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    • 3. 发明授权
    • Undercoating material for photosensitive resins
    • 感光树脂底漆材料
    • US4902770A
    • 1990-02-20
    • US52466
    • 1987-05-20
    • Wataru IshiiShozo MiyazawaShinji TsuchiyaHisashi NakaneAkira Yokota
    • Wataru IshiiShozo MiyazawaShinji TsuchiyaHisashi NakaneAkira Yokota
    • G03F7/09G03F7/11
    • G03F7/11G03F7/094
    • The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.
    • 本发明的底涂层组合物可用作在基材表面上提供感光性抗蚀剂层的顶涂层的底涂层,其主要成分为通过羟基取代的二苯胺和 在氮原子上被羟甲基和/或烷氧基甲基取代的三聚氰胺化合物。 获得的组合物的底漆对于施加在其上的外涂层溶液的侵蚀是高度抗性的,使得由于在底漆和面漆之间的界面处没有任何障碍,通过光刻技术的图案再现的保真度被大大提高 层。 当底涂层组合物还包含光致纤维素剂,例如, 染料,其表面涂层的光敏抗蚀剂具有敏感性的波长区域具有吸收性。
    • 4. 发明授权
    • Time-axis compression-expansion devices for sound signals
    • 用于声音信号的时间轴压缩扩展装置
    • US4365115A
    • 1982-12-21
    • US141617
    • 1980-04-18
    • Masayuki NagataShozo Miyazawa
    • Masayuki NagataShozo Miyazawa
    • G11B20/00G11B13/00
    • G11B20/00007
    • The device of the present invention utilizes a processing principle for time-axis compression-expansion devices which presents variations of reproduction speed from reducing the intelligibility of sounds. Sound signals, without being subjected to any time-axis processing, are altered in frequency while some reduction in intelligibility would be expected to occur, the sound signals are subjected to time-axis transformation processing (compression-expansion processing) to yield reproduced signals of high intelligibility.The present invention is characterized by the capability of making this type of processing available through the use of simple, inexpensive system configurations such as an analog to digital conversion system based on delta/.DELTA. modulation. The speed-changer signal processing circuitry is bypassed automatically when record-playback speeds are the same to avoid processing noise.
    • 本发明的装置利用了时间轴压缩扩展装置的处理原理,其提供再现速度的变化以减少声音的可懂度。 在不受任何时间轴处理的情况下,声音信号在频率上被改变,同时可以预期会发生一些可理解性的降低,对声音信号进行时间轴变换处理(压缩扩展处理)以产生 高清晰度 本发明的特征在于通过使用诸如基于Δ/ DELTA调制的模数转换系统的简单,便宜的系统配置使得这种类型的处理可用。 当记录回放速度相同时,速度变换器信号处理电路被自动旁路以避免处理噪声。
    • 5. 发明授权
    • Water-soluble photosensitive resin composition and a method of forming
black matrix patterns using the same
    • 水溶性光敏树脂组合物和使用其形成黑矩阵图案的方法
    • US5725978A
    • 1998-03-10
    • US590475
    • 1996-01-24
    • Shozo Miyazawa
    • Shozo Miyazawa
    • C08F226/06G03F7/00G03F7/012G03C5/00
    • G03F7/012C08F226/06G03F7/0007
    • The improved water-soluble photosensitive resin composition comprises a high-polymer compound represented by the general formula(I): ##STR1## (where X is Na, K or NH.sub.4) and a water-soluble polymer which is either polyvinylpyrrolidone or a copolymer of vinylpyrrolidone and vinylimidazole or both. The composition is applied to a substrate, exposed through a mask pattern and developed to form a photocured pattern and, thereafter, a light absorber is applied to the entire surface of the substrate and dried, followed by stripping away the photocured pattern and the overlying light absorber to form a black matrix pattern. The composition is suitable for use as a photoresist in the manufacture of black matrices as on color CRTs and capable of efficient formation of photocured patterns with high sensitivity by shorter times and lower intensities of exposure. In addition, the composition adheres strongly to glass substrates and is capable of pattern formation as thin film that is faithful to the mask pattern used.
    • 改进的水溶性光敏树脂组合物包含由通式(I)表示的高分子化合物:其中X是Na,K或NH 4,和水溶性聚合物,其是聚乙烯吡咯烷酮或 乙烯基吡咯烷酮和乙烯基咪唑的共聚物或两者。 将组合物施加到基板上,通过掩模图案曝光并显影以形成光固化图案,然后将光吸收剂施加到基板的整个表面上并干燥,然后剥离光固化图案和上覆光 吸收体形成黑色矩阵图案。 该组合物适用于在彩色CRT上制造黑色矩阵中的光致抗蚀剂,并且能够通过更短的时间和更低的曝光强度有效地形成具有高灵敏度的光固化图案。 此外,组合物强烈地粘附到玻璃基板上,并且能够形成图案,作为忠实于所使用的掩模图案的薄膜。