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    • 3. 发明申请
    • Method for supplying gas while dividing to chamber from gas supply facility equipped with flow controller
    • 在配备有流量控制器的气体供给设备的同时向室供给气体的方法
    • US20050005994A1
    • 2005-01-13
    • US10495641
    • 2003-01-20
    • Kazuhiko SugiyamaNobukazu IkedaKouji NishinoRyousuke DohiToyomi Uenoyama
    • Kazuhiko SugiyamaNobukazu IkedaKouji NishinoRyousuke DohiToyomi Uenoyama
    • H01L21/205G05D7/06B67C3/00
    • G05D7/0664Y10T137/7759Y10T137/7761
    • A method for supplying a specified quantity Q of processing gas while dividing at a desired flow rate ratio Q1/Q2 accurately and quickly from a gas supply facility equipped with a flow controller into a chamber. When a specified quantity Q of gas is supplied while being divided at a desired flow rate ratio Q1/Q2 from a gas supply facility equipped with a flow controller into a reduced pressure chamber C through a plurality of branch supply lines and shower plates fixed to the ends thereof, pressure type division quantity controllers FV1 and FV2 are provided in the plurality of branch supply lines GL1 and GL2. Opening control of both division quantity controllers FV1 and FV2 is started by an initial flow rate set signal from a division quantity control board FRC for fully opening the control valve CV of the pressure type division quantity controller having a higher flow rate and pressures P3′ and P3″ on the downstream side of the control valve CV are regulated thus supplying a total quantity Q=Q1+Q2 of gas while dividing into the chamber C through orifice holes (3a, 4a) made in shower plates (3, 4) at desired division quantities Q1 and Q2 represented by formulas Q1=C1P3′ and Q2=C2P3″ (where, C1 and C2 are constants dependent on the cross-sectional area of the orifice hole or the gas temperature on the upstream side thereof).
    • 一种用于在从配备有流量控制器的气体供给设备进入腔室的情况下,以期望的流量比Q1 / Q2精确而快速地分配处理气体的规定量Q的方法。 当通过多个分支供应管线和固定到所述流体控制器的淋浴板以期望的流量比Q1 / Q2从装备有流量控制器的气体供应设备分配到减压室C中时,供应指定量的气体 在多个分支供给线GL1和GL2中设置有压力分离量控制器FV1和FV2。 通过来自分割量控制板FRC的初始流量设定信号来开始分控数量控制器FV1和FV2的打开控制,以完全打开具有较高流量和压力P3'的压力型分配量控制器的控制阀CV,并且 在控制阀CV的下游侧的P3“被调节,从而通过在淋浴板(3,4)上形成的喷孔(3a,4a)分隔成室C,从而提供气体的总量Q = Q1 + Q2, 由公式Q1 = C1P3'和Q2 = C2P3“表示的期望分割量Q1和Q2(其中C1和C2是取决于孔口的横截面面积或其上游侧的气体温度的常数)。
    • 9. 发明授权
    • Method of supplying divided gas to a chamber from a gas supply apparatus equipped with a flow-rate control system
    • 从配备有流量控制系统的气体供给装置向腔室供给分割气体的方法
    • US07059363B2
    • 2006-06-13
    • US10495641
    • 2003-01-20
    • Kazuhiko SugiyamaNobukazu IkedaKouji NishinoRyosuke DohiToyomi Uenoyama
    • Kazuhiko SugiyamaNobukazu IkedaKouji NishinoRyosuke DohiToyomi Uenoyama
    • B65B1/04
    • G05D7/0664Y10T137/7759Y10T137/7761
    • A method for supplying a specified quantity Q of processing gas while dividing at a desired flow rate ratio Q1/Q2 accurately and quickly from a gas supply facility equipped with a flow controller into a chamber. When a specified quantity Q of gas is supplied while being divided at a desired flow rate ratio Q1/Q2 from a gas supply facility equipped with a flow controller into a reduced pressure chamber C through a plurality of branch supply lines and shower plates fixed to the ends thereof, pressure type division quantity controllers FV1 and FV2 are provided in the plurality of branch supply lines GL1 and GL2. Opening control of both division quantity controllers FV1 and FV2 is started by an initial flow rate set signal from a division quantity control board FRC for fully opening the control valve CV of the pressure type division quantity controller having a higher flow rate and pressures P3′ and P3″ on the downstream side of the control valve CV are regulated thus supplying a total quantity Q=Q1+Q2 of gas while dividing into the chamber C through orifice holes (3a, 4a) made in shower plates (3, 4) at desired division quantities Q1 and Q2 represented by formulas Q1=C1P3′ and Q2=C2P3″ (where, C1 and C2 are constants dependent on the cross-sectional area of the orifice hole or the gas temperature on the upstream side thereof).
    • 一种用于提供规定量的处理气体的方法,同时从装备有流量的气体供应设备精确而快速地分离所需流量比Q 1 / Q 2 2 控制器进入一个房间。 当从设置有流量控制器的气体供给设备以期望的流量比Q 1 / Q 2 2分配被指定量的气体供给时, 压力室C通过固定在其端部的多个分支供给管线和淋浴板,压力分离量控制器FV 1和FV 2 2设置在多个分支 供应线GL&lt; 1&gt;和GL&gt; 2&lt; 2&gt ;. 通过来自分割量控制板FRC的初始流量设定信号开始两个分割量控制器FV 1和FV 2 2的打开控制,以完全打开控制阀CV 在控制阀CV的下游侧具有较高的流量和压力P 3 3和P 3 3“的压力型分配量控制器被调节,从而提供总计 数量Q = Q 1/2 + Q 2 2,同时通过在淋浴板(3,4)中制成的孔口(3a,4a)分成腔室C 由式Q 1表示的期望分割量Q 1和Q 2 2由下式表示:C 1&lt; 1&gt;&lt; 3& /&gt;和&lt; 2&gt; 2&gt; 2&lt; 3&gt;&lt; 3&gt;(其中,C 1和C < SUB> 2 是取决于孔口的横截面积或其上游侧的气体温度的常数)。
    • 10. 发明授权
    • Pressure-type flow rate control apparatus
    • 压力式流量控制装置
    • US06152168A
    • 2000-11-28
    • US284352
    • 1999-05-24
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiTomio UnoKouji NishinoHiroyuki FukudaNobukazu IkedaMichio Yamaji
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiTomio UnoKouji NishinoHiroyuki FukudaNobukazu IkedaMichio Yamaji
    • F16K17/22G05D7/06
    • G05D7/0647Y10T137/7759Y10T137/7761
    • A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q=KP1 (K=constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves a variable orifice wherein the gap is adjusted by the orifice drive.
    • PCT No.PCT / JP98 / 03620 Sec。 371日期1999年5月24日 102(e)日期1999年5月24日PCT提交1998年8月13日PCT公布。 公开号WO99 /​​ 09463 日期1999年2月25日一种特别用于半导体制造设备中的气体供给系统的压力式流量控制装置。 流量控制装置设置有可变孔口,其允许容易地切换流体流量控制范围以及压力型流量控制装置的尺寸减小,并且提供其它优点,包括改进的气体替换性,防止灰尘 形成和降低流量控制系统的制造成本。 该装置包括孔口,设置在孔口的上游侧的控制阀,设置在控制阀和孔口之间的压力检测器,以及控制单元,用于根据检测到的压力P1计算流体流量Q 压力检测器具有等式Q = KP1(K =常数),并且在控制阀的驱动器中输出设定流量信号Qs和计算流量信号Q之间的差作为控制信号Qy,其中压力P1 on 孔口的上游侧通过致动用于控制孔口下游流体的流速的控制阀来调节,孔口上游侧的压力P1与保持在不同的孔口的下游压力P2之间的比率P2 / P1 高于受控流体的临界压力的比例,其特征在于,直接触摸式金属隔膜阀单元用作孔口,并且阀海之间的环形间隙 并且隔膜用于可变孔口,其中间隙由孔口驱动器调节。