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1. 发明申请

US20120135067A1 VACCINE FOR MYCOPLASMA INFECTION 有权
标题翻译：疫苗用于感染MYCOPLASMA
公开(公告)号：US20120135067A1
公开(公告)日：2012-05-31
申请号：US13376009
申请日：2010-06-04
申请人： Kazuhiro Matsuda , Koji Ichiyama , Sachie Matsuda , Yuko Sasaki , Yoshichika Arakawa , Ryo Harasawa , Yoshihiro Nishida , Norio Katayama , Yasuo Endo , Nobuo Nomura
发明人： Kazuhiro Matsuda , Koji Ichiyama , Sachie Matsuda , Yuko Sasaki , Yoshichika Arakawa , Ryo Harasawa , Yoshihiro Nishida , Norio Katayama , Yasuo Endo , Nobuo Nomura
IPC分类号： A61K9/127 , A61P37/04 , A61K39/02 , A61K39/09 , A61P31/16 , A61P31/00 , A61P11/06 , A61P19/02 , A61P11/00 , A61K9/00 , A61K39/145
CPC分类号： A61K39/0241 , A61K9/127 , A61K9/1272 , A61K39/12 , A61K39/145 , A61K39/39 , A61K2039/55555 , A61K2039/55594 , Y02A50/403
摘要： Disclosed is a vaccine which has a high therapeutic effect on mycoplasma infection and is highly safe. For the purpose of developing effective therapeutic methods for mycoplasma infection, mycoplasma-mimic particles which are effective as a vaccine for mycoplasma infection are provided, and also provided are bacterium-mimic particles including common bacteria. Bacterium-mimic particles such as mycoplasma-mimic particles can be provided by producing liposome particles in which a lipid antigen specific to a pathogenic bacterium such as mycoplasma is contained as a liposome-constituting lipid component. The administration of the mycoplasma-mimic particles enables the induction of a potent immunological activity in living bodies. The mycoplasma-mimic particles can be used as an excellent vaccine for the prevention or treatment of mycoplasma infection.
摘要翻译：公开了对支原体感染具有高治疗效果的疫苗，并且是高度安全的。为了开发有效的支原体感染治疗方法，提供了作为支原体感染疫苗有效的支原体模拟颗粒，并且还提供了包括常见细菌的细菌模拟颗粒。可以通过生产脂质体颗粒来提供细菌模拟颗粒，例如支原体模拟颗粒，其中作为构成脂质体的脂质组分含有诸如支原体的致病菌特异性的脂质抗原。支原体模拟颗粒的施用使得能够诱导活体中有效的免疫活性。支原体模拟颗粒可用作预防或治疗支原体感染的优良疫苗。

2. 发明授权

US09539209B2 Vaccine for mycoplasma infection 有权
标题翻译：疫苗支原体感染
公开(公告)号：US09539209B2
公开(公告)日：2017-01-10
申请号：US13376009
申请日：2010-06-04
申请人： Kazuhiro Matsuda , Koji Ichiyama , Sachie Matsuda , Yuko Sasaki , Yoshichika Arakawa , Ryo Harasawa , Yoshihiro Nishida , Norio Katayama , Yasuo Endo , Nobuo Nomura
发明人： Kazuhiro Matsuda , Koji Ichiyama , Sachie Matsuda , Yuko Sasaki , Yoshichika Arakawa , Ryo Harasawa , Yoshihiro Nishida , Norio Katayama , Yasuo Endo , Nobuo Nomura
IPC分类号： A61K39/02 , A61K39/00 , A61K49/00 , A61K9/127 , A61K39/39 , A61K39/145 , A61K39/12
CPC分类号： A61K39/0241 , A61K9/127 , A61K9/1272 , A61K39/12 , A61K39/145 , A61K39/39 , A61K2039/55555 , A61K2039/55594 , Y02A50/403
摘要： Disclosed is a vaccine which has a high therapeutic effect on mycoplasma infection and is highly safe. For the purpose of developing effective therapeutic methods for mycoplasma infection, mycoplasma-mimic particles which are effective as a vaccine for mycoplasma infection are provided, and also provided are bacterium-mimic particles including common bacteria. Bacterium-mimic particles such as mycoplasma-mimic particles can be provided by producing liposome particles in which a lipid antigen specific to a pathogenic bacterium such as mycoplasma is contained as a liposome-constituting lipid component. The administration of the mycoplasma-mimic particles enables the induction of a potent immunological activity in living bodies. The mycoplasma-mimic particles can be used as an excellent vaccine for the prevention or treatment of mycoplasma infection.
摘要翻译：公开了对支原体感染具有高治疗效果的疫苗，并且是高度安全的。为了开发有效的支原体感染治疗方法，提供了作为支原体感染疫苗有效的支原体模拟颗粒，并且还提供了包括常见细菌的细菌模拟颗粒。可以通过生产脂质体颗粒来提供细菌模拟颗粒，例如支原体模拟颗粒，其中作为构成脂质体的脂质组分含有诸如支原体的致病菌特异性的脂质抗原。支原体模拟颗粒的施用使得能够诱导活体中有效的免疫活性。支原体模拟颗粒可用作预防或治疗支原体感染的优良疫苗。

3. 发明申请

US20080116391A1 Charged Particle Beam Orbit Corrector and Charged Particle Beam Apparatus 有权
标题翻译：带电粒子束轨道校正器和带电粒子束装置
公开(公告)号：US20080116391A1
公开(公告)日：2008-05-22
申请号：US11943241
申请日：2007-11-20
申请人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
发明人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
IPC分类号： G21K1/087 , G21K1/093
CPC分类号： H01J37/141 , H01J37/09 , H01J37/12 , H01J37/153 , H01J37/28 , H01J2237/142 , H01J2237/1534 , H01J2237/303
摘要： The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.
摘要翻译：本发明涉及一种用于带电粒子束的轨道校正方法，其目的在于解决常规像差校正系统中固有的问题，并提供一种用于带电粒子束的低成本，高精度，高分辨率的聚光系统。为此，所采用的是波束轨道受环形形式限制以形成朝向光束轨道中心收敛的电磁场分布的结构。因此，可以抵消以电子透镜的球面像差为代表的向外扩大的非线性动作。具体地说，这种效果可以通过设置在轴上的电子元件实现，并且经受电压以便于静电聚焦的发生。对于磁场，这种效果可以通过在旋转方向上等角地分割的表面上形成径向分布缠绕的线圈来实现，以控制磁通密度的收敛。

4. 发明申请

US20060151698A1 Charged particle beam apparatus 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20060151698A1
公开(公告)日：2006-07-13
申请号：US11311278
申请日：2005-12-20
申请人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
发明人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/153 , H01J37/21 , H01J37/222 , H01J37/265 , H01J2237/141 , H01J2237/1532 , H01J2237/21 , H01J2237/221 , H01J2237/2817
摘要： A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
摘要翻译：提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性在高分辨率和广域的观察视野之间。

5. 发明授权

US6088300A Calendar electronic timepiece 失效
标题翻译：日历电子钟表
公开(公告)号：US6088300A
公开(公告)日：2000-07-11
申请号：US65992
申请日：1998-04-24
申请人： Kenichi Nakajima , Takayuki Satodate , Akihiro Matouge , Akihiko Inada , Mitsuru Ishii , Yoshio Koyama , Shigeo Suzuki , Masayuki Kawata , Yuko Sasaki , Eriko Takakuwa
发明人： Kenichi Nakajima , Takayuki Satodate , Akihiro Matouge , Akihiko Inada , Mitsuru Ishii , Yoshio Koyama , Shigeo Suzuki , Masayuki Kawata , Yuko Sasaki , Eriko Takakuwa
IPC分类号： G04B19/24 , G04C3/00 , G04C3/12 , G04C17/00 , G04G9/00 , G04B19/20
CPC分类号： G04C3/12 , G04C17/0066
摘要： A calendar electronic timepiece comprises a signal generating circuit for generating a date signal, a driving circuit for outputting a driving signal in accordance with the date signal generated by the signal generating circuit, and an ultrasonic motor driven by the driving signal outputted by the driving circuit. The ultrasonic motor is comprised of a piezoelectric vibrator having an electrode pattern and being driven by the driving signal outputted from the driving circuit to undergo expansion and contraction movement, a vibrating member connected to the piezoelectric vibrator and vibrationally driven by expansion and contraction movement of the piezoelectric vibrator, and a date dial disposed on the vibrating member to be frictionally driven by expansion and contraction movement of the piezoelectric vibrator.
摘要翻译：日历电子钟表包括用于产生日期信号的信号发生电路，用于根据由信号发生电路产生的日期信号输出驱动信号的驱动电路和由驱动电路输出的驱动信号驱动的超声波马达。超声波电动机由具有电极图案的压电振动器构成，由驱动电路输出的驱动信号进行驱动，进行膨胀收缩运动;振动部件与压电振动体连接，振动部件通过膨胀收缩运动而振动压电振动器和设置在振动部件上的日期指示器，以通过压电振动器的膨胀和收缩运动来摩擦驱动。

6. 发明授权

US08338781B2 Charged particle beam scanning method and charged particle beam apparatus 有权
标题翻译：带电粒子束扫描法和带电粒子束装置
公开(公告)号：US08338781B2
公开(公告)日：2012-12-25
申请号：US13079361
申请日：2011-04-04
申请人： Yuko Sasaki , Makoto Ezumi , Makoto Nishihara , Tsutomu Kawai , Toshiaki Yanokura
发明人： Yuko Sasaki , Makoto Ezumi , Makoto Nishihara , Tsutomu Kawai , Toshiaki Yanokura
IPC分类号： H01J37/304
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/15 , H01J2237/2826 , H01J2237/3045
摘要： In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.
摘要翻译：在扫描带电粒子束的方法中，其可以将扫描位置定位在带电粒子束的扫描位置的可偏转范围内的适当位置，带电粒子束的扫描位置偏转到扫描内的多个目标物体位置可偏转区域，并且基于偏转之后的扫描位置处的目标物体的偏移，校正扫描位置处的偏转量。

7. 发明授权

US08324594B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08324594B2
公开(公告)日：2012-12-04
申请号：US12370242
申请日：2009-02-12
申请人： Hiroyuki Ito , Yuko Sasaki , Tadashi Otaka
发明人： Hiroyuki Ito , Yuko Sasaki , Tadashi Otaka
IPC分类号： G01F23/00 , G21K5/08 , G21K5/10
CPC分类号： H01J37/28 , H01J37/20 , H01J37/30 , H01J2237/0216 , H01J2237/20214 , H01J2237/20221
摘要： A charged particle beam apparatus can be constructed with a smaller size (resulting in a small installation space) and a lower cost, suppress vibration, operate at higher speed, and be reliable in inspection. The charged particle beam apparatus is largely effective when a wafer having a large diameter is used. The charged particle beam apparatus includes: a plurality of inspection mechanisms, each of which is mounted on a vacuum chamber and has a charged particle beam mechanism for performing at least an inspection on the sample; a single-shaft transfer mechanism that moves the sample between the inspection mechanisms in the direction of an axis of the single-shaft transfer mechanism; and a rotary stage that mounts the sample thereon and has a rotational axis on the single-shaft transfer mechanism. The single-shaft transfer mechanism moves the sample between the inspection mechanisms in order that the sample is placed under any of the inspection mechanisms. The rotary stage positions the sample such that a target portion of the sample can be inspected by the inspection mechanism under which the sample is placed, and the inspection mechanisms inspect the sample.
摘要翻译：带电粒子束装置可以以较小的尺寸（导致小的安装空间）和较低的成本，抑制振动，更高的速度运行并且可靠地进行检查。当使用具有大直径的晶片时，带电粒子束装置很有效。带电粒子束装置包括：多个检查机构，每个检查机构安装在真空室上，并具有至少对样品进行检查的带电粒子束机构; 单轴传送机构，其在所述检查机构之间沿所述单轴传送机构的轴线的方向移动所述样本; 以及将样品安装在其上并在单轴传送机构上具有旋转轴的旋转台。单轴传送机构将样品移动到检查机构之间，以便将样品放置在任何检查机构下。旋转台定位样品，使得样品的目标部分可以通过放置样品的检查机构进行检查，检查机构检查样品。

8. 发明授权

US08207513B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08207513B2
公开(公告)日：2012-06-26
申请号：US12615955
申请日：2009-11-10
申请人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
发明人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/153 , H01J37/21 , H01J37/222 , H01J37/265 , H01J2237/141 , H01J2237/1532 , H01J2237/21 , H01J2237/221 , H01J2237/2817
摘要： A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
摘要翻译：提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性在高分辨率和广域的观察视野之间。

9. 发明授权

US07728294B2 Semiconductor wafer inspection tool and semiconductor wafer inspection method 失效
标题翻译：半导体晶圆检查工具和半导体晶圆检查方法
公开(公告)号：US07728294B2
公开(公告)日：2010-06-01
申请号：US11808247
申请日：2007-06-07
申请人： Takashi Hiroi , Kenji Tanimoto , Yuko Sasaki , Hiroshi Makino
发明人： Takashi Hiroi , Kenji Tanimoto , Yuko Sasaki , Hiroshi Makino
IPC分类号： H01J37/21 , H01J37/26
CPC分类号： H01J37/20 , G01R31/307 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/2008 , H01J2237/20235 , H01J2237/20292 , H01J2237/221 , H01J2237/24564 , H01J2237/24592 , H01J2237/28
摘要： A semiconductor wafer inspection tool and a semiconductor wafer inspection method capable of conducting an inspection under appropriate conditions in any one of an NVC (Negative Voltage Contrast) mode and a PVC (Positive Voltage Contrast) mode is provided. Primary electrons 2 are irradiated onto a wafer to be inspected 6 and the irradiation position thereof is scanned in an XY direction. Secondary electrons (or reflected electrons) 10 from the wafer to be inspected 6 are controlled by a charge control electrode 5 and detected by a sensor 11. An image processor converts a detection signal from the sensor 11 to a detected image, compares the detected image with a predetermined reference image, judges defects, an overall control section 14 selects inspection conditions from recipe information for each wafer to be inspected 6 and sets a voltage to be applied to the charge control electrode 5. A Z stage 8 sets the distance between the wafer to be inspected 6 and the charge control electrode 5 according to this voltage.
摘要翻译：提供能够在适当条件下进行NVC（负电压对比度）模式和PVC（正电压对比度）模式中的任一种的半导体晶片检查工具和半导体晶片检查方法。将一次电子2照射到要检查的晶片6上，并且其XY照射位置被扫描。来自待检查晶片的二次电子（或反射电子）10由充电控制电极5控制并由传感器11检测。图像处理器将来自传感器11的检测信号转换为检测图像，通过预定的参考图像判断缺陷，总体控制部分14从每个要检查的晶片的配方信息中选择检查条件6并设置要施加到充电控制电极5的电压.Za级8设置晶片之间的距离根据该电压检查6和充电控制电极5。

10. 发明授权

US07425702B2 Charged particle beam apparatus 有权
公开(公告)号：US07425702B2
公开(公告)日：2008-09-16
申请号：US10838342
申请日：2004-05-05
申请人： Yuko Sasaki , Mitsugu Sato
发明人： Yuko Sasaki , Mitsugu Sato
IPC分类号： H01J37/244
CPC分类号： H01J37/265 , G01N23/2251 , H01J2237/043 , H01J2237/049 , H01J2237/28
摘要： When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a condenser lens and a virtual cathode position is calculated from a lens excitation of the condenser lens at that time and the mechanical positional relation of the electron gun to set an optical condition. For more accurate setting of the optical condition, a deflecting electrode device is provided at a crossover position of the condenser lens and a voltage is applied to the deflecting electrode device at a constant period so as to control the lens excitation of the condenser lens such that the amount of movement of an image is minimized on an image display unit such as CRT.

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