专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US6114089A Positive working photosensitive lithographic printing plate 失效
标题翻译：正性光敏平版印刷版
公开(公告)号：US6114089A
公开(公告)日：2000-09-05
申请号：US55969
申请日：1998-04-07
申请人： Satoshi Takita , Mitsuhiro Imaizumi , Keiji Akiyama , Seiji Uno , Shiro Tan
发明人： Satoshi Takita , Mitsuhiro Imaizumi , Keiji Akiyama , Seiji Uno , Shiro Tan
IPC分类号： B41N3/03 , G03F7/11 , G03C1/77
CPC分类号： B41C1/1016 , G03F7/11 , B41C2201/04 , B41C2201/06 , B41C2201/10 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A positive working photosensitive lithographic printing plate comprising an aluminum substrate and a positive working photosensitive layer, the aluminum substrate having been anodized and rendered water-wettable, wherein an intermediate layer containing a polymer comprising (A) a unit interacting with an alumina layer and (B) a unit interacting with a water-wettable layer is provided between the aluminum substrate and the photosensitive layer. The photosensitive layer and the water-wettable aluminum substrate have good adhesion so that the printing plate has a satisfactory press life.
摘要翻译：一种正性感光性平版印刷版，其特征在于，具有铝基板和正性感光层，所述铝基板经过阳极氧化处理，使其具有水润湿性，其中含有聚合物的中间层包含（A）与氧化铝层相互作用的单元和（ B）在铝基材和感光层之间设置与水可湿性层相互作用的单元。感光层和水润湿铝基材具有良好的粘合性，使得印刷版具有令人满意的印刷寿命。

2. 发明授权

US5958646A Positive-working photosensitive composition and process for image formation 失效
标题翻译：正性感光组合物和成像方法
公开(公告)号：US5958646A
公开(公告)日：1999-09-28
申请号：US569316
申请日：1995-12-08
申请人： Koichi Kawamura , Satoshi Takita , Keiji Akiyama , Yoshitaka Kawamura
发明人： Koichi Kawamura , Satoshi Takita , Keiji Akiyama , Yoshitaka Kawamura
IPC分类号： G03F7/022 , G03F7/00 , G03F7/023 , G03F7/033 , G03F7/039 , G03F7/30 , H01L21/027 , G03C1/52
CPC分类号： G03F7/0233
摘要： Disclosed are (i) a positive-working photosensitive composition containing (a) a polymer having at least 60 mol % structural units represented by formula (1): ##STR1## wherein A represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms; X represents --CO-- or --SO.sub.2 --; Y represents --CO--R.sub.1 or --SO.sub.2 --R.sub.1, where R.sub.1 represents an alkyl group, a substituted alkyl group wherein the substituent on the substituted alkyl group is a halogen atom, an aryl group, an amido group, an alkoxy group or an alkoxycarbonyl group, an unsubstituted aromatic group, or a substituted aromatic group wherein the substituent on the substituted aromatic group is a halogen atom, an alkyl group, an alkoxy group having 1 to 10 carbon atoms, an amido group or an aryl group, provided that at least one of X and Y contains --SO.sub.2 --and (b) a o-naphthoquinone diazide, and (ii) a process for image formation which comprises image-wise exposing to light a photosensitive material having a photosensitive layer comprising the positive-working photosensitive composition and then developing the resulting photosensitive material with an aqueous alkali solution having a pH of 12.5 or below.
摘要翻译：公开了（i）正性光敏组合物，其含有（a）具有式（1）表示的至少60摩尔％结构单元的聚合物：其中A表示氢原子，卤素原子或具有1〜 4个碳原子; X表示-CO-或-SO 2 - ; Y表示-CO-R1或-SO2-R1，其中R1表示烷基，取代烷基上的取代基为卤素原子，芳基，酰胺基，烷氧基或烷氧基羰基的取代烷基基团，取代芳基或取代芳基，其中取代芳基上的取代基为卤素原子，烷基，具有1-10个碳原子的烷氧基，酰胺基或芳基，条件是在 X和Y中的至少一个含有-SO 2 - 和（b）邻萘醌二叠氮，以及（ii）图像形成方法，其包括使具有感光层的感光材料成像曝光于光敏层，所述光敏材料包含正性感光层然后用pH为12.5以下的碱性水溶液显影所得的感光材料。

3. 发明申请

US20100173246A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING CURED FILM USING THE SAME 有权
标题翻译：正型感光树脂组合物和使用其形成固化膜的方法
公开(公告)号：US20100173246A1
公开(公告)日：2010-07-08
申请号：US12663016
申请日：2008-06-05
申请人： Satoshi Takita
发明人： Satoshi Takita
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0392 , C08F220/28 , G03F7/0045 , G03F7/40
摘要： The present invention provides a positive photosensitive resin composition including: a resin containing a specific acrylic acid-based constituent unit capable of undergoing dissociation of an acid-dissociable group to produce a carboxyl group, and a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates; and a compound capable of generating an acid upon irradiation with an actinic ray or radiation. The present invention also provides a method for forming a cured film using the composition. The positive photosensitive composition is excellent in the sensitivity, film residual ratio and storage stability and by the method for forming a cured film using the positive photosensitive resin composition, a cured film excellent in the heat resistance, adhesion, transmittance and the like can be provided.
摘要翻译：本发明提供一种正型感光性树脂组合物，其包含：含有能够分解酸解离基而产生羧基的特定丙烯酸系构成单元的树脂，以及具有能够与羧基形成共价键，当酸解离基解离时，该树脂是碱不溶性或微溶碱性的并变成碱溶性的; 以及能够在用光化射线或辐射照射时能够产生酸的化合物。本发明还提供了使用该组合物形成固化膜的方法。正性感光性组合物的灵敏度，膜残留率和保存稳定性优异，通过使用正型感光性树脂组合物的固化膜的形成方法，可以提供耐热性，粘合性，透射率等优异的固化膜。

4. 发明申请

US20100119973A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME 审中-公开
标题翻译：正性感光树脂组合物和固化膜的形成方法
公开(公告)号：US20100119973A1
公开(公告)日：2010-05-13
申请号：US12532005
申请日：2008-03-27
申请人： Satoshi Takita
发明人： Satoshi Takita
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0751 , G03F7/40
摘要： A positive photosensitive resin composition, includes: (A) a resin containing an acid-dissociable group having a specific acetal structure as defined in the specification, which is alkali-insoluble or sparingly alkali-soluble and becomes alkali-soluble when the acid-dissociable group is dissociated; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a crosslinking agent; and (D) an adhesion aid, and a cured film forming method uses the same.
摘要翻译：正型感光性树脂组合物包含：（A）含有本说明书中规定的具有特定缩醛结构的酸解离性基团的树脂，其在酸解离时为碱不溶性或微溶碱性且变得碱溶性群体分离; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）交联剂; 和（D）粘合助剂，并且固化膜形成方法使用它。

5. 发明申请

US20100130738A1 PYRAZOLONE DERIVATIVE AND PDE INHIBITOR CONTAINING THE SAME AS ACTIVE INGREDIENT 审中-公开
标题翻译：含有该活性成分的吡唑啉酮衍生物和PDE抑制剂
公开(公告)号：US20100130738A1
公开(公告)日：2010-05-27
申请号：US12452173
申请日：2008-06-18
申请人： Yasushi Kohno , Koji Ochiai , Satoshi Takita , Tetsuya Kishi
发明人： Yasushi Kohno , Koji Ochiai , Satoshi Takita , Tetsuya Kishi
IPC分类号： C07D401/14 , C07D471/04 , C07D417/14 , C07D403/14 , C07D407/10
CPC分类号： C07D401/14 , C07D403/14 , C07D405/14 , C07D409/14 , C07D417/14 , C07D471/04
摘要： It is to provide a novel pyrazolone derivative represented by the following general formula (1), which is useful as a pharmaceutical and has a phosphodiesterase inhibitory action: wherein R1,R2: C1-6 alkyl; R3,R4: H, X, C1-6 alkoxy; Z:O, S; A:AA, BB, wherein AA represents wherein BB represents wherein R5: H, C1-6 alkyl; R6,R7: C1-6 alkyl.
摘要翻译：提供由以下通式（1）表示的新型吡唑啉酮衍生物，其可用作药物并具有磷酸二酯酶抑制作用：其中R1，R2：C1-6烷基; R3，R4：H，X，C1-6烷氧基; Z：O，S; A：AA，BB，其中AA表示其中BB表示其中R5：H，C1-6烷基; R6，R7：C1-6烷基。

6. 发明申请

US20090318385A1 Pyrazolopyride derivative and phosphodiesterase ( pde) inhibitors containing the same as active ingredient 审中-公开
标题翻译：吡唑并吡啶衍生物和含有与活性成分相同的磷酸二酯酶（pde）抑制剂
公开(公告)号：US20090318385A1
公开(公告)日：2009-12-24
申请号：US12310736
申请日：2007-09-05
申请人： Yasushi Kohno , Satoshi Takita , Akihiko Kojima , Tetsuya Kishi
发明人： Yasushi Kohno , Satoshi Takita , Akihiko Kojima , Tetsuya Kishi
IPC分类号： A61K31/695 , C07D471/04 , A61K31/437 , C07F7/02
CPC分类号： C07D471/04
摘要： A novel pyrazolopyridine derivative is provided which is useful as a pharmaceutical drug having phosphodiesterase inhibitory activity.The pyrazolopyridine derivative is represented by the following general formula (1): [wherein R1 is a hydrogen atom, an optionally substituted alkyl group having 1 to 6 carbon atoms, or the like, R2 is an optionally substituted alkyl group having 1 to 6 carbon atoms or the like, R5 and R6 are independently a hydrogen atom or a halogen atom, R13 is a hydrogen atom or a halogen atom, n is 0 or 1, is a single or double bond, R3 is a hydrogen atom, a hydroxyl group, or the like, and R4 is a hydrogen atom, a phenyl group, or the like] or a pharmaceutically acceptable salt thereof, and a hydrate thereof.
摘要翻译：提供一种新颖的吡唑并吡啶衍生物，其可用作具有磷酸二酯酶抑制活性的药物。吡唑并吡啶衍生物由以下通式（1）表示：[其中R 1是氢原子，任选取代的具有1至6个碳原子的烷基等，R 2是任选取代的具有1至6个碳的烷基原子等，R 5和R 6独立地为氢原子或卤素原子，R 13为氢原子或卤素原子，n为0或1，为单键或双键，R 3为氢原子，羟基等，R 4为氢原子，苯基等]或其药学上可接受的盐及其水合物。

7. 发明授权

US5227473A Quinone diazide compound and light-sensitive composition containing same 失效
标题翻译：喹啉二氮化合物和含有它的光敏组合物
公开(公告)号：US5227473A
公开(公告)日：1993-07-13
申请号：US698108
申请日：1991-05-10
申请人： Kouichi Kawamura , Satoshi Takita
发明人： Kouichi Kawamura , Satoshi Takita
IPC分类号： C07C309/45 , C07D219/10 , C07D277/20 , C07D277/36 , C07D311/80 , C07D417/06 , C08K5/36 , C08K5/38 , C08K5/39 , C08K5/41 , C08K5/42 , C08K5/43 , C08K5/45 , C08K5/47 , C08L101/00 , C09B6/00 , C09B11/28 , C09B23/00 , C09B23/01 , C09B23/02 , C09B23/10 , C09B55/00 , C09B57/00 , C09B69/10 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C309/45 , C09B11/28 , C09B23/0091 , C09B23/02 , C09B23/10 , C09B6/00 , C09B69/10 , G03F7/023
摘要： A quinone diazide of formula (I) or formula (II):(S)l--(L.sup.1)m=-(Q).sub.n (I)--(L.sup.2 (-S))o-(L.sup.3 (--Q))p- (II)wherein S is a light absorbing portion having an absorption coefficient of greater than 1000 in wavelengths longer than 360 nm; Q is a quinone diazide residue; L.sup.1, L.sup.2 and L.sup.3 are connecting groups connecting S and Q, provided, however, that L.sup.1, L.sup.2 and L.sup.3 do not conjugate S and Q; l, m, n, o and p are integers; andwherein the emission intensity of the compound of formulas (I) and (II) is smaller than the emission intensity of the chromophoric group alone. Also disclosed is a light sensitive composition comprising an alkali soluble resin and the above quinone diazide compound. The quinone diazide compound of the present invention have spectral sensitization with respect to visible light and are useful in visible light projection plates and as visible laser sensing materials.
摘要翻译：式（I）或式（II）的醌二叠氮化物：（S）1-（L1）m = - （Q）n（I） - （L2（-S））o-（L3（-Q） - （II）其中S是长于360nm的波长的吸收系数大于1000的光吸收部分; Q是醌二氮杂残基; L1，L2和L3是连接S和Q的连接组，但是L1，L2和L3不共轭S和Q; l，m，n，o和p是整数; 并且其中式（I）和（II）化合物的发射强度小于单独发色团的发射强度。还公开了包含碱溶性树脂和上述醌二叠氮化合物的光敏性组合物。本发明的醌二叠氮化合物对可见光具有光谱增感作用，可用于可见光投射板和可见激光感测材料。

8. 发明授权

US09034440B2 Positive photosensitive resin composition and cured film forming method using the same 有权
标题翻译：正型感光性树脂组合物和使用其的固化膜形成方法
公开(公告)号：US09034440B2
公开(公告)日：2015-05-19
申请号：US12680273
申请日：2008-09-26
申请人： Satoshi Takita
发明人： Satoshi Takita
IPC分类号： G03F7/004 , G03F7/039 , G03F7/40
CPC分类号： G03F7/004 , B32B2457/202 , B32B2457/206 , G03F7/0045 , G03F7/0392 , G03F7/20 , G03F7/40 , Y10T428/10 , Y10T428/24802
摘要： There are provided a positive photosensitive resin composition excellent in the sensitivity, film residual ratio and storage stability, comprising a resin containing a specific acrylic acid-based constituent unit capable of dissociating an acid-dissociable group to produce a carboxyl group, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates, a resin containing a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, and a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a cured film forming method using the positive photosensitive resin composition; and a cured film excellent in the heat resistance, adhesion, transmittance and the like.
摘要翻译：提供了灵敏度，膜残留率和保存稳定性优异的正性感光性树脂组合物，其含有能够解离酸解离基而产生羧基的特定的丙烯酸系构成单元的树脂，该树脂为碱 - 不溶或微溶碱性并且当酸解离基解离时变为碱溶性，含有具有能够与羧基反应形成共价键的官能团的构成单元的树脂和能够产生用光化射线或辐射照射时酸; 使用正型感光性树脂组合物的固化成膜方法; 以及耐热性，粘合性，透射率等优异的固化膜。

9. 发明申请

US20100160335A1 PYRIDAZINONE DERIVATIVE AND PDE INHIBITOR CONTAINING THE SAME AS ACTIVE INGREDIENT 审中-公开
标题翻译：含有相同活性成分的吡咯烷酮衍生物和PDE抑制剂
公开(公告)号：US20100160335A1
公开(公告)日：2010-06-24
申请号：US12452172
申请日：2008-06-18
申请人： Yasushi Kohno , Koji Ochiai , Satoshi Takita , Akihiko Kojima , Tomohiko Eiraku , Tetsuya Kishi
发明人： Yasushi Kohno , Koji Ochiai , Satoshi Takita , Akihiko Kojima , Tomohiko Eiraku , Tetsuya Kishi
IPC分类号： A61K31/50 , A61K31/501 , C07D403/00
CPC分类号： C07D413/14 , C07D401/14 , C07D403/14 , C07D405/14 , C07D409/14 , C07D417/14 , C07D471/04
摘要： It is to provide a novel pyridazinone derivative represented by the following general formula (1), which is useful as a pharmaceutical and has a phosphodiesterase inhibitory action: wherein R1 represents H or C1-6 alkyl, each of R2 and R3 represents H, X, C1-6 alkoxy, Z represents O or S, and A represents AA or BB, wherein AA represents: and BB represents: wherein R4 represents H or C1-6 alkyl, and each of R5 and R6 represents C1-6 alkyl.
摘要翻译：提供由以下通式（1）表示的新的哒嗪酮衍生物，其可用作药物并具有磷酸二酯酶抑制作用：其中R1表示H或C1-6烷基，R2和R3各自表示H，X C 1-6烷氧基，Z表示O或S，A表示AA或BB，其中AA表示：BB表示：其中R4表示H或C1-6烷基，R5和R6各自表示C1-6烷基。

10. 发明授权

US06037098A Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06037098A
公开(公告)日：2000-03-14
申请号：US50007
申请日：1998-03-30
申请人： Toshiaki Aoai , Satoshi Takita
发明人： Toshiaki Aoai , Satoshi Takita
IPC分类号： C08F2/50 , G03F7/004
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and a compound represented by formula (Ia) or (Ib) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: ##STR1## wherein R.sub.1 to R.sub.3 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by --S--R.sub.4, where R.sub.4 represents an alkyl group or an aryl group; X.sup.- represents the specific anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid; and l, m, and n represents an integer of 1 to 3.
摘要翻译：提供了具有高光敏性的正光敏组合物，能够赋予优异的抗蚀剂图案，并且在曝光后随时间变化很小。正型光敏组合物包括具有能够通过酸的作用分解的基团的树脂，以增强树脂在碱性显影液中的溶解度和由式（Ia）或（Ib）表示的化合物，其能够产生在用光化射线照射时的磺酸或辐射：其中R1至R3各自表示氢原子，烷基，环烷基，烷氧基，羟基，卤素原子或由-S- R4，其中R4表示烷基或芳基; X-表示苯磺酸，萘磺酸或蒽磺酸的特定阴离子; 和l，m，n表示1〜3的整数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式