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1. 发明授权

US4658143A Ion source 失效
标题翻译：离子源
公开(公告)号：US4658143A
公开(公告)日：1987-04-14
申请号：US711824
申请日：1985-03-14
申请人： Katsumi Tokiguchi , Hidemi Koike , Noriyuki Sakudo , Osami Okada , Ken Ninomiya , Susumu Ozasa
发明人： Katsumi Tokiguchi , Hidemi Koike , Noriyuki Sakudo , Osami Okada , Ken Ninomiya , Susumu Ozasa
IPC分类号： H01J27/02 , H01J27/18 , H01J37/08 , H01J27/00
CPC分类号： H01J37/08 , H01J27/022 , H01J27/18
摘要： An ion source equipped with an ion beam exit slit for extracting ions from plasma generated in feed gas introduced into a discharge chamber, and with gas inlet or inlets for introducing the feed gas into the discharge chamber in close proximity of the ion beam exit slit. Ion extraction can be made stably without any deposit on the ion beam exit slit even when a boron halide is used as the feed gas. The effect of the ion source can be further enhanced by adding oxygen, hydrogen or gas of an oxygen-containing compound to the feed gas, and by using a microwave.
摘要翻译：离子源配备有用于从引入到放电室的进料气体中产生的等离子体提取离子的离子束出口狭缝，以及用于将进料气体引入离子束出口狭缝附近的放电室的气体入口或入口。即使使用卤化硼作为原料气体，也可以稳定地进行离子提取，而不会在离子束出口狭缝上沉积。通过向原料气中加入含氧化合物的氧气，氢气或气体，以及使用微波可以进一步提高离子源的效果。

2. 发明授权

US4801847A Charged particle accelerator using quadrupole electrodes 失效
标题翻译：使用四极电极的带电粒子加速器
公开(公告)号：US4801847A
公开(公告)日：1989-01-31
申请号：US763133
申请日：1985-07-29
申请人： Noriyuki Sakudo , Katsumi Tokiguchi , Hidemi Koike , Osami Okada , Norio Saito , Susumu Ozasa
发明人： Noriyuki Sakudo , Katsumi Tokiguchi , Hidemi Koike , Osami Okada , Norio Saito , Susumu Ozasa
IPC分类号： H01J37/30 , H01J37/317 , H05H7/02 , H05H7/18 , H05H9/00 , H01J25/10
CPC分类号： H05H7/02 , H01J37/3007 , H01J37/3171 , H05H7/18 , H05H9/00
摘要： A charged particle accelerator is provided with quadrupole electrodes with surfaces that are opposed to each other and are undulated, and with an external resonance circuit. The external resonance circuit consists of a capacitor formed by the opposing electrodes, a variable capacitor provided in parallel with said capacitor, and a coil. The resonance frequency is variable. A direct current and an alternating current may be applied in a superposed manner to the quadrupole electrodes. The thus constructed accelerator can be employed for an ion implanter to implant a heavy-current ion beam of several hundred KeV to several MeV.
摘要翻译： PCT No.PCT / JP84 / 00557 Sec。 371日期：1985年7月29日第 102（e）日期1985年7月29日PCT 1984年11月22日PCT公布。公开号WO85 / 02489 日期：1985年6月6日。带电粒子加速器具有四极电极，四极电极具有彼此相对的并且起伏的表面，并具有外部谐振电路。外部谐振电路包括由相对电极形成的电容器，与所述电容器并联设置的可变电容器和线圈。共振频率是可变的。直流电流和交流电可以叠加施加到四极电极。这样构造的加速器可以用于离子注入机，以将几百KeV的大电流离子束注入几MeV。

3. 发明授权

US4629930A Plasma ion source 失效
标题翻译：等离子体离子源
公开(公告)号：US4629930A
公开(公告)日：1986-12-16
申请号：US517696
申请日：1983-07-27
申请人： Noriyuki Sakudo , Osami Okada , Susumu Ozasa , Katsumi Tokiguchi , Hidemi Koike , Shunroku Taya , Mitsunori Komatsumoto , Mitsuo Komatsu
发明人： Noriyuki Sakudo , Osami Okada , Susumu Ozasa , Katsumi Tokiguchi , Hidemi Koike , Shunroku Taya , Mitsunori Komatsumoto , Mitsuo Komatsu
IPC分类号： H01J27/02 , H01J27/16 , H05H7/08
CPC分类号： H01J27/16 , H01J27/022
摘要： A plasma ion source includes a discharge chamber in which a plasma is produced by plasma generator, with an acceleration electrode being disposed adjacent to the discharge chamber in order to extract ions from the produced plasma. A deceleration electrode is disposed adjacent to the acceleration electrode to decelerate the extracted ions, and a ground electrode is disposed adjacent to the deceleration electrode. An insulator container is disposed so as to surround the discharge chamber and the respective electrodes, and a shield ring electrode of ground potential is disposed in the vicinity of the deceleration electrode and along an inner wall surface of the insulator container in order to prevent any discharge from arising across the deceleration electrode and the ground electrode.
摘要翻译：等离子体离子源包括其中由等离子体发生器产生等离子体的放电室，其中加速电极邻近放电室设置，以从所产生的等离子体中提取离子。减速电极与加速电极相邻地设置，以使所提取的离子减速，并且接地电极与减速电极相邻配置。绝缘体容器设置成围绕放电室和各个电极，并且将地电位的屏蔽环电极设置在减速电极附近并且沿着绝缘体容器的内壁表面设置，以防止任何放电来自减速电极和接地电极。

4. 发明授权

US4633138A Ion implanter 失效
标题翻译：离子注入机
公开(公告)号：US4633138A
公开(公告)日：1986-12-30
申请号：US766393
申请日：1985-08-16
申请人： Katsumi Tokiguchi , Osami Okada , Noriyuki Sakudo , Hidemi Koike
发明人： Katsumi Tokiguchi , Osami Okada , Noriyuki Sakudo , Hidemi Koike
IPC分类号： G21K5/10 , H01J37/317 , H01L21/265 , G21K5/00 , H01J7/24
CPC分类号： H01J37/3171 , G21K5/10
摘要： In order to implant ions uniformly in a plurality of wafers, carriers, on which a plurality of wafers are mounted, are moved along a straight line one after another. An ion implanter comprises a beam sweep width controller for controlling the beam sweep width in such a manner that the area scanned with the ion beam by sweeping it coincides approximately with the shape of the wafers in which ions are to be implanted and a carrier speed controller for controlling the carrier speed, depending on the beam sweep width so that the dose of ions implanted in the wafers is uniform. The beam sweep width controller includes a detector for detecting the width of a wafer in which ions are being implanted in the one direction and a controller for varying the beam sweep width, depending on the width of the wafer thus detected. The carrier speed controller varies the carrier speed inversely proportionally to the width of the wafer thus detected.
摘要翻译：为了将离子均匀地注入到多个晶片中，其上安装有多个晶片的载体沿着直线一个接一个地移动。离子注入机包括用于以这样一种方式控制光束扫描宽度的光束扫描宽度控制器，其中通过扫描其被离子束扫描的区域大致与离子将被注入的晶片的形状重合，并且载波速度控制器用于根据光束扫描宽度控制载体速度，使得植入晶片中的离子的剂量是均匀的。光束扫描宽度控制器包括检测器，用于检测其中沿一个方向注入离子的晶片的宽度，以及用于根据检测到的晶片的宽度改变光束扫描宽度的控制器。载波速度控制器将载波速度与所检测的晶片的宽度成反比地变化。

5. 发明授权

US4543465A Microwave plasma source having improved switching operation from plasma ignition phase to normal ion extraction phase 失效
标题翻译：微波等离子体源具有从等离子体点火阶段到正常离子提取阶段的改进的开关操作
公开(公告)号：US4543465A
公开(公告)日：1985-09-24
申请号：US517404
申请日：1983-07-26
申请人： Noriyuki Sakudo , Katsunobu Abe , Katsumi Tokiguchi , Hidemi Koike , Osami Okada
发明人： Noriyuki Sakudo , Katsunobu Abe , Katsumi Tokiguchi , Hidemi Koike , Osami Okada
IPC分类号： H01J27/16 , B23K10/00 , C23F4/00 , H01J37/08 , H01L21/302 , H01L21/3065 , B23K9/00 , H01J27/00
CPC分类号： B23K10/006
摘要： In a microwave plasma source, a discharge space supplied with a microwave electric field is supplied with a DC magnetic field. A material to be ionized is introduced into the discharge space to produce plasma, whereby ions are extracted through an ion extracting system. A switch is provided for effecting through switching operation the change-over of the magnetic field applied to the discharge space from the intensity for the ignition of plasma to the intensity for ion extraction in succession to completion of the plasma ignition.
摘要翻译：在微波等离子体源中，向微波电场供给的放电空间被供给直流磁场。将被离子化的材料引入放电空间以产生等离子体，从而通过离子提取系统提取离子。提供了一种开关，用于通过切换操作，将施加到放电空间的磁场的转换从等离子体的点火强度切换到等离子体点火完成之后的离子提取强度。

6. 发明授权

US4433228A Microwave plasma source 失效
标题翻译：微波等离子体源
公开(公告)号：US4433228A
公开(公告)日：1984-02-21
申请号：US319987
申请日：1981-11-10
申请人： Shigeru Nishimatsu , Keizo Suzuki , Noriyuki Sakudo , Ken Ninomiya , Hidemi Koike , Osami Okada , Shinjiro Katagiri , Sadayuki Okudaira
发明人： Shigeru Nishimatsu , Keizo Suzuki , Noriyuki Sakudo , Ken Ninomiya , Hidemi Koike , Osami Okada , Shinjiro Katagiri , Sadayuki Okudaira
IPC分类号： H01J25/50 , H01J27/16 , H01J37/08 , H01J37/317 , H01J37/32 , H01L21/265 , H01L21/302 , H01L21/3065 , H05H1/46
CPC分类号： H01J37/32211 , H01J37/32192 , H01J37/32293
摘要： The microwave plasma source of this invention comprises a vacuum room which forms a discharging space with discharge gas introduced therein, a means for conducting the microwave to the discharging space so that the microwave electric field is provided in the discharging space, and a means for providing the magnetic field in the discharging space located on the microwave propagating path and made up of a permanent magnet which virtually propagates the microwave.
摘要翻译：本发明的微波等离子体源包括形成放电空间的真空室，其中引入有放电气体，用于将微波传导到放电空间的装置，使得微波电场设置在放电空间中，以及用于提供位于微波传播路径上的放电空间中的磁场，并由实际上传播微波的永磁体组成。

7. 发明授权

US4579623A Method and apparatus for surface treatment by plasma 失效
标题翻译：用等离子体表面处理的方法和装置
公开(公告)号：US4579623A
公开(公告)日：1986-04-01
申请号：US642801
申请日：1984-08-21
申请人： Keizo Suzuki , Ken Ninomiya , Shigeru Nishimatsu , Sadayuki Okudaira , Osami Okada
发明人： Keizo Suzuki , Ken Ninomiya , Shigeru Nishimatsu , Sadayuki Okudaira , Osami Okada
IPC分类号： H01L21/205 , C23C16/511 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/318 , H01L21/3213 , H01L21/306 , B05B5/02 , B05D3/06 , B44C1/22
CPC分类号： H01J37/32935 , C23C16/511 , H01L21/30655 , H01L21/3185 , H01L21/32135 , H01L21/32136 , H01L21/32137
摘要： A gas is introduced into a vacuum chamber after the vacuum chamber is evacuated, and a plasma is generated within at least part of the vacuum chamber. The specimen surface is exposed to the plasma so that the surface is treated. A plurality of different gases, such as SF.sub.6, N.sub.2, and the like, are used as the gas being introduced. The quantity of the gas is changed during the surface treatment. A controller is used as a mechanism for changing the quantity of gas introduced. The controller is operated in accordance with a predetermined program, or by signals obtained by detecting the surface conditions of the specimen during the surface treatment.
摘要翻译：在真空室抽真空之后，将气体引入真空室中，并且在真空室的至少一部分内产生等离子体。将样品表面暴露于等离子体，使得表面被处理。使用多种不同的气体，例如SF 6，N 2等，作为被引入的气体。在表面处理期间，气体的量变化。控制器用作改变引入气体量的机构。控制器根据预定的程序或通过在表面处理期间检测样品的表面状态而获得的信号进行操作。

8. 发明授权

US5108543A Method of surface treatment 失效
标题翻译：表面处理方法
公开(公告)号：US5108543A
公开(公告)日：1992-04-28
申请号：US262266
申请日：1988-10-20
申请人： Keizo Suzuki , Ken Ninomiya , Shigeru Nishimatsu , Osami Okada
发明人： Keizo Suzuki , Ken Ninomiya , Shigeru Nishimatsu , Osami Okada
IPC分类号： C23C14/22 , C30B25/18 , H01L21/20 , H01L21/306 , H01L21/3065 , H01L21/311 , H01L21/316 , H01L21/318 , H01L21/3213
CPC分类号： H01L21/02019 , C23C14/22 , C30B25/18 , H01L21/02164 , H01L21/0217 , H01L21/02238 , H01L21/02252 , H01L21/02271 , H01L21/02381 , H01L21/02532 , H01L21/02546 , H01L21/0262 , H01L21/30621 , H01L21/3065 , H01L21/31116 , H01L21/31612 , H01L21/31662 , H01L21/3185 , H01L21/32136 , H01L21/32137
摘要： Surface treatment is applied to a substrate by supplying thereto excited molecules in which the vibrational energy level is excited. SF.sub.6, O.sub.2, N.sub.2, etc., are used as the excited molecules and supplied to the substrate as beams. This method is particularly suitable for the surface treatment in the production of semiconductor devices.
摘要翻译：通过向其施加激发振动能级的激发分子对基板施加表面处理。 SF6，O2，N2等被用作激发分子并作为光束提供给基板。该方法特别适用于半导体器件的制造中的表面处理。

9. 发明授权

US4901667A Surface treatment apparatus 失效
标题翻译：表面处理装置
公开(公告)号：US4901667A
公开(公告)日：1990-02-20
申请号：US891641
申请日：1986-08-01
申请人： Keizo Suzuki , Ken Ninomiya , Shigeru Nishimatsu , Osami Okada
发明人： Keizo Suzuki , Ken Ninomiya , Shigeru Nishimatsu , Osami Okada
IPC分类号： H01L21/205 , C23C16/452 , C23F4/00 , H01J37/30 , H01L21/302 , H01L21/3065 , H01L21/31
CPC分类号： C23C16/452
摘要： A surface treatment apparatus comprising a vacuum chamber, means for introducing a gas into the vacuum chamber, a gas furnace for heating and activating the gas while it is being introduced, apertures for injecting the heated gas, and a substrate stage for holding a substrate of which the surface is to be treated by the injected gas. The gas that is heated and activated is blown onto the surface of the substrate to treat the surface without causing the surface to be damaged. Therefore, the apparatus can be employed very effectively for a process for producing semiconductor elements.
摘要翻译：一种表面处理装置，包括真空室，用于将气体引入真空室的装置，用于在引入气体时加热和活化气体的气体炉，用于喷射加热气体的孔，以及用于保持基板的基板的基板台表面将被注入的气体处理。被加热和活化的气体被吹到基板的表面上以处理该表面而不会使表面受损。因此，该装置可以非常有效地用于制造半导体元件的工艺。

10. 发明授权

US4769540A Atmospheric pressure ionization mass spectrometer 失效
标题翻译：大气压电离质谱仪
公开(公告)号：US4769540A
公开(公告)日：1988-09-06
申请号：US924640
申请日：1986-10-30
申请人： Yasuhiro Mitsui , Osami Okada
发明人： Yasuhiro Mitsui , Osami Okada
IPC分类号： G01N27/62 , H01J49/04 , H01J49/10 , H01J49/12 , H01J49/14
CPC分类号： H01J49/24 , H01J49/145
摘要： An atmospheric pressure ionization mass spectrometer which comprises an ion source for ionizing a sample gas, a low pressure region provided with a mass filter and a collector therein, a differential pumping region provided between the ion source and the low pressure region and with electrodes provided on the side of the ion source and on the side of the low pressure region, respectively, and a pressure-gradient electrode means for dissociation and removal of cluster ions, as connected to the electrode on the side of the ion source among the electrodes provided in the differential pumping region is disclosed.
摘要翻译：一种大气压电离质谱仪，其包括用于离子化样品气体的离子源，设置有质量过滤器的低压区域和集尘器，设置在离子源和低压区域之间的差分泵浦区域以及设置在离子源的侧面和低压区域的一侧，以及用于离解和去除簇离子的压力梯度电极装置，其连接到设置在电极中的电极之间的离子源侧的电极公开了差分泵浦区域。

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