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1. 发明授权

US5672459A Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups 失效
标题翻译：含有具有两个受阻酚基团的醌二叠氮酯的辐射敏感性树脂组合物
公开(公告)号：US5672459A
公开(公告)日：1997-09-30
申请号：US621008
申请日：1996-03-22
申请人： Katsumi Inomata , Masahiro Akiyama , Toshiyuki Ota , Akira Tsuji
发明人： Katsumi Inomata , Masahiro Akiyama , Toshiyuki Ota , Akira Tsuji
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/022
摘要： The present invention provides a radiation sensitive resin composition which contains an alkali soluble resin and a 1,2-quinonediazide compound represented by the following formula, for example. ##STR1## The radiation sensitive resin composition of the present invention has an excellent developability, provides an excellent pattern shape, is superior in sensitivity and resolution, and has greatly improved focus latitude and heat resistance in particular. Therefore, the radiation sensitive resin composition of the present invention can be suitably used as a resist for the production of LSIs.
摘要翻译：本发明提供了含有碱溶性树脂和下式所示的1,2-醌二叠氮化合物的辐射敏感性树脂组合物。本发明的辐射敏感性树脂组合物具有优异的显影性，提供优异的图案形状，灵敏度和分辨率优异，特别是大大提高了聚焦纬度和耐热性。因此，本发明的感光性树脂组合物可以适合用作制造LSI的抗蚀剂。

2. 发明授权

US5798201A Radiation sensitive resin composition 失效
公开(公告)号：US5798201A
公开(公告)日：1998-08-25
申请号：US887466
申请日：1997-07-02
申请人： Katsumi Inomata , Nasahiro Akiyama , Toshiyuki Ota , Akira Tsuji
发明人： Katsumi Inomata , Nasahiro Akiyama , Toshiyuki Ota , Akira Tsuji
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/022 , Y10S428/901 , Y10S428/913
摘要： A radiation sensitive resin composition containing an alkali soluble resin and a 1,2-quinonediazide compound of a polyphenol or a radiation sensitive resin composition containing an alkali soluble resin and a 1,2-quinonediazide compound and a polyphenol compound.

3. 发明授权

US5707558A Radiation sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US5707558A
公开(公告)日：1998-01-13
申请号：US538049
申请日：1995-10-02
申请人： Katsumi Inomata , Nasahiro Akiyama , Toshiyuki Ota , Akira Tsuji
发明人： Katsumi Inomata , Nasahiro Akiyama , Toshiyuki Ota , Akira Tsuji
IPC分类号： G03F7/022 , G03C1/00 , G03C1/52
CPC分类号： G03F7/022 , Y10S428/901 , Y10S428/913
摘要： A radiation sensitive resin composition containing an alkali soluble resin and a 1,2-quinonediazide compound of a polyphenol or a radiation sensitive resin composition containing an alkali soluble resin and a 1,2-quinonediazide compound and a polyphenol compound.
摘要翻译：含有多酚的碱溶性树脂和1,2-醌二叠氮化合物的辐射敏感性树脂组合物或含有碱溶性树脂和1,2-醌二叠氮化合物以及多酚化合物的辐射敏感性树脂组合物。

4. 再颁专利

USRE37179E1 Radiation sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：USRE37179E1
公开(公告)日：2001-05-15
申请号：US09420604
申请日：1999-10-21
申请人： Mikio Yamachika , Eiichi Kobayashi , Akira Tsuji , Toshiyuki Ota
发明人： Mikio Yamachika , Eiichi Kobayashi , Akira Tsuji , Toshiyuki Ota
IPC分类号： G03F7023
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/11 , Y10S430/111
摘要： A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer is an alkali developer after the irradiation: wherein R1 represents a hydrogen atom or a methyl group and R2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）在酸存在下变为碱溶性的聚合物和（B）辐射敏感的酸产生剂，其在辐射时产生酸，所述聚合物（A）包含两个重复由通式（1）和（2）表示的单元和降低聚合物溶解度的重复单元是照射后的碱显影剂：其中R1表示氢原子或甲基，R2表示氢原子或甲基。所述组合物提供化学放大的正性抗蚀剂，其可以产生具有良好图案形状的精细图案，并且所述抗蚀剂没有体积收缩，剥离破坏和粘合剂破坏，具有优异的耐干蚀刻性，并且与各种辐射有效反应以产生良好的图案形状，其光刻工艺稳定性优异，所述图案形状在上部没有变薄部分。

5. 发明授权

US5629135A Chemically amplified resist composition 失效
标题翻译：化学扩增抗蚀剂组合物
公开(公告)号：US5629135A
公开(公告)日：1997-05-13
申请号：US590677
申请日：1996-01-29
申请人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
发明人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0048 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).
摘要翻译：正色调和负色度化学放大抗蚀剂组合物，其包含：（a-1）封端树脂，（a-2）碱溶性树脂和溶解控制剂的组合，或（a-3）碱溶性树脂和交联剂，（b）光致酸发生剂，和（c）特定种类的溶剂。正色调和负色调抗蚀剂组合物显示出优异的灵敏度，高分辨能力和优异的储存稳定性，并且可以通过旋涂来优异地应用于大尺寸基材，以通过照射制造出优异的图案。组合物可以有利地用作制造半导体器件或集成电路（IC）的化学放大抗蚀剂。

6. 发明授权

US5556734A Radiation sensitive resin composition comprising copolymer of isopropenylphenol and T-butyl(meth)acrylate 失效
标题翻译：包含异丙烯基苯酚与（甲基）丙烯酸叔丁酯的共聚物的辐射敏感性树脂组合物
公开(公告)号：US5556734A
公开(公告)日：1996-09-17
申请号：US363269
申请日：1994-12-23
申请人： Mikio Yamachika , Eiichi Kobayashi , Toshiyuki Ota , Akira Tsuji
发明人： Mikio Yamachika , Eiichi Kobayashi , Toshiyuki Ota , Akira Tsuji
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C1/73
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111 , Y10S430/122
摘要： A radiation sensitive resin composition which comprises (A) a copolymer represented by the following general formula and (B) a radiation sensitive acid generator and, if necessary, (C) an alkali-soluble resin: ##STR1## wherein R represents a hydrogen atom or a methyl group and m and n are integers representing the numbers of the respective recurring units and satisfying the relations 0.1.gtoreq.m/(m+n)
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）由以下通式表示的共聚物和（B）辐射敏感性酸产生剂，如果需要，其包含（C）碱溶性树脂：其中R表示氢原子或甲基，m和n是表示各个重复单元的数目的整数，并且满足关系式0.1> / = m /（m + n）<0.6和0.4

7. 发明授权

US6114086A Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US6114086A
公开(公告)日：2000-09-05
申请号：US288848
申请日：1999-04-09
申请人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
发明人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0048 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).
摘要翻译：正色调和负色度化学放大抗蚀剂组合物，其包含：（a-1）封端树脂，（a-2）碱溶性树脂和溶解控制剂的组合，或（a-3）碱溶性树脂和交联剂，（b）光致酸发生剂，和（c）特定种类的溶剂。正色调和负色调抗蚀剂组合物显示出优异的灵敏度，高分辨能力和优异的储存稳定性，并且可以通过旋涂来优异地应用于大尺寸基材，以通过照射制造出优异的图案。组合物可以有利地用作制造半导体器件或集成电路（IC）的化学放大抗蚀剂。

8. 发明授权

US5916729A Chemically amplified resist composition 失效
公开(公告)号：US5916729A
公开(公告)日：1999-06-29
申请号：US799566
申请日：1997-02-12
申请人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
发明人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
IPC分类号： G03F7/004 , G03F7/039 , G03F7/016 , G03C1/54
CPC分类号： G03F7/039 , G03F7/0048 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).

9. 发明授权

US5679495A Radiation sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US5679495A
公开(公告)日：1997-10-21
申请号：US352848
申请日：1994-12-02
申请人： Mikio Yamachika , Eiichi Kobayashi , Toshiyuki Ota , Akira Tsuji
发明人： Mikio Yamachika , Eiichi Kobayashi , Toshiyuki Ota , Akira Tsuji
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039 , H01L21/027 , G03F7/023
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/11 , Y10S430/111
摘要： A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer in an alkali developer after the irradiation: ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group and R.sup.2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）在酸存在下变为碱溶性的聚合物和（B）辐射敏感的酸产生剂，其在辐射时产生酸，所述聚合物（A）包含两个重复由通式（1）和（2）表示的单元和反应单元，其用于降低聚合物在照射后的碱显影剂中的溶解度：其中R1表示氢原子或甲基，R 2表示氢原子或甲基。所述组合物提供化学放大的正性抗蚀剂，其可以产生具有良好图案形状的精细图案，并且所述抗蚀剂没有体积收缩，剥离破坏和粘合剂破坏，具有优异的耐干蚀刻性，并且与各种辐射有效反应以产生良好的图案形状，其光刻工艺稳定性优异，所述图案形状在上部没有变薄部分。

10. 发明授权

US06727032B1 Radiation-sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06727032B1
公开(公告)日：2004-04-27
申请号：US08797620
申请日：1997-02-07
申请人： Mitsuhito Suwa , Toru Kajita , Shin-ichiro Iwanaga , Toshiyuki Ota
发明人： Mitsuhito Suwa , Toru Kajita , Shin-ichiro Iwanaga , Toshiyuki Ota
IPC分类号： G03F7039
CPC分类号： C08G61/06 , C08G61/08 , C08L65/00 , G03F7/0045 , G03F7/039 , G03F7/0395 , Y10S430/106
摘要： A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.
摘要翻译：提供了包含（A）在其主链中含有脂环族骨架的树脂和（B）辐射敏感性的酸产生剂的辐射敏感性树脂组合物。该组合物在耐辐照和耐干蚀刻性方面的透明性优异，并且可以得到对基材的粘附性，灵敏度，分辨率和显影性优异的光致抗蚀剂图案。

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