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1. 发明授权

US06416925B1 Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06416925B1
公开(公告)日：2002-07-09
申请号：US09497281
申请日：2000-02-02
申请人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
发明人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.
摘要翻译：适用于使用波长为250nm或更短，特别是220nm或更短的光源的曝光的正性工作光敏组合物; 包括（A）能够在光化射线或辐射照射时能够产生酸的化合物和（B）包含具有特定结构的脂环族基团的重复单元的树脂，包括金刚烷基，并且具有能够由于作用而分解的基团的酸以增加在碱性显影剂中的溶解度。

2. 发明授权

US6042991A Positive working photosensitive composition 失效
公开(公告)号：US6042991A
公开(公告)日：2000-03-28
申请号：US25451
申请日：1998-02-18
申请人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
发明人： Toshiaki Aoai , Shiro Tan , Kenichiro Sato
IPC分类号： G03F7/004 , G03F7/039 , G03C1/72 , G03C1/73
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.

3. 发明授权

US6136504A Positive-working photoresist composition 失效
标题翻译：正光刻胶组合物
公开(公告)号：US6136504A
公开(公告)日：2000-10-24
申请号：US280679
申请日：1999-03-29
申请人： Shiro Tan , Toru Fujimori , Toshiaki Aoai
发明人： Shiro Tan , Toru Fujimori , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention provides an excellent chemically-sensitized positive-working photoresist composition which exhibits a high resolution and a good dimensional stability with time, generates no development residue (scum) and standing waves and is less liable to loss of lone pattern. A novel positive-working photoresist composition is provided comprising at least (a) a copolymer A having at least structural units representedby the following general formulae (I), (II) and (III), (b) a compound which generates an acid when irradiated with actinic rays or radiation and (c) a solvent: ##STR1## wherein R.sub.1 and R.sub.2 each independently represent a hydrogen atom or methyl group; R.sub.3 represents a tertiary alkyl or cycloalkyl group which may be substituted; and X represents a divalent organic residue.
摘要翻译：本发明提供了一种优异的化学敏化正性光致抗蚀剂组合物，其显示出高分辨率和随时间稳定的尺寸稳定性，不产生显影残渣（浮渣）和驻波，并且不易损失孤单图案。提供了一种新型的正性光致抗蚀剂组合物，其包含至少（a）至少具有由以下通式（I），（II）和（III）表示的结构单元的共聚物A，（b）用光化射线或辐射照射，和（c）溶剂：其中R1和R2各自独立地表示氢原子或甲基; R3表示可以被取代的叔烷基或环烷基; X表示二价有机残基。

4. 发明授权

US5318875A Positive quinonediazide photoresist composition containing select hydroxyphenol additive 失效
标题翻译：含有选择性羟基苯酚添加剂的正醌二叠氮化物光致抗蚀剂组合物
公开(公告)号：US5318875A
公开(公告)日：1994-06-07
申请号：US15921
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
IPC分类号： C07C45/46 , G03F7/022 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226 , C07C45/46 , G03F7/022
摘要： A positive photoresist composition includes an alkali-soluble resin, a quinonediazide compound and a compound selected from the group consisting of compounds represented by formulae (I), (II) and (III): ##STR1## wherein R.sub.1 to R.sub.27, which may be the same or different, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group, nitro group, alkenyl group, aryl group, aralkyl group, alkoxycarbonyl group, arylcarbonyl group, acyloxy group, acyl group, aryloxy group or aralkoxy group; ##STR2## wherein R.sub.31 represents an organic group, single bond, ##STR3## R.sub.32 represents a hydrogen atom, monovalent organic group or ##STR4## R.sub.33 to R.sub.37, which may be the same or different, and in which not all four groups for each of R.sub.33 to R.sub.37 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group, with the proviso that at least one of R.sub.33 to R.sub.35 is a hydroxyl group; X represents a divalent organic group; and m represents an integer 0 or 1; ##STR5## wherein R.sub.41 to R.sub.44, which may be the same or different and in which not all four groups for each of R.sub.41 to R.sub.44 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group; R.sub.45 and R.sub.46 each represents a hydrogen atom, alkyl group or ##STR6## a and c each represents an integer 0 or 1; and b represents an integer from 1 to 4.
摘要翻译：正型光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物和选自由式（I），（II）和（III）表示的化合物的化合物：其中R 1至R 27，可以相同或不同，分别表示氢原子，羟基，卤素原子，烷基，烷氧基，硝基，烯基，芳基，芳烷基，烷氧基羰基，芳基羰基，酰氧基，酰基，芳氧基或芳烷氧基; （II）其中R31表示有机基团，单键，R32表示氢原子，一价有机基团或R33至R37，其可以相同或不同，并且其中并不全部为四 R 33〜R 37各自可以相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基，条件是R 33〜R 35中的至少一个为羟基; X表示二价有机基团; m表示0或1的整数; （III）其中R41〜R44可以相同或不同，并且其中R41至R44中的每一个不是全部四个基团可以同时相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基; R 45和R 46各自表示氢原子，烷基或者a和c各自表示0或1的整数; b表示1〜4的整数。

5. 发明授权

US06638683B1 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06638683B1
公开(公告)日：2003-10-28
申请号：US09103544
申请日：1998-06-24
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/115
摘要： A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.
摘要翻译：正型光致抗蚀剂组合物包含（a）由含有酚羟基的碱溶性树脂得到的树脂A的组合，通过用式（I）和（b）表示的基团代替10至80％的酚羟基，通过用式（II）或（III）表示的基团代替10〜80％的酚羟基或由至少一种以上的非聚合物溶解抑制化合物代替的酚醛羟基的碱溶性树脂得到的树脂B 选自叔烷基酯基和叔烷基碳酸酯基的一类基团;其中R 1，W，n和R 4如说明书中所定义。

6. 发明授权

US06379860B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06379860B1
公开(公告)日：2002-04-30
申请号：US09220682
申请日：1998-12-23
申请人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
发明人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/115
摘要： A positive photosensitive composition is disclosed which comprises a compound generating an acid upon irradiation with actinic rays or a radiation and a resin having groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution, said resin being obtained by reacting an alkali-soluble resin having phenolic hydroxyl groups with at least one specific enol ether compound under acid conditions in a specific organic solvent. The positive photosensitive composition shows improved discrimination between nonimage areas and image areas, has high sensitivity, high resolving power, and high heat resistance, suffers little change in performance with the lapse of time from exposure to light to heat treatment (PED), and is free from defects, e.g., development defects.
摘要翻译：公开了一种正型感光性组合物，其包含在用光化射线照射时产生酸的化合物或辐射，以及具有通过酸作用分解的基团的树脂，以增强在碱性显影液中的溶解度，所述树脂是通过使具有酚羟基的碱溶性树脂与至少一种特定的烯醇醚化合物在酸性条件下在特定的有机溶剂中。正型感光性组合物显示出非图像区域和图像区域之间的区分改善，具有高灵敏度，高分辨率和高耐热性，随着从曝光到热处理（PED）的时间的流逝，性能几乎没有变化，并且是没有缺陷，例如发展缺陷。

7. 发明授权

US6004721A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US6004721A
公开(公告)日：1999-12-21
申请号：US18883
申请日：1998-02-05
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition is disclosed which comprises (a) a resin obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group having a specific structure, (b) a compound which generates an acid upon irradiation with actinic rays or a radiation, and (c) a solvent. This composition is an excellent, chemically amplified photoresist composition which has high resolution and gives a resist pattern having no depressions in an upper part thereof and having satisfactory adhesion to the substrate.
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含（a）通过用具有特定结构的基团代替10至80％的酚羟基，由（b）化合物其在用光化射线或辐射照射时产生酸，和（c）溶剂。该组合物是优异的化学放大型光致抗蚀剂组合物，其具有高分辨率并且在其上部具有不具有凹陷的抗蚀剂图案，并且对基材具有令人满意的粘合性。

8. 发明授权

US06830872B2 Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound 失效
标题翻译：具有含有氟高分子化合物的成像层的平版印刷版原版
公开(公告)号：US06830872B2
公开(公告)日：2004-12-14
申请号：US10247656
申请日：2002-09-20
申请人： Kazuyoshi Mizutani , Shiro Tan
发明人： Kazuyoshi Mizutani , Shiro Tan
IPC分类号： G03F7038
CPC分类号： G03F7/0233 , B41C1/1008 , B41C1/1016 , B41C2201/04 , B41C2201/06 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/0046 , G03F7/033 , G03F7/0382 , G03F7/0392 , Y10S430/108 , Y10S430/165
摘要： Disclosed is planographic printing plate precursor comprising a support having disposed thereon an image forming layer containing a fluorine macromolecular compound having a structural unit derived from a monomer represented by the following general formula (I). In the general formula (I), R0 represents a hydrogen atom, a methyl group, a cyano group or a halogen atom. X represents a single bond or a divalent connecting group. R1 to R6 each independently represent a hydrogen atom, an alkyl group, a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. Further, at least one of R1 to R6 represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom.
摘要翻译：公开了平版印刷版原版，其包括载体，其上设置有含有衍生自由以下通式（I）表示的单体的结构单元的氟高分子化合物的成像层。在通式（I）中，R 0表示氢原子，甲基，氰基或卤素原子。 X表示单键或二价连接基团。 R 1〜R 6各自独立地表示氢原子，烷基，氟原子或至少一个氢原子被氟原子取代的烷基。此外，R 1至R 6中的至少一个表示氟原子或至少一个氢原子被氟原子取代的烷基。

9. 发明授权

US5674657A Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers 失效
标题翻译：包含由四种酚类单体制成的碱溶性酚醛清漆树脂的正性光致抗蚀剂组合物
公开(公告)号：US5674657A
公开(公告)日：1997-10-07
申请号：US743592
申请日：1996-11-04
申请人： Shiro Tan , Yasumasa Kawabe , Kenji Honda
发明人： Shiro Tan , Yasumasa Kawabe , Kenji Honda
IPC分类号： C08L61/06 , G03F7/022 , G03F7/023 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0236 , G03F7/022
摘要： The invention is directed to an alkali-soluble novolak binder resin composition made by addition condensation reaction of a phenolic mixture with at least one aldehyde source, the feedstock of said phenolic mixture for the reaction comprising about 33 to about 83 mole percent of meta-cresol; about 1 to about 4 mole percent of para-cresol; about 10 to about 60 mole percent of a phenolic monomer selected from the group consisting of 2,3-xylenol, 3,4-xylenol, 3,5-xylenol and mixtures thereof; and about 5 to about 55 mole percent of a methoxy phenol monomer, the amount of aldehyde source being from about 40 to about 200 percent of the stoichiometric amount needed to react with all of the phenolic moieties in said phenolic mixture, and the alkali-soluble novolak binder resin having a weight average molecular weight (M.sub.w) of about 3,000 to about 20,000 with a molecular weight polydispersity (M.sub.w /M.sub.n) of 1.5-4.0. The invention is also directed to a positive working photoresist made from the composition.
摘要翻译：本发明涉及通过酚类混合物与至少一种醛源的加成缩合反应制备的碱溶性酚醛清漆粘合剂树脂组合物，所述用于反应的酚类混合物的原料包含约33-约83摩尔％的间甲酚 ; 约1至约4摩尔％的对 - 甲酚; 约10至约60摩尔％的选自2,3-二甲苯酚，3,4-二甲苯酚，3,5-二甲苯酚及其混合物的酚单体; 和约5至约55摩尔％的甲氧基酚单体，醛源的量为所述酚类混合物中所有酚部分反应所需化学计量的约40至约200％，碱溶性酚醛清漆粘合剂树脂，重均分子量（Mw）约为3,000至约20,000，分子量多分散性（Mw / Mn）为1.5-4.0。本发明还涉及由该组合物制成的正性工作光致抗蚀剂。

10. 发明授权

US06277541B1 Photosensitive lithographic printing plate 失效
标题翻译：感光平版印刷版
公开(公告)号：US06277541B1
公开(公告)日：2001-08-21
申请号：US09333655
申请日：1999-06-16
申请人： Seiji Uno , Shiro Tan , Mitsuhiro Imaizumi , Keiji Akiyama
发明人： Seiji Uno , Shiro Tan , Mitsuhiro Imaizumi , Keiji Akiyama
IPC分类号： G03C177
CPC分类号： B41C1/1016 , B41C2201/04 , B41C2201/06 , B41C2201/10 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/11 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/111
摘要： A photosensitive lithographic printing plate in which press life, deletion performance, photosensitive layer removability and image reproducibility are compatible with one another, while retaining scumming prevention performance, which comprises an aluminum support hydrophilized after anodic oxidization, an intermediate layer provided thereon containing an alkali-soluble polymer adjusted in a number-average molecular weight (Mn) to the range of 300 to 5,000 by using an initiator in combination with a chain transfer agent in radical polymerization, and a photosensitive layer provided on the intermediate layer.
摘要翻译：其中压印寿命，缺失性能，感光层可除去性和图像再现性彼此兼容的感光性平版印刷版，同时保持防阳离子性能，其包括在阳极氧化后亲水化的铝载体，其上设置有含有碱 - 通过在自由基聚合中使用与链转移剂组合的引发剂和在中间层上设置的感光层，将数均分子量（Mn）调节至300-5,000范围内的可溶性聚合物。

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