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1. 再颁专利

USRE37470E1 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：USRE37470E1
公开(公告)日：2001-12-18
申请号：US09388589
申请日：1999-09-02
申请人： Jun Ohkura , Naruaki Iida , Hiroyuki Kudou , Masanori Tateyama , Yasuhiro Sakamoto
发明人： Jun Ohkura , Naruaki Iida , Hiroyuki Kudou , Masanori Tateyama , Yasuhiro Sakamoto
IPC分类号： G03D500
CPC分类号： H01L21/6715 , H01L21/67781 , H01L21/68707
摘要： A wafer processing apparatus includes a common path, extending in a Y-axis direction, in which one wafer or a plurality of wafers are conveyed, a plurality of process units stacked on both sides of the common path to constitute multi-stage structures, a main handler moved in the common path in the Y-axis direction and rotated about a Z axis at an angle &thgr; to load/unload the wafer into/from the process units, an arm section arranged to move in the main handler in the Z-axis direction, a plurality of holding arms arranged in the arm section to constitute a multi-stage structure so as to respectively hold the wafers, each holding arm being advanced and retreated on an X-Y plane from the arm section, an optical sensor, arranged in the arm section, for detecting a holding state of the wafer in each of the plurality of holding arms, and a controller for controlling an operation of the main handler, an operation of the arm section, and operations of the plurality of holding arms on the basis of a detection result from the optical sensor, wherein the controller advances or retreats each holding arm while operating at least one of the main handler and the arm section, and causes the optical sensor to detect the holding state of the wafer by each holding arm before the holding arm reaches a corresponding one of the process units.
摘要翻译：晶片处理装置包括在Y轴方向上延伸的公共路径，其中一个晶片或多个晶片被输送，多个处理单元堆叠在公共路径的两侧以构成多级结构，主处理器沿着Y轴方向在公共路径中移动并且以角度θ围绕Z轴旋转以将晶片装载/卸载到处理单元中/从加工单元中卸载晶片，臂部分布置成在Z轴方向上移动到主处理器中，多个保持臂，布置在所述臂部中，以构成多个阶段结构，以分别保持晶片，每个保持臂从臂部在XY平面上前进和后退;光学传感器，布置在臂部，用于检测多个保持臂中的每一个中的晶片的保持状态;以及控制器，用于控制主处理器的操作，臂部的操作以及多个保持臂的操作 bas 具有来自光学传感器的检测结果，其中控制器在操作主处理器和臂部分中的至少一个的同时前进或后退每个保持臂，并且使得光学传感器通过每个保持臂检测晶片的保持状态在握持臂到达相应的一个处理单元之前。

2. 发明授权

US5664254A Substrate processing apparatus and substrate processing method 失效
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US5664254A
公开(公告)日：1997-09-02
申请号：US594937
申请日：1996-01-31
申请人： Jun Ohkura , Naruaki Iida , Hiroyuki Kudou , Masanori Tateyama , Yasuhiro Sakamoto
发明人： Jun Ohkura , Naruaki Iida , Hiroyuki Kudou , Masanori Tateyama , Yasuhiro Sakamoto
IPC分类号： B65G49/07 , H01L21/00 , H01L21/677 , H01L21/687 , G03D5/00 , G03D3/08
CPC分类号： H01L21/6715 , H01L21/67781 , H01L21/68707
摘要： A wafer processing apparatus includes a common path, extending in a Y-axis direction, in which one wafer or a plurality of wafers are conveyed, a plurality of process units stacked on both sides of the common path to constitute multi-stage structures, a main handler moved in the common path in the Y-axis direction and rotated about a Z axis at an angle .theta. to load/unload the wafer into/from the process units, an arm section arranged to move in the main handler in the Z-axis direction, a plurality of holding arms arranged in the arm section to constitute a multi-stage structure so as to respectively hold the wafers, each holding arm being advanced and retreated on an X-Y plane from the arm section, an optical sensor, arranged in the arm section, for detecting a holding state of the wafer in each of the plurality of holding arms, and a controller for controlling an operation of the main handler, an operation of the arm section, and operations of the plurality of holding arms on the basis of a detection result from the optical sensor, wherein the controller advances or retreats each holding arm while operating at least one of the main handler and the arm section, and causes the optical sensor to detect the holding state of the wafer by each holding arm before the holding arm reaches a corresponding one of the process units.
摘要翻译：晶片处理装置包括在Y轴方向上延伸的公共路径，其中一个晶片或多个晶片被输送，多个处理单元堆叠在公共路径的两侧以构成多级结构，主处理器沿着Y轴方向在公共路径中移动并且以角度θ围绕Z轴旋转以将晶片装载/卸载到处理单元中/从加工单元中卸载晶片，臂部分布置成在Z轴方向上移动到主处理器中，多个保持臂，布置在所述臂部中，以构成多个阶段结构，以分别保持晶片，每个保持臂从臂部在XY平面上前进和后退;光学传感器，布置在臂部，用于检测多个保持臂中的每一个中的晶片的保持状态;以及控制器，用于控制主处理器的操作，臂部的操作以及多个保持臂的操作 bas 具有来自光学传感器的检测结果，其中控制器在操作主处理器和臂部分中的至少一个的同时前进或后退每个保持臂，并且使得光学传感器通过每个保持臂检测晶片的保持状态在握持臂到达相应的一个处理单元之前。

3. 发明授权

US5711646A Substrate transfer apparatus 失效
标题翻译：基板转印装置
公开(公告)号：US5711646A
公开(公告)日：1998-01-27
申请号：US837520
申请日：1997-04-22
申请人： Issei Ueda , Masami Akimoto , Hiroyuki Kudou
发明人： Issei Ueda , Masami Akimoto , Hiroyuki Kudou
IPC分类号： B65G49/07 , B25J15/06 , H01L21/677 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67766 , H01L21/67778 , H01L21/68707 , Y10S414/137 , Y10S414/141 , Y10T279/11
摘要： A substrate transfer apparatus for receiving and delivering a substrate among a plurality of process locations and transferring the substrate among the process locations comprises an apparatus body, a transfer member, movably provided on the apparatus body, for supporting and transferring the substrate, the transfer member having a plurality of support portions for supporting the substrate at different positions in the same plane, moving mechanism for moving the transfer member for enabling the transfer member to receive and deliver the substrate, and switching mechanism for switching the position of the transfer member among a plurality of positions for receiving and delivering the substrate on the support portions.
摘要翻译：一种用于在多个处理位置之间接收和传送基板并在处理位置之间传送基板的基板传送装置包括可移动地设置在装置主体上用于支撑和传送基板的装置主体，传送构件，传送构件具有用于将基板支撑在同一平面中的不同位置处的多个支撑部分，用于移动传送部件以使传送部件能够接收和传送基板的移动机构，以及用于切换传送部件的位置的切换机构多个位置，用于在支撑部分上接收和传送基板。

4. 发明授权

US06096233A Method for wet etching of thin film 失效
标题翻译：湿法蚀刻薄膜的方法
公开(公告)号：US06096233A
公开(公告)日：2000-08-01
申请号：US935837
申请日：1997-09-23
申请人： Hiroki Taniyama , Miyako Yamasaka , Hiroyuki Kudou , Akira Yonemizu
发明人： Hiroki Taniyama , Miyako Yamasaka , Hiroyuki Kudou , Akira Yonemizu
IPC分类号： H01L21/00 , H01L21/66 , H01L21/302
CPC分类号： H01L21/6708 , H01L22/26
摘要： The present invention provides a wet etching method applied to a thin, including the steps of (a) setting in advance an etching rate of said thin film in view of a kind of the thin film to be etched, components of said etchant solution, and temperature, (b) loading the substrate on a spin chuck such that the surface having the thin film formed thereon faces upward and, (c) detecting a thickness of the thin film in at least a peripheral portion and a central portion of the substrate. The method also includes the steps (d) calculating moving speeds of a nozzle at predetermined passing points of said nozzle on the basis of the etching rate set in step (a) and a film thickness detected in the step (c), (e) rotating the substrate by driving the spin chuck, and (f) controlling the moving speed of the nozzle, while allowing the nozzle to supply the etchant solution to the thin film formed on the surface of the substrate which is being rotated, to conform with the moving speeds calculated in step (d) at the predetermined passing points of the nozzle so as to move the nozzle in a radial direction of the substrate.
摘要翻译：本发明提供了一种应用于薄的湿式蚀刻方法，包括以下步骤：（a）考虑到要蚀刻的薄膜的种类，所述蚀刻剂溶液的成分和所述蚀刻剂溶液的成分，预先设定所述薄膜的蚀刻速率温度，（b）将基板装载在旋转卡盘上，使得其上形成有薄膜的表面朝上，（c）在基板的至少周边部分和中心部分检测薄膜的厚度。该方法还包括步骤（d）基于步骤（a）中设定的蚀刻速率和在步骤（c）中检测到的膜厚度计算喷嘴在预定通过点处的移动速度，（e）通过驱动旋转卡盘旋转基板，和（f）控制喷嘴的移动速度，同时允许喷嘴将蚀刻剂溶液供应到正在旋转的基板的表面上形成的薄膜，以符合在步骤（d）中计算出的在喷嘴的预定通过点处的移动速度，以沿着基板的径向方向移动喷嘴。

5. 发明授权

US4161651A Simultaneously sampled remote data reading and transmission system using optical fibers 失效
标题翻译：使用光纤同时采集远程数据读取和传输系统
公开(公告)号：US4161651A
公开(公告)日：1979-07-17
申请号：US882909
申请日：1978-03-02
申请人： Yoshihiro Sano , Tomio Chiba , Hiroyuki Kudou , Yoshiteru Miki
发明人： Yoshihiro Sano , Tomio Chiba , Hiroyuki Kudou , Yoshiteru Miki
IPC分类号： G02B6/28 , H02H1/00 , H02J13/00 , H04B10/275 , H04B9/00 , G01R19/26
CPC分类号： H02J13/0065 , G02B6/2817 , H02H1/0069
摘要： A system for sampling and collecting simultaneously data from terminal apparatus installed at a plurality of data measuring locations (data sources) distributed in a system to be monitored or controlled by using at least a single optical fiber includes means for initiating sampling of measured quantities in response to a synchronizing signal supplied-from a master station, and means for allotting to the terminal apparatus respective particular time slots during which the data as measured is transmitted to the master station through at least a single optical fiber.
摘要翻译：一种系统，用于同时从安装在通过使用至少一根光纤监视或控制的系统中的多个数据测量位置（数据源）的数据测量位置（数据源）进行采样和收集数据的系统包括用于响应于开始采样测量量的装置到从主站提供的同步信号，以及用于向终端设备分配相应的特定时隙的装置，在该时间期间，通过至少一根光纤将所测量的数据发送到主站。

6. 发明授权

US06656281B1 Substrate processing apparatus and substrate processing method 失效
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US06656281B1
公开(公告)日：2003-12-02
申请号：US09589451
申请日：2000-06-08
申请人： Issei Ueda , Hiroyuki Kudou
发明人： Issei Ueda , Hiroyuki Kudou
IPC分类号： B05C1100
CPC分类号： H01L21/67253 , H01L21/67017
摘要： A blast unit for sending air from the top of a processing chamber to the bottom thereof and an exhaust pipe for exhausting gas from the bottom of the processing chamber are provided. Concomitantly with a change in pressure in the processing chamber, intervals of a slit damper and/or the degree of opening of a damper is controlled by a controller and thus a blast amount or an exhaust amount is controlled, thereby maintaining the pressure in the processing chamber almost constant.
摘要翻译：提供一种用于将空气从处理室的顶部输送到其底部的排气单元和用于从处理室的底部排出气体的排气管。伴随着处理室中的压力变化，狭缝阻尼器的间隔和/或阻尼器的开度由控制器控制，从而控制鼓风量或排气量，从而保持处理中的压力房间几乎不变。

7. 发明授权

US5975097A Processing apparatus for target processing substrate 失效
标题翻译：目标处理基板的加工装置
公开(公告)号：US5975097A
公开(公告)日：1999-11-02
申请号：US917619
申请日：1997-08-26
申请人： Akira Yonemizu , Hiroyuki Kudou , Masami Akimoto
发明人： Akira Yonemizu , Hiroyuki Kudou , Masami Akimoto
IPC分类号： H01L21/304 , H01L21/00 , B08B3/02
CPC分类号： H01L21/67173 , H01L21/67051 , Y10S134/902
摘要： A processing apparatus of this invention has an openable window portion for transferring a target processing substrate, and an inlet port for introducing the outer atmosphere. Further, the processing apparatus includes a closed processing chamber for performing predetermined processing for the target processing substrate transferred via the window portion, an exhaust means for evacuating the interior of the processing chamber, and an opening/closing mechanism for closing the inlet port, and opening the inlet port when the pressure in the processing chamber is negative.
摘要翻译：本发明的处理装置具有用于传送目标处理基板的可打开的窗口部分和用于引入外部空气的入口。此外，处理装置包括用于对通过窗口部分传送的目标处理基板进行预定处理的封闭处理室，用于抽出处理室内部的排气装置和用于关闭入口的打开/关闭机构，以及当处理室中的压力为负时打开入口。

8. 发明授权

US06309116B1 Substrate processing system 失效
标题翻译：基板加工系统
公开(公告)号：US06309116B1
公开(公告)日：2001-10-30
申请号：US09588797
申请日：2000-06-06
申请人： Koji Mahara , Hiroyuki Kudou , Issei Ueda , Hiroichi Inada
发明人： Koji Mahara , Hiroyuki Kudou , Issei Ueda , Hiroichi Inada
IPC分类号： G03D500
CPC分类号： H01L21/67167 , G03F7/70991 , H01L21/67178 , H01L21/67196 , H01L21/67225 , H01L21/67745 , Y10S414/14
摘要： A substrate processing system for processing a substrate in accordance with a photolithographic process, comprising a cassette section, a process section having a plurality of process units each processing a substrate, main transfer arm mechanism arranged in a transfer space surrounded by the process section and the cassette section, for transporting substrates one by one not only between a cassette of the cassette section and each of the plurality of process units but also between the plurality of process units, and a loop transfer path movably supporting the main transfer arm means in a lower portion of the transfer space and guiding the main transfer arm means so as to face each of the process units and the cassette section.
摘要翻译：一种用于根据光刻工艺处理衬底的衬底处理系统，包括：盒部分，具有处理衬底的多个处理单元的处理部分;布置在由处理部分包围的传送空间中的主传送臂机构; 盒部分，用于不仅在盒部分的盒与多个处理单元中的每一个之间而且在多个处理单元之间逐一传送基板以及可移动地将主传送臂装置支撑在下部的环形传送路径中并且引导主传送臂装置以面对每个处理单元和盒部分。

9. 发明授权

US5737338A ATM exchange and method of testing same 失效
标题翻译： ATM交换和测试方法
公开(公告)号：US5737338A
公开(公告)日：1998-04-07
申请号：US510181
申请日：1995-08-02
申请人： Nobuhiko Eguchi , Hiroyuki Kudou , Kazumasa Sonoda , Naoki Aihara
发明人： Nobuhiko Eguchi , Hiroyuki Kudou , Kazumasa Sonoda , Naoki Aihara
IPC分类号： H04Q3/00 , H04L12/26 , H04L12/28 , H04L12/70 , H04L12/931 , H04L12/939 , H04Q11/04 , H04L12/56
CPC分类号： H04Q11/0478 , H04L2012/5627 , H04L2012/5652
摘要： A method of testing an ATM exchange having a redundant structure that includes an active system and a standby system includes the steps of transmitting a test cell from a testing device to both the active system and standby system, causing the test cell to pass through ATM switches in each of the active and standby systems, returning the test cell that has passed through the ATM switches of both systems to the testing device, and conducting a test of the ACT switches in the active and standby systems by comparing data contained in the transmitted test cell with data contained in a test cell received from the active system or standby system.
摘要翻译：一种测试具有包括主动系统和备用系统的冗余结构的ATM交换机的方法包括以下步骤：将测试单元从测试设备发送到主动系统和备用系统，使测试单元通过ATM交换机在每个主动和待机系统中，将已经通过两个系统的ATM交换机的测试单元返回到测试设备，并通过比较发送测试中包含的数据来对主动和待机系统中的ACT交换机进行测试单元，其包含在从活动系统或备用系统接收的测试单元中的数据。

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