second mask.
摘要翻译：用于定位的方法，其中不使用虚拟物，其中多色光可以用作对准的光源，并且其中不需要像差校正，并且根据本发明实现了用于执行该处理的装置通过投影透镜执行投影到第一掩模上，其中透镜的至少面向工件的侧面是偏心的。在工件远程的状态下，将曝光波长的光从光照射部发射到第二掩模。移动第一掩模（或第二掩模），使得第二掩模的对准标记的投影图像和第一掩模的对准标记相互置于顶部。此外，照射光被分束器分支，并且存储第二掩模的对准标记的位置。接下来，停止具有曝光波长的光的发射，将工件插入到预定位置，从另一个具有非曝光波长的光照射部分的多色度发射，确定工件的对准标记的位置，并将工件移动到将这些对准标记放置在第二掩模的对准标记的存储位置的顶部的位置。

6. 发明授权

US6072915A Process for pattern searching and a device for positioning of a mask to a workpiece 失效
标题翻译：用于图案搜索的工艺和用于将掩模定位到工件上的装置
公开(公告)号：US6072915A
公开(公告)日：2000-06-06
申请号：US782330
申请日：1997-01-13
申请人： Yoneta Tanaka
发明人： Yoneta Tanaka
IPC分类号： G01B11/00 , G03F9/00 , G06T1/00 , G06T7/60 , G06K9/36
CPC分类号： G03F9/70 , G03F9/00
摘要： A process for pattern searching in which position coordinates of patterns on a workpiece with a rough surface can be determined automatically and with high precision, and a device for executing the process are achieved by CCD cameras and the like picking up patterns which are located on a workpiece with a rough surface, and which are formed only by intersecting lines, and by a storage means storing light-dark signals. Furthermore, according to the invention, the image signals are integrated in directions which are each parallel to the lines of the patterns, by which integral signals .SIGMA.Xn, .SIGMA.Yn are determined. By integrating the image signals, the images which are formed as a result of surface roughness are averaged. The integration signals clearly yield boundary positions of the patterns, and by differentiating these integral signals, the pattern positions are determined based on their peak positions.
摘要翻译：可以自动和高精度地确定具有粗糙表面的工件上的图案的位置坐标的图案搜索的处理，并且用于执行该处理的装置通过CCD相机等实现，其拾取图案位于具有粗糙表面的工件，并且仅由相交线形成，以及存储暗黑色信号的存储装置。此外，根据本发明，图像信号被集成在与图案的线平行的方向上，由此确定积分信号SIGMA Xn，SIGMA Yn。通过对图像信号进行积分，将作为表面粗糙度的结果形成的图像进行平均。积分信号明显地产生了图案的边界位置，并且通过区分这些积分信号，基于它们的峰值位置来确定图案位置。

7. 发明授权

US5934780A Polarized light irradiation device for purposes of optical alignment of an alignment layer of a liquid crystal cell element 失效
标题翻译：偏振光照射装置，用于液晶单元元件的取向层的光学取向
公开(公告)号：US5934780A
公开(公告)日：1999-08-10
申请号：US928335
申请日：1997-09-12
申请人： Yoneta Tanaka
发明人： Yoneta Tanaka
IPC分类号： G02F1/1337 , G02B5/30
CPC分类号： G02B5/3066 , G02F1/133788
摘要： A polarized light irradiation device in which formation of an alignment layer of a liquid crystal cell element is enabled by optical alignment is obtained by the fact that light which contains UV light and which is emitted from a discharge lamp is focused by an oval focusing mirror and is reflected by a first flat mirror. This light is incident via a shutter on an integrator lens. The light emerging from the integrator lens is reflected by a second flat mirror and is converted into parallel light by a collimation lens, and is incident in the polarization element. In the polarization element, there are several glass plates spaced parallel to one another and inclined by the Brewster angle relative to the incident light. The polarization element transmits the P-polarized light and reflects the S-polarized light for the most part. The P-polarized light which has emerged from the polarization element irradiates a workpiece via a mask.
摘要翻译：通过光学取向来实现液晶单元元件的配向层的形成的偏振光照射装置是通过以下事实获得的：通过椭圆形聚焦镜将从放电灯发出的含有紫外光的光聚焦，被第一平面镜反射。该光通过积分器透镜上的快门入射。从积分透镜出射的光被第二平面镜反射，并通过准直透镜转换成平行光，入射到偏振元件中。在偏振元件中，有几个彼此平行间隔开的玻璃板，相对于入射光倾斜布鲁斯特角。偏振元件透射P偏振光并且反射S偏振光大部分。偏振元件出现的P偏振光通过掩模照射工件。

8. 发明授权

US06525804B1 Exposure device capable of aligning while moving mask 失效
标题翻译：曝光装置能够在移动面罩时对准
公开(公告)号：US06525804B1
公开(公告)日：2003-02-25
申请号：US09762300
申请日：2001-02-08
申请人： Yoneta Tanaka
发明人： Yoneta Tanaka
IPC分类号： G03B2742
CPC分类号： G03F9/7003 , G03F7/70791 , G03F9/7011
摘要： An exposure device and method that transfers a pattern on a mask onto a workpiece including a movable mask stage that holds the mask with the pattern, an alignment microscope movably mounted relative to the workpiece and is adapted to detect a mask alignment mark formed on the mask and a workpiece alignment mark formed on the workpiece, and a control unit adapted to move the mask stage to align the mask alignment mark and the workpiece alignment mark to thereby align the mask and the workpiece. In one embodiment, the alignment microscope is integrated with the mask stage and moves with the mask stage. In another embodiment, the alignment microscope includes an alignment microscope drive device that allows independent movement of the alignment microscope relative to the mask stage. In both embodiments, the control unit may be adapted to move the alignment microscope in search for the workpiece alignment mark if the workpiece alignment mark is initially not detected to be within a field of the alignment microscope.
摘要翻译：一种将掩模上的图案转印到工件上的曝光装置和方法，所述工件包括将所述掩模保持在所述图案上的可移动掩模台，相对于所述工件可移动地安装的对准显微镜，并且适于检测形成在所述掩模上的掩模对准标记以及形成在工件上的工件对准标记，以及控制单元，其适于移动掩模台以对准掩模对准标记和工件对准标记，从而对准掩模和工件。在一个实施例中，对准显微镜与掩模台一体化并与掩模台一起移动。在另一个实施例中，对准显微镜包括对准显微镜驱动装置，其允许对准显微镜相对于掩模台的独立移动。在两个实施例中，如果最初没有检测到工件对准标记在对准显微镜的场内，则控制单元可以适于移动对准显微镜以搜索工件对准标记。

9. 发明授权

US5881165A Process for the positioning of a mask relative to a workpiece and device for executing the process 失效
标题翻译：用于掩模相对于工件和装置的定位的过程用于执行该过程
公开(公告)号：US5881165A
公开(公告)日：1999-03-09
申请号：US715966
申请日：1996-09-19
申请人： Yoneta Tanaka
发明人： Yoneta Tanaka
IPC分类号： G03F9/00 , H01L21/027 , G06K9/00
CPC分类号： G03F9/70
摘要： A process for positioning a mask relative to a workpiece in which positioning can be done with high accuracy, and which can be advantageously used for step and repeat exposure. An improved device for executing the process of the present invention is also provided. The invention includes a reflection component positioned on a workpiece carrier in a position removed from the workpiece attachment site. The exposure light from an exposure light irradiation device is projected onto the mask and alignment marks provided on the mask are projected onto the reflection component. The alignment mask projection images are detected, their relative positions are stored, and emission of the exposure light terminated. The workpiece carrier, on which a workpiece is placed, is moved into a position in which the mask alignment marks are projected onto the workpiece. Furthermore, nonexposure light is emitted onto the alignment marks of the workpiece, the workpiece alignment marks are detected and their relative positions are determined. Then the workpiece and/or the mask are/is moved such that the mask and workpiece alignment marks come to rest on top of one another.
摘要翻译：用于相对于工件定位掩模的方法，其中可以高精度地进行定位，并且其可以有利地用于步进和重复曝光。还提供了用于执行本发明的方法的改进的装置。本发明包括一个反射部件，该反射部件位于从工件附接部位移除的位置上的工件载体上。将来自曝光光照射装置的曝光光投影到掩模上，将设置在掩模上的对准标记投影到反射部件上。检测对准掩模投影图像，存储它们的相对位置，并且终止曝光光的发射。将工件放置在其上的工件载体移动到掩模对准标记投影到工件上的位置。此外，非曝光光被发射到工件的对准标记上，检测到工件对准标记并确定它们的相对位置。然后移动工件和/或掩模，使得掩模和工件对准标记彼此顶部搁置。

10. 发明授权

US5777747A Process for positioning a mask relative to a workpiece and device for performing the process 失效
标题翻译：用于相对于工件定位掩模的过程和用于执行该过程的装置
公开(公告)号：US5777747A
公开(公告)日：1998-07-07
申请号：US564005
申请日：1995-11-29
申请人： Yoneta Tanaka
发明人： Yoneta Tanaka
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/70
摘要： A process and apparatus for positioning a mask relative to a workpiece in which the relative positions of the alignment marks of the alignment mark of the mask and the workpiece can be easily recognized are achieved according to the invention by the fact that alignment light is emitted onto the mask alignment marks, projected images of the alignment marks of the mask are recorded by alignment units and undergo image processing, the relative positions are determined and stored, then emission of alignment light is stopped, alignment light is then emitted onto the alignment marks of the workpiece from the partial illumination systems, the alignment marks of the workpiece are recorded and undergo image processing, the relative positions thereof are determined and stored, data of the relative positions of the alignment marks of the mask and workpiece are computed, and relative movement of the workpiece and the mask is produced to position the two alignment marks one on top of the other.
摘要翻译：根据本发明，通过将对准光发射到如下的事实上，实现了掩模相对于工件的定位过程和装置，其中可以容易地识别掩模和工件的对准标记的对准标记的相对位置掩模对准标记，掩模的对准标记的投影图像由对准单元记录并进行图像处理，确定并存储相对位置，然后停止对准光的发射，然后将对准光发射到对来自部分照明系统的工件，工件的对准标记进行记录并进行图像处理，确定并存储其相对位置，计算掩模和工件的对准标记的相对位置的数据，并且相对运动并且产生掩模以将两个对准标记一个放置在另一个的顶部上。

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