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1. 发明授权

US6042647A Nozzle system for feeding treatment liquid such as a liquid developer on a workpiece 失效
标题翻译：用于在工件上进行处理液体如液体显影剂的喷嘴系统
公开(公告)号：US6042647A
公开(公告)日：2000-03-28
申请号：US79993
申请日：1998-05-15
申请人： Kazushi Kawakami , Toshinori Imai
发明人： Kazushi Kawakami , Toshinori Imai
IPC分类号： G03G15/10 , B05C5/00 , B05C5/02 , B05C11/10 , G03F7/30 , H01L21/00 , H01L21/027 , H01L21/306 , B05D1/02 , B65D47/00 , B67D3/00
CPC分类号： H01L21/6715 , B05C5/0225 , G03F7/30
摘要： In a nozzle system for feeding treatment liquid, a storage tank is equipped with a nozzle comprising an opening and a stopcock which opens and closes said opening. When the stopcock opens the opening, a predetermined amount of liquid developer is dropped from the tank onto a wafer through a narrow gap between the outer surface of the stopcock and the inner edge of the opening. Thereby, the large amount of the liquid developer can be discharged and diffused on the entire wafer surface for a short time. Besides, the liquid amount is controlled with ease, and damage to the wafer is reduced, which enables a high quality of the development.
摘要翻译：在用于供给处理液的喷嘴系统中，储罐装备有一个喷嘴，该喷嘴包括开口和一个打开和关闭所述开口的活塞。当活塞打开开口时，预定量的液体显影剂通过活栓的外表面和开口的内边缘之间的窄间隙从罐中落到晶片上。因此，大量的液体显影剂能够在整个晶片表面上短时间地排放和扩散。此外，容易地控制液体量，并且减少了对晶片的损坏，这使得高质量的显影。

2. 发明申请

US20140138590A1 PHOSPHOR FOR DISPERSION-TYPE EL, DISPERSION-TYPE EL DEVICE, AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：用于分散型EL，分散型EL器件的磷光体及其制造方法
公开(公告)号：US20140138590A1
公开(公告)日：2014-05-22
申请号：US14131754
申请日：2012-07-11
申请人： Koichi Wani , Tatsuya Kanda , Emi Hashimoto , Kazushi Kawakami , Sadahiro Yagishita , Fumitaka Iwakura , Taku Nishikawa
发明人： Koichi Wani , Tatsuya Kanda , Emi Hashimoto , Kazushi Kawakami , Sadahiro Yagishita , Fumitaka Iwakura , Taku Nishikawa
IPC分类号： H01J7/02 , B29C43/52 , B29C43/00
CPC分类号： H01J7/02 , B29C43/003 , B29C43/52 , C09K11/584 , C09K11/612 , C09K11/642
摘要： Provided is a phosphor for a dispersion-type EL that may be manufactured in a simple process and may provide stable, high brightness and light emission efficiency. The phosphor for a dispersion-type EL according to the present invention includes a mixture of an electron-accepting phosphor particle (4A) and an electron-donating phosphor particle (4B). The electron-accepting phosphor particle (4A) includes a base particle and an acceptor element added thereto, and the electron-donating phosphor particle (4B) includes a base particle and a donor element added thereto. For example, the base particle is a ZnS particle, the acceptor element is Cu, and the donor element is Cl or Al.
摘要翻译：提供了可以以简单的方法制造的分散型EL的荧光体，并且可以提供稳定的高亮度和发光效率。根据本发明的分散型EL的荧光体包括电子接受荧光体颗粒（4A）和供电子荧光体颗粒（4B）的混合物。受电子荧光体颗粒（4A）包括添加到其中的基础颗粒和受体元素，并且供电子荧光体颗粒（4B）包括添加到其中的基础颗粒和施主元件。例如，基础颗粒是ZnS颗粒，受主元素是Cu，供体元素是Cl或Al。

3. 发明授权

US4899685A Substrate coating equipment 失效
标题翻译：基材涂布设备
公开(公告)号：US4899685A
公开(公告)日：1990-02-13
申请号：US274883
申请日：1988-11-22
申请人： Kazushi Kawakami
发明人： Kazushi Kawakami
IPC分类号： B05C11/06 , B05C11/08 , G03F7/16 , H01L21/027
CPC分类号： G03F7/162 , B05C11/06 , B05C11/08
摘要： This invention relates to a coating equipment to be used for coating a coating solution (coating diffusion agent, photo-resist agent, etc.) on a film which forms patterns of photo mask substrates (hereinafter merely called "substrates") used for production of reticle and photo masks or of glass substrates used for liquid crystal display. It features that said coating equipment comprises of a substrate table (spin head) being formed on the upper part of the spindle, a through hole whose dimension is a little larger than said substrate and whose section is of a reversed-U shape to said spin head being prepared at the central part of the upper part thereof, an aerial stream control frame body having a peripheral wall of a specified height and being provided with an air exhaust hole on said peripheral wall side, both said through hole and said aerial stream control frame body being able to rotate altogether, a doughnut-like cup being provided and arranged so that said aerial stream control frame body can be wrapped at the inside center thereof, an air suction hole of a little higher dimension than the height of the peripheral wall side of said aerial stream control frame body being drilled at the internal face thereof, and the bottom of said cup is interconnected to a pipe equipped with an exhaust fan.
摘要翻译：本发明涉及一种涂覆设备，用于在形成用于生产的光掩模基板（以下简称为“基板”）的图案的膜上涂覆涂布溶液（涂层扩散剂，光致抗蚀剂等）掩模版和光掩模或用于液晶显示的玻璃基板。其特征在于，所述涂覆设备包括形成在心轴的上部的基底台（旋转头），尺寸比所述基底稍大的截面，并且截面为所述旋转的U形头部在其上部的中央部分准备，具有指定高度的周壁的空气流控制框架体，并且在所述周壁侧设置有排气孔，所述通孔和所述空气流控制框架体能够完全旋转，提供并布置环形杯，使得所述空中流量控制框架体可以在其内部中心被包裹，具有比周壁高度稍高的空气吸入孔所述空气流控制框体的一侧在其内表面被钻孔，并且所述杯的底部与配备有排风扇的管道互连。

4. 发明授权

US09305736B2 Phosphor for dispersion-type EL, dispersion-type EL device, and method of manufacturing the same 有权
标题翻译：用于分散型EL的荧光体，分散型EL器件及其制造方法
公开(公告)号：US09305736B2
公开(公告)日：2016-04-05
申请号：US14131754
申请日：2012-07-11
申请人： Koichi Wani , Tatsuya Kanda , Emi Hashimoto , Kazushi Kawakami , Sadahiro Yagishita , Fumitaka Iwakura , Taku Nishikawa
发明人： Koichi Wani , Tatsuya Kanda , Emi Hashimoto , Kazushi Kawakami , Sadahiro Yagishita , Fumitaka Iwakura , Taku Nishikawa
IPC分类号： C09K11/00 , C09K11/08 , C09K11/56 , H05B33/10 , H05B33/14 , H01J7/02 , C09K11/64 , C09K11/58 , C09K11/61 , B29C43/00 , B29C43/52
CPC分类号： H01J7/02 , B29C43/003 , B29C43/52 , C09K11/584 , C09K11/612 , C09K11/642
摘要： Provided is a phosphor for a dispersion-type EL that may be manufactured in a simple process and may provide stable, high brightness and light emission efficiency. The phosphor for a dispersion-type EL according to the present invention includes a mixture of an electron-accepting phosphor particle (4A) and an electron-donating phosphor particle (4B). The electron-accepting phosphor particle (4A) includes a base particle and an acceptor element added thereto, and the electron-donating phosphor particle (4B) includes a base particle and a donor element added thereto. For example, the base particle is a ZnS particle, the acceptor element is Cu, and the donor element is Cl or Al.
摘要翻译：提供了可以以简单的方法制造的分散型EL的荧光体，并且可以提供稳定的高亮度和发光效率。根据本发明的分散型EL的荧光体包括电子接受荧光体颗粒（4A）和供电子荧光体颗粒（4B）的混合物。受电子荧光体颗粒（4A）包括添加到其中的基础颗粒和受体元素，并且供电子荧光体颗粒（4B）包括添加到其中的基础颗粒和施主元件。例如，基础颗粒是ZnS颗粒，受主元素是Cu，供体元素是Cl或Al。

5. 发明授权

US4889069A Substrate coating equipment 失效
标题翻译：基材涂布设备
公开(公告)号：US4889069A
公开(公告)日：1989-12-26
申请号：US274882
申请日：1988-11-22
申请人： Kazushi Kawakami
发明人： Kazushi Kawakami
IPC分类号： B05C11/08 , B05C11/10 , G03F7/16 , H01L21/027
CPC分类号： B05C11/1039 , B05C11/08 , G03F7/162
摘要： This invention relates to a coating equipment to be used for coating a coating solution (coating diffusion agent, photo-resist agent, etc.) on a film which forms patterns of photo mask substrates (hereinafter merely called "substrates") used for production of reticle and photo masks or of glass substrates used for liquid crystal display. It features that said coating equipment comprises of a substrate table (spin head) having vacuum suction holes to set and fix said substrates being formed on the upper part of the spindle, a vessel for wrapping said spin head consisting of a vessel body having a peripheral side wall of a certain fixed height and its coverlid means, and both said vessel body and coverlid being able to be separated, a plurality of small holes and tubes being provided at the lower part of said peripheral side wall with a prompt interval, a doughnut-like cup being arranged and placed so that said doughnut-like cut can wrap said vessel of the above structure inside the center portion of said cup, an air suction hole whose height is a little larger than the outer diameter of said small holes or tubes being drilled and provided on the internal periphery of said cup, and the bottom portion of said cup being interconnected to a pipe furnished with an exhaust fan.
摘要翻译：本发明涉及一种涂覆设备，用于在形成用于生产的光掩模基板（以下简称为“基板”）的图案的膜上涂覆涂布溶液（涂层扩散剂，光致抗蚀剂等）掩模版和光掩模或用于液晶显示的玻璃基板。其特征在于，所述涂覆设备包括具有真空抽吸孔的衬底台（旋转头），以设置和固定形成在心轴的上部的所述衬底，用于包裹所述旋转头的容器，所述容器主体包括具有周边具有一定固定高度的侧壁和其盖板装置，并且所述容器主体和盖板都能够分离，多个小孔和管被提供在所述周边侧壁的下部，具有提示间隔，环形圈配置和放置，使得所述环状切口可以将上述结构的容器包裹在所述杯的中心部分内，空气吸入孔的高度比所述小孔或管的外径稍大被钻孔并设置在所述杯的内周上，并且所述杯的底部与配备有排风扇的管道互连。

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