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1. 发明授权

US06517987B2 Positive-working presensitized plate useful for preparing a lithographic printing plate 失效
标题翻译：用于制备平版印刷版的正性工作预敏板
公开(公告)号：US06517987B2
公开(公告)日：2003-02-11
申请号：US09811425
申请日：2001-03-20
申请人： Kazuo Fujita , Shiro Tan , Akira Nagashima
发明人： Kazuo Fujita , Shiro Tan , Akira Nagashima
IPC分类号： G03F7023
CPC分类号： G03F7/022 , G03F7/023 , G03F7/0233
摘要： The present invention relates to a positiive-working presensitized plate useful for preparing a lithographic printing plate comprising a positive-working photosensitive composition comprising at least one ester of 1,2-naphthoquinone-2-diazide-5-sulfonic acid, at least one ester of 1,2-naphthoquinone-2-diazide-4-sulfonic acid, and at least one polymer which is insoluble in water and soluble in an aqueous alkaline solution and which comprises at least one group or bond selected from sulfonamide group, urea bond or urethane bond. A lithographic printing plate prepared from the presensitized plate of the present invention shows improvement of chemical-resistance and printing durability, and good sensitivity, coupling property, adaptability to ball-point pen, shelf stability, and stability of sensitivity with time after exposure.
摘要翻译：本发明涉及一种用于制备平版印刷版的正极工作预敏板，其包含正性光敏组合物，其包含至少一种1,2-萘醌-2-重氮化物-5-磺酸酯，至少一种酯的1,2-萘醌-2-二叠氮-4-磺酸，以及至少一种不溶于水并可溶于碱性水溶液的聚合物，其包含至少一个选自磺酰胺基，脲键或氨基甲酸酯键。由本发明的预敏板制备的平版印刷版显示出耐化学性和印刷耐久性的改善，以及良好的灵敏度，偶联性，圆珠笔的适应性，储存稳定性以及曝光后随时间的灵敏度的稳定性。

2. 发明授权

US07144678B2 Lithographic printing plate precursor 失效
公开(公告)号：US07144678B2
公开(公告)日：2006-12-05
申请号：US10109870
申请日：2002-04-01
申请人： Shiro Tan , Kazuo Fujita , Akira Nishioka
发明人： Shiro Tan , Kazuo Fujita , Akira Nishioka
IPC分类号： G03F7/09
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/12 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/0046 , G03F7/0233 , Y10S430/111 , Y10S430/145
摘要： A lithographic printing plate precursor comprises: a support; and an image-forming layer including a fluoroaliphatic group-containing copolymer, wherein the fluoroaliphatic group-containing copolymer contains a repeating unit corresponding to monomer (i) below and a repeating unit corresponding to monomer (ii) below: (i) a specified fluoroaliphatic group-containing monomer, and (ii) at least one of a poly(oxyalkylene) acrylate and a poly(oxyalkylene) methacrylate.

3. 发明授权

US06709800B2 Presensitized plate for preparing lithographic printing plate 失效
标题翻译：用于制备平版印刷版的预感板
公开(公告)号：US06709800B2
公开(公告)日：2004-03-23
申请号：US10211372
申请日：2002-08-05
申请人： Kazuo Fujita , Shiro Tan
发明人： Kazuo Fujita , Shiro Tan
IPC分类号： G03F7033
CPC分类号： G03F7/0382 , G03F7/0046 , G03F7/0233 , G03F7/033 , G03F7/038 , Y10S430/108 , Y10S430/111
摘要： A presensitized plate for preparing a lithographic printing plate comprises a substrate provided thereon with a light-sensitive layer containing a fluoro-aliphatic group-containing copolymer prepared by copolymerizing at least (A) an addition polymerizable monomer having, on a side chain, a fluoro-aliphatic group in which hydrogen atoms are replaced with fluorine atoms and (B) a (meth)acrylate having an ester chain represented by a specific general formula. The use of the foregoing specific fluorine atom-containing polymer permits the formation of a light-sensitive layer having uniform surface condition without causing abnormality in the surface quality due to the foaming phenomenon observed during the production and also permits the production of a positive light-sensitive resin composition having excellent solubility and dispersibility in a developer.
摘要翻译：用于制备平版印刷版的预感板包括其上设置有含有含氟 - 脂族基团的共聚物的感光层，所述光敏层通过至少共聚（A）在侧链上具有氟 - 脂族基团，其中氢原子被氟原子取代，和（B）具有由特定通式表示的酯链的（甲基）丙烯酸酯。使用上述特定含氟原子的聚合物可以形成具有均匀表面状态的感光层，而不会由于在生产过程中观察到的发泡现象而引起表面质量的异常，并且还允许生产正光发射层，敏感性树脂组合物在显影剂中具有优异的溶解性和分散性。

4. 发明授权

US07105270B2 Fluoroaliphatic group-containing copolymer 有权
标题翻译：含氟脂族基团的共聚物
公开(公告)号：US07105270B2
公开(公告)日：2006-09-12
申请号：US10353025
申请日：2003-01-29
申请人： Kazuo Fujita , Shiro Tan
发明人： Kazuo Fujita , Shiro Tan
IPC分类号： G03F7/004 , G03F7/00
CPC分类号： C08F220/22 , G03F7/0046 , G03F7/0233 , G03F7/033 , G03F7/038
摘要： The present invention provides a copolymer comprising repeating units derived from (A) at least one fluoroalkyl (meth) acrylate represented by the following general formula (I) or (II): wherein, X1 represents —O— or —NR3—; R1 represents —H or —CH3; R3 represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 12 carbon atoms, a substituted or unsubstituted aryl group having 6 to 12 carbon atoms or a substituted or unsubstituted aralkyl group having 7 to 24 carbon atoms; R2 represents H or F; m is an integer ranging from 0 to 10; n is an integer of 2 or 3; and o and p each represents an integer of 1 or 2, and (B) at least one polyoxyalkylene group-containing ethylenically unsaturated monomer, and also provides an image-forming composition, a presensitized plate useful for preparing a lithographic printing plate, a paint composition or a photo resist composition comprising the copolymer. The fluoroaliphatic group-containing copolymer can provide a coating composition capable of simultaneously satisfying the requirements for the ability of a coating liquid to wet the base material and the uniform coating ability upon the application of the liquid and the post-processing aptitudes such as the re-coating ability of the coated film and developing ability as well as the foaming ability of the coating liquid.
摘要翻译：本发明提供了包含衍生自（A）至少一种由以下通式（I）或（II）表示的（甲基）丙烯酸氟烷基酯的重复单元的共聚物的共聚物：其中，X 1表示-O - 或-NR 3 - 。 R 1表示-H或-CH 3 3; R 3表示氢原子，取代或未取代的碳原子数1〜12的烷基，取代或未取代的碳原子数3〜12的环烷基，取代或未取代的芳基，6〜12 碳原子或取代或未取代的碳原子数为7〜24的芳烷基; R 2表示H或F; m为0〜10的整数; n为2或3的整数; 和o和p各自表示1或2的整数，和（B）至少一个含聚氧化烯基的烯属不饱和单体，并且还提供成像组合物，用于制备平版印刷版的预敏化板，涂料组合物或包含该共聚物的光致抗蚀剂组合物。含氟脂族基团的共聚物可以提供能够同时满足涂布液润湿基材的能力要求的涂料组合物和在施加液体时的均匀涂布能力以及后处理能力如再次涂膜的涂布能力和显影能力以及涂布液的发泡能力。

5. 发明授权

US06660445B2 Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound 有权
标题翻译：包含乙烯基共聚物和邻萘醌二叠氮化合物的感光组合物
公开(公告)号：US06660445B2
公开(公告)日：2003-12-09
申请号：US09970988
申请日：2001-10-05
申请人： Kazuo Fujita , Shiro Tan
发明人： Kazuo Fujita , Shiro Tan
IPC分类号： G03F7023
CPC分类号： G03F7/0233
摘要： The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A): a compound having an alkaline-soluble group represented by general formula (I), (II) or (III) as defined in the specification, and at least one monomer unit derived from monomer compound (B): (meth)acrylate having poly(oxyalkylene) chain. A lithographic printing plate prepared from a presensitized plate having a photosensitive layer of said photosensitive compound of the present invention shows improvement of abrasion resistance, printing durability, chemical resistance, development latitude, and contamination property.
摘要翻译：本发明涉及包含不溶于水并可溶于碱性水溶液和邻萘醌二叠氮化合物的乙烯基聚合物化合物的光敏化合物，其中所述乙烯基聚合物化合物是包含至少一种衍生自单体化合物的单体单元的共聚物（ A）：具有本说明书中定义的通式（I），（II）或（III）表示的碱溶性基团的化合物和至少一种衍生自单体化合物（B）的单体单元：（甲基）丙烯酸酯具有聚（氧化烯）链。由具有本发明的感光性化合物的感光层的预感板制备的平版印刷版显示耐磨性，印刷耐久性，耐化学性，显影宽容性和污染性的提高。

6. 发明授权

US06830872B2 Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound 失效
标题翻译：具有含有氟高分子化合物的成像层的平版印刷版原版
公开(公告)号：US06830872B2
公开(公告)日：2004-12-14
申请号：US10247656
申请日：2002-09-20
申请人： Kazuyoshi Mizutani , Shiro Tan
发明人： Kazuyoshi Mizutani , Shiro Tan
IPC分类号： G03F7038
CPC分类号： G03F7/0233 , B41C1/1008 , B41C1/1016 , B41C2201/04 , B41C2201/06 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/0046 , G03F7/033 , G03F7/0382 , G03F7/0392 , Y10S430/108 , Y10S430/165
摘要： Disclosed is planographic printing plate precursor comprising a support having disposed thereon an image forming layer containing a fluorine macromolecular compound having a structural unit derived from a monomer represented by the following general formula (I). In the general formula (I), R0 represents a hydrogen atom, a methyl group, a cyano group or a halogen atom. X represents a single bond or a divalent connecting group. R1 to R6 each independently represent a hydrogen atom, an alkyl group, a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. Further, at least one of R1 to R6 represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom.
摘要翻译：公开了平版印刷版原版，其包括载体，其上设置有含有衍生自由以下通式（I）表示的单体的结构单元的氟高分子化合物的成像层。在通式（I）中，R 0表示氢原子，甲基，氰基或卤素原子。 X表示单键或二价连接基团。 R 1〜R 6各自独立地表示氢原子，烷基，氟原子或至少一个氢原子被氟原子取代的烷基。此外，R 1至R 6中的至少一个表示氟原子或至少一个氢原子被氟原子取代的烷基。

7. 发明授权

US06416925B1 Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06416925B1
公开(公告)日：2002-07-09
申请号：US09497281
申请日：2000-02-02
申请人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
发明人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.
摘要翻译：适用于使用波长为250nm或更短，特别是220nm或更短的光源的曝光的正性工作光敏组合物; 包括（A）能够在光化射线或辐射照射时能够产生酸的化合物和（B）包含具有特定结构的脂环族基团的重复单元的树脂，包括金刚烷基，并且具有能够由于作用而分解的基团的酸以增加在碱性显影剂中的溶解度。

8. 发明授权

US5674657A Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers 失效
标题翻译：包含由四种酚类单体制成的碱溶性酚醛清漆树脂的正性光致抗蚀剂组合物
公开(公告)号：US5674657A
公开(公告)日：1997-10-07
申请号：US743592
申请日：1996-11-04
申请人： Shiro Tan , Yasumasa Kawabe , Kenji Honda
发明人： Shiro Tan , Yasumasa Kawabe , Kenji Honda
IPC分类号： C08L61/06 , G03F7/022 , G03F7/023 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0236 , G03F7/022
摘要： The invention is directed to an alkali-soluble novolak binder resin composition made by addition condensation reaction of a phenolic mixture with at least one aldehyde source, the feedstock of said phenolic mixture for the reaction comprising about 33 to about 83 mole percent of meta-cresol; about 1 to about 4 mole percent of para-cresol; about 10 to about 60 mole percent of a phenolic monomer selected from the group consisting of 2,3-xylenol, 3,4-xylenol, 3,5-xylenol and mixtures thereof; and about 5 to about 55 mole percent of a methoxy phenol monomer, the amount of aldehyde source being from about 40 to about 200 percent of the stoichiometric amount needed to react with all of the phenolic moieties in said phenolic mixture, and the alkali-soluble novolak binder resin having a weight average molecular weight (M.sub.w) of about 3,000 to about 20,000 with a molecular weight polydispersity (M.sub.w /M.sub.n) of 1.5-4.0. The invention is also directed to a positive working photoresist made from the composition.
摘要翻译：本发明涉及通过酚类混合物与至少一种醛源的加成缩合反应制备的碱溶性酚醛清漆粘合剂树脂组合物，所述用于反应的酚类混合物的原料包含约33-约83摩尔％的间甲酚 ; 约1至约4摩尔％的对 - 甲酚; 约10至约60摩尔％的选自2,3-二甲苯酚，3,4-二甲苯酚，3,5-二甲苯酚及其混合物的酚单体; 和约5至约55摩尔％的甲氧基酚单体，醛源的量为所述酚类混合物中所有酚部分反应所需化学计量的约40至约200％，碱溶性酚醛清漆粘合剂树脂，重均分子量（Mw）约为3,000至约20,000，分子量多分散性（Mw / Mn）为1.5-4.0。本发明还涉及由该组合物制成的正性工作光致抗蚀剂。

9. 发明授权

US06277541B1 Photosensitive lithographic printing plate 失效
标题翻译：感光平版印刷版
公开(公告)号：US06277541B1
公开(公告)日：2001-08-21
申请号：US09333655
申请日：1999-06-16
申请人： Seiji Uno , Shiro Tan , Mitsuhiro Imaizumi , Keiji Akiyama
发明人： Seiji Uno , Shiro Tan , Mitsuhiro Imaizumi , Keiji Akiyama
IPC分类号： G03C177
CPC分类号： B41C1/1016 , B41C2201/04 , B41C2201/06 , B41C2201/10 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/11 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/111
摘要： A photosensitive lithographic printing plate in which press life, deletion performance, photosensitive layer removability and image reproducibility are compatible with one another, while retaining scumming prevention performance, which comprises an aluminum support hydrophilized after anodic oxidization, an intermediate layer provided thereon containing an alkali-soluble polymer adjusted in a number-average molecular weight (Mn) to the range of 300 to 5,000 by using an initiator in combination with a chain transfer agent in radical polymerization, and a photosensitive layer provided on the intermediate layer.
摘要翻译：其中压印寿命，缺失性能，感光层可除去性和图像再现性彼此兼容的感光性平版印刷版，同时保持防阳离子性能，其包括在阳极氧化后亲水化的铝载体，其上设置有含有碱 - 通过在自由基聚合中使用与链转移剂组合的引发剂和在中间层上设置的感光层，将数均分子量（Mn）调节至300-5,000范围内的可溶性聚合物。

10. 发明授权

US6114089A Positive working photosensitive lithographic printing plate 失效
标题翻译：正性光敏平版印刷版
公开(公告)号：US6114089A
公开(公告)日：2000-09-05
申请号：US55969
申请日：1998-04-07
申请人： Satoshi Takita , Mitsuhiro Imaizumi , Keiji Akiyama , Seiji Uno , Shiro Tan
发明人： Satoshi Takita , Mitsuhiro Imaizumi , Keiji Akiyama , Seiji Uno , Shiro Tan
IPC分类号： B41N3/03 , G03F7/11 , G03C1/77
CPC分类号： B41C1/1016 , G03F7/11 , B41C2201/04 , B41C2201/06 , B41C2201/10 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A positive working photosensitive lithographic printing plate comprising an aluminum substrate and a positive working photosensitive layer, the aluminum substrate having been anodized and rendered water-wettable, wherein an intermediate layer containing a polymer comprising (A) a unit interacting with an alumina layer and (B) a unit interacting with a water-wettable layer is provided between the aluminum substrate and the photosensitive layer. The photosensitive layer and the water-wettable aluminum substrate have good adhesion so that the printing plate has a satisfactory press life.
摘要翻译：一种正性感光性平版印刷版，其特征在于，具有铝基板和正性感光层，所述铝基板经过阳极氧化处理，使其具有水润湿性，其中含有聚合物的中间层包含（A）与氧化铝层相互作用的单元和（ B）在铝基材和感光层之间设置与水可湿性层相互作用的单元。感光层和水润湿铝基材具有良好的粘合性，使得印刷版具有令人满意的印刷寿命。

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