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1. 发明授权

US07187143B2 Mover device and semiconductor manufacturing apparatus and method 有权
标题翻译：移动装置及半导体制造装置及方法
公开(公告)号：US07187143B2
公开(公告)日：2007-03-06
申请号：US10781756
申请日：2004-02-20
申请人： Keiji Okada , Yoshitomo Hidaka , Michiro Sugitani , Junichi Murakami , Fumiaki Sato , Mitsukuni Tsukihara , Suguru Hirokawa , Masamitsu Shinozuka
发明人： Keiji Okada , Yoshitomo Hidaka , Michiro Sugitani , Junichi Murakami , Fumiaki Sato , Mitsukuni Tsukihara , Suguru Hirokawa , Masamitsu Shinozuka
IPC分类号： H02P1/00
CPC分类号： H01L21/67709 , Y10T74/15
摘要： A mover device and an ion implanter apparatus having a processing base that reciprocates at a high speed without undesirable noise and vibration are provided. The mover device includes: a fixed base; a movable base that is linearly movable with respect to the fixed base; a processing base that is linearly movable with respect to the movable base; a main linear motor that generates a moving force to move the processing base with respect to the movable base, thereby moving the processing base with respect to the fixed base; and a velocity control unit that controls the moving velocity of the processing base with respect to the fixed base. In this mover device, the movable base is moved by virtue of a reaction force caused by the moving force to move the processing base.
摘要翻译：提供了具有处理基座的移动装置和离子注入机装置，该处理基座高速往复运动而没有不期望的噪声和振动。动子装置包括：固定基座; 可移动基座，其相对于固定基座线性移动; 处理基座，其相对于所述可动基座线性移动; 主线性电动机，其产生相对于可移动基座移动处理基座的移动力，从而相对于固定基座移动处理基座; 以及速度控制单元，其控制所述处理基座相对于所述固定基座的移动速度。在这种移动装置中，可移动基座由于由移动力引起的反作用力而移动，以移动处理基座。

2. 发明授权

US07597531B2 Method of controlling mover device 失效
标题翻译：控制动力装置的方法
公开(公告)号：US07597531B2
公开(公告)日：2009-10-06
申请号：US11044632
申请日：2005-01-28
申请人： Keiji Okada , Michiro Sugitani , Yoshitomo Hidaka , Junichi Murakami , Fumiaki Sato , Mitsukuni Tsukihara , Suguru Hirokawa , Masamitsu Shinozuka
发明人： Keiji Okada , Michiro Sugitani , Yoshitomo Hidaka , Junichi Murakami , Fumiaki Sato , Mitsukuni Tsukihara , Suguru Hirokawa , Masamitsu Shinozuka
IPC分类号： B65H1/00 , C23C16/00 , C23F1/00 , H01L21/306 , H02K41/00
CPC分类号： H01L21/67706 , H01L21/67709 , Y10S414/135
摘要： Embodiments of the invention are directed to a method of controlling a mover device The method includes generating a moving force from a moving force generating unit to move a processing base with respect to a movable base, thereby moving the processing base with respect to a fixed base as a result of the movement of the processing base with respect to the movable base; moving the movable base on the fixed base in the opposite direction to the moving direction of the processing base by virtue of a reaction force caused by the moving force generated from the moving force generating unit to move the processing base, so that the movable base moves in the opposite direction to the moving direction of the processing base on the fixed base. The method further includes controlling the moving velocity of the processing base with respect to the fixed base.
摘要翻译：本发明的实施例涉及一种控制移动器装置的方法。该方法包括从移动力产生单元产生移动力以相对于可移动基座移动处理基座，从而相对于固定基座移动处理基座作为处理基座相对于可移动基座移动的结果; 通过由从移动力产生单元产生的移动力产生的反作用力使处于移动方向的方向与处理基座的移动方向相反的方向移动到固定基座上，以移动处理基座，使得可移动基座移动在与固定基座上的处理基座的移动方向相反的方向上。该方法还包括控制处理基座相对于固定基座的移动速度。

3. 发明申请

US20050188924A1 Method of controlling mover device, cooperative device of mover device, cooperative method of mover device, semiconductor manufacturing device, liquid crystal manufacturing device, and mechanical scan ion implantation device 失效
标题翻译：移动器装置的方法，移动装置的协同装置，移动装置的协作方法，半导体制造装置，液晶制造装置和机械扫描离子注入装置
公开(公告)号：US20050188924A1
公开(公告)日：2005-09-01
申请号：US11044632
申请日：2005-01-28
申请人： Keiji Okada , Michiro Sugitani , Yoshitomo Hidaka , Junichi Murakami , Fumiaki Sato , Mitsukuni Tsukihara , Suguru Hirokawa , Masamitsu Shinozuka
发明人： Keiji Okada , Michiro Sugitani , Yoshitomo Hidaka , Junichi Murakami , Fumiaki Sato , Mitsukuni Tsukihara , Suguru Hirokawa , Masamitsu Shinozuka
IPC分类号： G03F7/20 , G05D3/12 , H01L21/02 , H01L21/027 , H01L21/677 , H01L21/68 , C23C16/00
CPC分类号： H01L21/67706 , H01L21/67709 , Y10S414/135
摘要： A method of controlling a mover device that includes: a fixed base; a movable base that is moveable in a linear direction with respect to the fixed base; a processing base that is movable in a linear direction with respect to the movable base, the linear direction being in parallel with the linear moving direction of the movable base; and a moving force generating unit that is provided between the processing base and the movable base, and forms a main moving unit in cooperation with the processing base and the movable base, includes the steps of: generating a moving force from the moving force generating unit to move the processing base with respect to the movable base, thereby moving the processing base with respect to the fixed base as a result of the movement of the processing base with respect to the movable base; moving the movable base on the fixed base in the opposite direction to the moving direction of the processing base by virtue of a reaction force caused by the moving force generated from the moving force generating unit to move the processing base, so that the movable base moves in the opposite direction to the moving direction of the processing base on the fixed base; and controlling the moving velocity of the processing base with respect to the fixed base.
摘要翻译：一种控制动子装置的方法，包括：固定基座; 可移动基座，其相对于所述固定基座在直线方向上移动; 处理基座，其相对于可动基座在直线方向上移动，所述线性方向与所述可动基座的线性移动方向平行; 以及设置在所述处理基座和所述可动基座之间并与所述处理基座和所述可动基座协作形成主移动单元的移动力产生单元，包括以下步骤：从所述移动力产生单元产生移动力相对于可移动基座移动处理基座，从而由于处理基座相对于可移动基座的移动而相对于固定基座移动处理基座; 通过由从移动力产生单元产生的移动力产生的反作用力使处于移动方向的方向与处理基座的移动方向相反的方向移动到固定基座上，以移动处理基座，使得可移动基座移动在与固定基座上的处理基座的移动方向相反的方向上; 并且控制处理基座相对于固定基座的移动速度。

4. 发明授权

US08096744B2 Wafer processing system, wafer processing method, and ion implantation system 有权
标题翻译：晶圆处理系统，晶圆加工方法和离子注入系统
公开(公告)号：US08096744B2
公开(公告)日：2012-01-17
申请号：US11254854
申请日：2005-10-21
申请人： Keiji Okada , Fumiaki Sato , Hiroaki Nakaoka
发明人： Keiji Okada , Fumiaki Sato , Hiroaki Nakaoka
IPC分类号： H01L21/677
CPC分类号： H01L21/67213 , H01L21/67201 , H01L21/67745
摘要： Two load lock chambers having a load lock pedestal are provided adjacent to a vacuum process chamber through a vacuum intermediate chamber. A passage opening is provided between the vacuum process chamber and the vacuum intermediate chamber. Two wafer retaining arms are installed between a platen device in the vacuum process chamber and the vacuum intermediate chamber. The two wafer retaining arms are reciprocatingly movable between the corresponding load lock pedestals and the platen device while passing through the passage opening and crossing with an overpass each other at different levels. By retaining an unprocessed wafer by one of the wafer retaining arms and retaining a processed wafer by the other wafer retaining arm, transfer of the unprocessed wafer from one of the load lock pedestals to the platen device and transfer of the processed wafer from the platen device to the other load lock pedestal are performed simultaneously.
摘要翻译：具有负载锁定基座的两个负载锁定室通过真空中间室邻近真空处理室设置。在真空处理室和真空中间室之间设有通道开口。两个晶片保持臂安装在真空处理室中的压板装置和真空中间室之间。两个晶片保持臂在相应的负载锁定基座和压板装置之间可往复运动，同时穿过通道开口并与不同级别的立交桥交叉。通过用晶片保持臂中的一个保持未加工的晶片并通过另一个晶片保持臂保持经处理的晶片，将未加工的晶片从负载锁定基座之一转移到压板装置，并将经处理的晶片从压板装置到另一个负载锁定基座同时进行。

5. 发明申请

US20060182532A1 Wafer processing system, wafer processing method, and ion implantation system 有权
标题翻译：晶圆处理系统，晶圆加工方法和离子注入系统
公开(公告)号：US20060182532A1
公开(公告)日：2006-08-17
申请号：US11254854
申请日：2005-10-21
申请人： Keiji Okada , Fumiaki Sato , Hiroaki Nakaoka
发明人： Keiji Okada , Fumiaki Sato , Hiroaki Nakaoka
IPC分类号： B65G1/00
CPC分类号： H01L21/67213 , H01L21/67201 , H01L21/67745
摘要： Two load lock chambers having a load lock pedestal are provided adjacent to a vacuum process chamber through a vacuum intermediate chamber. A passage opening is provided between the vacuum process chamber and the vacuum intermediate chamber. Two wafer retaining arms are installed between a platen device in the vacuum process chamber and the vacuum intermediate chamber. The two wafer retaining arms are reciprocatingly movable between the corresponding load lock pedestals and the platen device while passing through the passage opening and crossing with an overpass each other at different levels. By retaining an unprocessed wafer by one of the wafer retaining arms and retaining a processed wafer by the other wafer retaining arm, transfer of the unprocessed wafer from one of the load lock pedestals to the platen device and transfer of the processed wafer from the platen device to the other load lock pedestal are performed simultaneously.
摘要翻译：具有负载锁定基座的两个负载锁定室通过真空中间室邻近真空处理室设置。在真空处理室和真空中间室之间设有通道开口。两个晶片保持臂安装在真空处理室中的压板装置和真空中间室之间。两个晶片保持臂在相应的负载锁定基座和压板装置之间可往复运动，同时穿过通道开口并与不同级别的立交桥交叉。通过用晶片保持臂中的一个保持未加工的晶片并通过另一个晶片保持臂保持经处理的晶片，将未加工的晶片从负载锁定基座之一转移到压板装置，并将经处理的晶片从压板装置到另一个负载锁定基座同时进行。

6. 发明授权

US08974983B2 Electrical conductive member and polymer electrolyte fuel cell using the same 有权
标题翻译：导电构件和使用其的聚合物电解质燃料电池
公开(公告)号：US08974983B2
公开(公告)日：2015-03-10
申请号：US13130979
申请日：2009-10-20
申请人： Tomokatsu Himeno , Atsushi Miyazawa , Motoki Yaginuma , Keisuke Yamamoto , Keiji Okada , Tsutomu Yamazaki , Yasuhiro Numao , Toshihiko Tsuda
发明人： Tomokatsu Himeno , Atsushi Miyazawa , Motoki Yaginuma , Keisuke Yamamoto , Keiji Okada , Tsutomu Yamazaki , Yasuhiro Numao , Toshihiko Tsuda
IPC分类号： H01M8/10 , H01M8/02 , H01M8/08 , H01M8/12 , H01M8/14
CPC分类号： H01M8/0213 , H01M8/0228 , H01M8/0254 , H01M8/083 , H01M8/086 , H01M2008/1095 , H01M2008/1293 , H01M2008/147 , Y02E60/50 , Y02E60/525 , Y02E60/526
摘要： An electrical conductive member includes: an electrical conductive structure including: a substrate; an electrical conductive carbon layer provided on at least one surface of the substrate and containing electrical conductive carbon; and a middle layer interposed between the substrate and the electrical conductive carbon layer. An intensity ratio R (ID/IG) of a D-band peak intensity (ID) to a G-band peak intensity (IG) measured by a Raman scattering spectroscopic analysis in the electrical conductive carbon layer is between 1.4 and 1.9.
摘要翻译：导电构件包括：导电结构，包括：基底; 设置在所述基板的至少一个表面上并且包含导电性碳的导电性碳层; 以及介于基板和导电性碳层之间的中间层。通过导电性碳层中的拉曼散射光谱分析测定的D带峰强度（ID）与G带峰强度（IG）的强度比R（ID / IG）为1.4〜1.9。

7. 发明授权

US07820607B2 Viscosity modifier for lubricating oils, additive composition for lubricating oils, and lubricating oil compositions 有权
标题翻译：用于润滑油的粘度调节剂，用于润滑油的添加剂组合物和润滑油组合物
公开(公告)号：US07820607B2
公开(公告)日：2010-10-26
申请号：US11662139
申请日：2005-09-08
申请人： Akihiro Matsuda , Ryousuke Kaneshige , Satoshi Ikeda , Keiji Okada
发明人： Akihiro Matsuda , Ryousuke Kaneshige , Satoshi Ikeda , Keiji Okada
IPC分类号： C10M143/00
CPC分类号： C08F210/06 , C08F4/65908 , C08F4/65912 , C08F210/16 , C08F2420/02 , C10M143/06 , C10M143/08 , C10M2203/1006 , C10M2205/022 , C10N2220/021 , C10N2220/022 , C10N2230/02 , C08F4/6592 , C08F210/14 , C08F2500/17 , C08F2500/03 , C08F2500/20 , C10M2205/026 , C10M2205/024 , C10M2205/028
摘要： A viscosity modifier for lubricating oils or an additive composition for lubricating oils, which is excellent in oil-thickening properties and can provide lubricating oil compositions excellent in low-temperature characteristics and handleability at low temperatures; and lubricating oil compositions excellent in low-temperature characteristics and handleability at low temperatures. The viscosity modifier comprises an ethylene/α-olefin copolymer (B) which comprises (i) a structural unit derived from ethylene, (ii) a structural unit derived from an α-olefin having 3 to 19 carbon atoms, and (iii) a structural unit derived from a higher α-olefin having 4 to 20 carbon atoms whose carbon number is by one or more larger than that of the α-olefin having the unit (ii) which has the following properties of (1) and (2): (1) the contents of units (i), (ii) and (iii) are 25-49 mol %, 15-55 mol %, and 9-40 mol % respectively (with the proviso that the total of the units (i), (ii), and (iii) is 100 mol %) and (2) the intrinsic viscosity [η] is 0.5 to 5.0 dl/g.
摘要翻译：一种用于润滑油的粘度调节剂或润滑油添加剂组合物，其油增稠性能优异，并且可以提供低温特性和低温处理性优异的润滑油组合物; 以及在低温下具有优异的低温特性和可操作性的润滑油组合物。粘度调节剂包括乙烯/α-烯烃共聚物（B），其包含（i）衍生自乙烯的结构单元，（ii）衍生自具有3至19个碳原子的α-烯烃的结构单元，和（iii）具有碳原子数为1以上的具有碳原子数4〜20的高级α-烯烃的结构单元比具有（1）和（2）的以下性质的具有单元（ⅱ）的α-烯烃的碳原子数为1以上，：（1）单位（i），（ii）和（iii）的含量分别为25-49mol％，15-55mol％和9-40mol％（条件是单位（ i），（ii）和（iii）为100摩尔％）和（2）特性粘度[ηe]为0.5〜5.0dl / g。

8. 外观设计

USD595327S1 Microscope 有权
公开(公告)号：USD595327S1
公开(公告)日：2009-06-30
申请号：US29293822
申请日：2007-12-13
申请人： Keiji Okada , Yuichiro Hashimoto , Takashi Yoneyama
设计人： Keiji Okada , Yuichiro Hashimoto , Takashi Yoneyama

9. 外观设计

USD588153S1 Transitional image for a portion of a display screen of a digital camera 有权
公开(公告)号：USD588153S1
公开(公告)日：2009-03-10
申请号：US29294256
申请日：2007-12-31
申请人： Keiji Okada
设计人： Keiji Okada

10. 发明申请

US20080188621A1 Rubber Composition and Use Thereof 审中-公开
标题翻译：橡胶组合物及其用途
公开(公告)号：US20080188621A1
公开(公告)日：2008-08-07
申请号：US11587904
申请日：2005-04-28
申请人： Kotaro Ichino , Masao Kunizane , Yuji Ishit , Kunihide Hiraoka , Masaaki Kawasaki , Hidetatsu Murakami , Keiji Okada
发明人： Kotaro Ichino , Masao Kunizane , Yuji Ishit , Kunihide Hiraoka , Masaaki Kawasaki , Hidetatsu Murakami , Keiji Okada
IPC分类号： C08L9/02
CPC分类号： C08L21/00 , B60C1/0016 , C08L9/00 , C08L9/02 , C08L23/16 , C08L53/00 , C08L2666/02 , C08L2666/08
摘要： Provided is a rubber composition which can give a tire excellent in braking performance and fuel consumption and which is excellent in mechanical strength and fatigue resistance, and a use thereof.The rubber composition of the present invention contains a (A) 60 to 0.1 parts by weight of a nonconjugated polyene copolymer, which is a random copolymer containing 96 to 70 mol % of the structural units derived from α-olefin (A1) and 4 to 30 mol % of the structural units derived from a nonconjugated polyene (A2), and has a glass transition temperature (Tg) of −25 to 20° C., (B) 40 to 99.9 parts by weight of a diene rubber and (C) at least one selected from the group consisting of specific polymers.
摘要翻译：提供一种橡胶组合物，其能够赋予制动性能和燃料消耗优异并且机械强度和耐疲劳性优异的轮胎及其用途。本发明的橡胶组合物含有（A）60〜0.1重量份的非共轭多烯共聚物，其是含有96〜70摩尔％的来自α-烯烃（A1）的结构单元和4〜衍生自非共轭多烯（A2）的结构单元的30摩尔％，玻璃化转变温度（Tg）为-25〜20℃，（B）为40〜99.9重量份的二烯系橡胶，（C ）选自由特定聚合物组成的组中的至少一种。

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