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1. 发明授权

US08577119B2 Wafer surface observing method and apparatus 有权
标题翻译：晶圆表面观察方法及装置
公开(公告)号：US08577119B2
公开(公告)日：2013-11-05
申请号：US11698987
申请日：2007-01-29
申请人： Hiroshi Higashi , Tetsuya Watanabe , Kenji Aiko
发明人： Hiroshi Higashi , Tetsuya Watanabe , Kenji Aiko
IPC分类号： G06K9/00 , G01N21/00
CPC分类号： G01N21/9501 , G01N21/9503
摘要： A wafer surface observing apparatus for inspecting a peripheral portion of an object has (A) a lens system and a CCD camera for taking images of the peripheral portion of the object, (B) storage for storing image data about the taken images, and (C) display for displaying the image data stored in the storage device. In particular, the present apparatus can have functions of rotating the object placed on a prealignment portion, recording images of one full outer periphery of an end portion of the object by the lens system and CCD camera into the location where the orientation flat portions or notched portions of the object are placed in position, accepting the images into the storage device, and displaying the images on a CRT.
摘要翻译：用于检查物体的周边部分的晶片表面观察装置具有（A）用于拍摄物体的周边部分的图像的透镜系统和CCD照相机，（B）用于存储关于拍摄图像的图像数据的存储器和（ C）显示用于显示存储在存储装置中的图像数据。具体地说，本装置具有使放置在预对准部上的物体旋转的功能，通过透镜系统和CCD照相机将物体的端部的一个完整外周的图像记录到定位平面部分或切口的位置将物体的部分放置在适当位置，将图像接收到存储装置中，并将图像显示在CRT上。

2. 发明申请

US20100214561A1 DEFECT INSPECTING APPARATUS 有权
标题翻译：缺陷检查装置
公开(公告)号：US20100214561A1
公开(公告)日：2010-08-26
申请号：US12774379
申请日：2010-05-05
申请人： Shuichi CHIKAMATSU , Minori NOGUCHI , Kenji AIKO
发明人： Shuichi CHIKAMATSU , Minori NOGUCHI , Kenji AIKO
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
摘要： A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
摘要翻译：本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化，缺陷的检测灵敏度变得不稳定。该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。

3. 发明授权

US07733474B2 Defect inspection system 失效
标题翻译：缺陷检查系统
公开(公告)号：US07733474B2
公开(公告)日：2010-06-08
申请号：US12081107
申请日：2008-04-10
申请人： Kenji Aiko , Shuichi Chikamatsu , Minori Noguchi , Hisafumi Iwata
发明人： Kenji Aiko , Shuichi Chikamatsu , Minori Noguchi , Hisafumi Iwata
IPC分类号： G01N21/00
CPC分类号： H04N7/18 , G01N21/9501 , G01N21/956 , G01N2021/8822 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increase a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, an oblique detection optics system receives the light from the defect at a reduced elevation angle with respect to the sample surface to reduce light from the sample rough surface, an oxide film rough bottom surface, and a circuit pattern, and increases the amount of the light from the defect and detected. The diameter of a lens is smaller than the diameter of a second lens, resulting in a reduction in the ability to focus the scattered light.
摘要翻译：缺陷检查系统可以抑制来自样品粗糙表面或规则电路图案的光的影响，并且增加来自诸如异物的缺陷的光的增益，以高灵敏度检测样品表面上的缺陷。当使用具有大NA值的透镜时，倾斜检测光学系统相对于样品表面以降低的仰角接收来自缺陷的光，以减少来自样品粗糙表面的光，氧化膜粗糙的底表面和电路图案，并且增加来自缺陷的光的量并检测。透镜的直径小于第二透镜的直径，导致聚焦散射光的能力降低。

4. 发明申请

US20100106443A1 Defect Inspection Apparatus and Defect Inspection Method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20100106443A1
公开(公告)日：2010-04-29
申请号：US12683455
申请日：2010-01-07
申请人： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
发明人： Kei Shimura , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
IPC分类号： G06F19/00 , G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/95607 , G01N21/95623 , G06K9/2036 , G06K2209/19 , G06T7/0006 , G06T2207/30148
摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.
摘要翻译：缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线，空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

5. 发明申请

US20090207405A1 DEFECT INSPECTING APPARATUS 失效
标题翻译：缺陷检查装置
公开(公告)号：US20090207405A1
公开(公告)日：2009-08-20
申请号：US12428065
申请日：2009-04-22
申请人： Shuichi CHIKAMATSU , Minori Noguchi , Kenji Aiko
发明人： Shuichi CHIKAMATSU , Minori Noguchi , Kenji Aiko
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
摘要： A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
摘要翻译：本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化，缺陷的检测灵敏度变得不稳定。该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。

6. 发明申请

US20080059094A1 Defect Inspection Apparatus and Defect Inspection Method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20080059094A1
公开(公告)日：2008-03-06
申请号：US11846829
申请日：2007-08-29
申请人： Kei SHIMURA , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
发明人： Kei SHIMURA , Minori Noguchi , Masaaki Ito , Kenji Aiko , Shuichi Chikamatsu , Shigeo Otsuki , Shigeru Abe , Masayuki Ochi , Takuaki Sekiguchi , Hiroyuki Yamashita
IPC分类号： G06F19/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/95607 , G01N21/95623 , G06K9/2036 , G06K2209/19 , G06T7/0006 , G06T2207/30148
摘要： A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane.
摘要翻译：缺陷检查装置包括：各自安装检查对象的阶段，在其上形成具有一组平行线的电路图案，并且每个行与该组线垂直或平行; 照明光学系统，其利用狭缝光照射被检查物体的表面，使得狭缝光束的纵向方向基本上垂直于台阶的行进方向，并且具有由方向形成的第一倾斜角并且将所述狭缝光束的光轴的投影线和所述检查对象的投影线，空间滤波器，根据取向分布的差异来屏蔽或发射检测对象的反射和散射光; 以及检测光学系统，其通过图像传感器检测透过空间滤波器的反射和散射光。此外，照明光学系统在与平面上的狭缝光束的入射方向相反的方向上用另一个狭缝光照射检查对象。

7. 发明授权

US08723536B2 Inspection apparatus, substrate mounting device and inspection method 有权
标题翻译：检查装置，基板安装装置及检查方法
公开(公告)号：US08723536B2
公开(公告)日：2014-05-13
申请号：US13580473
申请日：2011-01-14
申请人： Yusuke Miyazaki , Kenji Aiko , Yuichiro Iijima , Yuichiro Kato
发明人： Yusuke Miyazaki , Kenji Aiko , Yuichiro Iijima , Yuichiro Kato
IPC分类号： G01R31/00
CPC分类号： G01R31/00 , G01N21/9501 , H01L21/67288 , H01L21/6838 , H01L21/68728
摘要： Non-contact type displacement sensors which measure the height of a substrate surface are installed above the substrate in order to hold the upper surface of the substrate at a desired height or to maintain the flatness of the substrate. A substrate mounting device is such that a plurality of grooves and of barriers are provided on the upper surface of a table and air is supplied between the substrate and the table to enable the pressure of air to displace the substrate. In addition, the substrate mounting device has such a structure as to make it possible to deform the substrate into an arbitrary convex-concave shape or to make the substrate flat by feeding back the output of the displacement sensor.
摘要翻译：测量衬底表面高度的非接触型位移传感器安装在衬底上方，以将衬底的上表面保持在期望的高度或保持衬底的平坦度。衬底安装装置使得在桌子的上表面上设置多个凹槽和屏障，并且在衬底和工作台之间提供空气以使得空气的压力能够移动衬底。此外，基板安装装置具有能够使基板变形成任意的凸凹形状或通过反馈位移传感器的输出而使基板平坦化的结构。

8. 发明申请

US20130320216A1 DEVICE FOR DETECTING FOREIGN MATTER AND METHOD FOR DETECTING FOREIGN MATTER 有权
标题翻译：用于检测外部事项的装置和检测外部事项的方法
公开(公告)号：US20130320216A1
公开(公告)日：2013-12-05
申请号：US13984286
申请日：2012-02-01
申请人： Kenji Aiko , Shigeya Tanaka , Yasuko Aoki , Hiroshi Kawaguchi , Kei Shimura
发明人： Kenji Aiko , Shigeya Tanaka , Yasuko Aoki , Hiroshi Kawaguchi , Kei Shimura
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01B11/303 , G01N21/3563 , G01N21/3581 , G01N21/8806 , G01N21/94 , H01M4/0404 , H01M4/139 , Y02E60/122
摘要： The present invention provides a device for detecting foreign matter and a method for detecting foreign matter to detect a foreign matter on a surface of an object such as a film of an electrode mixture etc. or a foreign matter contained in the object, thereby to improve the reliability of the object. By irradiating an object with a terahertz illumination light 100 (wavelength of 4 μm to 10 mm) and detecting a scattered light 660 from an electrode 10 as an example of the object by a scattered light detector 200, a foreign matter on a surface of the electrode 10 or contained in the electrode 10, for example, a metal foreign matter 720, is detected. The electrode 10 is one in which electrode mixture layers 700 each including an active material 701, conductive additive and a binder as components are coated on both surfaces of a collector 710. The scattered light 660 results from a part of a transmitted light 656 reflected by the metal foreign matter 720.
摘要翻译：本发明提供一种检测异物的装置和检测异物以检测诸如电极混合物等的膜或物体中包含的异物的物体的表面上的异物的方法，从而改善对象的可靠性。通过用太赫兹照明光100（波长4μm至10mm）照射物体并通过散射光检测器200从作为物体的实例的电极10检测散射光660，在该表面上的异物检测电极10中或容纳在电极10中的金属异物720。电极10是其中各自包含活性材料701，导电添加剂和作为组分的粘合剂的电极混合物层700涂覆在集电体710的两个表面上的。散射光660由透射光656的一部分反射，金属异物720。

9. 发明申请

US20100271473A1 DEFECT INSPECTION SYSTEM 失效
标题翻译：缺陷检查系统
公开(公告)号：US20100271473A1
公开(公告)日：2010-10-28
申请号：US12770337
申请日：2010-04-29
申请人： Kenji AIKO , Shuichi Chikamatsu , Minori Noguchi , Hisafumi Iwata
发明人： Kenji AIKO , Shuichi Chikamatsu , Minori Noguchi , Hisafumi Iwata
IPC分类号： H04N7/18 , G01N21/88 , G02B3/02
CPC分类号： H04N7/18 , G01N21/9501 , G01N21/956 , G01N2021/8822 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increasing a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, the outer diameter of the lens is 10a, and an angle between the sample surface and a traveling direction of the light from a defect is α1. An oblique detection optics system receives the light from the defect at a reduced elevation angle α2 with respect to the sample surface to reduce light from the sample rough surface, an oxide film rough bottom surface, and a circuit pattern, and to increase the amount of the light from the defect and detected. The diameter 10a of a lens is smaller than the diameter 10b, resulting in a reduction in the ability to focus the scattered light. When a lens with an outer diameter 10c is used to improve the focus ability, the lens interferes with the sample. To avoid the interference, a portion of the lens interfering with the sample is removed. The lens has an aperture larger than the diameter 10b while the lens receives the light scattered at the elevation angle α2, making it possible to improve the ability to detect defects and lens performance simultaneously.
摘要翻译：缺陷检查系统可以抑制来自样品粗糙表面或常规电路图案的光的影响，并且增加来自诸如异物的缺陷的光的增益以高灵敏度检测样品表面上的缺陷。当使用具有大NA值的透镜时，透镜的外径为10a，并且样品表面与来自缺陷的光的行进方向之间的角度为α1。倾斜检测光学系统以相对于样品表面的降低的仰角α2接收来自缺陷的光，以减少来自样品粗糙表面，氧化膜粗糙底表面和电路图案的光，并且增加来自缺陷的光并检测。透镜的直径10a小于直径10b，导致散射光聚焦的能力降低。当使用外径为10c的透镜来提高聚焦能力时，透镜会干扰样品。为了避免干扰，去除了与样品干扰的一部分透镜。透镜具有大于直径10b的孔径，而透镜接收以仰角α2散射的光，从而可以提高同时检测缺陷和透镜性能的能力。

10. 发明授权

US07733475B2 Defect inspecting apparatus 失效
标题翻译：缺陷检查装置
公开(公告)号：US07733475B2
公开(公告)日：2010-06-08
申请号：US12428065
申请日：2009-04-22
申请人： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
发明人： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
摘要： A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
摘要翻译：本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化，缺陷的检测灵敏度变得不稳定。该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。

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