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    • 2. 发明申请
    • GAS DISTRIBUTION PLATE AND APPARATUS USING THE SAME
    • 气体分配板和使用它的装置
    • US20110073038A1
    • 2011-03-31
    • US12616203
    • 2009-11-11
    • Jung-Chen CHIENJun-Chin LiuHung-Jen YangTean-Mu ShenMuh-Wang Liang
    • Jung-Chen CHIENJun-Chin LiuHung-Jen YangTean-Mu ShenMuh-Wang Liang
    • C23C16/455
    • C23C16/45574C23C16/45565
    • The present invention provides a gas distribution plate for providing at least two gas flowing channel. In one embodiment, the gas distribution plate has a first flowing channel, at least a second flowing channel disposed around the first flowing channel, and a tapered opening communicating with the first and the second flowing channel. In another embodiment, the gas distribution plate has a first flowing channel passing through a first and a second surface of the gas distribution plate, a second flowing channel paralleling to the first surface and a third flowing channel disposed at the second surface and communicating with the second flowing channel. The ends of the first and the third flowing channel have a tapered opening respectively. Besides, the present further provides a gas distribution apparatus for allowing at least two separate gases to be delivered independently into a process chamber while enabling the gases to be mixed completely after entering the processing chamber.
    • 本发明提供一种用于提供至少两个气体流动通道的气体分配板。 在一个实施例中,气体分配板具有第一流动通道,围绕第一流动通道设置的至少第二流动通道和与第一和第二流动通道连通的锥形开口。 在另一个实施例中,气体分布板具有穿过气体分配板的第一和第二表面的第一流动通道,与第一表面平行的第二流动通道和设置在第二表面处的第三流动通道, 第二流通道。 第一和第三流动通道的末端分别具有锥形开口。 此外,本发明还提供了一种气体分配装置,用于允许至少两个分离的气体独立地输送到处理室中,同时使气体在进入处理室之后能够被完全混合。