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1. 发明授权

US06429117B1 Method to create copper traps by modifying treatment on the dielectrics surface 有权
标题翻译：通过修改电介质表面处理来产生铜阱的方法
公开(公告)号：US06429117B1
公开(公告)日：2002-08-06
申请号：US09619018
申请日：2000-07-19
申请人： John Sudijono , Yakub Aliyu , Mei Sheng Zhou , Simon Chooi , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu
发明人： John Sudijono , Yakub Aliyu , Mei Sheng Zhou , Simon Chooi , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu
IPC分类号： H01L214763
CPC分类号： H01L21/76831 , H01L21/3105 , H01L21/31633 , H01L21/31695 , H01L21/76807 , H01L21/76814 , H01L21/76826 , Y10S438/958
摘要： A method of preventing metal penetration and diffusion from metal structures formed over a semiconductor structure, comprising the following steps. A semiconductor structure including a patterned dielectric layer is provided. The patterned dielectric layer includes an opening and an upper surface. The dielectric layer surface is then passivated to form a passivation layer. A metal plug is formed within the dielectric layer opening. The passivation layer prevents penetration and diffusion of metal out from the metal plug into the semiconductor structure and the patterned dielectric layer.
摘要翻译：一种防止在半导体结构上形成的金属结构的金属渗透和扩散的方法，包括以下步骤。提供包括图案化介电层的半导体结构。图案化电介质层包括开口和上表面。然后将介电层表面钝化以形成钝化层。在电介质层开口内形成金属塞。钝化层防止金属从金属插塞渗入并扩散到半导体结构和图案化的介电层中。

2. 发明授权

US06475810B1 Method of manufacturing embedded organic stop layer for dual damascene patterning 失效
标题翻译：用于双镶嵌图案的嵌入式有机停止层的制造方法
公开(公告)号：US06475810B1
公开(公告)日：2002-11-05
申请号：US09636579
申请日：2000-08-10
申请人： Mei Sheng Zhou , John Leonard Sudijono , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu , Simon Chooi , Yakub Aliyu
发明人： Mei Sheng Zhou , John Leonard Sudijono , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu , Simon Chooi , Yakub Aliyu
IPC分类号： H01L2158
CPC分类号： H01L21/76834 , H01L21/31116 , H01L21/31138 , H01L21/76807 , H01L21/76832
摘要： A new method of forming a dual damascene interconnect structure, wherein damage of interconnect and contamination of dielectrics during etching is minimized by having an embedded organic stop layer over the lower interconnect and later etching the organic stop layer with an H2 containing plasma, or hydrogen radical.
摘要翻译：形成双镶嵌互连结构的新方法，其中在蚀刻期间互连和电介质污染的损害最小化，在下互连上具有嵌入的有机阻挡层，并且随后用含H2的等离子体或氢自由基蚀刻有机阻挡层。

3. 发明授权

US06720204B2 Method of using hydrogen plasma to pre-clean copper surfaces during Cu/Cu or Cu/metal bonding 有权
标题翻译：在Cu / Cu或Cu /金属接合期间使用氢等离子体预清洁铜表面的方法
公开(公告)号：US06720204B2
公开(公告)日：2004-04-13
申请号：US10120836
申请日：2002-04-11
申请人： John Leonard Sudijono , Yakub Aliyu , Mei Sheng Zhou , Simon Chooi , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu
发明人： John Leonard Sudijono , Yakub Aliyu , Mei Sheng Zhou , Simon Chooi , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu
IPC分类号： H01L2144
CPC分类号： H01L24/05 , C23G5/00 , H01L21/02046 , H01L21/32136 , H01L23/4824 , H01L24/03 , H01L24/45 , H01L24/48 , H01L24/49 , H01L24/85 , H01L2224/04042 , H01L2224/05001 , H01L2224/05073 , H01L2224/05118 , H01L2224/05124 , H01L2224/05155 , H01L2224/05166 , H01L2224/05556 , H01L2224/05624 , H01L2224/05644 , H01L2224/05647 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/4813 , H01L2224/4846 , H01L2224/48463 , H01L2224/4847 , H01L2224/48624 , H01L2224/48644 , H01L2224/48647 , H01L2224/48724 , H01L2224/48747 , H01L2224/48824 , H01L2224/48844 , H01L2224/48847 , H01L2224/49111 , H01L2224/85013 , H01L2224/85201 , H01L2224/85203 , H01L2224/85205 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01015 , H01L2924/01018 , H01L2924/01022 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01327 , H01L2924/05042 , H01L2924/13055 , H01L2924/13091 , H01L2924/14 , H01L2924/19042 , H01L2924/19043 , H01L2924/00014 , H01L2924/00 , H01L2224/48744 , H01L2924/00015
摘要： A method of bonding a wire to a metal bonding pad, comprising the following steps. A semiconductor die structure having an exposed metal bonding pad within a chamber is provided. The bonding pad has an upper surface. A hydrogen-plasma is produced within the chamber from a plasma source. The metal bonding pad is pre-cleaned and passivated with the hydrogen-plasma to remove any metal oxide formed on the metal bonding pad upper surface. A wire is then bonded to the passivated metal bonding pad.
摘要翻译：一种将金属丝焊接到金属焊盘上的方法，包括以下步骤。提供一种在室内具有暴露的金属接合焊盘的半导体管芯结构。接合垫具有上表面。在等离子体源室内产生氢等离子体。用氢 - 等离子体对金属接合垫进行预清洁和钝化以去除在金属焊盘上表面上形成的任何金属氧化物。然后将线接合到钝化金属接合焊盘。

4. 发明授权

US06692579B2 Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence 失效
标题翻译：在重复气相/液相序列中使用烃和溶剂清洗半导体结构的方法
公开(公告)号：US06692579B2
公开(公告)日：2004-02-17
申请号：US09764244
申请日：2001-01-19
申请人： Sudipto Ranendra Roy , Yi Xu , Simon Chooi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono , Paul Kwok Keung Ho , Subhash Gupta
发明人： Sudipto Ranendra Roy , Yi Xu , Simon Chooi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono , Paul Kwok Keung Ho , Subhash Gupta
IPC分类号： B08B300
CPC分类号： H01L21/02057 , B08B3/00 , C11D7/24 , C11D7/5027 , C11D11/0047 , H01L21/02063 , H01L21/6704
摘要： A method for cleaning a semiconductor structure using vapor phase condensation with a thermally vaporized cleaning agent, a hydrocarbon vaporized by pressure variation, or a combination of the two. In the thermally vaporized cleaning agent process, a semiconductor structure is lowered into a vapor blanket in a thermal gradient cleaning chamber at atmospheric pressure formed by heating a liquid cleaning agent below the vapor blanket and cooling the liquid cleaning agent above the vapor blanket causing it to condense and return to the bottom of the thermal gradient cleaning chamber. The semiconductor structure is then raised above the vapor blanket and the cleaning agent condenses on all of the surfaces of the semiconductor structure removing contaminants and is returned to the bottom of the chamber by gravity. In the pressurized hydrocarbon process, a semiconductor structure is placed into a variable pressure cleaning chamber, having a piston which changes the pressure by reducing or increasing the volume of the chamber. The semiconductor structure first exposed to the hydrocarbon in vapor phase, then the piston is lowered to condense the hydrocarbon. A semiconductor structure can be cleaned by either or both of these processes by repetitive vaporization/condensation cycles.
摘要翻译：一种使用与气相清洗剂进行气相冷凝的半导体结构，通过压力变化蒸发的烃或两者的组合来清洗半导体结构的方法。在热蒸发清洗剂方法中，半导体结构在大气压力的热梯度清洗室内被降低成蒸气层，所述热梯度清洗室通过将蒸气层下方的液体清洗剂加热而形成，并将该液体清洁剂冷却至蒸气层以上冷凝并返回到热梯度清洗室的底部。然后将半导体结构升高到蒸气层上方，并且清洁剂在半导体结构的所有表面上冷凝除去杂质，并通过重力返回到室的底部。在加压烃工艺中，将半导体结构放置在可变压力清洁室中，其具有通过减小或增加室的体积来改变压力的活塞。半导体结构首先暴露于气相中的烃，然后降低活塞以使烃冷凝。半导体结构可以通过这些过程中的任一个或两者通过重复的蒸发/冷凝循环进行清洁。

5. 发明授权

US06261955B1 Application of vapor phase HFACAC-based compound for use in copper decontamination and cleaning processes 失效
标题翻译：应用气相HFACAC基化合物用于铜去污和清洗过程
公开(公告)号：US06261955B1
公开(公告)日：2001-07-17
申请号：US09618262
申请日：2000-07-18
申请人： Yakub Aliyu , Simon Chooi , Mei Sheng Zhou , John Leonard Sudijono , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu
发明人： Yakub Aliyu , Simon Chooi , Mei Sheng Zhou , John Leonard Sudijono , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu
IPC分类号： H01L2144
CPC分类号： H01L21/02046 , C23F1/12 , H01L21/02079 , Y10S438/906
摘要： An effective copper decontamination method in the fabrication of integrated circuits is achieved. An organic-based HFACAC decontamination compound in vapor phase is sprayed over elemental copper found on equipment or tools or as a spill wherein the compound reacts with all of the elemental copper and forms a volatile compound that can be flushed away thereby completing copper decontamination.
摘要翻译：实现了集成电路制造中有效的铜去污方法。蒸气相中的基于有机的HFACAC去污化合物喷洒在设备或工具上发现的元素铜上，或作为溢出物喷洒，其中化合物与所有元素铜反应并形成可被冲洗掉的挥发性化合物，从而完成铜去污。

6. 发明授权

US06683002B1 Method to create a copper diffusion deterrent interface 失效
公开(公告)号：US06683002B1
公开(公告)日：2004-01-27
申请号：US09636580
申请日：2000-08-10
申请人： Simon Chooi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu
发明人： Simon Chooi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono , Subhash Gupta , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Yi Xu
IPC分类号： H01L2144
CPC分类号： H01L21/76844 , H01L21/28556 , H01L21/31111 , H01L21/314 , H01L21/76807
摘要： Method and product for forming a dual damascene interconnect structure, wherein depositing a copper sulfide interface layer as sidewalls to the opening deters migration or diffusing of copper ions into the dielectric material.

7. 发明授权

US06350689B1 Method to remove copper contamination by using downstream oxygen and chelating agent plasma 失效
标题翻译：使用下游氧和螯合剂等离子体去除铜污染的方法
公开(公告)号：US06350689B1
公开(公告)日：2002-02-26
申请号：US09839962
申请日：2001-04-23
申请人： Paul Ho , Simon Chooi , Yakub Aliyu , Mei Sheng Zhou , John Sudijono , Subhash Gupta , Sudipto Ranendra Roy , Yi Xu
发明人： Paul Ho , Simon Chooi , Yakub Aliyu , Mei Sheng Zhou , John Sudijono , Subhash Gupta , Sudipto Ranendra Roy , Yi Xu
IPC分类号： H01L2144
CPC分类号： H01L21/02074 , H01L21/02046 , H01L21/0209 , H01L21/32136 , Y10S438/906
摘要： A method of removing copper contamination from a semiconductor wafer, comprising the following steps. A semiconductor wafer having copper contamination thereon is provided. An oxidizing radical containing downstream plasma is provided from a first source (alternatively halogen (F2, Cl2, or Br2) may be used as on oxidizing agent). A vaporized chelating agent is provided from a second source. The oxidizing radical containing downstream plasma and vaporized chelating agent are mixed to form an oxidizing radical containing downstream plasma/vaporized chelating agent mixture. The mixture is directed to the copper contamination so that the mixture reacts with the copper contamination to form a volatile product. The volatile product is removed from the proximity of the wafer.
摘要翻译：一种从半导体晶片去除铜污染的方法，包括以下步骤。提供其上具有铜污染的半导体晶片。从第一来源提供含有下游等离子体的氧化基团（或者可以在氧化剂上使用卤素（F2，Cl2或Br2））。从第二来源提供蒸发的螯合剂。将含有下游等离子体和气化螯合剂的氧化基团混合以形成含有下游等离子体/汽化螯合剂混合物的氧化基团。混合物被引导到铜污染物，使得混合物与铜污染物反应形成挥发性产物。从晶片附近去除挥发性产物。

8. 发明授权

US06540841B1 Method and apparatus for removing contaminants from the perimeter of a semiconductor substrate 失效
标题翻译：从半导体衬底的周边去除污染物的方法和装置
公开(公告)号：US06540841B1
公开(公告)日：2003-04-01
申请号：US09607284
申请日：2000-06-30
申请人： Sudipto Ranendra Roy , Subhash Gupta , Simon Chooi , Xu Yi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono , Paul Kwok Keung Ho
发明人： Sudipto Ranendra Roy , Subhash Gupta , Simon Chooi , Xu Yi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono , Paul Kwok Keung Ho
IPC分类号： B08B700
CPC分类号： B08B1/04 , B08B3/04
摘要： A new method and apparatus is provided that can be applied to clean outer edges of semiconductor substrates. Under the first embodiment of the invention, a brush is mounted on the surface of the substrate around the periphery of the substrate, chemicals are fed to the surface that is being cleaned by means of a hollow core on which the cleaning brush is mounted. The surface that is being cleaned rotates at a relatively high speed thereby causing the chemicals that are deposited on this surface (by the brush) to remain in the edge of the surface. Under the second embodiment of the invention, a porous roller is mounted between a chemical reservoir and the surface that is being cleaned, the surface that is being cleaned rotates at a relatively high speed. The chemicals that are deposited by the interfacing porous roller onto the surface that is being cleaned therefore remain at the edge of this surface thereby causing optimum cleaning action of the edge of the surface. After contaminants have been removed in this manner from the surface, the surface can be further cleaned by applying DI water.
摘要翻译：提供了可用于清洁半导体衬底的外边缘的新方法和装置。在本发明的第一实施例中，刷子安装在基板周围的基板的表面上，化学品通过其上安装有清洁刷的中空芯被供给到待清洁的表面。待清洁的表面以相对高的速度旋转，从而使沉积在该表面（由刷子）上的化学物质残留在表面的边缘。在本发明的第二实施例中，多孔辊安装在化学容器和待清洁的表面之间，待清洁的表面以相对较高的速度旋转。因此，由界面多孔辊沉积在待清洗的表面上的化学物质保留在该表面的边缘，从而引起表面边缘的最佳清洁作用。污染物以这种方式从表面除去后，可以通过加入去离子水进一步清洁表面。

9. 发明授权

US06358821B1 Method of copper transport prevention by a sputtered gettering layer on backside of wafer 有权
标题翻译：通过晶片背面的溅射吸气层预防铜传输的方法
公开(公告)号：US06358821B1
公开(公告)日：2002-03-19
申请号：US09619376
申请日：2000-07-19
申请人： Subhash Gupta , Simon Chooi , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Xu Yi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono
发明人： Subhash Gupta , Simon Chooi , Sudipto Ranendra Roy , Paul Kwok Keung Ho , Xu Yi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono
IPC分类号： H01L2122
CPC分类号： H01L21/3221 , C23C14/165 , H01L21/2885
摘要： A method of preventing copper transport on a semiconductor wafer, comprising the following steps. A semiconductor wafer having a front side and a backside is provided. Metal, selected from the group comprising aluminum, aluminum-copper, aluminum-silicon, and aluminum-copper-silicon is sputtered on the backside of the wafer to form a layer of metal. The back side sputtered aluminum layer may be partially oxidized at low temperature to further decrease the copper penetration possibility and to also provide greater flexibility in subsequent copper interconnect related processing. Once the back side layer is in place, the wafer can be processed as usual. The sputtered back side aluminum layer can be removed during final backside grinding.
摘要翻译：一种防止半导体晶片上的铜传输的方法，包括以下步骤。提供具有正面和背面的半导体晶片。从包括铝，铝 - 铜，铝 - 硅和铝 - 铜 - 硅的组中选择的金属溅射在晶片的背面以形成一层金属。背面溅射的铝层可以在低温下部分氧化，以进一步降低铜的渗透可能性，并且在随后的铜互连相关处理中也提供更大的灵活性。一旦背面层就位，就可以照常处理晶片。最后的背面研磨可以除去溅射的背面铝层。

10. 发明授权

US06813796B2 Apparatus and methods to clean copper contamination on wafer edge 失效
标题翻译：清洁晶圆边缘铜污染的设备和方法
公开(公告)号：US06813796B2
公开(公告)日：2004-11-09
申请号：US10357137
申请日：2003-02-03
申请人： Sudipto Ranendra Roy , Subhash Gupta , Simon Chooi , Xu Yi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono , Paul Kwok Keung Ho
发明人： Sudipto Ranendra Roy , Subhash Gupta , Simon Chooi , Xu Yi , Yakub Aliyu , Mei Sheng Zhou , John Leonard Sudijono , Paul Kwok Keung Ho
IPC分类号： B08B700
CPC分类号： B08B1/04 , B08B3/04
摘要： A new apparatus is provided that can be applied to clean outer edges of semiconductor substrates. Under the first embodiment of the invention, a brush is mounted on the surface of the substrate around the periphery of the substrate, chemicals are fed to the surface that is being cleaned by means of a hollow core on which the cleaning brush is mounted. The surface that is being cleaned rotates at a relatively high speed thereby causing the chemicals that are deposited on this surface (by the brush) to remain in the edge of the surface. Under the second embodiment of the invention, a porous roller is mounted between a chemical reservoir and the surface that is being cleaned, the surface that is being cleaned rotates at a relatively high speed. The chemicals that are deposited by the interfacing porous roller onto the surface that is being cleaned therefore remain at the edge of this surface thereby causing optimum cleaning action of the edge of the surface. After contaminants have been removed in this manner from the surface, the surface can be further cleaned by applying DI water.
摘要翻译：提供了可用于清洁半导体衬底的外边缘的新设备。在本发明的第一实施例中，刷子安装在基板周围的基板的表面上，化学品通过其上安装有清洁刷的中空芯被供给到被清洁的表面。待清洁的表面以相对高的速度旋转，从而使沉积在该表面（由刷子）上的化学物质残留在表面的边缘。在本发明的第二实施例中，多孔辊安装在化学容器和待清洁的表面之间，待清洁的表面以相对较高的速度旋转。因此，由界面多孔辊沉积在待清洗的表面上的化学物质保留在该表面的边缘，从而引起表面边缘的最佳清洁作用。污染物以这种方式从表面除去后，可以通过加入去离子水进一步清洁表面。

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