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1. 发明授权

US06852791B2 Anti-reflection coating forming composition 有权
标题翻译：防反射涂层成型组合物
公开(公告)号：US06852791B2
公开(公告)日：2005-02-08
申请号：US09987367
申请日：2001-11-14
申请人： Kazuo Kawaguchi , Masato Tanaka , Tsutomu Shimokawa
发明人： Kazuo Kawaguchi , Masato Tanaka , Tsutomu Shimokawa
IPC分类号： G03F7/004 , G03F7/09 , C08K3/00
CPC分类号： G03F7/091
摘要： An anti-reflection coating-forming composition is provided. This composition includes a polymer and a solvent. The polymer has a structural unit represented by the formula (1): wherein R1 is a monovalent atom other than a hydrogen atom or a monovalent group, and n is an integer of 0-4, provided that when n is an integer of 2-4, a plural number of R1's are the same or different; R2 and R3 are each a monovalent atom or group; and X is a bivalent group. The anti-reflection coating formed from this composition has a high antireflective effect, does not generate intermixing with a resist film, and enables a good resist pattern profile excellent in resolution and precision in cooperation with a positive or negative resist.
摘要翻译：提供了防反射涂层组合物。该组合物包括聚合物和溶剂。聚合物具有由式（1）表示的结构单元：其中R1是除氢原子或一价基团以外的一价原子，n为0-4的整数，条件是当n为2- 如图4所示，多个R1相同或不同; R2和R3各自为一价原子或基团; X为二价基团。由该组合物形成的抗反射涂层具有高的抗反射效果，不会产生与抗蚀剂膜的混合，并且能够与正或负的抗蚀剂配合，分辨率和精度优异的抗蚀剂图案轮廓良好。

2. 发明申请

US20070248911A1 Pattern forming method and bilayer film 审中-公开
公开(公告)号：US20070248911A1
公开(公告)日：2007-10-25
申请号：US11808508
申请日：2007-06-11
申请人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Kazuo Kawaguchi , Masato Tanaka
发明人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Kazuo Kawaguchi , Masato Tanaka
IPC分类号： G03C1/72
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/0757 , Y10S430/106
摘要： A pattern forming method comprising forming a coating of a radiation-sensitive resin composition, which contains an acid-dissociable group-containing polysiloxane, alkali-insoluble or scarcely alkali-soluble but becoming alkali-soluble when the acid-dissociable group dissociates, on a film containing a polymer with a carbon content of 80 wt % or more and a polystyrene-reduced weight average molecular weight of 500-100,000, an applying radiation to the coating is provided. The method can form minute patterns with a high aspect ratio by suitably selecting a specific etching gas in the dry etching process, without being affected by standing waves.

3. 发明授权

US07244549B2 Pattern forming method and bilayer film 有权
标题翻译：图案形成方法和双层膜
公开(公告)号：US07244549B2
公开(公告)日：2007-07-17
申请号：US10226321
申请日：2002-08-23
申请人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Kazuo Kawaguchi , Masato Tanaka
发明人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Kazuo Kawaguchi , Masato Tanaka
IPC分类号： G03C1/825 , G03F7/039 , G03F7/20
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/0757 , Y10S430/106
摘要： A pattern forming method comprising forming a coating of a radiation-sensitive resin composition, which contains an acid-dissociable group-containing polysiloxane, alkali-insoluble or scarcely alkali-soluble but becoming alkali-soluble when the acid-dissociable group dissociates, on a film containing a polymer with a carbon content of 80 wt % or more and a polystyrene-reduced weight average molecular weight of 500–100,000, an applying radiation to the coating is provided. The method can form minute patterns with a high aspect ratio by suitably selecting a specific etching gas in the dry etching process, without being affected by standing waves.
摘要翻译：一种图案形成方法，包括形成辐射敏感性树脂组合物的涂层，其包含含酸解离基团的聚硅氧烷，碱解不溶性或几乎不碱溶性，当酸解离基解离时变成碱溶性含有碳含量为80重量％以上且聚苯乙烯换算的重均分子量为500〜10000的聚合物的薄膜，提供了对涂层的涂布辐射。该方法可以通过在干蚀刻工艺中适当地选择特定的蚀刻气体而不受驻波的影响而形成具有高纵横比的微小图案。

4. 发明申请

US20080026314A1 Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition 审中-公开
标题翻译：硅烷化合物，聚硅氧烷和辐射敏感性树脂组合物
公开(公告)号：US20080026314A1
公开(公告)日：2008-01-31
申请号：US10576075
申请日：2004-10-14
申请人： Isao Nishimura , Noboru Yamahara , Masato Tanaka , Tsutomu Shimokawa
发明人： Isao Nishimura , Noboru Yamahara , Masato Tanaka , Tsutomu Shimokawa
IPC分类号： G03C5/00
CPC分类号： G03F7/0757 , C07F7/0838 , C07F7/1804 , C08G77/14 , C08G77/24 , G03F7/0045
摘要： A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided.The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10.The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.
摘要翻译：适用作为具有特别优异的ID偏压，深度聚焦（DOF）等的化学增幅抗蚀剂的树脂组分的新型聚硅氧烷，可用作合成聚硅氧烷的原料的新型硅烷化合物和辐射敏感性提供了包含聚硅氧烷的树脂组合物。硅烷化合物由下式（I）表示，聚硅氧烷具有下述式（1）所示的结构单元，式中，R为烷基，R 1，R 2， 2个独立地表示氟原子，低级烷基或低级氟代烷基，n为0或1，k为1或2，i为0至10的整数。该辐射敏感性树脂组合物包含聚硅氧烷和光致酸发生剂。

5. 发明授权

US07037994B2 Acenaphthylene derivative, polymer, and antireflection film-forming composition 有权
标题翻译：苊烯衍生物，聚合物和抗反射膜形成组合物
公开(公告)号：US07037994B2
公开(公告)日：2006-05-02
申请号：US10624678
申请日：2003-07-23
申请人： Hikaru Sugita , Keiji Konno , Masato Tanaka , Tsutomu Shimokawa
发明人： Hikaru Sugita , Keiji Konno , Masato Tanaka , Tsutomu Shimokawa
IPC分类号： C08F32/08 , C08F12/32 , C08F132/08
CPC分类号： C07C69/14 , C07C33/38 , C07C2603/20 , G03F7/091
摘要： Novel compounds acetoxymethylacenaphthylene and hydroxymethylacenaphthyleneare disclosed. A polymer prepared from these novel compounds containing a structural unit of the formula (3), wherein R1 is a hydrogen atom and R2and R3 individually represent a monovalent atom or a monovalent organic group is also disclosed. The polymer is suitable as a component for an antireflection film-forming composition exhibiting a high antireflection effect and not causing intermixing with a resist film.
摘要翻译：公开了新型化合物乙酰氧基甲基苊烯和羟甲基苊。由含有式（3）结构单元的这些新化合物制备的聚合物，其中R 1是氢原子，R 2和R 3， SUP>分别表示一价原子或一价有机基团。聚合物适合作为抗反射膜形成组合物的组分，其具有高抗反射效果并且不会与抗蚀剂膜混合。

6. 发明授权

US11003124B2 Image forming apparatus using special toner and performing fixing condition change control 有权
公开(公告)号：US11003124B2
公开(公告)日：2021-05-11
申请号：US16903734
申请日：2020-06-17
申请人： Masato Tanaka , Keiji Kunimi , Masaki Yoshino , Kazumi Suzuki
发明人： Masato Tanaka , Keiji Kunimi , Masaki Yoshino , Kazumi Suzuki
IPC分类号： G03G15/00 , G03G15/20 , G03G21/04
摘要： An image forming apparatus including an image forming unit, a fixing device, and circuitry is provided. The image forming unit is configured to perform a special image forming operation that forms a color toner image and a special toner image with a color toner and a special toner, respectively, on a recording medium and a normal image forming operation that forms the color toner image without forming the special toner image on the recording medium. The fixing device is configured to fix the color toner image and the special toner image on the recording medium. The circuitry is configured to perform, in the special image forming operation, a toner amount suppression control that makes an amount of the color toner on the recording medium per unit area smaller than that in the normal image forming operation.

7. 发明授权

US08865382B2 Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus, and process for producing electrophotographic photosensitive member 有权
标题翻译：电子照相感光构件，处理盒和电子照相设备，以及用于制造电子照相感光构件的方法
公开(公告)号：US08865382B2
公开(公告)日：2014-10-21
申请号：US13102541
申请日：2011-05-06
申请人： Masaki Nonaka , Masato Tanaka
发明人： Masaki Nonaka , Masato Tanaka
IPC分类号： G03G15/00 , G03G5/147 , G03G5/05 , G03G5/07 , G03G5/06
CPC分类号： G03G5/0609 , G03G5/0542 , G03G5/0546 , G03G5/071 , G03G5/1473 , G03G5/14734 , G03G5/14786 , G03G5/14791 , G03G5/14795
摘要： An electrophotographic photosensitive member having a surface layer containing a polymeric product obtained by polymerizing a specific adamantane compound, a process cartridge and an electrophotographic apparatus which have the electrophotographic photosensitive member, and a process for producing the electrophotographic photosensitive member.
摘要翻译：具有包含通过聚合特定金刚烷化合物获得的聚合物的表面层的电子照相感光构件，具有电子照相感光构件的处理盒和电子照相设备以及用于制造电子照相感光构件的方法。

8. 发明授权

US08859174B2 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus 有权
标题翻译：电子照相感光构件，处理盒和电子照相设备
公开(公告)号：US08859174B2
公开(公告)日：2014-10-14
申请号：US13477876
申请日：2012-05-22
申请人： Masaki Nonaka , Masato Tanaka
发明人： Masaki Nonaka , Masato Tanaka
IPC分类号： G03G5/00
CPC分类号： G03G5/0575 , G03G5/0618 , G03G5/14769
摘要： An electrophotographic photosensitive member has a surface layer that contains a urea compound having two or more urea moieties. Each of the urea moieties has a carbonyl group and two nitrogen atoms. Each of the two nitrogen atoms connects to an alkyl group and a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group.
摘要翻译：电子照相感光构件具有包含具有两个或更多个脲部分的脲化合物的表面层。每个脲部分具有羰基和两个氮原子。两个氮原子中的每一个连接到烷基和取代或未取代的芳基或取代或未取代的亚芳基。

9. 发明授权

US08859172B2 Electrophotographic photosensitive member, method of producing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus 有权
标题翻译：电子照相感光构件，电子照相感光构件的制造方法，处理盒和电子照相设备
公开(公告)号：US08859172B2
公开(公告)日：2014-10-14
申请号：US13477561
申请日：2012-05-22
申请人： Hideaki Nagasaka , Masaki Nonaka , Masato Tanaka
发明人： Hideaki Nagasaka , Masaki Nonaka , Masato Tanaka
IPC分类号： G03G5/047
CPC分类号： G03G5/0517 , G03G5/0546 , G03G5/0592 , G03G5/0596 , G03G5/0614 , G03G5/071 , G03G5/14708 , G03G5/14734 , G03G5/14791
摘要： An electrophotographic photosensitive member has a surface layer that contains a polymer produced by the polymerization of a charge transporting substance having two or more methacryloyloxy groups per molecule. The surface layer contains a quinone derivative at a concentration of 5 ppm or more and 1500 ppm or less of the total mass of the polymer. The quinone derivative is a compound represented by the following formula (1) or a compound represented by the following formula (2) or both.
摘要翻译：电子照相感光构件具有包含通过每分子具有两个以上甲基丙烯酰氧基的电荷输送物质的聚合而生成的聚合物的表面层。表面层含有聚合物总质量为5ppm以上且1500ppm以下的醌衍生物。醌衍生物是由下式（1）表示的化合物或由下式（2）表示的化合物或两者。

10. 发明授权

US08805589B2 Air conditioning operating device and air conditioning operating method 有权
标题翻译：空调操作装置和空调操作方式
公开(公告)号：US08805589B2
公开(公告)日：2014-08-12
申请号：US12899058
申请日：2010-10-06
申请人： Masato Tanaka , Ryouta Dazai
发明人： Masato Tanaka , Ryouta Dazai
IPC分类号： G05D23/00
CPC分类号： F24F11/30 , F24F11/62 , F24F2001/0066
摘要： An outdoor air temperature information acquisition section acquires the outdoor air temperature, a room temperature information acquisition section that acquires room temperature, an air conditioner state information acquisition section that acquires information on the state of heat exchange type air conditioners and the outdoor air cooler, an estimated value calculating section for room temperature during outdoor air cooling calculating the estimated value for room temperature after switching to the complete outdoor air cooling mode that stops the heat exchange type air conditioner and carries out room temperature control by only increasing or decreasing the effect of the outdoor air cooler from the cooling mode mainly using the heat exchange type air conditioner. An estimated value display section for room temperature during outdoor air cooling, a switching instruction input section receiving the switching operation to complete outdoor air cooling from the occupant and a switching section carrying out switching to the complete outdoor air cooling mode according to the switching instruction.
摘要翻译：室外空气温度信息取得部获取室外空气温度，取得室内温度的室内温度信息取得部，获取有关热交换式空调机和室外空气冷却器的状态的信息的空调状态信息取得部，在室外空气冷却后的室内温度的估计值计算部，在切换到停止热交换型空调的完全室外空气冷却模式之后，计算室内温度的推定值，仅通过增加或减少室外空气冷却器从冷却模式主要采用换热式空调。室外空气冷却中的室温的估计值显示部，接收从乘员完成室外空气冷却的切换动作的切换指示输入部以及根据切换指示切换到完全室外空气冷却模式的切换部。

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