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1. 发明授权

US06477786B1 Apparatus for drying batches of disks 有权
标题翻译：用于干燥批次的盘的装置
公开(公告)号：US06477786B1
公开(公告)日：2002-11-12
申请号：US09579837
申请日：2000-05-26
申请人： Oliver David Jones , Kenneth C. McMahon , Jonathan Borkowski , Scott Petersen , Donald Stephens , Yassin Mehmandoust , James M. Olivas
发明人： Oliver David Jones , Kenneth C. McMahon , Jonathan Borkowski , Scott Petersen , Donald Stephens , Yassin Mehmandoust , James M. Olivas
IPC分类号： F26B1900
CPC分类号： H01L21/67057 , H01L21/67034 , H01L21/67046 , H01L21/6776
摘要： Liquid is removed from batches of substrates by apparatus and methods for drying substrates that have been wet in an elongated liquid bath. The substrates are moved relative to the bath and an elongated gas-filled volume at rates of movement selected according to the location of the batches of substrates in the bath or the volume. As an example, the substrates and the bath are separated at a controlled rate to form a thin layer of liquid on each substrate as each substrate enters the gas-filled volume. The gas-filled volume is defined by an elongated hot chamber and hot gas directed into the volume and across the substrates and out of the volume continuously transfers thermal energy to the substrates . The flow rate of the gas into the volume is related to introduction of the substrates into the bath to avoid disturbing the liquid in the bath. The thermal energy transferred to the substrates in the volume evaporates the thin layer from the substrates without decreasing the rate of separation of the substrates and the bath below the maximum rate of such separation at which a meniscus will form between the bath and the surface of one of the substrates during such separation. Relative humidity in the volume is controlled by sensing the relative humidity and regulating the speed of a fan that draws gas from the volume.
摘要翻译：通过用于干燥在细长液体浴中润湿的基底的装置和方法从批次的基底中除去液体。衬底相对于浴移动，并且根据衬底批次在浴中的位置或体积选择移动速率的细长气体填充体积。作为示例，基板和浴以受控的速率分离，以在每个基板进入气体填充体积时在每个基板上形成薄层的液体。气体填充体积由细长的热室和引导到体积中并跨过衬底的热气体限定，并且在体积之外连续地将热能传递到衬底。进入体积的气体的流速与将基底引入浴中以避免干扰浴中的液体有关。在体积中转移到基底的热能从衬底中蒸发薄层，而不会降低衬底和浴的分离速率低于这种分离的最大速率，其中在浴和表面之间形成弯液面在这种分离过程中。通过感测相对湿度并调节从体积吸取气体的风扇的速度来控制体积中的相对湿度。

2. 发明授权

US06446355B1 Disk drying apparatus and method 有权
标题翻译：盘式干燥装置及方法
公开(公告)号：US06446355B1
公开(公告)日：2002-09-10
申请号：US09579841
申请日：2000-05-26
申请人： Oliver David Jones , Kenneth C. McMahon , Jonathan Borkowski , Scott Petersen , Donald Stephens , Yassin Mehmandoust , James M. Olivas
发明人： Oliver David Jones , Kenneth C. McMahon , Jonathan Borkowski , Scott Petersen , Donald Stephens , Yassin Mehmandoust , James M. Olivas
IPC分类号： F26B334
CPC分类号： H01L21/67057 , H01L21/67034 , H01L21/67046 , H01L21/6776
摘要： Liquid is removed from disks by apparatus and methods for drying a disk that has been wet in a liquid bath. The disk and the bath are separated at a controlled rate to form a monolayer of liquid on the disk as the disk is positioned in a gas-filled volume. The separation may be by moving the disk out of the liquid bath, and the controlled rate is generally not less than the maximum rate at which a meniscus will form between the liquid bath and the surface of the disk when the liquid bath and the disk are separated. The gas-filled volume is defined by a hot chamber that continuously transfers thermal energy to the disk in the gas-filled volume. Hot gas directed into the volume and across the disk and out of the volume continuously transfers thermal energy to the disk. The directing of the gas out of the volume is independent of the separation of the bath and the disk. The thermal energy transferred to the disk in the volume evaporates the monolayer from the disk without decreasing the rate of separation of the disk and the bath below the maximum rate of such separation at which a meniscus will form between the bath and the surface of the disk during such separation. In addition to such separation, and directing of the hot gas across the disk and out of the volume, the relative humidity in the volume is kept low to inhibit recondensation of the liquid on the disks.
摘要翻译：通过用于干燥已经在液浴中润湿的盘的装置和方法将液体从盘上除去。当盘被定位在充气体积中时，盘和浴以受控的速率分离以在盘上形成单层液体。分离可以是通过将液体槽移出液槽，并且控制速率通常不低于当液体浴和盘是液体槽时在液体浴和盘表面之间形成弯液面的最大速率分开充气体积由热室确定，其在气体填充体积中将热能连续传递到盘。引导到体积中并跨越盘并且离开体积的热气体将热能连续传递到盘。将气体引导到体积中是与浴和盘的分离无关的。在体积中传递到盘的热能从盘中蒸发单层而不降低盘和浴的分离速率低于在浴和表面之间形成弯液面的最大速率的最大速率在这种分离过程中。除了这种分离之外，还引导热气体穿过盘并离开体积，体积中的相对湿度保持较低，以防止液体在盘上的再冷凝。

3. 发明授权

US06430841B1 Apparatus for drying batches of wafers 有权
标题翻译：用于干燥批次的晶片的装置
公开(公告)号：US06430841B1
公开(公告)日：2002-08-13
申请号：US09580825
申请日：2000-05-26
申请人： Jonathan Borkowski , Oliver David Jones , Kenneth C. McMahon , Scott Petersen , Donald Stephens , Yassin Mehmandoust , James M. Olivas
发明人： Jonathan Borkowski , Oliver David Jones , Kenneth C. McMahon , Scott Petersen , Donald Stephens , Yassin Mehmandoust , James M. Olivas
IPC分类号： F26B2108
CPC分类号： H01L21/67057 , H01L21/67034 , H01L21/67046 , H01L21/6776
摘要： Liquid is removed from batches of substrates by apparatus and methods for drying substrates that have been wet in an elongated liquid bath. The substrates are moved relative to the bath and an elongated gas-filled volume at rates of movement selected according to the location of the batches of substrates in the bath or the volume. As an example, the substrates and the bath are separated at a controlled rate to form a thin layer of liquid on each substrate as each substrate enters the gas-filled volume. The gas-filled volume is defined by an elongated hot chamber and hot gas directed into the volume and across the substrates and out of the volume continuously transfers thermal energy to the substrates. The flow rate of the gas into the volume is related to introduction of the substrates into the bath to avoid disturbing the liquid in the bath. The thermal energy transferred to the substrates in the volume evaporates the thin layer from the substrates without decreasing the rate of separation of the substrates and the bath below the maximum rate of such separation at which a meniscus will form between the bath and the surface of one of the substrates during such separation. Relative humidity in the volume is controlled by sensing the relative humidity and regulating the speed of a fan that draws gas from the volume.
摘要翻译：通过用于干燥在细长液体浴中润湿的基底的装置和方法从批次的基底中除去液体。衬底相对于浴移动，并且根据衬底批次在浴中的位置或体积选择移动速率的细长气体填充体积。作为示例，基板和浴以受控的速率分离，以在每个基板进入气体填充体积时在每个基板上形成薄层的液体。气体填充体积由细长的热室和引导到体积中并跨过衬底的热气体限定，并且在体积之外连续地将热能传递到衬底。进入体积的气体的流速与将基底引入浴中以避免干扰浴中的液体有关。在体积中转移到基底的热能从衬底中蒸发薄层，而不会降低衬底和浴的分离速率低于这种分离的最大速率，其中在浴和表面之间形成弯液面在这种分离过程中。通过感测相对湿度并调节从体积吸取气体的风扇的速度来控制体积中的相对湿度。

4. 发明授权

US06615510B2 Wafer drying apparatus and method 有权
标题翻译：晶圆干燥装置及方法
公开(公告)号：US06615510B2
公开(公告)日：2003-09-09
申请号：US10230846
申请日：2002-08-28
申请人： Oliver David Jones , Kenneth C. McMahon , Jonathan E. Borkowski , Scott Petersen , Donald E. Stephens , Yassin Mehmandoust , James M. Olivas
发明人： Oliver David Jones , Kenneth C. McMahon , Jonathan E. Borkowski , Scott Petersen , Donald E. Stephens , Yassin Mehmandoust , James M. Olivas
IPC分类号： F26B300
CPC分类号： H01L21/67057 , H01L21/67034 , H01L21/67046 , H01L21/6776
摘要： Liquid is removed from wafers for drying a wafer that has been wet in a liquid bath. The wafer and the bath are separated at a controlled rate as the wafer is positioned in a gas-filled volume. The controlled rate is generally not less than the maximum rate at which a meniscus will form between the liquid bath and the surface of the wafer when the liquid bath and the wafer are separated. The gas-filled volume is defined by a hot chamber that continuously transfers thermal energy to the wafer in the gas-filled volume. Hot gas directed into the volume and across the wafer and out of the volume continuously transfers thermal energy to the wafer.
摘要翻译：将液体从晶片上除去，以干燥已在液体浴中湿润的晶片。当晶片定位在气体填充的体积中时，以受控的速率分离晶片和浴。控制速率通常不低于当液浴和晶片分离时在液槽和晶片表面之间形成弯液面的最大速率。充气体积由热室定义，其在气体填充体积中将热能连续传递到晶片。引导到体积中并跨越晶片并且离开体积的热气体将热能连续传递到晶片。

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