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1. 发明授权

US08504949B2 Hybrid hotspot detection 有权
标题翻译：混合热点检测
公开(公告)号：US08504949B2
公开(公告)日：2013-08-06
申请号：US13191436
申请日：2011-07-26
申请人： Juan Andres Torres Robles , Salma Mostafa Fahmy , Peter Louiz Rezk Beshay , Kareem Madkour , Fedor G Pikus , Jen-Yi Wuu , Duo Ding
发明人： Juan Andres Torres Robles , Salma Mostafa Fahmy , Peter Louiz Rezk Beshay , Kareem Madkour , Fedor G Pikus , Jen-Yi Wuu , Duo Ding
IPC分类号： G06F17/50
CPC分类号： G06F17/5081
摘要： Aspects of the invention relate to hybrid hotspot detection techniques. The hybrid hotspot detection techniques combine machine learning classification, pattern matching and process simulation. A machine learning model, along with false hotspots and false non-hotspots for pattern matching, is determined based on training patterns. The determined machine learning model is then used to classify patterns in a layout design into three categories: preliminary hotspots, preliminary non-hotspots and potential hotspots. Pattern matching is then employed to identify false positives and false negatives in the first two categories. Process simulation is employed to identify boundary hotspots in the last category.
摘要翻译：本发明的方面涉及混合热点检测技术。混合热点检测技术结合机器学习分类，模式匹配和过程模拟。基于训练模式确定机器学习模型，以及虚拟热点和虚拟非热点模式匹配。然后使用确定的机器学习模型将布局设计中的图案分为三类：初步热点，初步非热点和潜在热点。然后使用模式匹配来识别头两个类别中的假阳性和假阴性。采用流程模拟来识别最后一类的边界热点。

2. 发明授权

US08402397B2 Hotspot detection based on machine learning 有权
标题翻译：基于机器学习的热点检测
公开(公告)号：US08402397B2
公开(公告)日：2013-03-19
申请号：US13191433
申请日：2011-07-26
申请人： Juan Andres Torres Robles , Salma Mostafa Fahmy , Kareem Madkour , Jen-Yi Wuu
发明人： Juan Andres Torres Robles , Salma Mostafa Fahmy , Kareem Madkour , Jen-Yi Wuu
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： Aspects of the invention relate to machine-learning-based hotspot detection techniques. These hotspot detection techniques employ machine learning models constructed using two feature encoding schemes. When two-level machine learning methods are also employed, a total four machine learning models are constructed: scheme-one level-one, scheme-one level-two, scheme-two level-one and scheme-two level-two. The four models are applied to test patterns to derive scheme-one hotspot information and scheme-two hotspot information, which are then used to determine final hotspot information.
摘要翻译：本发明的方面涉及基于机器学习的热点检测技术。这些热点检测技术采用使用两种特征编码方案构建的机器学习模型。当采用两级机器学习方法时，构建了四种机器学习模型：方案一级一，方案一二级，方案二级一和方案二二级。将四种模型应用于测试模式，以获得方案一热点信息和方案二热点信息，然后用于确定最终热点信息。

3. 发明申请

US20130031522A1 HOTSPOT DETECTION BASED ON MACHINE LEARNING 有权
标题翻译：基于机器学习的HOTSPOT检测
公开(公告)号：US20130031522A1
公开(公告)日：2013-01-31
申请号：US13191433
申请日：2011-07-26
申请人： Juan Andres Torres Robles , Salma Mostafa Fahmy , Kareem Madkour , Jen-Yi Wuu
发明人： Juan Andres Torres Robles , Salma Mostafa Fahmy , Kareem Madkour , Jen-Yi Wuu
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： Aspects of the invention relate to machine-learning-based hotspot detection techniques. These hotspot detection techniques employ machine learning models constructed using two feature encoding schemes. When two-level machine learning methods are also employed, a total four machine learning models are constructed: scheme-one level-one, scheme-one level-two, scheme-two level-one and scheme-two level-two. The four models are applied to test patterns to derive scheme-one hotspot information and scheme-two hotspot information, which are then used to determine final hotspot information.
摘要翻译：本发明的方面涉及基于机器学习的热点检测技术。这些热点检测技术采用使用两种特征编码方案构建的机器学习模型。当采用两级机器学习方法时，构建了四种机器学习模型：方案一级一，方案一二级，方案二级一和方案二二级。将四种模型应用于测试模式，以获得方案一热点信息和方案二热点信息，然后用于确定最终热点信息。

4. 发明申请

US20130031518A1 Hybrid Hotspot Detection 有权
标题翻译：混合热点检测
公开(公告)号：US20130031518A1
公开(公告)日：2013-01-31
申请号：US13191436
申请日：2011-07-26
申请人： Juan Andres Torres Robles , Salma Mostafa Fahmy , Peter Louiz Rezk Beshay , Kareem Madkour , Fedor G. Pikus , Jen-Yi Wuu , Duo Ding
发明人： Juan Andres Torres Robles , Salma Mostafa Fahmy , Peter Louiz Rezk Beshay , Kareem Madkour , Fedor G. Pikus , Jen-Yi Wuu , Duo Ding
IPC分类号： G06F17/50
CPC分类号： G06F17/5081
摘要： Aspects of the invention relate to hybrid hotspot detection techniques. The hybrid hotspot detection techniques combine machine learning classification, pattern matching and process simulation. A machine learning model, along with false hotspots and false non-hotspots for pattern matching, is determined based on training patterns. The determined machine learning model is then used to classify patterns in a layout design into three categories: preliminary hotspots, preliminary non-hotspots and potential hotspots. Pattern matching is then employed to identify false positives and false negatives in the first two categories. Process simulation is employed to identify boundary hotspots in the last category.
摘要翻译：本发明的方面涉及混合热点检测技术。混合热点检测技术结合机器学习分类，模式匹配和过程模拟。基于训练模式确定机器学习模型，以及虚拟热点和虚拟非热点模式匹配。然后使用确定的机器学习模型将布局设计中的图案分为三类：初步热点，初步非热点和潜在热点。然后使用模式匹配来识别头两个类别中的假阳性和假阴性。采用流程模拟来识别最后一类的边界热点。

5. 发明授权

US08799830B2 Integrated circuit layout design methodology with process variation bands 有权
标题翻译：具有过程变化带的集成电路布局设计方法
公开(公告)号：US08799830B2
公开(公告)日：2014-08-05
申请号：US11123340
申请日：2005-05-06
申请人： Juan Andres Torres Robles
发明人： Juan Andres Torres Robles
IPC分类号： G06F17/50 , G06F9/455 , G06F11/22
CPC分类号： G06F17/5081 , G03F1/36 , G06F17/5022 , G06F17/5036 , G06F2217/06 , G06F2217/10 , G06F2217/12 , G06F2217/84 , Y02T10/82
摘要： A system for analyzing IC layouts and designs by calculating variations of a number of objects to be created on a semiconductor wafer as a result of different process conditions. The variations are analyzed to determine individual feature failures or to rank layout designs by their susceptibility to process variations. In one embodiment, the variations are represented by PV-bands having an inner edge that defines the smallest area in which an object will always print and an outer edge that defines the largest area in which an object will print under some process conditions.
摘要翻译：一种用于通过计算由于不同工艺条件在半导体晶片上产生的多个物体的变化来分析IC布局和设计的系统。分析变化以确定单个特征故障或通过它们对过程变化的敏感性来对布局设计进行排序。在一个实施例中，变化由具有限定物体将始终打印的最小区域的内边缘和定义对象将在某些处理条件下打印的最大区域的外边缘的PV带表示。

6. 发明授权

US08108806B2 Contrast-based resolution enhancement for photolithographic processing 有权
标题翻译：用于光刻处理的基于对比度的分辨率增强
公开(公告)号：US08108806B2
公开(公告)日：2012-01-31
申请号：US12501349
申请日：2009-07-10
申请人： Juan Andres Torres Robles , Yuri Granik
发明人： Juan Andres Torres Robles , Yuri Granik
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G03F1/36 , G06F2217/12 , Y02P90/265
摘要： A contrast-based resolution enhancing technology (RET) determines a distribution of contrast values for edge fragments in a design layout or portion thereof. Resolution enhancement is applied to the edge fragments in a way that increases the number of edge fragments having a contrast value that exceeds a predetermined threshold.
摘要翻译：基于对比度的分辨率增强技术（RET）确定设计布局或其部分中边缘片段的对比度值的分布。以增加具有超过预定阈值的对比度值的边缘片段的数量的方式对边缘片段应用分辨率增强。

7. 发明申请

US20100023916A1 Model Based Hint Generation For Lithographic Friendly Design 审中-公开
标题翻译：用于光刻友好设计的基于模型的提示生成
公开(公告)号：US20100023916A1
公开(公告)日：2010-01-28
申请号：US12416077
申请日：2009-03-31
申请人： Marko P. Chew , Yue Yang , Juan Andres Torres Robles
发明人： Marko P. Chew , Yue Yang , Juan Andres Torres Robles
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： In various implementations of the invention, a model of an optical proximity correction process is employed to determine potential adjustments to a layout design for a mask that might resolve potential errors an image resulting from application of the mask in an optical lithographic process. In various implementations of the invention, corrected mask shapes, such as for example optical proximity corrected mask shapes, and associated printed image contours are generated through use of a model. Subsequently, the associated printed image contour and a desired printed image contour may be used to determine various edge segment adjustments to the corrected mask shapes that would realize the desired printed image contour. In various implementations of the present invention, the model for generation of the corrected mask shapes and the associated printed image contour is a square kernel model. With various implementations of the invention, the kernel represents a grey scale map wherein each pixel of the map is generated based on the desired displacement relative to the displacement to be modeled. For example by application of linear regression techniques. As a result, printed image contours and corrected mask shapes may be generated based upon an input layout design, wherein potential adjustments to the mask may be determined based upon a desired printed image contour.
摘要翻译：在本发明的各种实施方案中，采用光学邻近校正处理的模型来确定对于掩模的布局设计的潜在调整，该掩模可以解决由于在光学平版印刷工艺中应用掩模而产生的图像的潜在错误。在本发明的各种实现中，通过使用模型来生成校正的掩模形状，例如光学邻近校正的掩模形状和相关的打印的图像轮廓。随后，可以使用相关联的打印图像轮廓和期望的打印图像轮廓来确定将实现期望的打印图像轮廓的校正的蒙版形状的各种边缘段调整。在本发明的各种实现中，用于生成校正的掩模形状的模型和相关联的打印图像轮廓是平方内核模型。通过本发明的各种实现，内核表示灰度图，其中基于相对于要建模的位移的期望位移来生成地图的每个像素。例如通过应用线性回归技术。结果，可以基于输入布局设计来生成打印图像轮廓和校正的掩模形状，其中可以基于期望的打印图像轮廓来确定对掩模的潜在调整。

8. 发明申请

US20080141195A1 ANALYSIS OPTIMIZER 有权
标题翻译：分析优化器
公开(公告)号：US20080141195A1
公开(公告)日：2008-06-12
申请号：US11937423
申请日：2007-11-08
申请人： Juan Andres Torres Robles , William S. Graupp , Mark C. Simmons
发明人： Juan Andres Torres Robles , William S. Graupp , Mark C. Simmons
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G03F1/36 , G06F17/5009 , G06F17/5072 , G06F17/5077 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14
摘要： A method of preparing a set of target layout data for the application of a photolithographic friendly design (LFD) analysis or other photolithographic analysis. The target layout data is revised to remove areas or features prior to performing the LFD analysis. The features removed include features that have been determined to print correctly, duplicate features and features that are not sensitive to variations in process conditions. The revised target layout is analyzed to determine if the features that remain will print correctly on a wafer.
摘要翻译：一种制备用于应用光刻友好设计（LFD）分析或其它光刻分析的一组目标布局数据的方法。在执行LFD分析之前，修改目标布局数据以删除区域或特征。删除的功能包括已确定要正确打印的功能，重复功能和对过程条件变化不敏感的功能。分析修订后的目标布局，以确定残留的特征是否会在晶圆上正确打印。

9. 发明申请

US20180260512A1 INTEGRATED CIRCUIT LAYOUT DESIGN METHODOLOGY WITH PROCESS VARIATION BANDS 审中-公开
公开(公告)号：US20180260512A1
公开(公告)日：2018-09-13
申请号：US15978044
申请日：2018-05-11
申请人： Juan Andres Torres Robles
发明人： Juan Andres Torres Robles
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/36 , G06F17/5022 , G06F17/5036 , G06F2217/06 , G06F2217/10 , G06F2217/12 , G06F2217/84 , Y02T10/82
摘要： A system for analyzing IC layouts and designs by calculating variations of a number of objects to be created on a semiconductor wafer as a result of different process conditions. The variations are analyzed to determine individual feature failures or to rank layout designs by their susceptibility to process variations. In one embodiment, the variations are represented by PV-bands having an inner edge that defines the smallest area in which an object will always print and an outer edge that defines the largest area in which an object will print under some process conditions.

10. 发明申请

US20090178018A1 PRE-BIAS OPTICAL PROXIMITY CORRECTION 有权
标题翻译： PRE-BIAS光学近似校正
公开(公告)号：US20090178018A1
公开(公告)日：2009-07-09
申请号：US12406820
申请日：2009-03-18
申请人： Juan Andres Torres Robles , Andrew Michael Jost , Mark C. Simmons , George P. Lippincott
发明人： Juan Andres Torres Robles , Andrew Michael Jost , Mark C. Simmons , George P. Lippincott
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/68
摘要： A pre-bias optical proximity correction (OPC) method allows faster convergence during OPC iterations, providing an initial set of conditions to edge fragments of a layout based on density conditions near the edge fragments.
摘要翻译：预偏置光学邻近校正（OPC）方法允许在OPC迭代期间更快地收敛，基于靠近边缘片段的密度条件向布局的边缘片段提供初始条件集。

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