专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06573017B2 Single-layer type electrophotosensitive material 有权
公开(公告)号：US06573017B2
公开(公告)日：2003-06-03
申请号：US10012306
申请日：2001-12-12
申请人： Jun Azuma , Yukimasa Watanabe , Hisakazu Honma , Ayako Yashima , Maki Uchida , Eiichi Miyamoto
发明人： Jun Azuma , Yukimasa Watanabe , Hisakazu Honma , Ayako Yashima , Maki Uchida , Eiichi Miyamoto
IPC分类号： G03G500
CPC分类号： G03G5/04 , G03G5/05 , G03G5/0609 , G03G5/0614 , G03G5/0651 , G03G5/0666
摘要： Disclosed is a single-layer type electrophotosensitive material comprising a conductive substrate and a photosensitive layer made of a binder resin containing at least an electric charge generating material and an electric charge transferring material, which is formed on the conductive substrate, wherein an oxygen transmission rate of the binder resin is not more than 35 cc·mm/m2·day·atom, wherein it is preferred that a mobility at an electric field strength of 5×105 V/cm of the hole transferring material is not less than 5×10−6 cm2/V/sec and a solid content of the electric charge transferring material is not less than 30% by weight and not more than 50% by weight based on the whole solid content; said electrophotosensitive material has good ozone resistance and does not cause defects such as image black belt due to lowering of the charge capability, an ozone of which is 5.0 ppm at most, and is also superior in sensitivity and wear resistance.

2. 发明授权

US06593047B2 Single-layer type electrophotosensitive material 有权
公开(公告)号：US06593047B2
公开(公告)日：2003-07-15
申请号：US09942654
申请日：2001-08-31
申请人： Jun Azuma , Yukimasa Watanabe , Hisakazu Honma , Ayako Yashima , Maki Uchida , Kyoichi Nakamura
发明人： Jun Azuma , Yukimasa Watanabe , Hisakazu Honma , Ayako Yashima , Maki Uchida , Kyoichi Nakamura
IPC分类号： G03G505
CPC分类号： G03G5/0564 , G03G5/0578 , G03G5/0609 , G03G5/0614 , G03G5/0616
摘要： A single-layer type electrophotosensitive material comprising a conductive substrate and a photosensitive layer made of a binder resin containing at least an electric charge generating material and a hole transferring material and an electron transferring material as an electric charge transferring material, which is formed on the conductive substrate, characterized in that the binder resin contains a polycarbonate resin having a repeating structural unit represented by the general formula [1] and the solid content of the hole transferring material and the electron transferring material is not less than 30% by weight and not more than 50% by weight relative to the entire solid content, exhibits good wear resistance with respect to the photosensitive layer and is also superior in durability.

3. 发明授权

US6015646A Electrophotosensitive material and image forming method using the same 有权
标题翻译：电光敏材料及使用其的成像方法
公开(公告)号：US6015646A
公开(公告)日：2000-01-18
申请号：US210612
申请日：1998-12-14
申请人： Hiroaki Iwasaki , Yukimasa Watanabe , Sakae Saitoh , Shyunichi Matsumoto , Maki Uchida
发明人： Hiroaki Iwasaki , Yukimasa Watanabe , Sakae Saitoh , Shyunichi Matsumoto , Maki Uchida
IPC分类号： G03G5/06 , G03G15/04 , G03G15/043 , G03G5/09
CPC分类号： G03G5/0614
摘要： The present invention provides an electrophotosensitive material comprising a photosensitive layer containing a m-phenylenediamine compound represented by the general formula (1): ##STR1## wherein R.sup.1A and R.sup.1B are the same or different and indicate an alkyl group; and R.sup.1C, R.sup.1D, R.sup.1E and R.sup.1F are the same or different and indicate a hydrogen atom or an alkyl group, which has high sensitivity and issuperior in stability to strong light, durability and heat resistance, and an image forming method capable of realizing more higher speed and more larger energy saving than the prior art.
摘要翻译：本发明提供一种电光敏材料，其包含含有通式（1）表示的间苯二胺化合物的感光层：其中R1A和R1B相同或不同，表示烷基; 并且R1C，R1D，R1E和R1F相同或不同，表示氢原子或烷基，其对强光，耐久性和耐热性具有高灵敏度和稳定性上升，并且能够实现更高的图像形成方法速度和更大的节能比现有技术。

4. 发明授权

US5830615A Naphthylenediamine derivative and electrophotosensitive material using the same 失效
标题翻译：萘二胺衍生物和使用其的电光敏材料
公开(公告)号：US5830615A
公开(公告)日：1998-11-03
申请号：US865196
申请日：1997-05-29
申请人： Eiichi Miyamoto , Mikio Kakui , Hideo Nakamori , Yukikatsu Imanaka , Tadashi Sakuma , Maki Uchida , Hiroaki Iwasaki , Yasuyuki Hanatani , Nariaki Tanaka , Yuka Nakamura
发明人： Eiichi Miyamoto , Mikio Kakui , Hideo Nakamori , Yukikatsu Imanaka , Tadashi Sakuma , Maki Uchida , Hiroaki Iwasaki , Yasuyuki Hanatani , Nariaki Tanaka , Yuka Nakamura
IPC分类号： C07C211/58 , C07C211/59 , C07C217/84 , C07C217/92 , C07C217/94 , C07C255/58 , G03G5/06
CPC分类号： G03G5/0618 , C07C211/58 , C07C217/84 , G03G5/0609 , G03G5/0614 , G03G5/0651
摘要： The present invention provides a novel naphthylenediamine derivative which is superior in electric charge transferring capability, compatibility with binding resin and stability, and an electrophotosensitive material which has a higher sensitivity and an excellent durability. The above naphthylenediamine derivative is represented by the following general formula (1), and the electrophotosensitive material is formed by providing a photosensitive layer having this naphthylenediamine derivative as an electric charge transferring material on a conductive substrate. ##STR1## wherein R.sup.1 to R.sup.4, R.sup.5a to R.sup.5f and a to d are as defined.
摘要翻译：本发明提供一种电荷转移能力优异，与粘合树脂的相容性和稳定性优异的新型萘二胺衍生物，以及具有较高灵敏度和优异耐久性的电光敏材料。上述萘二胺衍生物由以下通式（1）表示，并且通过在导电性基材上设置具有该亚萘二胺衍生物作为电荷转移材料的感光层而形成电光敏材料。（1）其中R1至R4，R5a至R5f和a至d定义。

5. 发明授权

US5767315A Naphthylenediamine derivative 失效
标题翻译：萘二胺衍生物
公开(公告)号：US5767315A
公开(公告)日：1998-06-16
申请号：US539620
申请日：1995-10-05
申请人： Eiichi Miyamoto , Mikio Kakui , Hideo Nakamori , Yukikatsu Imanaka , Tadashi Sakuma , Maki Uchida
发明人： Eiichi Miyamoto , Mikio Kakui , Hideo Nakamori , Yukikatsu Imanaka , Tadashi Sakuma , Maki Uchida
IPC分类号： C07C211/58 , C07C211/59 , C07C217/84 , C07C217/92 , C07C217/94 , C07C255/58 , G03G5/06
CPC分类号： G03G5/0618 , C07C211/58 , C07C217/84 , G03G5/0609 , G03G5/0614 , G03G5/0651
摘要： The present invention provides a novel naphthylenediamine derivative which is superior in electric charge transferring capability, compatibility with binding resin and stability. The above naphthylenediamine derivative is represented by the following general formula (1) ##STR1## wherein R.sup.1 to R.sup.4, R.sup.5a to R.sup.5f and a to d are as defined.
摘要翻译：本发明提供了一种新颖的萘二胺衍生物，它具有优异的电荷转移能力，与粘结树脂的相容性和稳定性。上述萘二胺衍生物由以下通式（1）表示：其中R1至R4，R5a至R5f和a至d如上所定义。

6. 发明授权

US06444385B1 Electrophotosensitive material and method of producing the same 有权
公开(公告)号：US06444385B1
公开(公告)日：2002-09-03
申请号：US09808117
申请日：2001-03-15
申请人： Jun Azuma , Mitsuo Ihara , Maki Uchida , Daisuke Kuboshima , Yukikatsu Imanaka , Hiromi Nakatsu , Teruyo Taguchi
发明人： Jun Azuma , Mitsuo Ihara , Maki Uchida , Daisuke Kuboshima , Yukikatsu Imanaka , Hiromi Nakatsu , Teruyo Taguchi
IPC分类号： G03G506
摘要： The present invention relates to an electrophotosensitive material wherein a layer containing a binder resin and a pigment among a photosensitive layer is formed by applying and drying a coating solution prepared by dispersing the binder resin and the pigment in a dispersion medium containing alcohol represented by the formula (1): wherein R1, R2 and R3 are the same or different and represent a hydrogen atom or an alkyl group; the electrophotosensitive material is free from lowering of the sensitivity due to formation of agglomerates of the pigment and is superior in sensitivity characteristics.

7. 发明授权

US5550290A Benzidine derivative and electrophotosensitive material using the same 失效
标题翻译：联苯胺衍生物和使用它们的电光敏材料
公开(公告)号：US5550290A
公开(公告)日：1996-08-27
申请号：US314375
申请日：1994-09-28
申请人： Yasufumi Mizuta , Masashi Tanaka , Nariaki Muto , Toshiyuki Fukami , Hideo Nakamori , Mikio Kakui , Sakae Saito , Hiroshi Shiomi , Keisuke Sumida , Maki Uchida
发明人： Yasufumi Mizuta , Masashi Tanaka , Nariaki Muto , Toshiyuki Fukami , Hideo Nakamori , Mikio Kakui , Sakae Saito , Hiroshi Shiomi , Keisuke Sumida , Maki Uchida
IPC分类号： C07C211/54 , G03G5/06 , C07C217/92
CPC分类号： C07C211/54 , G03G5/0614
摘要： The present invention relates to a benzidine derivative represented by the general formula (1): ##STR1## wherein R.sup.1 to R.sup.6, m and n are as defined in the present specification. The benzidine derivative improves durability and heat resistance of a membrane containing the same while maintaining high hole transferring capability. Therefore, an electrophotosensitive material, which comprises a photosensitive layer containing the benzidine derivative, has high sensitivity and is superior in durability and heat resistance.
摘要翻译：本发明涉及由通式（1）表示的联苯胺衍生物：其中R1至R6，m和n如本说明书中所定义。联苯胺衍生物在保持高空穴转移能力的同时提高了含有该组合物的膜的耐久性和耐热性。因此，包含含有联苯胺衍生物的感光层的电光敏材料具有高灵敏度，耐久性和耐热性优异。

8. 发明授权

US5514508A Electrophotosensitive material 失效
标题翻译：电光敏材料
公开(公告)号：US5514508A
公开(公告)日：1996-05-07
申请号：US445055
申请日：1995-05-19
申请人： Toshiyuki Fukami , Hideo Nakamori , Hiroshi Shiomi , Hirofumi Kawaguchi , Hisakazu Uegaito , Nariaki Muto , Mikio Kakui , Keisuke Sumida , Sakae Saito , Maki Uchida
发明人： Toshiyuki Fukami , Hideo Nakamori , Hiroshi Shiomi , Hirofumi Kawaguchi , Hisakazu Uegaito , Nariaki Muto , Mikio Kakui , Keisuke Sumida , Sakae Saito , Maki Uchida
IPC分类号： G03G5/06
CPC分类号： G03G5/0679 , G03G5/0605 , G03G5/0607 , G03G5/0609 , G03G5/0612 , G03G5/0618 , G03G5/062 , G03G5/0681
摘要： The present invention provides an electrophotosensitive material having an improved sensitivity in comparison with a conventional one, obtained by combining a trinitrofluorenoneimine derivative represented by the formula (1): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are the same or different and indicate a hydrogen atom, an alkyl group, an alkoxy group, an aryl group which may contain a substituent, an aralkyl group which may contain a substituent, or a halogen atom! as an electron transferring material with a prescribed electric charge generating material or hole transferring material.
摘要翻译：本发明提供了一种通过组合由式（1）表示的三硝基芴酮亚胺衍生物获得的传统的光敏感材料：其中R1，R2，R3，R4和R5是相同或不同，表示氢原子，烷基，烷氧基，可以含有取代基的芳基，可以含有取代基的芳烷基或卤原子]作为具有规定电子的电子转移材料电荷产生材料或空穴转移材料。

9. 发明授权

US06828076B2 Electrophotosensitive material and method of producing the same 有权
标题翻译：电子感光材料及其制造方法
公开(公告)号：US06828076B2
公开(公告)日：2004-12-07
申请号：US10694126
申请日：2003-10-27
申请人： Maki Uchida
发明人： Maki Uchida
IPC分类号： G03G5147
CPC分类号： G03G5/142
摘要： An electrophotosensitive material comprising a supporting substrate, an intermediate layer containing a thermosetting resin formed on the supporting substrate, and a photosensitive layer formed on the intermediate layer, wherein a contact angle of the surface of the intermediate layer is not less than a value (A°) represented by the formula: A°=B°−2° in which B° is a contact angle corresponding to an intersection of a first approximation linear line and a second approximate linear line minus 2° in a correlation curve between a residual potential of the photosensitive material comprising the predetermined photosensitive layer formed on the intermediate layer containing the thermosetting resin and a contact angle of the intermediate layer containing the thermosetting resin. According to this photosensitive material, it is possible to obtain a good image, which has a low residual potential and is free from fog.
摘要翻译：一种电光敏材料，包括支撑基底，含有形成在支撑基底上的热固性树脂的中间层和形成在中间层上的感光层，其中中间层的表面的接触角不小于（A °），其中B°是与第一近似线性线和第二近似线性线相交的接触角在A°= B°-2°之间的残差电位之间的相关曲线中减去2° 包含形成在含有热固性树脂的中间层上的预定感光层和含有热固性树脂的中间层的接触角的感光材料。根据该感光材料，可以获得具有低残留电位且不起雾的良好图像。

10. 发明授权

US06641968B2 Electrophotosensitive material, production method of the same and method for inspecting an intermediary of the same 失效
标题翻译：电光敏材料，其制造方法和检查中间体的方法
公开(公告)号：US06641968B2
公开(公告)日：2003-11-04
申请号：US10102728
申请日：2002-03-22
申请人： Maki Uchida
发明人： Maki Uchida
IPC分类号： G03G514
CPC分类号： G03G5/142
摘要： The invention relates to an electrophotosensitive material comprising an intermediate layer formed between a conductive substrate and a photosensitive layer, and featuring heat treatment conditions for forming the intermediate layer defined such that a ratio A2/A1 between absorbances at two measurement wavelengths determined from a visible absorption spectrum of the intermediate layer is not more than a value of an intersection of a first approximation line and a second approximation line given by a correlation distribution between the absorbance ratio and the residual potential of the photosensitive material, the first approximation line representing little change of the residual potential despite the increase of the ratio A2/A1, the second approximation line representing a proportional increase of the residual potential with increase of the ratio A2/A1. The invention provides the electrophotosensitive material free from the variations of residual potential.
摘要翻译：本发明涉及一种电光敏材料，其包括形成在导电基底和感光层之间的中间层，并且具有用于形成中间层的热处理条件，其定义为使得在两个测量波长处的吸光度之间的比率A2 / A1由可见吸收中间层的光谱不大于由感光材料的吸光度比和残留电位之间的相关分布给出的第一近似线和第二近似线的交点的值，第一近似线表示较小的变化剩余电位尽管比率A2 / A1增加，但第二近似线代表比例A2 / A1增加的残余电势的比例增加。本发明提供了没有残留电位变化的电光敏材料。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式