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1. 发明授权

US07002168B2 Dense plasma focus radiation source 失效
标题翻译：密集等离子体聚焦辐射源
公开(公告)号：US07002168B2
公开(公告)日：2006-02-21
申请号：US10442544
申请日：2003-05-21
申请人： Jonah Jacob , Joseph A. Mangano , James Moran , Alexander Bykanov , Rodney Petr , Mordechai Rokni
发明人： Jonah Jacob , Joseph A. Mangano , James Moran , Alexander Bykanov , Rodney Petr , Mordechai Rokni
IPC分类号： H01J35/00
CPC分类号： H05G2/003 , H05G2/006 , H05H1/48
摘要： A dense plasma focus radiation source for generating EUV radiation using Lithium vapor and including a coaxially disposed anode and cathode. The invention includes methods and apparatuses for enhancing the efficiency of EUV radiation production, for protecting, cooling and extending the life of the anode and cathode, for protecting and shielding collecting optics from debris and pressure disturbances in the discharge chamber, and for feeding Lithium into the discharge chamber.
摘要翻译：一种致密的等离子体聚焦辐射源，用于使用锂蒸汽产生EUV辐射，并包括同轴设置的阳极和阴极。本发明包括用于提高EUV辐射生产效率的方法和装置，用于保护，冷却和延长阳极和阴极的寿命，用于保护和屏蔽聚集光学元件不受放电室中的碎片和压力扰动的影响，并将锂进入放电室。

2. 发明申请

US20060289806A1 LPP EUV drive laser input system 失效
标题翻译： LPP EUV驱动激光输入系统
公开(公告)号：US20060289806A1
公开(公告)日：2006-12-28
申请号：US11168785
申请日：2005-06-28
申请人： Rodney Simmons , John Viatella , Jerzy Hoffman , R. Webb , Alexander Bykanov , Oleh Khodykin
发明人： Rodney Simmons , John Viatella , Jerzy Hoffman , R. Webb , Alexander Bykanov , Oleh Khodykin
IPC分类号： G21G4/00
CPC分类号： H05G2/001
摘要： A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.
摘要翻译：公开了一种激光产生的等离子体（“LPP”）极紫外（“EUV”）光源及其操作方法，其可以包括具有室壁的EUV等离子体生产室; 在室壁中的驱动激光入口窗口; 在入口窗口中间的驱动激光入口外壳和腔室内的等离子体起始位置，并且包括入口外壳远端开口; 在远端开口和入口窗之间的至少一个孔板包括至少一个驱动激光通道孔。至少一个孔板可以包括至少两个孔板，其包括限定孔板中间空间的第一孔板和第二孔板。至少一个驱动激光孔通道可以包括至少两个驱动激光孔通道。激光通道孔可以限定足够大的开口，使得驱动激光束通过而不衰减，并且足够小以基本上减少通过入口窗口方向的穿过激光通道孔的碎屑。

3. 发明申请

US20070001131A1 LPP EUV light source drive laser system 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：US20070001131A1
公开(公告)日：2007-01-04
申请号：US11174299
申请日：2005-06-29
申请人： Alexander Ershov , Alexander Bykanov , Oleh Khodykin , Igor Fomenkov
发明人： Alexander Ershov , Alexander Bykanov , Oleh Khodykin , Igor Fomenkov
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100mum的EUV目标液滴上，如果在所涉及的几何形状的约束条件下聚焦镜头。驱动激光器可以包括CO 2激光器。驱动激光重定向机构可以包括镜子。

4. 发明申请

US20060192154A1 Method and apparatus for EUV plasma source target delivery 有权
标题翻译：用于EUV等离子体源目标传递的方法和装置
公开(公告)号：US20060192154A1
公开(公告)日：2006-08-31
申请号：US11067124
申请日：2005-02-25
申请人： J. Algots , Igor Fomenkov , Alexander Ershov , William Partlo , Richard Sandstrom , Oscar Hemberg , Alexander Bykanov , Dennis Cobb
发明人： J. Algots , Igor Fomenkov , Alexander Ershov , William Partlo , Richard Sandstrom , Oscar Hemberg , Alexander Bykanov , Dennis Cobb
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
摘要翻译：公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

5. 发明申请

US20060193997A1 Method and apparatus for EUV plasma source target delivery target material handling 失效
标题翻译：用于EUV等离子体源目标传送目标材料处理的方法和装置
公开(公告)号：US20060193997A1
公开(公告)日：2006-08-31
申请号：US11067073
申请日：2005-02-25
申请人： Alexander Bykanov
发明人： Alexander Bykanov
IPC分类号： C23C8/00
CPC分类号： H05G2/003 , B82Y10/00 , C22B4/005 , C22B9/04 , C22B9/05 , C22B26/12 , C23C4/123 , G03F7/70033 , H05G2/005 , H05G2/006
摘要： An EUV target delivery system and method are disclosed which may comprise: a target material purification system connected to deliver liquid target material comprising: a first container and a second container in fluid contact with the target material reservoir; a filter intermediate the first chamber and the second chamber; a liquid target material agitation mechanism, or at least one purification chamber containing the target material in a form reactive with impurities contained in the inert gas reacting with such impurities and removing from the inert gas the impurities, or providing an evaporation chamber in fluid communication with an impurity chamber and with a target droplet mechanism liquid target material reservoir and containing liquid source material; heating the liquid source material to a first temperature sufficient to evaporate a first set of contaminants; heating the liquid source material to a second temperature sufficient to evaporate lithium.
摘要翻译：公开了一种EUV靶递送系统和方法，其可以包括：连接到输送液体目标材料的靶材料净化系统，包括：第一容器和与所述靶材料储存器流体接触的第二容器; 位于第一室和第二室之间的过滤器; 液体目标材料搅拌机构或至少一个净化室，其含有与惰性气体中包含的杂质反应的形式与该杂质反应的物质，并从惰性气体中除去杂质，或提供与一个杂质室和一个目标液滴机构液体目标物料储存器，并含有液体源材料; 将液体源材料加热到足以蒸发第一组污染物的第一温度; 将液体源材料加热至足以蒸发锂的第二温度。

6. 发明申请

US20060192152A1 LPP EUV light source drive laser system 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：US20060192152A1
公开(公告)日：2006-08-31
申请号：US11217161
申请日：2005-08-31
申请人： Alexander Ershov , Alexander Bykanov , Oleh Khodykin , Igor Fomenkov
发明人： Alexander Ershov , Alexander Bykanov , Oleh Khodykin , Igor Fomenkov
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100mum的EUV目标液滴上，如果在所涉及的几何形状的约束条件下聚焦镜头。驱动激光器可以包括CO 2激光器。驱动激光重定向机构可以包括镜子。

7. 发明申请

US20060249699A1 Alternative fuels for EUV light source 失效
标题翻译： EUV光源的替代燃料
公开(公告)号：US20060249699A1
公开(公告)日：2006-11-09
申请号：US11406216
申请日：2006-04-17
申请人： Norbert Bowering , Oleh Khodykin , Alexander Bykanov , Igor Fomenkov
发明人： Norbert Bowering , Oleh Khodykin , Alexander Bykanov , Igor Fomenkov
IPC分类号： G01J3/10
CPC分类号： H05G2/006 , B82Y10/00 , G21K2201/061 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.
摘要翻译：公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素元素表面。锡化合物可以包括SnBr 4，SnBr 2和SnH 4。另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。

8. 发明申请

US20060192153A1 Source material dispenser for EUV light source 有权
标题翻译： EUV光源源材料分配器
公开(公告)号：US20060192153A1
公开(公告)日：2006-08-31
申请号：US11358983
申请日：2006-02-21
申请人： Alexander Bykanov , Oleh Khodykin
发明人： Alexander Bykanov , Oleh Khodykin
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： A source material dispenser for an EUV light source is disclosed that comprises a source material reservoir, e.g. tube, that has a wall and is formed with an orifice. The dispenser may comprise an electro-actuatable element, e.g. PZT material, that is spaced from the wall and operable to deform the wall and modulate a release of source material from the dispenser. A heat source heating a source material in the reservoir may be provided. Also, the dispenser may comprise an insulator reducing the flow of heat from the heat source to the electro-actuatable element. A method of dispensing a source material for an EUV light source is also described. In one method, a first signal may be provided to actuate the electro-actuatable elements to modulate a release of source material and a second signal, different from the first, may be provided to actuate the electro-actuatable elements to unclog the orifice.
摘要翻译：公开了一种用于EUV光源的源材料分配器，其包括源材料储存器，例如，管，其具有壁并形成有孔。分配器可以包括电致动元件，例如 PZT材料，其与壁间隔开并且可操作以使壁变形并且调制源材料从分配器的释放。可以提供加热储存器中的源材料的热源。此外，分配器可以包括绝缘体，其减少从热源到可电致动元件的热流。还描述了分配用于EUV光源的源材料的方法。在一种方法中，可以提供第一信号来致动电致动元件以调制源材料的释放，并且可以提供与第一信号不同的第二信号以致动电致动元件以阻塞孔口。

9. 发明申请

US20060097203A1 Systems and methods for cleaning a chamber window of an EUV light source 失效
标题翻译：用于清洁EUV光源的室窗的系统和方法
公开(公告)号：US20060097203A1
公开(公告)日：2006-05-11
申请号：US11288868
申请日：2005-11-28
申请人： Alexander Bykanov , William Marx
发明人： Alexander Bykanov , William Marx
IPC分类号： G01J3/10
CPC分类号： G21K1/06 , B08B7/0071 , B82Y10/00 , G01N21/15 , G03F7/70916 , G03F7/70925 , G21K2201/061 , G21K2201/064 , G21K2201/067 , H05G2/001
摘要： Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation. For the system, a subsystem may be positioned outside the chamber and may be operable to pass energy through the window to heat debris accumulating on the inside surface of the window. In a first embodiment, the subsystem may place a flowing, heated gas in contact with the outside surface of the window. In another embodiment, electromagnetic radiation may be passed through the window.
摘要翻译：公开了用于清洁极紫外（EUV）光源的室窗的系统和方法。窗口可以具有面向室内部和相对的外表面的内表面，并且光源可以通过等离子体形成而产生碎屑。对于该系统，子系统可以定位在室外，并且可操作以将能量传递通过窗口以加热积聚在窗口内表面上的碎屑。在第一实施例中，子系统可以使流动的加热气体与窗口的外表面接触。在另一个实施例中，电磁辐射可以通过窗口。

10. 发明申请

US20080179548A1 Laser produced plasma EUV light source 有权
标题翻译：激光产生等离子体EUV光源
公开(公告)号：US20080179548A1
公开(公告)日：2008-07-31
申请号：US11786145
申请日：2007-04-10
申请人： Alexander Bykanov , Norbert Bowering , Igor Fomenkov , David Brandt , Alexander Ershov , Oleh Khodykin , William Partlo
发明人： Alexander Bykanov , Norbert Bowering , Igor Fomenkov , David Brandt , Alexander Ershov , Oleh Khodykin , William Partlo
IPC分类号： H05H1/24
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译：公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预先选定的值以下。在一个实施方案中，气体可以包含氢气，并且在一个具体实施方案中，气体可以包含大于50体积％的氢气。

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