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1. 发明授权

US07672799B2 Defect inspection apparatus and defect inspection method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US07672799B2
公开(公告)日：2010-03-02
申请号：US11846829
申请日：2007-08-29
申请人： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
发明人： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
IPC分类号： G06F19/00 , G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/95607 , G01N21/95623 , G06K9/2036 , G06K2209/19 , G06T7/0006 , G06T2207/30148
摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.
摘要翻译：缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线，空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

2. 发明申请

US20100106443A1 Defect Inspection Apparatus and Defect Inspection Method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20100106443A1
公开(公告)日：2010-04-29
申请号：US12683455
申请日：2010-01-07
申请人： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
发明人： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
IPC分类号： G06F19/00 , G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/95607 , G01N21/95623 , G06K9/2036 , G06K2209/19 , G06T7/0006 , G06T2207/30148
摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.
摘要翻译：缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线，空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

3. 发明申请

US20080059094A1 Defect Inspection Apparatus and Defect Inspection Method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20080059094A1
公开(公告)日：2008-03-06
申请号：US11846829
申请日：2007-08-29
申请人： Kei SHIMURA , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
发明人： Kei SHIMURA , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
IPC分类号： G06F19/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/95607 , G01N21/95623 , G06K9/2036 , G06K2209/19 , G06T7/0006 , G06T2207/30148
摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.
摘要翻译：缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线，空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

4. 发明授权

US07953567B2 Defect inspection apparatus and defect inspection method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US07953567B2
公开(公告)日：2011-05-31
申请号：US12683455
申请日：2010-01-07
申请人： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
发明人： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
IPC分类号： G06F19/00 , G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/95607 , G01N21/95623 , G06K9/2036 , G06K2209/19 , G06T7/0006 , G06T2207/30148
摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.
摘要翻译：缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线，空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

5. 发明授权

US08228496B2 Defect inspection method and defect inspection apparatus 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US08228496B2
公开(公告)日：2012-07-24
申请号：US12830204
申请日：2010-07-02
申请人： Shuichi Chikamatsu , Minori Noguchi , Masayuki Ochi , Kenji Aiko
发明人： Shuichi Chikamatsu , Minori Noguchi , Masayuki Ochi , Kenji Aiko
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N2021/9513
摘要： Provided are a defect inspection apparatus having a large range for receiving light scattering from fine defects while securing a sufficiently large signal strength; and a defect inspection method for the same. The defect inspection apparatus includes: a stage part capable of traveling relative to optical systems with a substrate to be inspected mounted on the stage part; an illumination optical system for illuminating an inspection area on the substrate; a detection optical system for detecting light coming from the inspection area on the substrate; an image sensor for converting, to a signal, an image which is formed on the image sensor by the detection optical system; a signal processor for detecting defects by processing the signal from the image sensor; and a plane reflecting mirror, arranged between the detection optical system and the substrate, for transmitting the light, which comes from the substrate, to the detection optical system.
摘要翻译：提供一种具有大范围的缺陷检查装置，用于在确保足够大的信号强度的同时从细小的缺陷接收光散射; 及其缺陷检查方法。缺陷检查装置包括：能够相对于光学系统行进的载台部件，其中待检查的基板安装在平台部分上; 用于照射基板上的检查区域的照明光学系统; 用于检测来自基板上的检查区域的光的检测光学系统; 用于通过检测光学系统将形成在图像传感器上的图像转换成信号的图像传感器; 信号处理器，用于通过处理来自图像传感器的信号来检测缺陷; 以及布置在检测光学系统和基板之间的用于将来自基板的光传输到检测光学系统的平面反射镜。

6. 发明授权

US07847927B2 Defect inspection method and defect inspection apparatus 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US07847927B2
公开(公告)日：2010-12-07
申请号：US12038274
申请日：2008-02-27
申请人： Shuichi Chikamatsu , Minori Noguchi , Masayuki Ochi , Kenji Aiko
发明人： Shuichi Chikamatsu , Minori Noguchi , Masayuki Ochi , Kenji Aiko
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N2021/9513
摘要： Provided are a defect inspection apparatus having a large range for receiving light scattering from fine defects while securing a sufficiently large signal strength; and a defect inspection method for the same. The defect inspection apparatus includes: a stage part capable of traveling relative to optical systems with a substrate to be inspected mounted on the stage part; an illumination optical system for illuminating an inspection area on the substrate; a detection optical system for detecting light coming from the inspection area on the substrate; an image sensor for converting, to a signal, an image which is formed on the image sensor by the detection optical system; a signal processor for detecting defects by processing the signal from the image sensor; and a plane reflecting mirror, arranged between the detection optical system and the substrate, for transmitting the light, which comes from the substrate, to the detection optical system.
摘要翻译：提供一种具有大范围的缺陷检查装置，用于在确保足够大的信号强度的同时从细小的缺陷接收光散射; 及其缺陷检查方法。缺陷检查装置包括：能够相对于光学系统行进的载台部件，其中待检查的基板安装在平台部分上; 用于照射基板上的检查区域的照明光学系统; 用于检测来自基板上的检查区域的光的检测光学系统; 用于通过检测光学系统将形成在图像传感器上的图像转换成信号的图像传感器; 信号处理器，用于通过处理来自图像传感器的信号来检测缺陷; 以及布置在检测光学系统和基板之间的用于将来自基板的光传输到检测光学系统的平面反射镜。

7. 发明申请

US20080204736A1 Defect Inspection Method and Defect Inspection Apparatus 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20080204736A1
公开(公告)日：2008-08-28
申请号：US12038274
申请日：2008-02-27
申请人： Shuichi Chikamatsu , Minori Noguchi , Masayuki Ochi , Kenji Aiko
发明人： Shuichi Chikamatsu , Minori Noguchi , Masayuki Ochi , Kenji Aiko
IPC分类号： G01N21/94
CPC分类号： G01N21/9501 , G01N2021/9513
摘要： Provided are a defect inspection apparatus having a large range for receiving light scattering from fine defects while securing a sufficiently large signal strength; and a defect inspection method for the same. The defect inspection apparatus includes: a stage part capable of traveling relative to optical systems with a substrate to be inspected mounted on the stage part; an illumination optical system for illuminating an inspection area on the substrate; a detection optical system for detecting light coming from the inspection area on the substrate; an image sensor for converting, to a signal, an image which is formed on the image sensor by the detection optical system; a signal processor for detecting defects by processing the signal from the image sensor; and a plane reflecting mirror, arranged between the detection optical system and the substrate, for transmitting the light, which comes from the substrate, to the detection optical system.
摘要翻译：提供一种具有大范围的缺陷检查装置，用于在确保足够大的信号强度的同时从细小的缺陷接收光散射; 及其缺陷检查方法。缺陷检查装置包括：能够相对于光学系统行进的载台部件，其中待检查的基板安装在平台部分上; 用于照射基板上的检查区域的照明光学系统; 用于检测来自基板上的检查区域的光的检测光学系统; 用于通过检测光学系统将形成在图像传感器上的图像转换成信号的图像传感器; 信号处理器，用于通过处理来自图像传感器的信号来检测缺陷; 以及布置在检测光学系统和基板之间的用于将来自基板的光传输到检测光学系统的平面反射镜。

8. 发明授权

US08134701B2 Defect inspecting method and apparatus 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US08134701B2
公开(公告)日：2012-03-13
申请号：US12774379
申请日：2010-05-05
申请人： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
发明人： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
摘要： A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
摘要翻译：本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化，缺陷的检测灵敏度变得不稳定。该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。

9. 发明申请

US20070216896A1 Defect inspecting apparatus 失效
标题翻译：缺陷检查装置
公开(公告)号：US20070216896A1
公开(公告)日：2007-09-20
申请号：US11717651
申请日：2007-03-14
申请人： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
发明人： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
摘要： A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
摘要翻译：本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化，缺陷的检测灵敏度变得不稳定。该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。

10. 发明授权

US07733474B2 Defect inspection system 失效
标题翻译：缺陷检查系统
公开(公告)号：US07733474B2
公开(公告)日：2010-06-08
申请号：US12081107
申请日：2008-04-10
申请人： Kenji Aiko , Shuichi Chikamatsu , Minori Noguchi , Hisafumi Iwata
发明人： Kenji Aiko , Shuichi Chikamatsu , Minori Noguchi , Hisafumi Iwata
IPC分类号： G01N21/00
CPC分类号： H04N7/18 , G01N21/9501 , G01N21/956 , G01N2021/8822 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increase a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, an oblique detection optics system receives the light from the defect at a reduced elevation angle with respect to the sample surface to reduce light from the sample rough surface, an oxide film rough bottom surface, and a circuit pattern, and increases the amount of the light from the defect and detected. The diameter of a lens is smaller than the diameter of a second lens, resulting in a reduction in the ability to focus the scattered light.
摘要翻译：缺陷检查系统可以抑制来自样品粗糙表面或规则电路图案的光的影响，并且增加来自诸如异物的缺陷的光的增益，以高灵敏度检测样品表面上的缺陷。当使用具有大NA值的透镜时，倾斜检测光学系统相对于样品表面以降低的仰角接收来自缺陷的光，以减少来自样品粗糙表面的光，氧化膜粗糙的底表面和电路图案，并且增加来自缺陷的光的量并检测。透镜的直径小于第二透镜的直径，导致聚焦散射光的能力降低。

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