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    • 8. 发明申请
    • MANUFACTURING METHOD OF SINGLE CRYSTAL SEMICONDUCTOR FILM AND MANUFACTURING METHOD OF ELECTRODE
    • 单晶半导体膜的制造方法及电极的制造方法
    • US20110269301A1
    • 2011-11-03
    • US13092249
    • 2011-04-22
    • Sho KATOKazutaka KURIKI
    • Sho KATOKazutaka KURIKI
    • H01L21/20
    • H01L21/76251
    • To provide a method of obtaining a single crystal semiconductor film by a method that is simple and low-cost. A single crystal semiconductor film 11 having compression stress is formed over a surface of a single crystal semiconductor substrate 10 by a vapor phase epitaxial growth method, a film having tensile stress (for example, a thermo-setting resin film 12) is formed over a surface of the single crystal semiconductor film 11, and the single crystal semiconductor substrate 10 and the single crystal semiconductor film 11 are separated from each other by a separation step in which force is applied to the single crystal semiconductor film 11, thereby obtaining a single crystal semiconductor film. Note that as the thermo-setting resin film 12, an epoxy resin film can be used, for example.
    • 提供通过简单且低成本的方法获得单晶半导体膜的方法。 通过气相外延生长法在单晶半导体衬底10的表面上形成具有压应力的单晶半导体膜11,在其上形成具有拉伸应力的膜(例如,热固性树脂膜12) 通过对单晶半导体膜11施加力的分离工序将单晶半导体膜11的表面,单晶半导体基板10和单晶半导体膜11分离,得到单晶 半导体膜。 另外,作为热固性树脂膜12,例如可以使用环氧树脂膜。