专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07460206B2 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US07460206B2
公开(公告)日：2008-12-02
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Guenter Scheible, legal representative , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner
发明人： Patrick Scheible
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

2. 发明申请

US20080291419A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：US20080291419A1
公开(公告)日：2008-11-27
申请号：US12187116
申请日：2008-08-06
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

3. 发明申请

US20050225737A1 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US20050225737A1
公开(公告)日：2005-10-13
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

4. 发明授权

US07489441B2 Monocrystalline optical component with curved surface and multilayer coating 有权
标题翻译：具有曲面和多层涂层的单晶光学元件
公开(公告)号：US07489441B2
公开(公告)日：2009-02-10
申请号：US11130173
申请日：2005-05-17
申请人： Guenter Scheible, legal representative , Sigrid Scheible, legal representative , Harald Schink , Alexander Hirnet
发明人： Patrick Scheible
IPC分类号： C30B29/60
CPC分类号： G02B5/0833 , G02B1/02 , G02B1/113 , G02B3/00 , G02B5/0891 , G02B5/10 , Y10S117/902
摘要： An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a design wavelength λ0 and includes a first layer, applied to the substrate surface, made from a first dielectric material and at least one second layer, applied to the first layer, made from a second dielectric material. The substrate consists essentially of a crystal material that has an axially parallel crystal direction, running parallel to the optical axis, and edge crystal directions perpendicular to edge regions of the curved substrate surface. An angle between the axially parallel crystal direction and the edge crystal directions is at least 17°, and the first layer has an essentially untextured layer structure. An anisotropy, caused by the substrate structure, in the optical properties of the multilayer coating can thereby be avoided.
摘要翻译：光学部件具有基板，在其上形成限定光学部件的光轴的至少一个弯曲的基板表面，其中基板表面涂覆有在紫外区域中以设计波长λ0有活性的多层涂层，以及包括施加到基板表面的第一层，由第一介电材料制成，以及施加到由第二介电材料制成的第一层的至少一个第二层。衬底基本上由具有平行于光轴的平行晶体方向和垂直于弯曲衬底表面的边缘区域的边缘晶体方向的晶体材料组成。轴向平行晶体方向和边缘晶体方向之间的角度至少为17°，并且第一层具有基本上无纹理的层结构。由此可以避免由基板结构引起的多层涂层的光学性质的各向异性。

5. 发明申请

US20050286827A1 Optical component with a curved surface and a multilayer coating 有权
标题翻译：具有弯曲表面和多层涂层的光学部件
公开(公告)号：US20050286827A1
公开(公告)日：2005-12-29
申请号：US11130173
申请日：2005-05-17
申请人： Patrick Scheible , Guenter Scheible , Sigrid Scheible , Harald Schink , Alexander Hirnet
发明人： Patrick Scheible , Guenter Scheible , Sigrid Scheible , Harald Schink , Alexander Hirnet
IPC分类号： G02B1/02 , G02B1/10 , G02B1/11 , G02B3/00 , G02B5/08 , G02B5/10 , G02F1/295
CPC分类号： G02B5/0833 , G02B1/02 , G02B1/113 , G02B3/00 , G02B5/0891 , G02B5/10 , Y10S117/902
摘要： An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a design wavelength λ0 and includes a first layer, applied to the substrate surface, made from a first dielectric material and at least one second layer, applied to the first layer, made from a second dielectric material. The substrate consists essentially of a crystal material that has an axially parallel crystal direction, running parallel to the optical axis, and edge crystal directions perpendicular to edge regions of the curved substrate surface. An angle between the axially parallel crystal direction and the edge crystal directions is at least 17°, and the first layer has an essentially untextured layer structure. An anisotropy, caused by the substrate structure, in the optical properties of the multilayer coating can thereby be avoided.
摘要翻译：光学部件具有基板，在该基板上形成限定光学部件的光轴的至少一个弯曲的基板表面，其中基板表面涂覆有多个涂层，该多层涂层在设计波长λ< 并且包括由第一介电材料制成的施加到基板表面的第一层和施加到由第二介电材料制成的第一层的至少一个第二层。衬底基本上由具有平行于光轴的平行晶体方向和垂直于弯曲衬底表面的边缘区域的边缘晶体方向的晶体材料组成。轴向平行晶体方向和边缘晶体方向之间的角度至少为17°，并且第一层具有基本上无纹理的层结构。由此可以避免由基板结构引起的多层涂层的光学性质的各向异性。

6. 发明申请

US20080094599A1 Projection System with Compensation of Intensity Variations and Compensation Element Therefor 有权
标题翻译：具有强度变化和补偿要素补偿的投影系统
公开(公告)号：US20080094599A1
公开(公告)日：2008-04-24
申请号：US11628356
申请日：2005-06-03
申请人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
发明人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G02B13/02 , G02B17/0812 , G02B17/0892 , G03F7/70308
摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
摘要翻译：在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

7. 发明授权

US08605257B2 Projection system with compensation of intensity variations and compensation element therefor 有权
标题翻译：具有强度变化补偿和补偿要素的投影系统
公开(公告)号：US08605257B2
公开(公告)日：2013-12-10
申请号：US11628356
申请日：2005-06-03
申请人： Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer , Guenter Scheible , Sigrid Scheible
发明人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
IPC分类号： G03B27/72 , G03B27/68
CPC分类号： G02B13/02 , G02B17/0812 , G02B17/0892 , G03F7/70308
摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
摘要翻译：在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

8. 发明申请

US20050146683A1 Optical component and coating system for coating substrates for optical components 有权
标题翻译：用于光学部件涂覆基板的光学部件和涂层系统
公开(公告)号：US20050146683A1
公开(公告)日：2005-07-07
申请号：US11052751
申请日：2005-02-09
申请人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
发明人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
IPC分类号： G02B1/11 , B05B13/02 , B05B15/04 , B05D1/32 , C03C17/245 , C23C14/04 , C23C14/50 , G02B1/10 , G02C7/02
CPC分类号： G02B1/10 , C23C14/0021 , C23C14/044 , C23C14/505
摘要： An optical component and a coating system for coating substrates for optical components with essentially rotationally symmetric coatings, the system having a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (β max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.
摘要翻译：一种用于涂覆具有基本上旋转对称涂层的光学部件的基板的光学部件和涂层系统，该系统具有行星传动系统（1），其具有旋转的行星架（2）和几个行星（4），每个行星架单个衬底，其与行星架相关并且相对于主载体共转。在一个实施例中，允许控制物理膜厚度的径向变化的一组固定第一掩模（20）布置在位于行星下方的材料源（8）和基板之间。掩盖每个底物超过限制蒸发或入射角（βmax）的蒸发角度的一组第二掩模也与主载体（2）一致，这允许沉积具有规定径向膜厚度分布和实际上恒定的涂层在完全径向范围内涂层材料的密度相对较低且仅略微变化的蒸发角度。

9. 发明授权

US06863398B2 Method and coating system for coating substrates for optical components 有权
标题翻译：用于光学元件涂覆基板的方法和涂层系统
公开(公告)号：US06863398B2
公开(公告)日：2005-03-08
申请号：US10244419
申请日：2002-09-17
申请人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
发明人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
IPC分类号： G02B1/11 , B05B13/02 , B05B15/04 , B05D1/32 , C03C17/245 , C23C14/04 , C23C14/50 , G02B1/10 , G02C7/02 , B05D5/06
CPC分类号： G02B1/10 , C23C14/0021 , C23C14/044 , C23C14/505
摘要： A method for coating substrates (10) for optical components with essentially rotationally symmetric coatings employs a coating system equipped with a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (β max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.
摘要翻译：用于涂覆具有基本旋转对称涂层的光学部件的基板（10）的方法使用配备有行星传动系统（1）的涂层系统，行星传动系统（1）具有旋转的行星架（2）和几个行星（4），每个行星架单个衬底，其与行星架相关并且相对于主载体共转。在一个实施例中，允许控制物理膜厚度的径向变化的一组固定第一掩模（20）布置在位于行星下方的材料源（8）和基板之间。掩盖每个底物超过限制蒸发或入射角（βmax）的蒸发角度的一组第二掩模也与主载体（2）一致，这允许沉积具有规定径向膜厚度分布和实际上恒定的涂层在完全径向范围内涂层材料的密度相对较低且仅略微变化的蒸发角度。

10. 发明授权

US07093937B2 Optical component and coating system for coating substrates for optical components 有权
标题翻译：用于光学部件涂覆基板的光学部件和涂层系统
公开(公告)号：US07093937B2
公开(公告)日：2006-08-22
申请号：US11052751
申请日：2005-02-09
申请人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
发明人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
IPC分类号： G02C7/02
CPC分类号： G02B1/10 , C23C14/0021 , C23C14/044 , C23C14/505
摘要： An optical component and a coating system for coating substrates for optical components with essentially rotationally symmetric coatings, the system having a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (β max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.
摘要翻译：一种用于涂覆具有基本上旋转对称涂层的光学部件的基板的光学部件和涂层系统，该系统具有行星传动系统（1），其具有旋转的行星架（2）和几个行星（4），每个行星架单个衬底，其与行星架相关并且相对于主载体共转。在一个实施例中，允许控制物理膜厚度的径向变化的一组固定第一掩模（20）布置在位于行星下方的材料源（8）和基板之间。掩盖每个底物超过限制蒸发或入射角（βmax）的蒸发角度的一组第二掩模也与主载体（2）一致，这允许沉积具有规定径向膜厚度分布和实际上恒定的涂层在完全径向范围内涂层材料的密度相对较低且仅略微变化的蒸发角度。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式