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    • 4. 发明授权
    • Photoresist compositions
    • 光刻胶组合物
    • US08507569B2
    • 2013-08-13
    • US13255543
    • 2010-03-17
    • Hisatoshi KuraKaori SameshimaKazuhiko KunimotoPeter NesvadbaMasaki Ohwa
    • Hisatoshi KuraKaori SameshimaKazuhiko KunimotoPeter NesvadbaMasaki Ohwa
    • H05B6/68C08G61/04
    • G03F7/028C07D211/94C07D491/113C08F110/02C08F110/06C08F265/02C08K5/3435G03F7/0007G03F7/031G03F7/40C08L33/06
    • The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking. The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula (I) wherein Ra represents an acyl radical; one of Rb and Rc represents hydrogen and the other one represents a substituent; or Rb and Rc both represent hydrogen or identical or different substituents; or Rb and Rc together represent oxygen; or Rb and Rc together form a ring; R1-R4 each represent C1-C6 alkyl; and R5 and R6 each represent independently of one another hydrogen, C1-C6 alkyl or C6-C10 aryl; or R5 and R6 together represent oxygen.
    • 本发明涉及一种可自由基聚合的组合物,其包含用于制造滤色器的羟胺酯。 本发明还涉及新的羟胺酯。 本发明还涉及在需要后烘烤的所有液晶显示组件中使用羟胺酯。 本发明涉及可自由基聚合的组合物,其包含:(a)至少一种碱性显影树脂; (b)至少一种丙烯酸酯单体; (c)至少一种光引发剂; (d)至少一种式(I)的羟胺酯化合物,其中R a表示酰基; Rb和Rc之一表示氢,另一个表示取代基; 或Rb和Rc都表示氢或相同或不同的取代基; 或Rb和Rc一起代表氧; 或Rb和Rc一起形成环; R1-R4各自表示C1-C6烷基; R 5和R 6各自独立地表示氢,C 1 -C 6烷基或C 6 -C 10芳基; 或R5和R6一起表示氧。
    • 6. 发明授权
    • Oxime ester photoinitiators
    • 肟酯光引发剂
    • US07759043B2
    • 2010-07-20
    • US11660346
    • 2005-08-08
    • Junichi TanabeKazuhiko KunimotoHisatoshi KuraHidetaka OkaMasaki Ohwa
    • Junichi TanabeKazuhiko KunimotoHisatoshi KuraHidetaka OkaMasaki Ohwa
    • G03C1/00C07D213/00C07D207/00C07D209/56C09B5/00G03F7/26C08F2/50
    • G03F7/031B33Y70/00C07D209/86C07D413/10
    • Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.
    • 式(I)化合物,其中R 1,R 2和R 10彼此独立地是C 1 -C 20烷基,苯基,C 1 -C 12烷基苯基或苯基-C 1 -C 6烷基; R 3和R 4彼此独立地是氢,C 1 -C 20烷基,NR 6 R 7或SR 8,条件是R 3或R 4中的至少一个是NR 6 R 7或SR 8; R5是氢或C1-C20烷基; R 6和R 7彼此独立地是C 1 -C 20烷基,或者R 6和R 7与它们所连接的N原子一起形成5或6元环,其任选地被O,S或NR 9中断,并且任选地另外是 被一个或多个C 1 -C 4烷基取代; R8是苯基,联苯基,萘基,蒽基或菲基,它们全部被一个或多个C 1 -C 4烷基取代; 且R 9为氢,C 1 -C 20烷基,C 2 -C 4羟烷基或苯基; 在光聚合反应中表现出出人意料的良好性能。
    • 9. 发明申请
    • OXIME ESTER
    • US20130188270A1
    • 2013-07-25
    • US13824678
    • 2011-10-04
    • Yuichi NishimaeHisatoshi KuraKazuhiko KunimotoRyuhei YamagamiKeita Tanaka
    • Yuichi NishimaeHisatoshi KuraKazuhiko KunimotoRyuhei YamagamiKeita Tanaka
    • C08F2/50C07D409/10G02B5/22C07D409/12C07D403/10C07D209/80C07D405/12
    • C08F2/50B33Y70/00C07D209/80C07D209/86C07D403/10C07D405/12C07D409/10C07D409/12G02B5/223G03F7/0007G03F7/029G03F7/031G03F7/105
    • Compounds of the formula (I), wherein R1, R2, R3, R4, R5, R6, R7 and R8 for example independently of each other are hydro-gen, C1-C20alkyl, (II), COR16 or NO2, provided that at least one pair of R1 and R2, R2 and R3, R3 and R4, R5 and R6, R6 and R7, or R7 and R8 is (III); R9, R10, R11 and R12 for example independently of each other are hydrogen, C1-C20alkyl which optionally substituted; or R9, R10, R11, and R12 independently of each other are unsubstituted or substituted phenyl; X is CO or a direct bond; R13 is for example C1-C20alkyl which optionally is substituted, C2-C12alkenyl, C4-C8cycloalkenyl, C2-C12alkinyl, C3-C10-cycloalkyl, phenyl or naphthyl both of which are optionally substituted; R14 is for example hydrogen, C3-C8cycloalkyl, C2-C5alkenyl, C1-C20alkoxy, C1-C20alkyl, phenyl or naphthyl; R15 is for example C6-C20aryl or C5-C20heteroaryl; R16 is for example C6-C20aryl which is unsubstituted or substituted by one or more C1-C20alkoxy or C1-C20alkyl; are in particular suitable as photoinitiators for color filter applications.
    • 式(I)的化合物,其中R 1,R 2,R 3,R 4,R 5,R 6,R 7和R 8例如彼此独立地是氢,C 1 -C 20烷基,(II),COR 16或NO 2, 至少一对R1和R2,R2和R3,R3和R4,R5和R6,R6和R7,或R7和R8是(III); R9,R10,R11和R12彼此独立地是氢,任选取代的C 1 -C 20烷基; 或R 9,R 10,R 11和R 12彼此独立地是未取代或取代的苯基; X是CO或直接键; R13是例如任选被取代的C 1 -C 20烷基,C 2 -C 12烯基,C 4 -C 8环烯基,C 2 -C 12炔基,C 3 -C 10 - 环烷基,苯基或萘基,它们都是任选取代的; R 14是例如氢,C 3 -C 8环烷基,C 2 -C 5烯基,C 1 -C 20烷氧基,C 1 -C 20烷基,苯基或萘基; R 15例如是C 6 -C 20芳基或C 5 -C 20杂芳基; R 16是例如未被取代或被一个或多个C 1 -C 20烷氧基或C 1 -C 20烷基取代的C 6 -C 20芳基; 特别适用于用于滤色器应用的光引发剂。
    • 10. 发明授权
    • Photosensitive resin composition
    • 感光树脂组合物
    • US07829257B2
    • 2010-11-09
    • US09734635
    • 2000-12-12
    • Hidetaka OkaKazuhiko KunimotoHisatoshi KuraMasaki OhwaJunichi Tanabe
    • Hidetaka OkaKazuhiko KunimotoHisatoshi KuraMasaki OhwaJunichi Tanabe
    • G03C1/00
    • C08F2/50G03F7/031
    • Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR3, SR4 or NR5R6; or M1, when x is 3, is a trivalent group, optionally substituted; R3 is for example hydrogen or C1-C12alkyl; C2-C6alkyl which is for example substituted by —OH, —SH, —CN, C3-C6alkenoxy, or —OCH2CH2CN; R4 is for example hydrogen, C1-C12alkyl, C3-C12alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R5 and R6 independently of each other inter alia are hydrogen, C1-C12alkyl, C2-C4hydroxyalkyl, C2-C10alkoxyalkyl, C3-C5alkenyl, C3-C8cycloalkyl, phenyl-C1-C3alkyl, C1-C4alkanoyl, C3-C6alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.
    • 光敏组合物,其包含(A)碱溶性化合物; (B)至少一种式I或II的化合物,其中R 1特别是C 4 -C 9环烷酰基,C 3 -C 12烯酰基或未取代或取代的苯甲酰基; Ar 1是C 6 -C 20芳基或C 6 -C 20芳酰基,其各自为未取代或取代的; x为2或3; M1当x为2时,特别是亚苯基或亚萘基,其各自任选被取代。 由OR3,SR4或NR5R6; 或M1,当x为3时,为任选取代的三价基团; R3是例如氢或C1-C12烷基; 例如被-OH,-SH,-CN,C 3 -C 6烯氧基或-OCH 2 CH 2 CN取代的C 2 -C 6烷基; R4是例如氢,C1-C12烷基,C3-C12链烯基,环己基或未取代或取代的苯基; R 5和R 6彼此独立地尤其是氢,C 1 -C 12烷基,C 2 -C 4羟烷基,C 2 -C 10烷氧基烷基,C 3 -C 5烯基,C 3 -C 8环烷基,苯基-C 1 -C 3烷基,C 1 -C 4烷酰基,C 3 -C 6烯酰基,苯甲酰基或苯基 未取代或取代; 和(C)可光聚合化合物; 表现出意想不到的良好性能,特别是在光刻胶技术中。