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1. 发明授权

US06152168A Pressure-type flow rate control apparatus 有权
标题翻译：压力式流量控制装置
公开(公告)号：US06152168A
公开(公告)日：2000-11-28
申请号：US284352
申请日：1999-05-24
申请人： Tadahiro Ohmi , Tetu Kagazume , Kazuhiko Sugiyama , Ryousuke Dohi , Tomio Uno , Kouji Nishino , Hiroyuki Fukuda , Nobukazu Ikeda , Michio Yamaji
发明人： Tadahiro Ohmi , Tetu Kagazume , Kazuhiko Sugiyama , Ryousuke Dohi , Tomio Uno , Kouji Nishino , Hiroyuki Fukuda , Nobukazu Ikeda , Michio Yamaji
IPC分类号： F16K17/22 , G05D7/06
CPC分类号： G05D7/0647 , Y10T137/7759 , Y10T137/7761
摘要： A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q=KP1 (K=constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves a variable orifice wherein the gap is adjusted by the orifice drive.
摘要翻译： PCT No.PCT / JP98 / 03620 Sec。 371日期1999年5月24日 102（e）日期1999年5月24日PCT提交1998年8月13日PCT公布。公开号WO99 / 09463 日期1999年2月25日一种特别用于半导体制造设备中的气体供给系统的压力式流量控制装置。流量控制装置设置有可变孔口，其允许容易地切换流体流量控制范围以及压力型流量控制装置的尺寸减小，并且提供其它优点，包括改进的气体替换性，防止灰尘形成和降低流量控制系统的制造成本。该装置包括孔口，设置在孔口的上游侧的控制阀，设置在控制阀和孔口之间的压力检测器，以及控制单元，用于根据检测到的压力P1计算流体流量Q 压力检测器具有等式Q = KP1（K =常数），并且在控制阀的驱动器中输出设定流量信号Qs和计算流量信号Q之间的差作为控制信号Qy，其中压力P1 on 孔口的上游侧通过致动用于控制孔口下游流体的流速的控制阀来调节，孔口上游侧的压力P1与保持在不同的孔口的下游压力P2之间的比率P2 / P1 高于受控流体的临界压力的比例，其特征在于，直接触摸式金属隔膜阀单元用作孔口，并且阀海之间的环形间隙并且隔膜用于可变孔口，其中间隙由孔口驱动器调节。

2. 发明授权

US06158679A Orifice for pressure type flow rate control unit and process for manufacturing orifice 有权
标题翻译：用于压力式流量控制单元的孔口和用于制造孔口的工艺
公开(公告)号：US06158679A
公开(公告)日：2000-12-12
申请号：US284372
申请日：1999-06-16
申请人： Tadahiro Ohmi , Tetu Kagazume , Kazuhiko Sugiyama , Osamu Fukada , Susumu Ozawa , Yoshihiro Satou , Ryousuke Dohi , Tomio Uno , Kouji Nishino , Hiroyuki Fukuda , Nobukazu Ikeda , Michio Yamaji
发明人： Tadahiro Ohmi , Tetu Kagazume , Kazuhiko Sugiyama , Osamu Fukada , Susumu Ozawa , Yoshihiro Satou , Ryousuke Dohi , Tomio Uno , Kouji Nishino , Hiroyuki Fukuda , Nobukazu Ikeda , Michio Yamaji
IPC分类号： G01F1/40 , G05D7/01 , A62C31/02
CPC分类号： G01F1/40 , G05D7/0186
摘要： An orifice for a pressure-type flow rate controller, which can be produced by a simple method at a low cost, that provides a linearity--between the pressure P1 on the upstream side of the orifice and the flow rate--over a wide range of the pressure ratio P2/P1 of the pressure P2 on the downstream side of the orifice to the upstream pressure P1 and that permits adjustment with ease of flow characteristics among a plurality of orifices. The orifice comprises an inlet taper 1 in the shape of a bugle and a short narrowed straight section 2 adjoining the inlet taper 1, both formed by cutting one opening end of a preliminary hole 6 made in an orifice plate D, and further comprises a short inner taper 3 and an enlarged straight section 4 connecting with the taper 3 which are formed by enlarging the preliminary hole 6 at the other opening end, the short inner taper 3 adjoining the narrowed straight section 2 on one side and neighboring the enlarged straight section 4 on the other side.
摘要翻译： PCT No.PCT / JP98 / 03621 Sec。 371日期1999年6月16日第 102（e）1999年6月16日PCT PCT 1998年8月13日PCT公布。出版物WO99 / 09324 日期1999年2月25日，一种用于压力式流量控制器的孔口，其可以通过简单的方法以低成本生产，其在孔口上游侧的压力P1和流量 - 在孔的下游侧的压力P2的压力比P2 / P1的宽范围到上游压力P1，并且允许在多个孔中容易地调节流动特性。孔口包括一个具有插针形状的入口锥形1和邻近入口锥形1的短缩窄直线部分2，两者都是通过切割在孔板D中制成的预备孔6的一个开口端而形成的，还包括一个短内圆锥体3和与锥体3连接的扩大的直线部分4，其通过在另一个开口端扩大预备孔6而形成，短内锥形件3在一侧邻接变窄的直线部分2并且与扩大的直线部分4相邻另一方面。

3. 发明授权

US06848470B2 Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus 有权
标题翻译：平行分流式流体供给装置和流体切换式压力式流量控制方法以及用于同一流体供给装置的流体切换型压力式流量控制系统
公开(公告)号：US06848470B2
公开(公告)日：2005-02-01
申请号：US10775104
申请日：2004-02-11
申请人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
发明人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
IPC分类号： G05D7/06
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time Δt from the starting point.The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
摘要翻译：一种流体供给装置，具有从一个压力调节器分支出的多个流动管线，流动线平行布置并构造成使得打开或关闭一个流动通道对其它流动通道的稳定流动将没有暂时的影响。每个流路设置有时间延迟型质量流量控制器MFC，使得当一个封闭流体通道打开时，该流路上的质量流量控制器在起始点处以特定延迟时间Deltat达到设定流量Qs。本发明包括通过一个压力式流量控制系统以高精度控制多种气体类型的方法和装置。

4. 发明授权

US06820632B2 Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus 有权
标题翻译：平行分流式流体供给装置和流体切换式压力式流量控制方法以及用于同一流体供给装置的流体切换型压力式流量控制系统
公开(公告)号：US06820632B2
公开(公告)日：2004-11-23
申请号：US10162552
申请日：2002-06-06
申请人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
发明人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
IPC分类号： G05D706
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time At from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
摘要翻译：一种流体供给装置，具有从一个压力调节器分支出的多个流动管线，流动线平行布置并构造成使得打开或关闭一个流动通道对其它流动通道的稳定流动将没有暂时的影响。每个流路设置有时间延迟型质量流量控制器MFC，使得当一个封闭流体通道打开时，该流路上的质量流量控制器在起始点处达到特定延迟时间At的设定流量Qs。本发明包括通过一个压力式流量控制系统以高精度控制多种气体类型的方法和装置。

5. 发明授权

US06422264B1 Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus 有权
公开(公告)号：US06422264B1
公开(公告)日：2002-07-23
申请号：US09734640
申请日：2000-12-13
申请人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
发明人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
IPC分类号： G05D706
摘要： A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &Dgr;t from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.

6. 发明授权

US06302130B1 Method and apparatus for detection of orifice clogging in pressure-type flow rate controllers 有权
标题翻译：用于检测压力型流量控制器孔堵塞的方法和装置
公开(公告)号：US06302130B1
公开(公告)日：2001-10-16
申请号：US09529985
申请日：2000-07-18
申请人： Tadahiro Ohmi , Seiichi Iida , Satoshi Kagatsume , Jun Hirose , Kouji Nishino , Nobukazu Ikeda , Michio Yamaji , Ryousuke Dohi , Kazuhiro Yoshikawa , Mutsunori Koyomogi , Tomio Uno , Eiji Ideta , Takashi Hirose
发明人： Tadahiro Ohmi , Seiichi Iida , Satoshi Kagatsume , Jun Hirose , Kouji Nishino , Nobukazu Ikeda , Michio Yamaji , Ryousuke Dohi , Kazuhiro Yoshikawa , Mutsunori Koyomogi , Tomio Uno , Eiji Ideta , Takashi Hirose
IPC分类号： F17D116
CPC分类号： G05D7/0635 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/8326
摘要： A method and apparatus for detection of clogging of an orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow rate control unit and enhance its safety. The apparatus of detecting clogging of an orifice in a pressure-type flow rate controller has a control valve (CV), an orifice (2), a pressure detector (14) for measuring the upstream pressure P1 therebetween, and a flow rate setting circuit (32) wherein, with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated with the equation QC=KP1 (K=constant) and wherein the control valve (CV) is controlled by the difference signal QY between the calculated flow rate QC and the set flow rate QS. The apparatus comprises: a storage memory M memorizing standard pressure attenuation data Y(t) of the upstream pressure P1 measured with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL with the orifice (2) not clogged, a pressure detector (14) for determination of the pressure attenuation data P(t) of the upstream pressure P1 with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL with the orifice (2) in the actual conditions, a central processing unit CPU for checking the pressure attenuation data P(t) against standard pressure attenuation data Y(t), and an alarm circuit (46) that turns on a clogging alarm when the pressure attenuation data P(t) deviates from standard pressure attenuation data Y(t) to a specific degree or beyond that.
摘要翻译：一种用于通过测量上游侧压力而不破坏使用孔口的流量控制单元中的管道系统来检测孔口堵塞的方法和装置，以延长流量控制单元的寿命并提高其安全性。检测压力型流量控制器中的孔口堵塞的装置具有控制阀（CV），用于测量其上游压力P1的孔口（2），压力检测器（14）和流量设定电路（32）其中，在上游压力P1保持大于下游压力P2的两倍或更多倍的情况下，下游流量QC用等式QC = KP1（K =常数）计算，并且其中控制阀（CV）为由计算流量QC和设定流量QS之间的差分信号QY控制。该装置包括：存储存储器M，存储以从高设定流量QSH切换到低设定流量QSL的流量测量的上游压力P1的标准压力衰减数据Y（t），其中孔口（2）没有堵塞，用于确定上游压力P1的压力衰减数据P（t）的压力检测器（14），其中流量从高设定流量QSH切换到具有孔口（2）的低设定流量QSL 实际情况是用于根据标准压力衰减数据Y（t）检测压力衰减数据P（t）的中央处理单元CPU以及当压力衰减数据P（t）偏离时引起堵塞报警的报警电路（46）从标准压力衰减数据Y（t）到特定程度或以上。

7. 发明授权

US06289923B1 Gas supply system equipped with pressure-type flow rate control unit 有权
标题翻译：供气系统配有压力式流量控制单元
公开(公告)号：US06289923B1
公开(公告)日：2001-09-18
申请号：US09463514
申请日：2000-06-02
申请人： Tadahiro Ohmi , Satoshi Kagatsume , Nobukazu Ikeda , Kouji Nishino , Kazuhiro Yoshikawa , Eiji Ideta , Ryousuke Dohi , Tomio Uno , Michio Yamaji
发明人： Tadahiro Ohmi , Satoshi Kagatsume , Nobukazu Ikeda , Kouji Nishino , Kazuhiro Yoshikawa , Eiji Ideta , Ryousuke Dohi , Tomio Uno , Michio Yamaji
IPC分类号： G05D706
CPC分类号： G05D7/0635 , Y10T137/7759 , Y10T137/7761
摘要： An improved and reduced-size and low-cost gas supply system equipped with a pressure-type flow rate control unit, to be used, for instance, in semiconductor manufacturing facilities is disclosed. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, and to raise the flow rate control accuracy and reliability of facilities. That eliminates non-uniformity of products or semiconductors and raises the production efficiency. The gas supply system equipped with a pressure-type flow rate control unit is so configured that with the pressure on the upstream side of the orifice held about twice or more higher than the downstream side pressure, the gas flow rate is controlled to supply the gas to a gas-using process through an orifice-accompanying valve, the gas supply system comprising a control valve to receive gas from the gas supply source, an orifice-accompanying valve provided on the downstream side of the control valve, a pressure detector provided between the control valve and the orifice-accompanying valve, an orifice provided on the downstream side of the valve mechanism of the orifice-accompanying valve and a calculation control unit where on the basis of the pressure P1 detected by the pressure detector, the flow rate Qc is calculated with an equation Qc=KP1 (K: constant) and the difference between the flow-rate specifying signal Qs and the calculated flow rate Qc is then input as control signal Qy in the drive for the control valve, thereby regulating the opening of the control valve for adjusting the pressure P1 so that the flow rate of the gas to supply can be controlled.
摘要翻译：公开了一种改进的，尺寸较小的低成本的气体供应系统，其配备有例如半导体制造设备中使用的压力式流量控制单元。提高瞬态流量特性，防止气体开始时气体过冲，提高设备的流量控制精度和可靠性。这消除了产品或半导体的不均匀性并提高了生产效率。配置有压力式流量控制单元的气体供给系统被配置为使得在孔口的上游侧的压力保持为比下游侧压力高大约两倍或更多的气体，气体流量被控制以供应气体通过孔口相关阀进行气体使用过程，所述气体供应系统包括用于接收来自气体供应源的气体的控制阀，设置在控制阀的下游侧的孔附件阀，设置在控制阀之间的压力检测器所述控制阀和所述节流孔相关阀，设置在所述节流阀相关阀的阀机构的下游侧的孔口和计算控制单元，其中，基于由所述压力检测器检测到的压力P1，流量Qc 用公式Qc = KP1（K：常数）计算，然后输入流量指定信号Qs和计算流量Qc之间的差作为控制信号Qy i n是用于控制阀的驱动器，由此调节用于调节压力P1的控制阀的打开，从而可以控制供给气体的流量。

8. 发明授权

US07085628B2 Apparatus for the correction of temperature drift for pressure sensor, pressure control apparatus and pressure-type flow rate control apparatus 有权
标题翻译：用于校正压力传感器，压力控制装置和压力型流量控制装置的温度漂移的装置
公开(公告)号：US07085628B2
公开(公告)日：2006-08-01
申请号：US10476973
申请日：2002-11-22
申请人： Tadahiro Ohmi , Tomio Uno , Osamu Nakamura , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino , Atsushi Matsumoto , Kazuhiko Sugiyama
发明人： Tadahiro Ohmi , Tomio Uno , Osamu Nakamura , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino , Atsushi Matsumoto , Kazuhiko Sugiyama
IPC分类号： G06D23/00
CPC分类号： G05D7/0635 , G01D3/022 , G01F1/50 , G01F15/046 , G01L9/025
摘要： A pressure sensor, a pressure control apparatus, and a flow rate control apparatus are provided to automatically correct temperature drift of the pressure sensor and accurately detect pressure despite changes in temperature. An embodiment includes an upstream side pressure sensor between an orifice and a control valve, to control flow rate through the orifice by a regulating control valve, while calculating the flow from the upstream side pressure. With a temperature sensor, a memory means, and a temperature drift correcting means which calculates drift of the upstream side pressure sensor from data in the memory means when the temperature of the fluid changes and offsets the output drift of the upstream side pressure sensor with the calculated amount of the output drift, temperature drift of the pressure sensor is automatically corrected, enabling accurate control of flow rate.
摘要翻译：提供压力传感器，压力控制装置和流量控制装置来自动校正压力传感器的温度漂移并且尽管温度变化来精确地检测压力。一个实施例包括在孔口和控制阀之间的上游侧压力传感器，用于通过调节控制阀控制通过孔口的流量，同时计算从上游侧压力的流量。利用温度传感器，存储装置和温度漂移校正装置，当流体的温度变化时，上游侧压力传感器的输出漂移与输出漂移的计算量，压力传感器的温度漂移自动校正，可以精确控制流量。

9. 发明授权

US06964279B2 Pressure-type flow rate control apparatus 有权
标题翻译：压力式流量控制装置
公开(公告)号：US06964279B2
公开(公告)日：2005-11-15
申请号：US10469151
申请日：2002-11-22
申请人： Tadahiro Ohmi , Tomio Uno , Osamu Nakamura , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino , Atsushi Matsumoto , Kazuhiko Sugiyama , Shujiro Inui , Taiji Sakai , Masanori Ueyama
发明人： Tadahiro Ohmi , Tomio Uno , Osamu Nakamura , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino , Atsushi Matsumoto , Kazuhiko Sugiyama , Shujiro Inui , Taiji Sakai , Masanori Ueyama
IPC分类号： G01F1/00 , G01F1/36 , G01F1/42 , G05D7/06
CPC分类号： G05D7/0635 , Y10T137/7759 , Y10T137/7761
摘要： A pressure-type flow rate control apparatus controls the flow rate of fluid passing through an orifice to a target flow rate. The flow rate of a compressible fluid under non-critical conditions (sub-sonic) passing through the orifice is calculated by: Qc=KP2m(P1−P2)n so that the flow rate can be controlled to the target flow rate with high precision and speed. Also provided is an improved pressure-type flow rate control apparatus in which a pressure ratio P2/P1=r, obtained from an upstream pressure P1 and a downstream pressure P2 is constantly compared with a critical value r, and under critical conditions (r≦rc), the flow rate is calculated by: Qc=KP1. Under non-critical conditions (r>rc), the flow rate is calculated by Qc=KP2m(P1−P2)n.
摘要翻译：压力式流量控制装置将通过孔口的流体的流量控制为目标流量。通过孔口的非临界条件（亚音）的可压缩流体的流量通过以下公式计算：<？in-line-formula description =“In-line Formulas”end =“lead”？> Qc = KP （P 1→P 2） -formulae description =“在线公式”end =“tail”？>，可以以高精度和高速度将流量控制在目标流量上。还提供了一种改进的压力型流量控制装置，其中从上游压力P 1获得的压力比P 2 / P 1 / / SUB>和下游压力P 2 2不断与临界值r进行比较，在临界条件（r≤Rc c）下，流量由下式计算：：<？in-line-formula description =“In-line Formulas”end =“lead”？> Qc = KP <1> <？in-line-formula description =“In-line Formulas” end =“tail”？>在非关键条件下（r> r> c ），流量通过Qc = KP 2 / （P 1→P 2）。

10. 发明授权

US07926509B2 Method for flow rate control of clustering fluid and device for flow rate control of clustering fluid employed in the method 有权
标题翻译：聚类流体流量控制方法和方法中采用的聚类流体流量控制装置
公开(公告)号：US07926509B2
公开(公告)日：2011-04-19
申请号：US11182762
申请日：2005-07-18
申请人： Tadahiro Ohmi , Kazuhiko Sugiyama , Kenetu Mizusawa , Eiji Takahashi , Tomio Uno , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda , Masaaki Nagase
发明人： Tadahiro Ohmi , Kazuhiko Sugiyama , Kenetu Mizusawa , Eiji Takahashi , Tomio Uno , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda , Masaaki Nagase
IPC分类号： F16K49/00
CPC分类号： H01L21/67023 , G05D7/0635 , Y10T137/6416 , Y10T137/6606 , Y10T137/7761
摘要： Disclosed is a method of controlling the flow rate of clustering fluid using a pressure type flow rate control device in which the flow rate Q of gas passing through an orifice is computed as K=KP1 (where K is a constant) with the gas being in a state where the ratio P2/P1 between the gas pressure P1 on the upstream side of the orifice and the gas pressure P2 on the downstream side of the orifice is held at a value not higher than the critical pressure ratio of the gas wherein the association of molecules is dissociated either by heating the pressure type flow rate control device to the temperature higher than 40° C., or by applying the diluting gas to the clustering fluid to make it lower than a partial pressure so the clustering fluid is permitted to pass through the orifice in a monomolecular state.
摘要翻译：公开了一种使用压力式流量控制装置控制聚集流体的流量的方法，其中通过孔口的气体的流量Q被计算为K = KP1（其中K是常数），气体处于孔口上游侧的气体压力P1与孔口下游侧的气体压力P2之间的比P2 / P1保持在不高于气体的临界压力比的值的状态，的分子通过将压力型流量控制装置加热到高于40℃的温度来解离，或者通过将稀释气体施加到聚集流体以使其低于分压使得聚集流体被允许通过通过孔在单分子状态。

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