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1. 发明授权

US06888146B1 Maskless micro-ion-beam reduction lithography system 失效
标题翻译：无掩模微离子束还原光刻系统
公开(公告)号：US06888146B1
公开(公告)日：2005-05-03
申请号：US09289332
申请日：1999-04-09
申请人： Ka-Ngo Leung , William A. Barletta , David O. Patterson , Richard A. Gough
发明人： Ka-Ngo Leung , William A. Barletta , David O. Patterson , Richard A. Gough
IPC分类号： H01J3/18
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J2237/0435
摘要： A maskless micro-ion-beam reduction lithography system is a system for projecting patterns onto a resist layer on a wafer with feature size down to below 100 nm. The MMRL system operates without a stencil mask. The patterns are generated by switching beamlets on and off from a two electrode blanking system or pattern generator. The pattern generator controllably extracts the beamlet pattern from an ion source and is followed by a beam reduction and acceleration column.
摘要翻译：无掩模微离子束还原光刻系统是用于将图案投影到具有低于100nm的特征尺寸的晶片上的抗蚀剂层上的系统。 MMRL系统在没有模板掩模的情况下运行。通过从两个电极消隐系统或图案发生器切换小束来产生图案。图案发生器可控地从离子源提取子束图案，然后是光束减小和加速柱。

2. 发明授权

US08279993B2 Gamma source for active interrogation 有权
标题翻译： Gamma来源用于主动询问
公开(公告)号：US08279993B2
公开(公告)日：2012-10-02
申请号：US12541423
申请日：2009-08-14
申请人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
发明人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
IPC分类号： G21G1/12
CPC分类号： H05G2/00 , G01V5/0091
摘要： A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360° and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.
摘要翻译：圆柱形γ发生器包括同轴RF驱动的等离子体离子源和靶。在使用RF天线的圆柱形等离子体离子发生器中通过RF激发产生氢等离子体。圆柱形伽马产生靶与离子发生器同轴，由具有许多开口的等离子体和引出电极分离。等离子体发生器径向离子发射离子360°，圆柱形靶因此在其整个圆周上被离子照射。等离子体发生器和靶可以是期望的长度。

3. 发明授权

US07609815B2 High brightness—multiple beamlets source for patterned X-ray production 有权
标题翻译：高亮度多子束源用于图形化X射线生产
公开(公告)号：US07609815B2
公开(公告)日：2009-10-27
申请号：US11757137
申请日：2007-06-01
申请人： Ka-Ngo Leung , Qing Ji , William A. Barletta , Ximan Jiang , Lili Ji
发明人： Ka-Ngo Leung , Qing Ji , William A. Barletta , Ximan Jiang , Lili Ji
IPC分类号： H01J35/06
CPC分类号： G01N23/203 , B82Y10/00 , B82Y40/00 , G01V5/0008 , H01J3/025 , H01J3/04 , H01J27/024 , H01J35/00 , H01J37/045 , H01J37/077 , H01J37/08 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2235/06 , H01J2235/068 , H01J2237/0435 , H01J2237/061 , H01J2237/06366 , H01J2237/06375 , H01J2237/3171
摘要： Techniques for controllably directing beamlets to a target substrate are disclosed. The beamlets may be either positive ions or electrons. It has been shown that beamlets may be produced with a diameter of 1 μm, with inter-aperture spacings of 12 μm. An array of such beamlets, may be used for maskless lithography. By step-wise movement of the beamlets relative to the target substrate, individual devices may be directly e-beam written. Ion beams may be directly written as well. Due to the high brightness of the beamlets from extraction from a multicusp source, exposure times for lithographic exposure are thought to be minimized. Alternatively, the beamlets may be electrons striking a high Z material for X-ray production, thereafter collimated to provide patterned X-ray exposures such as those used in CAT scans. Such a device may be used for remote detection of explosives.
摘要翻译：公开了用于将子束可控地引导到目标衬底的技术。子束可以是正离子或电子。已经表明，可以制造直径为1um的子束，孔径间隔为12μm。这种子束的阵列可用于无掩模光刻。通过子束相对于目标衬底的逐步运动，各个器件可以被直接电子束写入。离子束也可以直接写入。由于从多焦源提取的子束的高亮度，认为光刻曝光的曝光时间被最小化。或者，子束可以是撞击高Z材料用于X射线产生的电子，然后准直以提供图案化的X射线曝光，例如在CAT扫描中使用的那些。这种装置可用于远程检测炸药。

4. 发明申请

US20090230314A1 GAMMA SOURCE FOR ACTIVE INTERROGATION 有权
标题翻译：有源互动的游戏源
公开(公告)号：US20090230314A1
公开(公告)日：2009-09-17
申请号：US11462999
申请日：2006-08-07
申请人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
发明人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
IPC分类号： G01T3/00 , H01J35/12 , H01J35/00
CPC分类号： H05G2/00 , G01V5/0091
摘要： A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360° and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.
摘要翻译：圆柱形γ发生器包括同轴RF驱动的等离子体离子源和靶。在使用RF天线的圆柱形等离子体离子发生器中通过RF激发产生氢等离子体。圆柱形伽马产生靶与离子发生器同轴，由具有许多开口的等离子体和引出电极分离。等离子体发生器径向离子发射离子360°，圆柱形靶因此在其整个圆周上被离子照射。等离子体发生器和靶可以是期望的长度。

5. 发明申请

US20100172458A1 GAMMA SOURCE FOR ACTIVE INTERROGATION 有权
标题翻译：有源互动的游戏源
公开(公告)号：US20100172458A1
公开(公告)日：2010-07-08
申请号：US12541423
申请日：2009-08-14
申请人： Ka-Ngo Leung , Tak-Pui Lou , William A. Barletta
发明人： Ka-Ngo Leung , Tak-Pui Lou , William A. Barletta
IPC分类号： G21B1/00 , G21C17/00
CPC分类号： H05G2/00 , G01V5/0091
摘要： A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360° and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.
摘要翻译：圆柱形γ发生器包括同轴RF驱动的等离子体离子源和靶。在使用RF天线的圆柱形等离子体离子发生器中通过RF激发产生氢等离子体。圆柱形伽马产生靶与离子发生器同轴，由具有许多开口的等离子体和引出电极分离。等离子体发生器径向离子发射离子360°，圆柱形靶因此在其整个圆周上被离子照射。等离子体发生器和靶可以是期望的长度。

6. 发明授权

US07596197B1 Gamma source for active interrogation 有权
标题翻译： Gamma来源用于主动询问
公开(公告)号：US07596197B1
公开(公告)日：2009-09-29
申请号：US11462999
申请日：2006-08-07
申请人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
发明人： Ka-Ngo Leung , Tak Pui Lou , William A. Barletta
IPC分类号： G21B1/00
CPC分类号： H05G2/00 , G01V5/0091
摘要： A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360° and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.
摘要翻译：圆柱形γ发生器包括同轴RF驱动的等离子体离子源和靶。在使用RF天线的圆柱形等离子体离子发生器中通过RF激发产生氢等离子体。圆柱形伽马产生靶与离子发生器同轴，由具有许多开口的等离子体和引出电极分离。等离子体发生器径向离子发射离子360°，圆柱形靶因此在其整个圆周上被离子照射。等离子体发生器和靶可以是期望的长度。

7. 发明授权

US06985553B2 Ultra-short ion and neutron pulse production 失效
标题翻译：超短离子和中子脉冲生产
公开(公告)号：US06985553B2
公开(公告)日：2006-01-10
申请号：US10350573
申请日：2003-01-23
申请人： Ka-Ngo Leung , William A. Barletta , Joe W. Kwan
发明人： Ka-Ngo Leung , William A. Barletta , Joe W. Kwan
IPC分类号： G21G1/06
CPC分类号： H01J27/16
摘要： An ion source has an extraction system configured to produce ultra-short ion pulses, i.e. pulses with pulse width of about 1 μs or less, and a neutron source based on the ion source produces correspondingly ultra-short neutron pulses. To form a neutron source, a neutron generating target is positioned to receive an accelerated extracted ion beam from the ion source. To produce the ultra-short ion or neutron pulses, the apertures in the extraction system of the ion source are suitably sized to prevent ion leakage, the electrodes are suitably spaced, and the extraction voltage is controlled. The ion beam current leaving the source is regulated by applying ultra-short voltage pulses of a suitable voltage on the extraction electrode.
摘要翻译：离子源具有被配置为产生超短离子脉冲的提取系统，即具有大约1微米或更小的脉冲宽度的脉冲，并且基于离子源的中子源产生相应的超短中子脉冲。为了形成中子源，中子产生靶被定位成从离子源接收加速的提取的离子束。为了产生超短离子或中子脉冲，离子源的提取系统中的孔适当地设定尺寸以防止离子泄漏，电极适当间隔开，并且控制提取电压。通过在提取电极上施加适当电压的超短电压脉冲来调节离开源极的离子束电流。

8. 发明授权

US5945677A Focused ion beam system 有权
标题翻译：聚焦离子束系统
公开(公告)号：US5945677A
公开(公告)日：1999-08-31
申请号：US225996
申请日：1999-01-05
申请人： Ka-Ngo Leung , Richard A. Gough , Qing Ji , Yung-Hee Yvette Lee
发明人： Ka-Ngo Leung , Richard A. Gough , Qing Ji , Yung-Hee Yvette Lee
IPC分类号： G01N23/225 , H01J37/08 , H01J37/30 , H01J37/317 , H01J3/18
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/08 , H01J37/3007 , H01J37/3177 , H01J2237/083 , H01J2237/31755 , H01J2237/31794
摘要： A focused ion beam (FIB) system produces a final beam spot size down to 0.1 .mu.m or less and an ion beam output current on the order of microamps. The FIB system increases ion source brightness by properly configuring the first (plasma) and second (extraction) electrodes. The first electrode is configured to have a high aperture diameter to electrode thickness aspect ratio. Additional accelerator and focusing electrodes are used to produce the final beam. As few as five electrodes can be used, providing a very compact FIB system with a length down to only 20 mm. Multibeamlet arrangements with a single ion source can be produced to increase throughput. The FIB system can be used for nanolithography and doping applications for fabrication of semiconductor devices with minimum feature sizes of 0.1 .mu.m or less.
摘要翻译：聚焦离子束（FIB）系统产生的最终束斑尺寸低至0.1μm或更小，离子束输出电流为微安数量级。 FIB系统通过适当地配置第一（等离子体）和第二（提取）电极来增加离子源亮度。第一电极被配置为具有高孔径至电极厚度纵横比。使用附加的加速器和聚焦电极来产生最终的光束。可以使用少至五个电极，提供非常紧凑的FIB系统，其长度只有20mm。可以生产具有单个离子源的多亚麻子布置以提高生产量。 FIB系统可用于制造半导体器件的纳米光刻和掺杂应用，最小特征尺寸为0.1μm或更小。

9. 发明授权

US07342988B2 Neutron tubes 有权
公开(公告)号：US07342988B2
公开(公告)日：2008-03-11
申请号：US10360245
申请日：2003-02-06
申请人： Ka-Ngo Leung , Tak Pui Lou , Jani Reijonen
发明人： Ka-Ngo Leung , Tak Pui Lou , Jani Reijonen
IPC分类号： G21B1/00
CPC分类号： H05H3/06
摘要： A neutron tube or generator is based on a RF driven plasma ion source having a quartz or other chamber surrounded by an external RF antenna. A deuterium or mixed deuterium/tritium (or even just a tritium) plasma is generated in the chamber and D or D/T (or T) ions are extracted from the plasma. A neutron generating target is positioned so that the ion beam is incident thereon and loads the target. Incident ions cause D-D or D-T (or T-T) reactions which generate neutrons. Various embodiments differ primarily in size of the chamber and position and shape of the neutron generating target. Some neutron generators are small enough for implantation in the body. The target may be at the end of a catheter-like drift tube. The target may have a tapered or conical surface to increase target surface area.

10. 发明申请

US20050220244A1 Cylindrical neutron generator 有权
公开(公告)号：US20050220244A1
公开(公告)日：2005-10-06
申请号：US11110310
申请日：2005-04-19
申请人： Ka-Ngo Leung
发明人： Ka-Ngo Leung
IPC分类号： G21B3/00 , G21B1/00
CPC分类号： G21B3/00 , Y02E30/18
摘要： A cylindrical neutron generator is formed with a coaxial RF-driven plasma ion source and target. A deuterium (or deuterium and tritium) plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical neutron generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which contain many slots. The plasma generator emanates ions radially over 360° and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired. The plasma generator may be in the center and the neutron target on the outside, or the plasma generator may be on the outside and the target on the inside. In a nested configuration, several concentric targets and plasma generating regions are nested to increase the neutron flux.

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