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1. 发明授权

US5691116A Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers 失效
标题翻译：用于制造固态成像器的小透镜阵列的图案转移技术
公开(公告)号：US5691116A
公开(公告)日：1997-11-25
申请号：US710591
申请日：1996-09-20
申请人： Joseph F. Revelli , Jeffrey I. Hirsh , Joseph Jech , Douglas R. Robello , Stephen P. Barry , Alan C. G. Nutt
发明人： Joseph F. Revelli , Jeffrey I. Hirsh , Joseph Jech , Douglas R. Robello , Stephen P. Barry , Alan C. G. Nutt
IPC分类号： G02B3/00 , G02B6/12 , G02B6/122 , G02B6/124 , G03F7/00 , H01L27/146
CPC分类号： G02B3/0018 , G02B6/1221 , G02B6/1245 , G03F7/001 , H01L27/14643 , G02B2006/12102 , G02B2006/12173 , G02B2006/12176
摘要： A method for forming lenslets which collect light and focus the light onto photosensitive elements of an electronic imager. The method includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate, forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning a thin photosensitive resin mask on the etch-stop layer so that the mask pattern corresponds to lenslets to be formed. The method further includes transferring by etching the pattern of the photosensitive resin mask to the thin etch-stop layer to form a thin etch-stop mask, anisotropically plasma etching the transparent lenslet-forming layer according to the patterned thin etch-stop mask, removing the thin etch-stop mask, and thermally reflowing the etched transparent lenslet-forming layer to form the lenslets.
摘要翻译：一种用于形成收集光并将光聚焦到电子成像器的感光元件上的小透镜的方法。该方法包括在衬底上或在衬底上的层上提供透明小透镜形成层，在透明小透镜形成层上形成薄的蚀刻停止层，并在蚀刻停止层上图案化薄的光敏树脂掩模，使得掩模图案对应于要形成的小透镜。该方法还包括通过将感光树脂掩模的图案蚀刻到薄蚀刻停止层上以形成薄的蚀刻停止掩模，根据图案化的薄蚀刻停止掩模进行各向异性等离子体蚀刻透明小透镜形成层，去除薄的蚀刻停止掩模，并且热回收蚀刻的透明小透镜形成层以形成小透镜。

2. 发明授权

US5605783A Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers 失效
标题翻译：用于制造固态成像器的小透镜阵列的图案转移技术
公开(公告)号：US5605783A
公开(公告)日：1997-02-25
申请号：US369235
申请日：1995-01-06
申请人： Joseph F. Revelli , Jeffrey I. Hirsh , Joseph Jech , Douglas R. Robello , Stephen P. Barry , Alan C. G. Nutt
发明人： Joseph F. Revelli , Jeffrey I. Hirsh , Joseph Jech , Douglas R. Robello , Stephen P. Barry , Alan C. G. Nutt
IPC分类号： G02B3/00 , G02B6/12 , G02B6/122 , G02B6/124 , G03F7/00 , H01L27/146 , G03F7/40
CPC分类号： G02B3/0018 , G02B6/1221 , G02B6/1245 , G03F7/001 , H01L27/14643 , G02B2006/12102 , G02B2006/12173 , G02B2006/12176
摘要： A method for forming lenslets which collect light and focuses it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate and forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer so that the mask pattern corresponds to lenslets to be formed, The method further includes anisotropically plasma etching the transparent lenslet-forming layer according to the thin etch-stop mask pattern, removing the thin etch-stop mask, and thermally reflowing the patterned transparent layer to form the transparent lenslets.
摘要翻译：一种用于形成收集光并将其聚焦到电子成像器的感光元件上的小透镜的方法包括在衬底上或衬底上的层上提供透明小透镜形成层，并在透明小透镜形成层上形成薄的蚀刻停止层并且图案化蚀刻停止层，使得掩模图案对应于要形成的小透镜。该方法还包括根据薄蚀刻停止掩模图案对透明小透镜形成层进行各向异性等离子体蚀刻，去除薄的蚀刻停止掩模，并且热回流图案化的透明层以形成透明小透镜。

3. 发明授权

US06040857A Phase-noise type broad spectral bandwidth optical low-pass anti-aliasing filter 失效
标题翻译：相位噪声类型宽谱带宽光学低通抗混叠滤波器
公开(公告)号：US06040857A
公开(公告)日：2000-03-21
申请号：US863648
申请日：1997-05-27
申请人： Jeffrey I. Hirsh , Joseph F. Revelli, Jr. , Alan C. G. Nutt
发明人： Jeffrey I. Hirsh , Joseph F. Revelli, Jr. , Alan C. G. Nutt
IPC分类号： G02B5/18 , G02B27/46 , H04N9/07 , H04N5/217
CPC分类号： G02B27/46 , G02B5/1871
摘要： A device is described for a very low cost anti-aliasing filter to be used to suppress aliasing artifacts present in discretely sampled solid-state electronic imaging devices. This device includes a transparent substrate upon which a multiplicity of transparent phase spots are placed. The diameter and thickness of the transparent phase spots are designed in such a way to cause just the right amount of blurring to suppress the aliasing artifacts, yet render a reasonable sharp image for spatial frequencies below the sampling frequency of the imager. This suppression is further accomplished over a broad spectral range. The phase noise filter thus formed can be placed either in object space or in image space.
摘要翻译：描述了一种用于非常低成本的抗混叠滤波器的装置，用于抑制存在于离散采样的固态电子成像装置中的混叠伪影。该装置包括透明基板，多个透明相位点放置在该透明基板上。透明相位点的直径和厚度被设计成仅仅产生适当的模糊量来抑制混叠伪影，而对于低于成像器的采样频率的空间频率，给出合理的清晰图像。在宽光谱范围内进一步完成了抑制。这样形成的相位噪声滤波器可以放置在物体空间或图像空间中。

4. 发明授权

US5723264A Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters 失效
标题翻译：使用专用聚酯制造小透镜阵列的图案转印技术
公开(公告)号：US5723264A
公开(公告)日：1998-03-03
申请号：US615938
申请日：1996-03-14
申请人： Douglas R. Robello , Joseph F. Revelli , Jeffrey I. Hirsh
发明人： Douglas R. Robello , Joseph F. Revelli , Jeffrey I. Hirsh
IPC分类号： C08G63/672 , G02B3/00 , G03F7/00 , G03F7/40
CPC分类号： G02B3/0018 , C08G63/672 , G03F7/001
摘要： In a method for forming lenslets which collect light and focus it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate, (a) providing a transparent polyester lenslet-forming layer on a substrate or on layer(s) on the substrate, the polyester containing repeat units, in part, having the structure ##STR1## wherein: n is 2 or greater; x is selected from the group consisting of H, CH.sub.3, Br and Cl; and Z is selected from the group consisting of nil, O, S, CH.sub.2, C.dbd.O, SO, SO.sub.2, CH--CH.sub.3, CH.sub.3 --C--CH.sub.3, CF.sub.3 --C--CF.sub.3, CH.sub.3 --C--CH.sub.2 CH.sub.3, ##STR2## (b) forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer to form a mask so that the pattern corresponds to lenslets to be formed; (c) anisotropically plasma etching the transparent lenslet-forming layer according to the pattern; (d) removing the thin etch-stop mask; and (e) thermally reflowing the patterned transparent layer to form the transparent lenslets.
摘要翻译：在形成收集光并将其聚焦在电子成像器的感光元件上的小透镜的方法中，包括在基底上或在基底上的层上提供透明的小透镜形成层，（a）在基底上提供透明的聚酯小透镜形成层底物或基层上的一层或多层，所述聚酯包含重复单元，部分具有结构，其中n为2或更大; x选自H，CH 3，Br和Cl; 并且Z选自N，O，S，CH 2，C = O，SO，SO 2，CH-CH 3，CH 3 -CH 3，CF 3 -C-CF 3，CH 3 -CH 2 CH 3，（b）在透明小透镜形成层上形成薄的蚀刻停止层，并对蚀刻停止层进行构图以形成掩模，使得图案对应于要形成的小透镜; （c）根据图案各向异性等离子体蚀刻透明小透镜形成层; （d）去除薄的蚀刻停止掩模; 和（e）将图案化的透明层热回流以形成透明小透镜。

5. 发明授权

US06043001A Dual mask pattern transfer techniques for fabrication of lenslet arrays 失效
标题翻译：用于制造小透镜阵列的双掩模图案转印技术
公开(公告)号：US06043001A
公开(公告)日：2000-03-28
申请号：US26990
申请日：1998-02-20
申请人： Jeffrey I. Hirsh , Joseph F. Revelli , Joseph Jech
发明人： Jeffrey I. Hirsh , Joseph F. Revelli , Joseph Jech
IPC分类号： G02B3/00 , G03F7/00
CPC分类号： G02B3/0018 , G03F7/001
摘要： A method for forming lenslets of a solid-state imager, includes providing a first etch-stop layer on a spacer layer formed on a substrate or layer(s) on a substrate; providing a patterned first photosensitive resin layer to form a first mask pattern; performing an etch transfer of the first mask pattern to the first photosensitive resin layer to form a first etch-stop mask pattern, and removing the first photosensitive resin layer; providing a transparent lenslet-forming layer on the spacer layer. The method further includes forming a second etch-stop layer on the transparent lenslet-forming layer to form a second mask pattern and patterning a second photosensitive resin layer on the second etch-stop layer wherein the second mask pattern corresponds to the lenslet array to be formed and wherein the lenslet array defined by the second mask pattern is aligned to the array of open regions of the first etch-stop mask pattern; transferring by etching the pattern of the second photosensitive resin layer to the second etch-stop layer to form a second etch-stop mask pattern; anisotropically plasma etching the transparent lenslet-forming layer according to the second etch-stop mask pattern; anisotropically plasma etching the spacer layer according to the first etch-stop mask pattern; isotropically etching to remove remaining portions of the first etch-stop layer forming the first etch-stop mask and portions of the second etch-stop layer forming the second etch-stop mask; and thermally reflowing the patterned transparent lenslet-forming layer to form the lenslets on the solid-state imager.
摘要翻译：一种用于形成固态成像器的小透镜的方法，包括在形成在衬底上的衬底或层上的间隔层上提供第一蚀刻停止层; 提供图案化的第一感光树脂层以形成第一掩模图案; 对第一感光性树脂层进行第一掩模图案的蚀刻转印，形成第一蚀刻停止掩模图案，除去第一感光性树脂层; 在间隔层上提供透明的小透镜形成层。该方法还包括在透明小透镜形成层上形成第二蚀刻停止层以形成第二掩模图案，并且在第二蚀刻停止层上构图第二感光树脂层，其中第二掩模图案对应于小透镜阵列并且其中由所述第二掩模图案限定的所述透镜阵列与所述第一蚀刻停止掩模图案的开放区域的阵列对准; 通过将第二感光性树脂层的图案蚀刻到第二蚀刻停止层，形成第二蚀刻停止掩模图案; 根据第二蚀刻停止掩模图案各向异性地蚀刻透明小透镜形成层; 根据第一蚀刻停止掩模图案各向异性地蚀刻间隔层; 各向同性蚀刻以去除形成第一蚀刻停止掩模的第一蚀刻停止层的剩余部分和形成第二蚀刻停止掩模的第二蚀刻停止层的部分; 并且将图案化的透明小透镜形成层热回流以在固态成像器上形成小透镜。

6. 发明授权

US6031666A Optical phase noise filter using randomly placed spots 有权
标题翻译：光学相位噪声滤波器采用随机放置点
公开(公告)号：US6031666A
公开(公告)日：2000-02-29
申请号：US131707
申请日：1998-08-10
申请人： Alan C. G. Nutt , Jeffrey I. Hirsh
发明人： Alan C. G. Nutt , Jeffrey I. Hirsh
IPC分类号： G02B5/20 , G02B26/06 , G02B5/30
CPC分类号： G02B26/06 , G02B5/20
摘要： An optical phase noise filter for use with an optical imaging system such as a solid-state imager or the like, including a transparent substrate; and a plurality of transparent spots randomly placed on the transparent substrate for producing a phase difference between a wavefront transmitted through the transparent spots and that portion of the transparent substrate other than the transparent spots to define an optical phase noise filter having a spatial sampling cut-off frequency and wherein the variance of the transparent spot to transparent spot distance between adjacent spots is minimized while maintaining the randomness of transparent spot placement.
摘要翻译：一种与诸如固态成像仪等的光学成像系统一起使用的光学相位噪声滤波器，包括透明基板; 以及随机地放置在透明基板上的多个透明点，用于产生通过透明点透射的波前与除了透明点之外的透明基板的部分之间的相位差，以限定具有空间采样截止的光学相位噪声滤波器，关闭频率，并且其中相邻点之间的透明点对透明点距离的方差最小化，同时保持透明点放置的随机性。

7. 发明授权

US06435840B1 Electrostrictive micro-pump 有权
标题翻译：电动微型泵
公开(公告)号：US06435840B1
公开(公告)日：2002-08-20
申请号：US09747215
申请日：2000-12-21
申请人： Ravi Sharma , Jeffrey I. Hirsh , Gilbert A. Hawkins
发明人： Ravi Sharma , Jeffrey I. Hirsh , Gilbert A. Hawkins
IPC分类号： F04B1700
CPC分类号： F04B43/043 , F04B43/082 , F04B43/12
摘要： An electrostrictive micro-pump is provided for controlling a fluid flow through a cannula or other narrow liquid conduit. The micro-pump includes a pump body having a passageway for conducting a flow of fluid, a pump element formed from a piece of viscoelastic material and disposed in the passageway, and a control assembly coupled to the viscoelastic material for electrostatically inducing a peristaltic wave along the longitudinal axis of the pump element to displace fluid disposed within the pump body. The control assembly includes a pair of electrodes disposed over upper and lower sides of the pump element. The lower electrode is formed from a plurality of uniformly spaced conductive panels, while the upper electrode is a single sheet of conductive material. A switching circuit is provided for actuating the conductive panels of the lower electrode in serial, multiplex fashion to induce a peristaltic pumping action.
摘要翻译：提供了一种电致伸缩微型泵，用于控制通过套管或其他窄液体导管的流体流动。微泵包括具有用于引导流体流动的通道的泵体，由粘弹性材料片形成并设置在通道中的泵元件，以及耦合到粘弹性材料的控制组件，用于静电诱导蠕动波泵元件的纵向轴线以置换设置在泵体内的流体。控制组件包括设置在泵元件的上侧和下侧上的一对电极。下电极由多个均匀间隔的导电板形成，而上电极是单片导电材料。提供了一种开关电路，用于以多重方式串联地驱动下部电极的导电板，以引起蠕动泵送作用。

8. 发明授权

US06406607B1 Method for forming a nozzle plate having a non-wetting surface of uniform thickness and an orifice wall of tapered contour, and nozzle plate 失效
标题翻译：用于形成具有均匀厚度的非润湿表面和锥形轮廓的孔壁的喷嘴板和喷嘴板的方法
公开(公告)号：US06406607B1
公开(公告)日：2002-06-18
申请号：US09709082
申请日：2000-11-10
申请人： Jeffrey I. Hirsh , Edwin A. Mycek , Larry L. Lapa
发明人： Jeffrey I. Hirsh , Edwin A. Mycek , Larry L. Lapa
IPC分类号： C25D102
CPC分类号： B41J2/1631 , B41J2/162 , B41J2/1628 , B41J2/1643 , C25D1/10
摘要： An inkjet printer nozzle plate having a non-wetting surface of uniform thickness and an orifice wall of tapered contour, and method of making the nozzle plate. In the method a metal masking layer is deposited on a glass substrate, the masking layer having an opening therethrough for passage of light only through the opening. Next, a negative photoresist layer is deposited on the masking layer, the negative photoresist layer being capable of photochemically reacting with the light. A light source passes light through the substrate, so that the light also passes only through the opening in the form of a tapered light cone. This tapered light cone will define the tapered contour of a nozzle plate orifice wall to be formed. The negative photoresist layer photochemically reacts with the light only in the light cone to define a light-exposed region of hardened negative photoresist. The negative photoresist layer is thereafter developed to remove negative photoresist surrounding the light-exposed region, so as to define a column of negative photoresist extending into the opening. A layer of non-wetting material is then electroless deposited on the masking layer. A nozzle plate material is now electrodeposited on the non-wetting layer. Next, the column is removed by a solvent and the nozzle plate material having the non-wetting layer adhering thereto is released from the masking layer. In this manner, the nozzle plate having the non-wetting layer of uniform thickness and the orifice wall of tapered contour is made.
摘要翻译：具有均匀厚度的不润湿表面和锥形轮廓的孔壁的喷墨打印机喷嘴板以及制造喷嘴板的方法。在该方法中，金属掩蔽层沉积在玻璃基板上，掩模层具有穿过其的通道，用于仅通过开口。接下来，在掩模层上沉积负性光致抗蚀剂层，负性光致抗蚀剂层能够与光发生光化学反应。光源使光通过基板，使得光也仅以锥形光锥的形式通过开口。该锥形光锥将限定要形成的喷嘴板孔壁的锥形轮廓。负光致抗蚀剂层光光化学地仅在光锥中与光反应以限定硬化的负性光致抗蚀剂的曝光区域。然后显影负性光致抗蚀剂层以去除光暴露区域周围的负光致抗蚀剂，从而限定延伸到开口中的负光致抗蚀剂柱。然后在掩蔽层上无电沉积一层非润湿材料。喷嘴板材料现在电沉积在非润湿层上。接下来，通过溶剂除去该柱，并且将具有粘附在其上的非润湿层的喷嘴板材料从掩蔽层释放。以这种方式，制成具有均匀厚度的非润湿层和锥形轮廓的孔壁的喷嘴板。

9. 发明授权

US06364469B1 Continuous ink jet printing process 失效
标题翻译：连续喷墨印刷工艺
公开(公告)号：US06364469B1
公开(公告)日：2002-04-02
申请号：US09730685
申请日：2000-12-06
申请人： Zhihao Yang , Ravi Sharma , Jeffrey I. Hirsh
发明人： Zhihao Yang , Ravi Sharma , Jeffrey I. Hirsh
IPC分类号： B41J207
CPC分类号： B41J2/02 , B41J2202/03
摘要： An ink jet printing process comprising the steps of; a) providing an ink jet printer in which a continuous stream of ink jet ink is emitted from a nozzle that is responsive to digital data signals; b) loading the printer with an ink jet recording element; c) loading the printer with an inkjet ink comprising a thermally-responsive polymeric material; and d) ejecting ink from a thermally-steered continuous ink jet print head onto one of the ink jet recording elements in response to the digital data signals.
摘要翻译：一种喷墨打印方法，包括以下步骤：a）提供一种喷墨打印机，其中喷墨墨水的连续流从响应于数字数据信号的喷嘴发射; b）用喷墨记录元件 ; c）使用包含热响应聚合物材料的喷墨油墨装载所述打印机; 并且d）响应于数字数据信号将墨从热转印连续喷墨打印头喷射到其中一个喷墨记录元件上。

10. 发明授权

US06626416B2 Electrostrictive valve for modulating a fluid flow 失效
公开(公告)号：US06626416B2
公开(公告)日：2003-09-30
申请号：US09735012
申请日：2000-12-12
申请人： Ravi Sharma , Gilbert A. Hawkins , Jeffrey I. Hirsh
发明人： Ravi Sharma , Gilbert A. Hawkins , Jeffrey I. Hirsh
IPC分类号： F16K3102
CPC分类号： F16K99/0001 , F15C5/00 , F16K7/123 , F16K31/02 , F16K99/0015 , F16K99/0051 , F16K2099/008
摘要： An electrostrictive micro-valve is provided for modulating a fluid flow through a cannula or other narrow liquid conduit. The micro-valve includes a valve body having a passageway for conducting a flow of fluid, a valve element formed from a piece of viscoelastic material and disposed in the passageway, and a control assembly coupled to the viscoelastic material for electrostatically controlling the shape of the material to open or close the passageway. The valve element has a flat lower side connected to an inner wall of the passage of the valve body, and an upper side which faces an opposing wall within the passageway. The control assembly includes a pair of electrodes disposed over the upper and lower sides of the valve element. The electrode facing the lower side of the element is patterned so that localized electrostatic forces are generated across the viscoelastic material when a voltage is applied across both electrodes. Localized electrostatic forces generate a sinusoidal ripple throughout the viscoelastic material forming the valve element whose peak portions act as obstructions throughout the valve body that partially or completely obstruct a fluid flow.

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