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    • 2. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING ELEMENT
    • 半导体发光元件
    • US20130248912A1
    • 2013-09-26
    • US13849822
    • 2013-03-25
    • KABUSHIKI KAISHA TOSHIBA
    • Kenji NAKAMURAAkira FujimotoTsutomu NakanishiRyota KitagawaKoji AsakawaTakanobu KamakuraShinji Nunotani
    • H01L33/58
    • H01L33/58H01L33/44
    • According to one embodiment, a semiconductor light emitting element includes a stacked body and an optical layer. The stacked body has a major surface and includes a light emitting layer. The optical layer is in contact with the surface and includes a dielectric body, first particles, and second particles. The optical layer includes a first region including the dielectric body and the first particles and does not include the second particles and a second region including the dielectric body and the second particles. A sphere-equivalent diameter of the first particle is not less than 1 nanometer and not more than 100 nanometers. A sphere-equivalent diameter of the second particle is more than 300 nanometers and less than 1000 nanometers. An average refractive index of the first region is larger than a refractive index of the stacked body and smaller than a refractive index of the second particle.
    • 根据一个实施例,半导体发光元件包括层叠体和光学层。 该层叠体具有主表面并且包括发光层。 光学层与表面接触并且包括介电体,第一颗粒和第二颗粒。 光学层包括包括电介质体和第一颗粒的第一区域,并且不包括第二颗粒和包括电介质体和第二颗粒的​​第二区域。 第一颗粒的球体当量直径不小于1纳米且不大于100纳米。 第二颗粒的​​球体当量直径大于300纳米且小于1000纳米。 第一区域的平均折射率大于层叠体的折射率,小于第二粒子的折射率。
    • 6. 发明授权
    • Semiconductor light emitting device and method for manufacturing the same
    • 半导体发光器件及其制造方法
    • US09331248B2
    • 2016-05-03
    • US14543942
    • 2014-11-18
    • Kabushiki Kaisha Toshiba
    • Kumi MasunagaRyota KitagawaAkira FujimotoKoji AsakawaTakanobu KamakuraShinji Nunotani
    • H01L21/00H01L33/40H01L33/38
    • H01L33/405H01L33/38H01L2933/0016H01L2933/0083
    • According to one embodiment, a semiconductor light emitting device includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type and a light emitting layer provided between the first semiconductor layer and the second semiconductor layer. The device also includes a first electrode layer having electrical continuity with the first semiconductor layer and a second electrode layer provided on the second semiconductor layer, the second electrode layer including a metal portion having a thickness not less than 10 nanometers and not more than 100 nanometers along a direction from the first semiconductor layer to the second semiconductor layer. A plurality of apertures penetrates the metal portion along the direction, each of the apertures viewed along the direction having equivalent circle diameters of not less than 10 nanometers and not more than 5 micrometers, and a Schottky barrier is provided between the second semiconductor layer and the metal portion.
    • 根据一个实施例,半导体发光器件包括第一导电类型的第一半导体层,第二导电类型的第二半导体层和设置在第一半导体层和第二半导体层之间的发光层。 该器件还包括与第一半导体层具有电连续性的第一电极层和设置在第二半导体层上的第二电极层,第二电极层包括厚度不小于10纳米且不大于100纳米的金属部分 沿着从第一半导体层到第二半导体层的方向。 多个孔沿着该方向穿过金属部分,沿着具有等于10纳米且不超过5微米的等效圆直径的方向观察每个孔,并且在第二半导体层和第二半导体层之间设置肖特基势垒 金属部分。
    • 7. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 半导体发光器件及其制造方法
    • US20150072456A1
    • 2015-03-12
    • US14543942
    • 2014-11-18
    • Kabushiki Kaisha Toshiba
    • Kumi MASUNAGARyota KitagawaAkira FujimotoKoji AsakawaTakanobu KamakuraShinji Nunotani
    • H01L33/40H01L33/38
    • H01L33/405H01L33/38H01L2933/0016H01L2933/0083
    • According to one embodiment, a semiconductor light emitting device includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type and a light emitting layer provided between the first semiconductor layer and the second semiconductor layer. The device also includes a first electrode layer having electrical continuity with the first semiconductor layer and a second electrode layer provided on the second semiconductor layer, the second electrode layer including a metal portion having a thickness not less than 10 nanometers and not more than 100 nanometers along a direction from the first semiconductor layer to the second semiconductor layer. A plurality of apertures penetrates the metal portion along the direction, each of the apertures viewed along the direction having equivalent circle diameters of not less than 10 nanometers and not more than 5 micrometers, and a Schottky barrier is provided between the second semiconductor layer and the metal portion.
    • 根据一个实施例,半导体发光器件包括第一导电类型的第一半导体层,第二导电类型的第二半导体层和设置在第一半导体层和第二半导体层之间的发光层。 该器件还包括与第一半导体层具有电连续性的第一电极层和设置在第二半导体层上的第二电极层,第二电极层包括厚度不小于10纳米且不大于100纳米的金属部分 沿着从第一半导体层到第二半导体层的方向。 多个孔沿着该方向穿过金属部分,沿着具有等于10纳米且不超过5微米的等效圆直径的方向观察每个孔,并且在第二半导体层和第二半导体层之间设置肖特基势垒 金属部分。