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1. 发明授权

US5605783A Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers 失效
标题翻译：用于制造固态成像器的小透镜阵列的图案转移技术
公开(公告)号：US5605783A
公开(公告)日：1997-02-25
申请号：US369235
申请日：1995-01-06
申请人： Joseph F. Revelli , Jeffrey I. Hirsh , Joseph Jech , Douglas R. Robello , Stephen P. Barry , Alan C. G. Nutt
发明人： Joseph F. Revelli , Jeffrey I. Hirsh , Joseph Jech , Douglas R. Robello , Stephen P. Barry , Alan C. G. Nutt
IPC分类号： G02B3/00 , G02B6/12 , G02B6/122 , G02B6/124 , G03F7/00 , H01L27/146 , G03F7/40
CPC分类号： G02B3/0018 , G02B6/1221 , G02B6/1245 , G03F7/001 , H01L27/14643 , G02B2006/12102 , G02B2006/12173 , G02B2006/12176
摘要： A method for forming lenslets which collect light and focuses it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate and forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer so that the mask pattern corresponds to lenslets to be formed, The method further includes anisotropically plasma etching the transparent lenslet-forming layer according to the thin etch-stop mask pattern, removing the thin etch-stop mask, and thermally reflowing the patterned transparent layer to form the transparent lenslets.
摘要翻译：一种用于形成收集光并将其聚焦到电子成像器的感光元件上的小透镜的方法包括在衬底上或衬底上的层上提供透明小透镜形成层，并在透明小透镜形成层上形成薄的蚀刻停止层并且图案化蚀刻停止层，使得掩模图案对应于要形成的小透镜。该方法还包括根据薄蚀刻停止掩模图案对透明小透镜形成层进行各向异性等离子体蚀刻，去除薄的蚀刻停止掩模，并且热回流图案化的透明层以形成透明小透镜。

2. 发明授权

US5691116A Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers 失效
标题翻译：用于制造固态成像器的小透镜阵列的图案转移技术
公开(公告)号：US5691116A
公开(公告)日：1997-11-25
申请号：US710591
申请日：1996-09-20
申请人： Joseph F. Revelli , Jeffrey I. Hirsh , Joseph Jech , Douglas R. Robello , Stephen P. Barry , Alan C. G. Nutt
发明人： Joseph F. Revelli , Jeffrey I. Hirsh , Joseph Jech , Douglas R. Robello , Stephen P. Barry , Alan C. G. Nutt
IPC分类号： G02B3/00 , G02B6/12 , G02B6/122 , G02B6/124 , G03F7/00 , H01L27/146
CPC分类号： G02B3/0018 , G02B6/1221 , G02B6/1245 , G03F7/001 , H01L27/14643 , G02B2006/12102 , G02B2006/12173 , G02B2006/12176
摘要： A method for forming lenslets which collect light and focus the light onto photosensitive elements of an electronic imager. The method includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate, forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning a thin photosensitive resin mask on the etch-stop layer so that the mask pattern corresponds to lenslets to be formed. The method further includes transferring by etching the pattern of the photosensitive resin mask to the thin etch-stop layer to form a thin etch-stop mask, anisotropically plasma etching the transparent lenslet-forming layer according to the patterned thin etch-stop mask, removing the thin etch-stop mask, and thermally reflowing the etched transparent lenslet-forming layer to form the lenslets.
摘要翻译：一种用于形成收集光并将光聚焦到电子成像器的感光元件上的小透镜的方法。该方法包括在衬底上或在衬底上的层上提供透明小透镜形成层，在透明小透镜形成层上形成薄的蚀刻停止层，并在蚀刻停止层上图案化薄的光敏树脂掩模，使得掩模图案对应于要形成的小透镜。该方法还包括通过将感光树脂掩模的图案蚀刻到薄蚀刻停止层上以形成薄的蚀刻停止掩模，根据图案化的薄蚀刻停止掩模进行各向异性等离子体蚀刻透明小透镜形成层，去除薄的蚀刻停止掩模，并且热回收蚀刻的透明小透镜形成层以形成小透镜。

3. 发明授权

US5723264A Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters 失效
标题翻译：使用专用聚酯制造小透镜阵列的图案转印技术
公开(公告)号：US5723264A
公开(公告)日：1998-03-03
申请号：US615938
申请日：1996-03-14
申请人： Douglas R. Robello , Joseph F. Revelli , Jeffrey I. Hirsh
发明人： Douglas R. Robello , Joseph F. Revelli , Jeffrey I. Hirsh
IPC分类号： C08G63/672 , G02B3/00 , G03F7/00 , G03F7/40
CPC分类号： G02B3/0018 , C08G63/672 , G03F7/001
摘要： In a method for forming lenslets which collect light and focus it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate, (a) providing a transparent polyester lenslet-forming layer on a substrate or on layer(s) on the substrate, the polyester containing repeat units, in part, having the structure ##STR1## wherein: n is 2 or greater; x is selected from the group consisting of H, CH.sub.3, Br and Cl; and Z is selected from the group consisting of nil, O, S, CH.sub.2, C.dbd.O, SO, SO.sub.2, CH--CH.sub.3, CH.sub.3 --C--CH.sub.3, CF.sub.3 --C--CF.sub.3, CH.sub.3 --C--CH.sub.2 CH.sub.3, ##STR2## (b) forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer to form a mask so that the pattern corresponds to lenslets to be formed; (c) anisotropically plasma etching the transparent lenslet-forming layer according to the pattern; (d) removing the thin etch-stop mask; and (e) thermally reflowing the patterned transparent layer to form the transparent lenslets.
摘要翻译：在形成收集光并将其聚焦在电子成像器的感光元件上的小透镜的方法中，包括在基底上或在基底上的层上提供透明的小透镜形成层，（a）在基底上提供透明的聚酯小透镜形成层底物或基层上的一层或多层，所述聚酯包含重复单元，部分具有结构，其中n为2或更大; x选自H，CH 3，Br和Cl; 并且Z选自N，O，S，CH 2，C = O，SO，SO 2，CH-CH 3，CH 3 -CH 3，CF 3 -C-CF 3，CH 3 -CH 2 CH 3，（b）在透明小透镜形成层上形成薄的蚀刻停止层，并对蚀刻停止层进行构图以形成掩模，使得图案对应于要形成的小透镜; （c）根据图案各向异性等离子体蚀刻透明小透镜形成层; （d）去除薄的蚀刻停止掩模; 和（e）将图案化的透明层热回流以形成透明小透镜。

4. 发明授权

US06043001A Dual mask pattern transfer techniques for fabrication of lenslet arrays 失效
标题翻译：用于制造小透镜阵列的双掩模图案转印技术
公开(公告)号：US06043001A
公开(公告)日：2000-03-28
申请号：US26990
申请日：1998-02-20
申请人： Jeffrey I. Hirsh , Joseph F. Revelli , Joseph Jech
发明人： Jeffrey I. Hirsh , Joseph F. Revelli , Joseph Jech
IPC分类号： G02B3/00 , G03F7/00
CPC分类号： G02B3/0018 , G03F7/001
摘要： A method for forming lenslets of a solid-state imager, includes providing a first etch-stop layer on a spacer layer formed on a substrate or layer(s) on a substrate; providing a patterned first photosensitive resin layer to form a first mask pattern; performing an etch transfer of the first mask pattern to the first photosensitive resin layer to form a first etch-stop mask pattern, and removing the first photosensitive resin layer; providing a transparent lenslet-forming layer on the spacer layer. The method further includes forming a second etch-stop layer on the transparent lenslet-forming layer to form a second mask pattern and patterning a second photosensitive resin layer on the second etch-stop layer wherein the second mask pattern corresponds to the lenslet array to be formed and wherein the lenslet array defined by the second mask pattern is aligned to the array of open regions of the first etch-stop mask pattern; transferring by etching the pattern of the second photosensitive resin layer to the second etch-stop layer to form a second etch-stop mask pattern; anisotropically plasma etching the transparent lenslet-forming layer according to the second etch-stop mask pattern; anisotropically plasma etching the spacer layer according to the first etch-stop mask pattern; isotropically etching to remove remaining portions of the first etch-stop layer forming the first etch-stop mask and portions of the second etch-stop layer forming the second etch-stop mask; and thermally reflowing the patterned transparent lenslet-forming layer to form the lenslets on the solid-state imager.
摘要翻译：一种用于形成固态成像器的小透镜的方法，包括在形成在衬底上的衬底或层上的间隔层上提供第一蚀刻停止层; 提供图案化的第一感光树脂层以形成第一掩模图案; 对第一感光性树脂层进行第一掩模图案的蚀刻转印，形成第一蚀刻停止掩模图案，除去第一感光性树脂层; 在间隔层上提供透明的小透镜形成层。该方法还包括在透明小透镜形成层上形成第二蚀刻停止层以形成第二掩模图案，并且在第二蚀刻停止层上构图第二感光树脂层，其中第二掩模图案对应于小透镜阵列并且其中由所述第二掩模图案限定的所述透镜阵列与所述第一蚀刻停止掩模图案的开放区域的阵列对准; 通过将第二感光性树脂层的图案蚀刻到第二蚀刻停止层，形成第二蚀刻停止掩模图案; 根据第二蚀刻停止掩模图案各向异性地蚀刻透明小透镜形成层; 根据第一蚀刻停止掩模图案各向异性地蚀刻间隔层; 各向同性蚀刻以去除形成第一蚀刻停止掩模的第一蚀刻停止层的剩余部分和形成第二蚀刻停止掩模的第二蚀刻停止层的部分; 并且将图案化的透明小透镜形成层热回流以在固态成像器上形成小透镜。

5. 发明授权

US5327512A Langmuir-Blodgett film in an integrated electro-optical scanner 失效
标题翻译： Langmuir-Blodgett电影在一个集成的电光学扫描仪
公开(公告)号：US5327512A
公开(公告)日：1994-07-05
申请号：US24716
申请日：1993-03-01
申请人： Thomas L. Penner , Nancy J. Armstrong , David J. Williams , Joseph F. Revelli
发明人： Thomas L. Penner , Nancy J. Armstrong , David J. Williams , Joseph F. Revelli
IPC分类号： G02F1/065 , H04N1/036 , G02B6/10
CPC分类号： H04N1/036 , G02F1/065 , G02F2202/027
摘要： A fully integrated electro-optic page-scanner comprises an optically-transparent waveguide made from an electro-optic polymer formed as a Langmuir-Blodgett film, and a linear array of electrically-addressable, spaced, parallel electrodes for selectively altering the refractive index across pixel-sized portions of the polymeric waveguide. Parallel addressing of the electrodes in accordance with the intensity pattern of a line of pixels to be recorded acts to modulate the phase front of an optical wave propagating within the waveguide in accordance with such line intensity pattern. Schlieren optics, also integrated with the page-scanner, convert the phase-front-modulated wave to an intensity-modulated pixel pattern which can be imaged onto a moving photosensitive recording element to record a two-dimensional (page) of image information. By using an electro-optic polymer formed as a Langmuir-Blodgett film as the waveguide, certain disadvantages of prior art scanning devices are eliminated.
摘要翻译：完全集成的电光寻像扫描器包括由形成为Langmuir-Blodgett膜的电光聚合物制成的光学透明波导和可电寻址的间隔开的平行电极的线性阵列，用于选择性地改变折射率聚合物波导的像素大小的部分。根据要记录的像素行的强度图案，电极的并行寻址用于根据这种线强度图案来调制在波导内传播的光波的相位前沿。也与页面扫描仪集成的施利伦光学器件将相位前调制波转换成强度调制像素图案，其可以被成像到移动的光敏记录元件上以记录图像信息的二维（页）。通过使用形成为Langmuir-Blodgett膜的电光聚合物作为波导，消除了现有技术的扫描装置的某些缺点。

6. 发明授权

US5093874A Integrated electro-optical scanner with photoconductive substrate 失效
标题翻译：集成光电扫描仪，带光导基板
公开(公告)号：US5093874A
公开(公告)日：1992-03-03
申请号：US678486
申请日：1991-04-01
申请人： Gilbert A. Hawkins , Joseph F. Revelli , David J. Williams
发明人： Gilbert A. Hawkins , Joseph F. Revelli , David J. Williams
IPC分类号： G02B6/12 , G02F1/065 , G02F1/295
CPC分类号： G02F1/065 , G02B6/12004 , G02F1/2955
摘要： A fully integrated electro-optic page-scanner comprises an optically transparent waveguide made from an electro-optic polymer, and an electrode structure including a linear array of electrically-addressable, spaced, parallel electrodes for selectively altering the refractive index across pixel-sized portions of the polymeric waveguide. According to the invention, the addressable electrodes are disposed on a photoconductive substrate which facilitates poling of the polymer waveguide to rander it electro-optic in nature. During the poling process, the photoconductive substrate is made electrically conductive by flood illumination, while a uniform electric field is established between the substrate and a transparent electrode which overlies the waveguide layer, opposite the addressable electrodes. Preferably, the photoconductive substrate comprises undoped silicon which enables certain electrode-addressing circuitry to be integrated within the scanner structure.
摘要翻译：完全集成的电光寻像扫描器包括由电光聚合物制成的光学透明波导，以及包括电可寻址，间隔开的平行电极的线性阵列的电极结构，用于选择性地改变穿过像素尺寸部分的折射率的聚合物波导。根据本发明，可寻址电极设置在光电导基板上，其有利于聚合物波导的极化，从而将光电性质放在其上。在极化过程中，通过泛光照明使感光基板导电，同时在衬底和覆盖波导层的透明电极之间建立均匀的电场，与可寻址电极相对。优选地，光导基板包括未掺杂的硅，其使得某些电极寻址电路能够集成在扫描器结构内。

7. 发明授权

US4801184A Integrated optical read/write head and apparatus incorporating same 失效
标题翻译：集成光读/写头及其结合的装置
公开(公告)号：US4801184A
公开(公告)日：1989-01-31
申请号：US62524
申请日：1987-06-15
申请人： Joseph F. Revelli
发明人： Joseph F. Revelli
IPC分类号： G02F1/295 , G11B7/09 , G11B7/12 , G02B6/10
CPC分类号： G02F1/2955 , G11B7/09 , G11B7/1245
摘要： Apparatus for writing and/or reading information on a recording element comprises an integrated optical write/read head of the type comprising a planar optical waveguide and means for deflecting a guided beam of radiation out of the waveguide at an egress zone and for bringing such beam to a focused spot on a desired data track on the recording element. Means, responsive to any displacement of such focused spot from a desired data track, is provided for selectively varying the effective refractive index of the waveguide in the vicinity of the egress zone in order to vary the tracking position of the spot. Such means comprises a pair of spaced parallel electrodes in close proximity to the egress zone, and means for producing an electric field between such electrodes, such field varying with the tracking error.
摘要翻译：用于在记录元件上写入和/或读取信息的装置包括一种包括平面光波导的类型的集成光学写入/读取头，以及用于将导向的波束束从出射区域偏离波导的装置，到记录元件上期望的数据轨道上的聚焦点。提供响应于来自所需数据轨道的这种聚焦点的任何位移的装置，用于选择性地改变在出口区域附近的波导的有效折射率，以便改变点的跟踪位置。这种装置包括紧邻出口区域的一对隔开的平行电极，以及用于在这种电极之间产生电场的装置，这种场随着跟踪误差而变化。

8. 发明授权

US5317666A Waveguide nonlinear optical frequency converter with integral modulation and optimization means 失效
标题翻译：波导非线性光变频器具有积分调制和优化手段
公开(公告)号：US5317666A
公开(公告)日：1994-05-31
申请号：US953925
申请日：1992-09-29
申请人： John A. Agostinelli , Jose M. Mir , Joseph F. Revelli
发明人： John A. Agostinelli , Jose M. Mir , Joseph F. Revelli
IPC分类号： G02F1/35 , G02F1/377 , G02B6/10
CPC分类号： G02F1/3775 , G02F2001/3546
摘要： An optical, waveguide, quasi-phase-matching frequency converter has integral means to vary the efficiency of the quasi-phase-matching frequency conversion process resulting in intensity modulation of the device output; said frequency converter has integral means to optimize the quasi-phase-matching frequency conversion process resulting in optimum device output; and said frequency converter has integral input signal polarization mode conversion means in optional combination with the conversion optimization means for modulating the optimized device output. Methods for modulating and optimizing the quasi-phase-matching frequency converted signal by electro-optically controlling the dispersion of the frequency converting medium are also disclosed.
摘要翻译：光学，波导，准相位匹配频率转换器具有改变准相位匹配频率转换过程的效率的整体手段，导致器件输出的强度调制; 所述变频器具有优化准相位匹配频率转换过程的集成手段，从而产生最佳的器件输出; 并且所述变频器具有与用于调制优化的器件输出的转换优化装置的可选组合的积分输入信号偏振模式转换装置。还公开了通过电光控制变频介质的色散来调制和优化准相位匹配频率转换信号的方法。

9. 发明授权

US5058970A Quasi-phase matching optical waveguide 失效
标题翻译：准相位匹配光波导
公开(公告)号：US5058970A
公开(公告)日：1991-10-22
申请号：US583118
申请日：1990-09-17
申请人： Jay S. Schildkraut , Joseph F. Revelli , Eric T. Prince
发明人： Jay S. Schildkraut , Joseph F. Revelli , Eric T. Prince
IPC分类号： G02B6/00 , G02B6/12 , G02F1/361 , G02F1/37 , G02F1/377
CPC分类号： B82Y20/00 , G02F1/3775 , G02F1/361 , G02F2202/022
摘要： A quasi-phase matching optical waveguide for producing a second harmonic of an internally propagated polarized laser beam having a wavelength in the range of from 700 to 1300 nm is disclosed. The waveguide is comprised of at least one array of laterally spaced transparent electrodes in direct contact with a transmission medium containing similarly polar aligned organic molecular dipoles in overlying areas. The transparent electrodes and overlying areas of the transmission medium are each of the same width and spacing.

10. 发明授权

US5052771A Integrated electro-optical scanner 失效
标题翻译：集成电光扫描仪
公开(公告)号：US5052771A
公开(公告)日：1991-10-01
申请号：US632195
申请日：1990-12-21
申请人： David J. Williams , Joseph F. Revelli
发明人： David J. Williams , Joseph F. Revelli
IPC分类号： G02B6/12 , G02F1/065 , G02F1/295 , H04N1/12
CPC分类号： H04N1/1275 , G02B6/12004 , G02F1/065 , G02F1/2955 , H04N1/12
摘要： A fully integrated electro-optic page-scanner comprises an optically-transparent waveguide made from an electro-optic polymer, and a linear array of electrically-addressable, spaced, parallel electrodes for selectively altering the refractive index across pixel-sized portions of the polymeric waveguide. Parallel addressing of the electrodes in accordance with the intensity pattern of a line of pixels to be recorded acts to modulate the phase front of an optical wave propagating within the waveguide in accordance with such line intensity pattern. Schlieren optics, also integrated with the page-scanner, convert the phase-front-modulated wave to an intensity-modulated pixel pattern which can be imaged onto a moving photosensitive recording element to record a two-dimensional (page) of image information. By using an electro-optic polymer as the waveguide, certain disadvantages of prior art scanning devices are eliminated.
摘要翻译：完全集成的电光寻像扫描器包括由电光聚合物制成的光学透明波导和可电寻址的间隔开的平行电极的线性阵列，用于选择性地改变聚合物的像素尺寸部分的折射率波导。根据要记录的像素行的强度图案，电极的并行寻址用于根据这种线强度图案来调制在波导内传播的光波的相位前沿。也与页面扫描仪集成的施利伦光学器件将相位前调制波转换成强度调制像素图案，其可以被成像到移动的光敏记录元件上以记录图像信息的二维（页）。通过使用电光聚合物作为波导，消除了现有技术的扫描装置的某些缺点。

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